• 제목/요약/키워드: Contact and Gap Resistance

검색결과 41건 처리시간 0.023초

봉착용 유리와 Mn-Zn 단결정 Ferrite와의 봉착특성에 관한 연구 (The sealing Characteristics of sealing glasses and Mn-Zn single crystal ferrite)

  • 윤성기;한중희;강원호
    • 한국재료학회지
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    • 제1권4호
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    • pp.221-228
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    • 1991
  • 본 연구는 computerdisk drive와 VTR head에 사용되어 지고 있는 ferrite head cores의 gap 형성에 적합한 유리의 봉착특성에 관하여 고찰하였다. 유리의 특성측정은 열팽창 계수, 미세경도, 내마모성을 측정하였으며 계면에서의 원소 농도분포는 WDS에 의해 관찰하였고 젖음성은 고온 현미경으로 측정하였다. 그 결과는 다음과 같다. 1. $PbO-B_2O_3$계 봉착용 유리에 있어서 PbO의 함량이 증가함에 따라 열팽창계수와 마모량이 증가하였으며 $B_2O_3$함량이 증가함에 따라서는 열팽창계수와 마모량이 감소하였다. 2. $PbO-B_2O_3$계 유리에 있어서 contact angle은 PbO함량에 주로 영향을 받는다. 3. 열팽창계수의 증가에 따라 봉착온도는 비례적으로 낮아지는 경향을 나타내었다. 4. Mn-Zn single crystal ferrite와 $PbO-B_2O_3$계 봉착용유리의 융착 계면에서의 확산은 ferrite성분이 glass측으로 소량확산이 이루어졌으며 봉착 열처리 시간에 따라서는 거의 영향을 받지 않았다.

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Plasma Assisted ALD 장비를 이용한 니켈 박막 증착과 Ti 캡핑 레이어에 의한 니켈 실리사이드 형성 효과 (Nickel Film Deposition Using Plasma Assisted ALD Equipment and Effect of Nickel Silicide Formation with Ti Capping Layer)

  • 윤상원;이우영;양충모;하종봉;나경일;조현익;남기홍;서화일;이정희
    • 반도체디스플레이기술학회지
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    • 제6권3호
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    • pp.19-23
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    • 2007
  • The NiSi is very promising candidate for the metallization in 45 nm CMOS process such as FUSI(fully silicided) gate and source/drain contact because it exhibits non-size dependent resistance, low silicon consumption and mid-gap workfunction. Ni film was first deposited by using ALD (atomic layer deposition) technique with Bis-Ni precursor and $H_2$ reactant gas at $220^{\circ}C$ with deposition rate of $1.25\;{\AA}/cycle$. The as-deposited Ni film exhibited a sheet resistance of $5\;{\Omega}/{\square}$. RTP (repaid thermal process) was then performed by varying temperature from $400^{\circ}C$ to $900^{\circ}C$ in $N_2$ ambient for the formation of NiSi. The process temperature window for the formation of low-resistance NiSi was estimated from $600^{\circ}C$ to $800^{\circ}C$ and from $700^{\circ}C$ to $800^{\circ}C$ with and without Ti capping layer. The respective sheet resistance of the films was changed to $2.5\;{\Omega}/{\square}$ and $3\;{\Omega}/{\square}$ after silicidation. This is because Ti capping layer increases reaction between Ni and Si and suppresses the oxidation and impurity incorporation into Ni film during silicidation process. The NiSi films were treated by additional thermal stress in a resistively heated furnace for test of thermal stability, showing that the film heat-treated at $800^{\circ}C$ was more stable than that at $700^{\circ}C$ due to better crystallinity.

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Fabrication of Two-dimensional MoS2 Films-based Field Effect Transistor for High Mobility Electronic Device Application

  • Joung, DaeHwa;Park, Hyeji;Mun, Jihun;Park, Jonghoo;Kang, Sang-Woo;Kim, TaeWan
    • Applied Science and Convergence Technology
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    • 제26권5호
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    • pp.110-113
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    • 2017
  • The two-dimensional layered $MoS_2$ has high mobility and excellent optical properties, and there has been much research on the methods for using this for next generation electronics. $MoS_2$ is similar to graphene in that there is comparatively weak bonding through Van der Waals covalent bonding in the substrate-$MoS_2$ and $MoS_2-MoS_2$ heteromaterial as well in the layer-by-layer structure. So, on the monatomic level, $MoS_2$ can easily be exfoliated physically or chemically. During the $MoS_2$ field-effect transistor fabrication process of photolithography, when using water, the water infiltrates into the substrate-$MoS_2$ gap, and leads to the problem of a rapid decline in the material's yield. To solve this problem, an epoxy-based, as opposed to a water-based photoresist, was used in the photolithography process. In this research, a hydrophobic $MoS_2$ field effect transistor (FET) was fabricated on a hydrophilic $SiO_2$ substrate via chemical vapor deposition CVD. To solve the problem of $MoS_2$ exfoliation that occurs in water-based photolithography, a PPMA sacrificial layer and SU-8 2002 were used, and a $MoS_2$ film FET was successfully created. To minimize Ohmic contact resistance, rapid thermal annealing was used, and then electronic properties were measured.

