• 한국전기전자재료학회:학술대회논문집
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• 한국전기전자재료학회 2003년도 추계학술대회 논문집 Vol.16
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• pp.329-331
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• 2003

In this paper, $0.10Pb(Sb_{1/2}Sn_{1/2})O_3-0.25PbTiO_3-0.65PbZrO_3$ ceramics were fabricated by the mixed-oxide method. The sintering temperature and time were $1230^{\circ}C$ and 2(hr), respectively. The structural, dielectric and pyroelectric properties with addition of $Y_2O_3$ were studied. The crystal structure of a specimen was rhombohedral. As a result of SEM, the average grain size were decreased with increasing the contents of $Y_2O_3$. Relative dielectric constant and dielectric loss of the specimen doped with 0.2wt% $Y_2O_3$ were 597 and 0.022, respectively. Remanent polarization and coercive field of the specimen doped with 0.4wt% $Y_2O_3$ were $8.5[{\mu}C/cm^2]$ and 10.2[kV/cm], respectively.

• 한국재료학회지
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• 제24권5호
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• pp.229-235
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• 2014

In this paper, the effects of precipitates and Mn-solute atoms on the recrystallization behavior of an Al-Mn alloy was studied using micro-Vickers hardness, electrical conductivity measurements and optical microscopy. Various thermo-mechanical processes were designed to investigate the different morphologies, and the solute concentration, of Mn in the matrix. The results indicate that the recrystallization temperature, $T_R$ and time, $t_R$, are influenced by the amount of M-solute atoms in the matrix, and that the recrystallization microstructure is influenced by the amount of precipitates. Recrystallization in the Slow-Cooling specimen was rapid due to its low concentration of Mn-solute atoms, and the crystal-grain size was the smallest due to finely distributed precipitates. However, in the case of the No-Holding specimen, elongated grains were observed at the low annealing temperature and the largest recrystallized grains were observed at the high annealing temperatures (compared with Slow-Cooling and Base specimens) due to the high Mn-solute atoms in the matrix.

• 한국태양에너지학회 논문집
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• 제39권1호
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• pp.33-40
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• 2019

Al-doped ZnO (AZO) thin films were synthesized on Si(100) wafers via plasma enhanced metal organic chemical vapor deposition (PE-MOCVD) method using diethyl zinc (DEZ) and N-methylpyrrolidine alane (MPA) as precursors. Effects of Al/Zn mixing ratio, plasma power on the surface morphology, crystal structure, and electrical property were investigated with SEM, XRD and 4-point probe measurement respectively. Growth rate of the film decreased slightly with increasing the Al/Zn mixing ratio, however electrical property was enhanced and resistivity of the film decreased greatly about 2 orders from $9.5{\times}10^{-1}$ to $8.0{\times}10^{-3}{\Omega}cm$ when the Al/Zn mixing ratio varied from 0 to 9 mol%. XRD analysis showed that the grain size increased with increasing the Al/Zn mixing ratio. Growth rate and electrical property were enhanced in a mild plasma condition. Resistivity of AZO film decreased down to $7.0{\times}10^{-4}{\Omega}cm$ at an indirect plasma of 100 W condition which was enough value to use for the transparent conducting oxide (TCO) material.

• Journal of Ceramic Processing Research
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• 제20권4호
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• pp.395-400
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• 2019

This study was conducted on the structural and electrical properties of (Ba0.7Sr0.3)TiO3 thin films prepared by the sol-gel and spin-coating methods in order to investigate their applicability to electrocaloric devices. All specimens showed a tetragonal crystal structure and lattice constants of a = 3.972 Å, c = 3.970 Å. The mean grain size of specimens sintered at 800 ℃ was about 30 nm, and the average thickness of 5 times coated specimens was 304~311 nm. In the specimen sintered at 750 ℃, The relative dielectric constant and loss of specimens measured at 20 ℃ were 230 and 0.130, respectively, while dependence of the dielectric constant on unit DC voltage was -8.163 %/V. The remanent polarization and coercive fields were 95.5 μC/㎠ and 161.3 kV/cm at 21 ℃, respectively. And, the highest electrocaloric property of 2.69 ℃ was observed when the electric field of 330 kV/cm was applied.

