Browse > Article
http://dx.doi.org/10.4191/kcers.2017.54.6.05

Effect of Working Pressure and Substrate Bias on Phase Formation and Microstructure of Cr-Al-N Coatings  

Choi, Seon-A (Department of Engineering Ceramic Center, Korea Institute of Ceramic and Engineering Technology)
Kim, Seong-Won (Department of Engineering Ceramic Center, Korea Institute of Ceramic and Engineering Technology)
Lee, Sung-Min (Department of Engineering Ceramic Center, Korea Institute of Ceramic and Engineering Technology)
Kim, Hyung-Tae (Department of Engineering Ceramic Center, Korea Institute of Ceramic and Engineering Technology)
Oh, Yoon-Suk (Department of Engineering Ceramic Center, Korea Institute of Ceramic and Engineering Technology)
Publication Information
Journal of the Korean Ceramic Society / v.54, no.6, 2017 , pp. 511-517 More about this Journal
Abstract
With different working pressures and substrate biases, Cr-Al-N coatings were deposited by hybrid physical vapor deposition (PVD) method, consisting of unbalanced magnetron (UBM) sputtering and arc ion plating (AIP) processes. Cr and Al targets were used for the arc ion plating and the sputtering process, respectively. Phase analysis, and composition, binding energy, and microstructural analyses were performed using X-ray diffraction (XRD), X-ray photoelectron spectroscopy (XPS), and field emission scanning electron microscopy (FESEM), respectively. Surface droplet size of Cr-Al-N coatings was found to decrease with increasing substrate bias. A decrease of the deposition rate of Cr-Al-N films was expected due to the increase of substrate bias. The coatings were grown with textured CrN phase and (111), (200), and (220) planes. X-ray diffraction data show that all Cr-Al-N coatings shifted to lower diffraction angles due to the addition of Al. The XPS results were used to determine the $Cr_2N$, CrN, and (Cr,Al)N binding energies. The compositions of the Cr-Al-N films were measured by XPS to be Cr 23.2~36.9 at%, Al 30.1~40.3 at%, and N 31.3~38.6 at%.
Keywords
Cr-Al-N; Hard coating; Hybrid physical vapor deposition; Arc ion plating; Unbalanced magnetron sputtering;
Citations & Related Records
Times Cited By KSCI : 3  (Citation Analysis)
연도 인용수 순위
1 J. Musil and S. Kadlec, "Reactive Sputtering of TiN Films at Large Substrate to Target Distances," Vacuum, 40 [5] 435-44 (1990).   DOI
2 X. Wan, S. Zhao, Y. Yang, J. Gong, and C. Sun, "Effects of Nitrogen Pressure and Pulse Bias Voltage on the Properties of Cr-N Coatings Deposited by Arc Ion Plating," Surf. Coat. Technol., 204 [11] 1800-10 (2010).   DOI
3 K.-L. Chang, S.-C. Chung, S.-H. Lai, and H.-C. Shih, "The Electrochemical Behavior of Thermally Oxidized CrN Coatings Deposited on Steel by Cathodic Arc Plasma Deposition," Appl. Surf. Sci., 236 [1] 406-15 (2004).   DOI
4 M. Huang, G. Lin, Y. Zhao, C. Sun, L. Wen, and C. Dong, "Macro-Particle Reduction Mechanism in Biased Arc Ion Plating of TiN," Surf. Coat. Technol., 176 [1] 109-14 (2003).   DOI
5 J. J. Wu and R. J. Miller, "Measurements of Charge on Submicron Particles Generated in a Sputtering Process," J. Appl. Phys., 67 [2] 1051-54 (1990).   DOI
6 A. Melzer, T. Trottenberg, and A. Piel, "Experimental Determination of the Charge on Dust Particles Forming Coulomb Lattices," Phys. Lett. A, 191 [3-4] 301-8 (1994).   DOI
7 R. Boxman and S. Goldsmith, "Macroparticle Contamination in Cathodic Arc Coatings: Generation, Transport and Control," Surf. Coat. Technol., 52 [1] 39-50 (1992).   DOI
8 Y. Chunyan, T. Linhai, W. Yinghui, W. Shebin, L. Tianbao, and X. Bingshe, "The Effect of Substrate Bias Voltages on Impact Resistance of CrAlN Coatings Deposited by Modified Ion Beam Enhanced Magnetron Sputtering," Appl. Surf. Sci., 255 [7] 4033-38 (2009).   DOI
9 H.-S. Jang, Y.-S. Kim, J.-H. Lee, H.-G. Chun, Y.-Z. You, and D.-I. Kim, "Effect of Substrate Bias Voltage on the Growth of Chromium Nitride Films," Korean J. Mater. Res., 17 [11] 618-21 (2007).   DOI
10 I.-W. Park, D. S. Kang, J. J. Moore, S. C. Kwon, J. J. Rha, and K. H. Kim, "Microstructures, Mechanical Properties, and Tribological Behaviors of Cr-Al-N, Cr-Si-N, and Cr-Al-Si-N Coatings by a Hybrid Coating System," Surf. Coat. Technol., 201 [9] 5223-27 (2007).   DOI
11 J. Pelleg, L. Zevin, S. Lungo, and N. Croitoru, "Reactive-Sputter-Deposited TiN Films on Glass Substrates," Thin Solid Films, 197 [1-2] 117-28 (1991).   DOI
