• 제목/요약/키워드: Cr2N

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AIP 와 스퍼터링으로 복합증착된 420 스테인리스강의 TiN과 CrN 박막에 미치는 중간층의 영향 (Effect of Interlayer on TiN and CrN Thin Films of STS 420 Hybrid-Deposited by AlP and DC Magnetron Sputtering)

  • 최웅섭;김현승;박범수;이경구;이도재;이광민
    • 한국재료학회지
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    • 제17권5호
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    • pp.256-262
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    • 2007
  • Effects of interlayer and the combination of different coating methods on the mechanical and corrosion behaviors of TiN and CrN coated on 420 stainless steel have been studied. STS 420 specimen were tempered at $300^{\circ}C$ for 1 hr in vacuum furnace. The TiN and CrN thin film with 2 ${\mu}m$ thickness were coated by arc ion plating and DC magnetron sputtering following the formation of interlayer for pure titanium and chromium with 0.2 ${\mu}m$ thickness. The microstructure and surface analysis of the specimen were conducted by using SEM, XRD and roughness tester. Mechanical properties such as hardness and adhesion also were examined. XRD patterns of TiN thin films showed that preferred TiN (111) orientation was observed. The peaks of CrN (111) and $Cr_2N$ (300) were only observed in CrN thin films deposited by arc ion plating. Both TiN and CrN deposited by arc ion plating had the higher adhesion and hardness compared to those formed by magnetron sputtering. The specimen of TiN and CrN on which interlayer deposited by magnetron sputtering and thin film deposited by arc ion plating had the highest adhesion with 22.2 N and 19.2 N. respectively. TiN and CrN samples shown the most noble corrosion potentials when the interlayers were deposited by using magnetron sputtering and the metal nitrides were deposited by using arc ion plating. The most noble corrosion potentials of TiN and CrN were found to be approximately -170 and -70 mV, respectively.

TiAlCrSiN 박막의 고온 산화 부식 (High-temperature Oxidation of the TiAlCrSiN Film)

  • 이동복;김민정
    • 한국표면공학회:학술대회논문집
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    • 한국표면공학회 2016년도 추계학술대회 논문집
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    • pp.107-107
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    • 2016
  • TiCrAlSiN films were developed in order to improve the high-temperature oxidation resistance, corrosion resistance, and mechanical properties of conventional TiN films that are widely used as hard films to protect and increase the lifetime and performance of cutting tools or die molds. In this study, a nano-multilayered TiAlCrSiN film was deposited by cathodic arc plasma deposition. It displayed relatively good oxidation resistance at $700-900^{\circ}C$, owing to the formation protective oxides of $Al_2O_3$, $Cr_2O_3$, and $SiO_2$, and semiprotective $TiO_2$. At $1000^{\circ}C$, the increased temperature led to the formation of the imperfect oxide scale that consisted primarily of the outer ($TiO_2$,$Al_2O_3$)-mixed scale and inner ($TiO_2$, $Al_2O_3$, $Cr_2O_3$)-mixed scale.

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Inductively Coupled Plasma Assisted D.C. Magnetron Sputtering법으로 제작된 TiCrN 코팅층의 특성 분석 (Investigation of the TiCrN Coating Deposited by Inductively Coupled Plasma Assisted DC Magnetron Sputtering.)

  • 차병철;김준호;이병석;김선광;김대욱;김대일;유용주
    • 열처리공학회지
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    • 제22권5호
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    • pp.267-274
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    • 2009
  • Titanium Chromium Nitrided (TiCrN) coatings were deposited on stainless steel 316 L and Si (100) wafer by inductively coupled plasma assisted D.C. magnetron sputtering at the various sputtering power on Cr target and $N_2/Ar$ gas ratio. Increasing the sputtering power of Cr target, XRD patterns were changed from TiCrN to nitride $Cr_2Ti$. The maximum hardness was $Hk_{3g}$ 3900 at $0.3\;N_2/Ar$ gas ratio. The thickness of the TiCrN films increased as the Cr target power increased, and it showed over $Hk_{5g}3100$ hardness at 100 W, 150 W. TiCrN films were deposited by the ICP assisted DC magnetron sputtering shown good wear resistance as the $N_2/Ar$ gas ratio was 0.1, 0.3.