• 한국표면공학회지
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• 제54권1호
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• pp.18-24
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• 2021

KNN is widely used in the electronic industry such as memory devices, sensors, and capacitors due to various structural, electrical, and eco-friendly properties. In this study, Mn-doped KNN was prepared by adopting a sol-gel method with advantages of low cost and large area thin film fabrication. The Mn-doped KNN thin films were deposited by annealing in air for 1 hour and 700℃. The surface morphology characteristics and grain size of the heat-treated KNN were observed by SEM and AFM, and we used the X-ray diffraction for measuring the crystal phase of KNN. The XRD analysis results show that the fabrication of (K0.5Na0.5)(Nb1-xMnn)O3 thin films by sol-gel method in the thin film process of this experiment was stable in the perovskite phase of c-axis orientation. The SEM and AFM results show that the cracks were not confirmed from the fracture surface data of KNN thin films and were densely deposited with thin films with uniform thickness.

• 센서학회지
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• 제31권6호
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• pp.371-375
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• 2022

Antimony-doped tin oxide (ATO) thin films, one type of transparent conductive oxide (TCO) films, were prepared on a SiO₂-coated glass substrate with different substrate temperatures by a radio-frequency magnetron sputtering system. Structural, optical, and electrical characteristics of the deposited ATO films were analyzed using X-ray diffraction, scanning electron microscopy, alpha-step, ultraviolet-visible spectrometer, and Hall effect measurement. The substrate temperature during deposition did not affect the basic crystal structure of the films but changed the grain size and film thickness. The optical transmittance of the ATO films deposited at different substrate temperatures was over 70%. The lowest sheet resistance and resistivity were 8.43 × 10² Ω/sq, and 0.3991 × 10^-2 Ω·cm, respectively, and the highest carrier concentration and mobility were 2.36 × 10²¹ cm^-3 and 6.627 × 10^-2 cm²V^-1s^-1, respectively, at a substrate temperature of 400 ℃.

• 한국결정성장학회지
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• 제31권2호
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• pp.73-77
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• 2021

RF 마그네트론 스퍼터링 공정에 의해 Ga-doped ZnO 박막이 O2 및 Ar 분위기 하에서 증착 조건에 따라 합성되었으며, N2 분위기에서, 600℃에서 급속열처리(RTA)를 실시하였다. 증착된 ZnO : Ga 박막에 대해 두께를 측정하였고, XRD 패턴 분석에 의해 결정상을 조사하였으며, FE-SEM, AFM 이미지에 의해 박막의 미세구조를 관찰하였다. O2 및 Ar 분위기 기체 종류별로 형성된 박막들의 증착 조건에 따라 X-선 회절 패턴의 (002)면의 세기는 상당한 차이를 나타냈다. O2 조건에서는 Ga doping이 이루어진 단일 박막의 경우에서는 강한 세기의 회절피크가 관찰되었다. O2 및 Ar 조건에서는 Ga doping이 이루어진 다층박막의 경우에서는 다소 약한 세기의 (002) 면의 피크만을 나타내었다. FE-SEM image에서는 박막의 표면입자의 크기는 두께가 증가함에 따라 입자크기가 다소 증가하는 것으로 관찰되었다. O2 및 Ar 분위기 조건 하에서, Ga doping이 이루어진 다층박막의 경우에서는, 비저항은 6.4 × 10-4Ω·cm을 나타냈고, O2 분위기 조건하에서, Ga doping이 이루어진 단일 박막의 경우에서는 저항값이 감소하였고, Ga-doped ZnO 박막의 두께가 2 ㎛로 증가하면서 저항이 감소하였으며, 1.0 × 10-3 Ω·cm의 비교적 낮은 비저항 값을 나타내었다.