Nonlinear finite element modeling of the self-centering steel moment connection with cushion flexural damper

  • Ali Nazeri;Reza Vahdani;Mohammad Ali Kafi
    • Structural Engineering and Mechanics
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    • 제87권2호
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    • pp.151-164
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    • 2023
  • The latest earthquake's costly repairs and economic disruption were brought on by excessive residual drift. Self-centering systems are one of the most efficient ways in the current generation of seismic resistance system to get rid of and reduce residual drift. The mechanics and behavior of the self-centering system in response to seismic forces were impacted by a number of important factors. The amount of post-tensioning (PT) force, which is often employed for the standing posture after an earthquake, is the first important component. The energy dissipater element is another one that has a significant impact on how the self-centering system behaves. Using the damper as a replaceable and affordable tool and fuse in self-centering frames has been recommended to boost energy absorption and dampening of structural systems during earthquakes. In this research, the self-centering steel moment frame connections are equipped with cushion flexural dampers (CFDs) as an energy dissipator system to increase energy absorption, post-yielding stiffness, and ease replacement after an earthquake. Also, it has been carefully considered how to reduce permanent deformations in the self-centering steel moment frames exposed to seismic loads while maintaining adequate stiffness, strength, and ductility. After confirming the FE model's findings with an earlier experimental PT connection, the behavior of the self-centering connection using CFD has been surveyed in this study. The FE modeling takes into account strands preloading as well as geometric and material nonlinearities. In addition to contact and sliding phenomena, gap opening and closing actions are included in the models. According to the findings, self-centering moment-resisting frames (SF-MRF) combined with CFD enhance post-yielding stiffness and energy absorption with the least amount of permeant deformation in a certain CFD thickness. The obtained findings demonstrate that the effective energy dissipation ratio (β), is increased to 0.25% while also lowering the residual drift to less than 0.5%. Also, this enhancement in the self-centering connection with CFD's seismic performance was attained with a respectable moment capacity to beam plastic moment capacity ratio.

PVDF/h-BN hybrid membranes and their application in desalination through AGMD

  • Moradi, Rasoul;Shariaty-Niassar, Mojtaba;Pourkhalili, Nazila;Mehrizadeh, Masoud;Niknafs, Hassan
    • Membrane and Water Treatment
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    • 제9권4호
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    • pp.221-231
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    • 2018
  • A new procedure to produce poly(vinylidene fluoride)/boron nitride hybrid membrane is presented for application in membrane distillation (MD) process. The influence of hexagonal boron nitride (h-BN) incorporation on the performance of the polymeric membranes is studied through the present investigation. For this aim, h-BN nanopowders were successfully synthesized using the simple chemical vapor deposition (CVD) route and subsequent solvent treatments. The resulting h-BN nanosheets were blended with poly(vinylidene fluoride) (PVDF) solution. Then, the prepared composite solution was subjected to phase inversion process to obtain PVDF/h-BN hybrid membranes. Various examinations such as scanning electron microscopy (SEM), wettability, permeation flux, mechanical strength and liquid entry pressure (LEP) measurements are performed to evaluate the prepared membrane. Moreover, Air gap membrane distillation (AGMD) experiments were carried out to investigate the salt rejection performance and the durability of membranes. The results show that our hybrid PVDF/h-BN membrane presents higher water permeation flux (${\sim}18kg/m^2h$) compared to pristine PVDF membrane. In addition, the experimental data confirms that the prepared nanocomposite membrane is hydrophobic (water contact angle: ${\sim}103^{\circ}$), has a porous skin layer (>85%), as well competitive fouling resistance and operational durability. Furthermore, the total salt rejection efficiency was obtained for PVDF/h-BN membrane. The results prove that the novel PVDF/h-BN membrane can be easily synthesized and applied in MD process for salt rejection purposes.