하이브리드 코팅 시스템으로 제조된 초고경도 Cr-Si-C-N 나노복합 코팅막의 미세구조 및 기계적 특성 (Microstructure and Mechanical Properties of Superhard Cr-Si-C-N Coatings Prepared by a Hybrid Coating System)

  • 장철식;허수정;송풍근;김광호
    • 한국표면공학회지
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    • 제38권3호
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    • pp.100-105
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    • 2005
  • Cr-Si-C-N coatings were deposited on steel substrate (SKD 11) by a hybrid system of arc ion plating (AIP) and sputtering techniques. From XRD, XPS, and HRTEM analyses, it was found that Cr-Si-C-N had a fine composite microstructure comprising nano-sized crystallites of Cr(C, N) well distributed in the amorphous phase of $Si_3N_4/SiC$ mixture. Microhardness of Cr(C, N) coatings and Cr-Si-N coatings were reported about $\~22 GPa$ and $\~35 GPa$, respectively. As the Si was incorporated into Cr(C, N) coatings, The Cr-Si-C-N coatings having a Si content of $9.2 at.\%$ showed the maximum hardness value. As increased beyond Si content of $9.2 at.\%$, the interaction between nanocrystallites and amorphous phase was gone, the hardness was reduced as dependent on amorphous phase of $Si_3N_4/SiC$. In addition, the average coefficient of Cr-Si-C-N coatings largely decreased compared with Cr(C, N) coatings.

Effect of Working Pressure and Substrate Bias on Phase Formation and Microstructure of Cr-Al-N Coatings

  • Choi, Seon-A;Kim, Seong-Won;Lee, Sung-Min;Kim, Hyung-Tae;Oh, Yoon-Suk
    • 한국세라믹학회지
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    • 제54권6호
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    • pp.511-517
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    • 2017
  • With different working pressures and substrate biases, Cr-Al-N coatings were deposited by hybrid physical vapor deposition (PVD) method, consisting of unbalanced magnetron (UBM) sputtering and arc ion plating (AIP) processes. Cr and Al targets were used for the arc ion plating and the sputtering process, respectively. Phase analysis, and composition, binding energy, and microstructural analyses were performed using X-ray diffraction (XRD), X-ray photoelectron spectroscopy (XPS), and field emission scanning electron microscopy (FESEM), respectively. Surface droplet size of Cr-Al-N coatings was found to decrease with increasing substrate bias. A decrease of the deposition rate of Cr-Al-N films was expected due to the increase of substrate bias. The coatings were grown with textured CrN phase and (111), (200), and (220) planes. X-ray diffraction data show that all Cr-Al-N coatings shifted to lower diffraction angles due to the addition of Al. The XPS results were used to determine the $Cr_2N$, CrN, and (Cr,Al)N binding energies. The compositions of the Cr-Al-N films were measured by XPS to be Cr 23.2~36.9 at%, Al 30.1~40.3 at%, and N 31.3~38.6 at%.

하이브리드 코팅시스템에 의해 제조된 Cr-Mo-Si-C-N 박막의 미세구조 및 기계적 특성연구 (Microstructure and Mechanical Properties of Cr-Mo-Si-C-N Coatings Deposited by a Hybrid Coating System)

  • 윤지환;안성규;김광호
    • 한국표면공학회지
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    • 제40권6호
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    • pp.279-282
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    • 2007
  • Cr-Mo-Si-C-N coatings were deposited on steel and Si wafer by a hybrid system of AIP and sputtering techniques using Cr, Mo and Si target in $Ar/N_2/CH_4$ gaseous mixture. Instrumental analyses of XRD and XPS revealed that the Cr-Mo-Si-C-N coatings must be a composite consisting of fine(Cr, Mo and Si)(C and N) crystallites and amorphous $Si_3N_4$ and SiC. The hardness value of Cr-Mo-Si-C-N coatings significantly increased from 41 GPa of Cr-Mo-C-N coatings to about 53 GPa with Si content of 9.3 at.% due to the refinement of (Cr, Mo and Si)(C and N) crystallites and the composite microstructure characteristics. A systematic investigation of the microstructures and mechanical properties of Cr-Mo-Si-C-N coatings prepared with various Si contents is reported in this paper.

크롬 질화물(CrN)의 합성 및 촉매특성에 관한 연구 (Synthesis of Chromium Nitride and Evaluation of its Catalytic Property)

  • 이용진;권혁회
    • 공업화학
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    • 제17권5호
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    • pp.451-457
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    • 2006
  • $CrCl_{3}$$NH_{3}$와 반응시켜 약 $850^{\circ}C$에서 표면적이 높은 단일 상 CrN 촉매를 합성하였다. 열질량분석을 통해 고체상 화학변이가 발생하는 온도를 파악하였고 물질의 상을 XRD로 분석하였다. 합성물질의 표면적, 결정크기 등을 분석하였고 합성변수의 영향을 확인하였다. 합성된 질화물의 표면적은 $12{\sim}47m^2/g$이었다. 공간속도는 표면적 증가에 약하게나마 영향을 미쳤는데 반응중간생성물의 빠른 제거가 표면적을 높이는데 기여하는 것으로 파악되었다. 승온환원반응 분석 결과 CrN은 비활성화(passivation)시 거의 산화되지 않아 수소분위기에서의 환원이 거의 일어나지 않았으며 약 $700^{\circ}C$$950^{\circ}C$ 부근에서 결정격자 중의 질소가 $N_{2}$로 분해되었다. 공기분위기에서 10 K/min의 속도로 가열하면 $300^{\circ}C$ 이후의 온도에서 산화가 진행되어 $800^{\circ}C$ 부근에서 $Cr_{2}O_{3}$ 상이 형성되기 시작하였으며 $900^{\circ}C$에서도 완전히 산화되지 않았다. 부탄과 피리딘을 이용한 활성실험 결과 CrN 촉매는 탈수소반응에 선택적으로 높은 활성을 가졌으며 수첨탈질이나 수소분해반응 활성은 거의 없었다. 부탄의 탈수소반응에서 부피반응속도는 상용 촉매인 $Pt-Sn/Al_{2}O_{3}$보다 우수하였다.