• 한국결정성장학회지
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• 제31권1호
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• pp.37-42
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• 2021

화학적 조성이 TiZrN 박막의 구조적 특성 및 열적 특성에 미치는 영향을 조사하였다. 증착된 TixZr1-xN(x = 0.87, 0.82, 0.7, 0.6, 0.28) 박막에서 Zr 분율이 증가함에 따라 결정립 크기가 감소하고 주상 구조에서 입계상 구조로 점진적으로 변화하는 미세구조 변화가 관찰되었다. 또한 XRD 분석을 통해 Zr 분율이 0.4까지 증가할 때 TiN 상에서 TiZrN 상으로의 점진적인 결정상 전이가 일어났음을 확인하였다. 900℃ 온도에서의 열처리 이후 Ti0.82Zr0.18N과 Ti0.7Zr0.3N 박막은 rutile 상 TiO2와 TiZrO4 산화물이 공존하는 형태로 전환된 반면에 Ti0.6Zr0.4N 박막은 TiZrO4 산화물로 변화함을 확인하였다. 다섯 가지 조성의 TiZrN 박막 중에서 Ti0.6Zr0.4N 박막이 가장 우수한 고온 안정성을 나타내었고, Inconel 617 기판의 열산화에 의해 발생하는 Cr의 표면 확산을 억제하는 열산화 저항성 향상 효과가 가장 우수함을 확인하였다.

• 한국재료학회지
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• 제33권4호
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• pp.142-150
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• 2023

AZO/Cu/AZO thin films were deposited on glass by RF magnetron sputtering. The specimens showed the preferred orientation of (0002) AZO and (111) Cu. The Cu crystal sizes increased from about 3.7 nm to about 8.5 nm with increasing Cu thickness, and from about 6.3 nm to about 9.5 nm with increasing heat treatment temperatures. The sizes of AZO crystals were almost independent of the Cu thickness, and increased slightly with heat treatment temperature. The residual stress of AZO after heat treatment also increased compressively from -4.6 GPa to -5.6 GPa with increasing heat treatment temperature. The increase in crystal size resulted from grain growth, and the increase in stress resulted from the decrease in defects that accompanied grain growth, and the thermal stress during cooling from heat treatment temperature to room temperature. From the PL spectra, the decrease in defects during heat treatment resulted in the increased intensity. The electrical resistivities of the 4 nm Cu film were 5.9×10^-4 Ω·cm and about 1.0×10^-4 Ω·cm for thicker Cu films. The resistivity decreased as the temperature of heat treatment increased. As the Cu thickness increased, an increase in carrier concentration resulted, as the fraction of AZO/Cu/AZO metal film increased. And the increase in carrier concentration with increasing heat treatment temperature might result from the diffusion of Cu ions into AZO. Transmittance decreased with increasing Cu thicknesses, and reached a maximum near the 500 nm wavelength after being heat treated at 200 ℃.

• 한국재료학회지
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• 제13권3호
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• pp.185-190
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• 2003

Titanium dioxide films were prepared by RF sputtering method on glass for various oxygen partial pressures at power 270 W. The crystal structure, photocatalytic property and the hydrophilicity of $TiO_2$thin film the deposition conditions were investigated. Crystallized anatase phase was observed in $TiO_2$film deposited at the ratio of oxygen partial pressure 10% and 20% for 2 hrs. As the increase of deposition time, the grain size and void size of $TiO_2$film have increased and also $V_2$films have been good crystallinity. The ultraviolet-visible light absorption of $TiO_2$films was increased with increasing of deposition time and occured chiefly at the wavelength between 280 and 340 nm. The absorption band was shifted to a longer wave length as deposition time increased. Water contact angle on the X$TiO_2$film of anatase structure was decreased with increasing ultraviolet illumination time and became lower than $11^{\circ}$ from $83^{\circ}$. When hydrophilic $TiO_2$film changed by enough ultraviolet illumination was stored in the dark, the film surface gradually turned to hydrophobic state.