사판식 유압 피스톤모터의 성능특성 분석 (Analysis of Performance Characteristics of Swash-Plate-Type Hydraulic Piston Motor)

  • 이용범;김광민
    • 대한기계학회논문집A
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    • 제36권11호
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    • pp.1441-1446
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    • 2012
  • 유압피스톤모터는 정압베어링부분의 마찰손실과 용적손실, 기구적 운동부분의 마찰손실, 오일의 관로저항에 의한 압력저하, 압축성에 의한 체적손실 그리고 하우징 오일 처닝(churning) 손실 등이 있다. 이러한 손실 중에서 일정한 틈새의 유막(oil film, $8{\sim}15{\mu}m$)으로 고속 회전하는 피스톤 슈(piston shoe)와 슈 플레이트(shoe plate) 사이 정압베어링 부분의 마찰 및 용적손실이 유압모터의 전체효율을 좌우 한다. 본 연구에서는 최고압력 35MPa, 최고회전수 2500rpm, 배재용적 320cc/rev급 2속(2-speed) 초대형 굴삭기의 주행모터용 유압피스톤모터를 대상으로 정압베어링비가 유압모터의 전 효율에 미치는 영향을 실험적으로 분석하였다.

SINTERED $Al_{2}O_{3}$-TiC SUBSTRATE FOR THIN FILM MAGNETIC HEAD

  • Nakano, Osamu;Hirayama, Takasi
    • 한국분말야금학회:학술대회논문집
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    • 한국분말야금학회 1998년도 춘계학술대회 및 발표대회 강연 및 발표논문 초록집
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    • pp.6-6
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    • 1998
  • In 1957, the first magnetic disk drive compatible with a movable head was introduced as an external file memory device for computer system. Since then, magnetic disks have been improved by increasing the recording density, which has brought about the development of a high performance thin film magnetic head. The thin film magnetic head has a magnetic circuit on a ceramic substrate using IC technology. The physical property of the substrate material is very important because it influences the tribology of head/disk interface and also manufacturing process of the head. $Al_{2}O_{3}$-TiC ceramics, so called ALTIC, is known to be one of the best substrate materials which satisfies this property requirement. Even though the head is not in direct contact with the disk, frequent instantaneous contacts are unavoidable due to its high rotating speed and the close gap between them. This may cause damage in the magnetic recording media and, thus, it is very important that the magnetic head has a good wear resistance. $Al_{2}O_{3}$-TiC ceramics has an excellent tribological property in head/disk interface. Manufacturing process of thin film head is similar to that of IC, which requires extremely smooth and flat surface of the substrate. The substrate must be readily sliced into the heads without chipping. $Al_{2}O_{3}$-TiC ceramics has excellent machineability and mechanical properties. $Al_{2}O_{3}$-TiC ceramics was first developed at Nippon Tungsten Co. as cutting tool materials in 1968, which was further developed to be used as the substrate materials for thin film head in collaboration with Sumitomo Special Metals Co., Ltd. in 1981. Today, we supply more than 60% of the substrates for thin film head market in the world. In this paper, we would like to present the sintering process of $Al_{2}O_{3}$-TiC ceramics and its property in detail.

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이종접합 태양전지에서의 Bi-Layer 구조를 통한 향상된 개방전압특성에 대한 고찰 (A Study on Improved Open-Circuit Voltage Characteristics Through Bi-Layer Structure in Heterojunction Solar Cells)

  • 김홍래;정성진;조재웅;김성헌;한승용;수레쉬 쿠마르 듄겔;이준신
    • 한국전기전자재료학회논문지
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    • 제35권6호
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    • pp.603-609
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    • 2022
  • Passivation quality is mainly governed by epitaxial growth of crystalline silicon wafer surface. Void-rich intrinsic a-Si:H interfacial layer could offer higher resistivity of the c-Si surface and hence a better device efficiency as well. To reduce the resistivity of the contact area, a modification of void-rich intrinsic layer of a-Si:H towards more ordered state with a higher density is adopted by adapting its thickness and reducing its series resistance significantly, but it slightly decreases passivation quality. Higher resistance is not dominated by asymmetric effects like different band offsets for electrons or holes. In this study, multilayer of intrinsic a-Si:H layers were used. The first one with a void-rich was a-Si:H(I1) and the next one a-SiOx:H(I2) were used, where a-SiOx:H(I2) had relatively larger band gap of ~2.07 eV than that of a-Si:H (I1). Using a-SiOx:H as I2 layer was expected to increase transparency, which could lead to an easy carrier transport. Also, higher implied voltage than the conventional structure was expected. This means that the a-SiOx:H could be a promising material for a high-quality passivation of c-Si. In addition, the i-a-SiOx:H microstructure can help the carrier transportation through tunneling and thermal emission.