Comparative study of microstructure and mechanical properties for films with various deposition rate by magnetron sputtering

  • Nam, Kyung H.;Jung, Yun M.;Han, Jeon G.
    • 한국표면공학회:학술대회논문집
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    • 한국표면공학회 2000년도 추계학술발표회 초록집
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    • pp.12-12
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    • 2000
  • This paper investigated the effect of the film deposition rate for $CrN_x$ microstructure and mechanical properties. For these purpose, pure Cr an stoichiometric CrN films were deposited with various target power density on Si hardened M2 tool steel. The variation of ni trogen concentration in $CrN_x$ f analyzed by AES and deposition rate was calculated by measuring of thickness using ${\alpha}-step$ profilometer. The microstructure was analyzed by X-Ray Diffract and Scanning Electron Microscopy(SEM), and mechanical properties were evalua residual stress, microhardness and adhesion tests. Deposition rate of Cr and CrN increased as an almost linear function of target power density from $0.25\mu\textrm{m}/min$ and $0.15\mu\textrm{m}/min$ to $0.43\mu\textrm{m}/min$. Residual stresses of Cr and CrN films were from tensi Ie to compressive stress with an increase of deposi tion rate a compressive stresses were increased as more augmentation of deposition r maximum hardness value of $2300kg/\textrm{mm}^2$ and the best adhesion strength correspond HF 1 were obtained for CrN film synthesized at the highest target densitY($13.2W/\textrm{mm}^2$) owing to high residual compressive stress and increasing mobility.

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CrAlMgSiN 박막의 600-900℃에서의 대기중 산화 (Oxidation of CrAlMgSiN thin films between 600 and 900℃ in air)

  • 원성빈;;황연상;이동복
    • 한국표면공학회:학술대회논문집
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    • 한국표면공학회 2013년도 춘계학술대회 논문집
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    • pp.112-113
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    • 2013
  • Thin CrAlMgSiN films, whose composition were 30.6Cr-11.1Al-7.3Mg-1.2Si-49.8N (at.%), were deposited on steel substrates in a cathodic arc plasma deposition system. They consisted of alternating crystalline Cr-N and AlMgSiN nanolayers. After oxidation at $800^{\circ}C$ for 200 h in air, a thin oxide layer formed by outward diffusion of Cr, Mg, Al, Fe, and N, and inward diffusion of O ions. Silicon ions were relatively immobile at $800^{\circ}C$. After oxidation at $900^{\circ}C$ for 10 h in air, a thin $Cr_2O_3$ layer containing dissolved ions of Al, Mg, Si, and Fe formed. Silicon ions became mobile at $900^{\circ}C$. After oxidation at $900^{\circ}C$ for 50 h in air, a thin $SiO_2-rich$ layer formed underneath the thin $Cr_2O_3$ layer. The film displayed good oxidation resistance. The main factor that decreased the oxidation resistance of the film was the outward diffusion and subsequent oxidation of Fe at the sample surface, particularly along the coated sample edge.

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고질소 Fe-l8Cr-l8Mn-2Mo-0.9N 강의 미끄럼 마멸 기구 (Sliding Wear Mechanism of the High-Nitrogen Austenitic 18Cr-l8Mn-2Mo-0.9N Steel)

  • 김승덕;김성준;김용석
    • 소성∙가공
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    • 제15권2호
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    • pp.112-117
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    • 2006
  • Sliding wear mechanism of a high nitrogen austenitic 18Cr-18Mn-2Mo-0.9N steel has been investigated. Dry sliding wear tests of the steel were carried out at various loads of IN-10N under a constant sliding speed condition of 0.15m/s against AISI 52100 bearing steel balls. Solution ($1050^{\circ}C$) and isothermal aging ($900^{\circ}C$) heat treatments were performed on the steel and the effect of the heat treatments on the wear was investigated. Wear rates of the solution-treated steel specimen remained low until 5N load, and then increased abruptly at loads above 5N. The rates of isothermally aged specimens were low and increased gradually with the applied load. Worn surfaces, their cross sections, and wear debris of the steel specimens were examined with a scanning electron microscopy. Phases of the heat-treated specimen and the wear debris were identified using XRD. The transformed phase underneath a sliding track was investigated and analyzed using a TEM. Effects of the phase transformation during the wear and $Cr_{2}N$ precipitates formed during the isothermal aging on the wear of the austenitic steel were discussed.