Korean Journal of Materials Research (한국재료학회지)

Materials Research Society of Korea (한국재료학회)
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Photocatalytic Properties of TiO2 Thin Films Prepared by RF Sputtering

RF Sputtering법으로 제조된 TiO2 박막의 광촉매 특성

  • Jeong, Min-ho (Div. of Advanced Materials Engineering, Chonbuk National University) ;
  • Jin, Duk-yong (Div. of Advanced Materials Engineering, Chonbuk National University) ;
  • Hayashi, Y. (Dep. of Material Science and Engineering Kyushu University) ;
  • Choi, Dae-kue (Dep. of Material Science and Engineering Kyushu University)
  • 정민호 (전북대학교 공과대학 신소재공학부) ;
  • 진덕용 (전북대학교 공과대학 신소재공학부) ;
  • ;
  • 최대규 (구주대학 공학부 재료공학과)
  • Published : 2003.03.01
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Abstract

Titanium dioxide films were prepared by RF sputtering method on glass for various oxygen partial pressures at power 270 W. The crystal structure, photocatalytic property and the hydrophilicity of $TiO_2$thin film the deposition conditions were investigated. Crystallized anatase phase was observed in $TiO_2$film deposited at the ratio of oxygen partial pressure 10% and 20% for 2 hrs. As the increase of deposition time, the grain size and void size of $TiO_2$film have increased and also $V_2$films have been good crystallinity. The ultraviolet-visible light absorption of $TiO_2$films was increased with increasing of deposition time and occured chiefly at the wavelength between 280 and 340 nm. The absorption band was shifted to a longer wave length as deposition time increased. Water contact angle on the X$TiO_2$film of anatase structure was decreased with increasing ultraviolet illumination time and became lower than $11^{\circ}$ from $83^{\circ}$. When hydrophilic $TiO_2$film changed by enough ultraviolet illumination was stored in the dark, the film surface gradually turned to hydrophobic state.

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References

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