High Performance Flexible Inorganic Electronic Systems

  • 박귀일;이건재
    • 한국진공학회:학술대회논문집
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    • 한국진공학회 2012년도 제43회 하계 정기 학술대회 초록집
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    • pp.115-116
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    • 2012
  • The demand for flexible electronic systems such as wearable computers, E-paper, and flexible displays has increased due to their advantages of excellent portability, conformal contact with curved surfaces, light weight, and human friendly interfaces over present rigid electronic systems. This seminar introduces three recent progresses that can extend the application of high performance flexible inorganic electronics. The first part of this seminar will introduce a RRAM with a one transistor-one memristor (1T-1M) arrays on flexible substrates. Flexible memory is an essential part of electronics for data processing, storage, and radio frequency (RF) communication and thus a key element to realize such flexible electronic systems. Although several emerging memory technologies, including resistive switching memory, have been proposed, the cell-to-cell interference issue has to be overcome for flexible and high performance nonvolatile memory applications. The cell-to-cell interference between neighbouring memory cells occurs due to leakage current paths through adjacent low resistance state cells and induces not only unnecessary power consumption but also a misreading problem, a fatal obstacle in memory operation. To fabricate a fully functional flexible memory and prevent these unwanted effects, we integrated high performance flexible single crystal silicon transistors with an amorphous titanium oxide (a-TiO2) based memristor to control the logic state of memory. The $8{\times}8$ NOR type 1T-1M RRAM demonstrated the first random access memory operation on flexible substrates by controlling each memory unit cell independently. The second part of the seminar will discuss the flexible GaN LED on LCP substrates for implantable biosensor. Inorganic III-V light emitting diodes (LEDs) have superior characteristics, such as long-term stability, high efficiency, and strong brightness compared to conventional incandescent lamps and OLED. However, due to the brittle property of bulk inorganic semiconductor materials, III-V LED limits its applications in the field of high performance flexible electronics. This seminar introduces the first flexible and implantable GaN LED on plastic substrates that is transferred from bulk GaN on Si substrates. The superb properties of the flexible GaN thin film in terms of its wide band gap and high efficiency enable the dramatic extension of not only consumer electronic applications but also the biosensing scale. The flexible white LEDs are demonstrated for the feasibility of using a white light source for future flexible BLU devices. Finally a water-resist and a biocompatible PTFE-coated flexible LED biosensor can detect PSA at a detection limit of 1 ng/mL. These results show that the nitride-based flexible LED can be used as the future flexible display technology and a type of implantable LED biosensor for a therapy tool. The final part of this seminar will introduce a highly efficient and printable BaTiO3 thin film nanogenerator on plastic substrates. Energy harvesting technologies converting external biomechanical energy sources (such as heart beat, blood flow, muscle stretching and animal movements) into electrical energy is recently a highly demanding issue in the materials science community. Herein, we describe procedure suitable for generating and printing a lead-free microstructured BaTiO3 thin film nanogenerator on plastic substrates to overcome limitations appeared in conventional flexible ferroelectric devices. Flexible BaTiO3 thin film nanogenerator was fabricated and the piezoelectric properties and mechanically stability of ferroelectric devices were characterized. From the results, we demonstrate the highly efficient and stable performance of BaTiO3 thin film nanogenerator.

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Ni/4H-SiC Field Plate Schottky 다이오드 제작 시 과도 식각에 의해 형성된 Nickel_Titanium 이중 금속 Schottky 접합 특성과 공정 개선 연구 (Characteristics of Nickel_Titanium Dual-Metal Schottky Contacts Formed by Over-Etching of Field Oxide on Ni/4H-SiC Field Plate Schottky Diode and Improvement of Process)

  • 오명숙;이종호;김대환;문정현;임정혁;이도현;김형준
    • 한국재료학회지
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    • 제19권1호
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    • pp.28-32
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    • 2009
  • Silicon carbide (SiC) is a promising material for power device applications due to its wide band gap (3.26 eV for 4H-SiC), high critical electric field and excellent thermal conductivity. The Schottky barrier diode is the representative high-power device that is currently available commercially. A field plate edge-terminated 4H-SiC was fabricated using a lift-off process for opening the Schottky contacts. In this case, Ni/Ti dual-metal contacts were unintentionally formed at the edge of the Schottky contacts and resulted in the degradation of the electrical properties of the diodes. The breakdown voltage and Schottky barrier height (SBH, ${\Phi}_B$) was 107 V and 0.67 eV, respectively. To form homogeneous single-metal Ni/4H-SiC Schottky contacts, a deposition and etching method was employed, and the electrical properties of the diodes were improved. The modified SBDs showed enhanced electrical properties, as witnessed by a breakdown voltage of 635 V, a Schottky barrier height of ${\Phi}_B$=1.48 eV, an ideality factor of n=1.04 (close to one), a forward voltage drop of $V_F$=1.6 V, a specific on resistance of $R_{on}=2.1m{\Omega}-cm^2$ and a power loss of $P_L=79.6Wcm^{-2}$.