12 S. Veprek and M. J. Veprek-Heijman, "Industrial Applications of Superhard Nanocomposite Coatings," Surf. Coat. Technol., 202 [21] 5063-73 (2008).   DOI
13 Y. Chim, X. Ding, X. Zeng, and S. Zhang, "Oxidation Resistance of TiN, CrN, TiAlN and CrAlN Coatings Deposited by Lateral Rotating Cathode Arc," Thin Solid Films, 517 [17] 4845-49 (2009).   DOI
14 K.-D. Bouzakis, N. Michailidis, S. Gerardis, G. Katirtzoglou, E. Lili, M. Pappa, M. Brizuela, A. Garcia-Luis, and R. Cremer, "Correlation of the Impact Resistance of Variously Doped CrAlN PVD Coatings with their Cutting Performance in Milling Aerospace Alloys," Surf. Coat. Technol., 203 [5] 781-85 (2008).   DOI
15 S. Zhang, L. Wang, Q. Wang, and M. Li, "A Superhard CrAlSiN Superlattice Coating Deposited by Multi-Arc Ion Plating: I. Microstructure and Mechanical Properties," Surf. Coat. Technol., 214 160-67 (2013).   DOI
16 J. Romero, M. Gomez, J. Esteve, F. Montalà, L. Carreras, M. Grifol, and A. Lousa, "CrAlN Coatings Deposited by Cathodic Arc Evaporation at Different Substrate Bias," Thin Solid Films, 515 [1] 113-17 (2006).   DOI
17 E. Spain, J. Avelar-Batista, M. Letch, J. Housden, and B. Lerga, "Characterisation and Applications of Cr-Al-N Coatings," Surf. Coat. Technol., 200 1507-13 (2005).   DOI
18 X.-Z. Ding and X. Zeng, "Structural, Mechanical and Tribological Properties of CrAlN Coatings Deposited by Reactive Unbalanced Magnetron Sputtering," Surf. Coat. Technol., 200, 1372-76 (2005).   DOI
19 Z. Li, P. Munroe, Z.-T. Jiang, X. Zhao, J. Xu, Z.-F. Zhou, J.-Q. Jiang, F. Fang, and Z.-H. Xie, "Designing Superhard, Self-Toughening CrAlN Coatings through Grain Boundary Engineering," Acta Mater., 60, 5735-44 (2012).   DOI
20 J. Lin, B. Mishra, J. Moore, and W. Sproul, "Microstructure, Mechanical and Tribological Properties of Cr1-xAlxN Films Deposited by Pulsed-Closed Field Unbalanced Magnetron Sputtering (P-CFUBMS)," Surf. Coat. Technol., 201 [7] 4329-34 (2006).   DOI
21 H. C. Barshilia, N. Selvakumar, B. Deepthi, and K. Rajam, "A Comparative Study of Reactive Direct Current Magnetron Sputtered CrAlN and CrN Coatings," Surf. Coat. Technol., 201 [6] 2193-201 (2006).   DOI
22 D. M. Mattox, Handbook of Physical Vapor Deposition (PVD) Processing; pp. 384-405, Elsevier, New Mexico, 2010.
23 S.-Y. Chun, "Microstructure and Mechanical Properties of Nanocrystalline TiN Films through Increasing Substrate Bias," J. Korean Ceram. Soc., 47 [6] 479-84 (2010).   DOI
24 H. W. Ryu, G. P. Choi, W.-S. Noh, Y.-J. Park, and J. S. Park, "Effect of Oxygen Flow Ratio on the Crystallographic Orientation of NiO Thin Films Deposited by RF Magnetron Sputtering," J. Korean Ceram. Soc., 41 [2] 106-10 (2004).   DOI
25 S.-K. Tien, C.-H. Lin, Y.-Z. Tsai, and J.-G. Duh, "Effect of Nitrogen Flow on the Properties of Quaternary CrAlSiN Coatings at Elevated Temperatures," Surf. Coat. Technol., 202 [4] 735-39 (2007).   DOI
26 T. Elangovan, P. Kuppusami, R. Thirumurugesan, V. Ganesan, E. Mohandas, and D. Mangalaraj, "Nanostructured CrN Thin Films Prepared by Reactive Pulsed DC Magnetron Puttering," Mater. Sci. Eng., B, 167 [1] 17-25 (2010).   DOI
27 M. Egawa, K. I. Miura, M. Yokoi, and I. Ishigami, "Effects of Substrate Bias Voltage on Projection Growth in Chromium Nitride Films Deposited by Arc Ion Plating," Surf. Coat. Technol., 201 [9] 4873-78 (2007).   DOI
28 E. Fornies, R. E. Galindo, O. Sanchez, and J. Albella, "Growth of CrNx Films by DC Reactive Magnetron Sputtering at Constant $N_2/Ar$ Gas Flow," Surf. Coat. Technol., 200 [20] 6047-53 (2006).   DOI
29 J. Bujak, J. Walkowicz, and J. Kusinski, "Influence of the Nitrogen Pressure on the Structure and Properties of (Ti, Al)N Coatings Deposited by Cathodic Vacuum Arc PVD Process," Surf. Coat. Technol., 180, 150-57 (2004).
30 C. Gautier and J. Machet, "Study of the Growth Mechanisms of Chromium Nitride Films Deposited by Vacuum ARC Evaporation," Thin Solid Films, 295 [1-2] 43-52 (1997).   DOI
31 M. Li and F. Wang, "Effects of Nitrogen Partial Pressure and Pulse Bias Voltage on (Ti,Al)N Coatings by Arc Ion Plating," Surf. Coat. Technol., 167 [2] 197-202 (2003).   DOI
32 J.-W. Lee, S.-K. Tien, and Y.-C. Kuo, "The Effects of Pulse Frequency and Substrate Bias to the Mechanical Properties of CrN Coatings Deposited by Pulsed DC Magnetron Sputtering," Thin Solid Films, 494 [1] 161-67 (2006).   DOI