• 한국공작기계학회논문집
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• 제15권2호
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• pp.24-29
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• 2006

The use electron-beam(E-beam) manufacturing system provides a means to alleviate optic exposure equipment's problems. We are developing an E-beam manufacturing system with scanning electron microscope(SEM) function. The E-beam manufacturing system consist of high voltage generator, beam blanker, condenser lenses, object lenses, stigmator and stage. The development of E-beam manufacturing system is used on the method of remaking SEM's structure. The functions of SEM are developed. It is important for the test of E-beam performance. In E-beam manufacturing system and SEM, beam focus is important function. In this paper, we propose intelligent remote control function for beam focus in E-beam manufacturing system. The function extends the user's function and gives convenience.

• 한국정밀공학회:학술대회논문집
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• 한국정밀공학회 2008년도 춘계학술대회 논문집
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• pp.561-562
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• 2008

• 한국정밀공학회지
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• 제24권9호
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• pp.95-102
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• 2007

The scanning electron microscope (SEM) is one of the most popular instruments available for the measurement and analysis of the micro/nano structures. It is equipped with an electron optical system that consists of an electron beam source, magnetic lenses, apertures, deflection coils, and a detector. The magnetic lenses playa role in refracting electron beams to obtain a focused spot using the magnetic field driven by an electric current from a coil. A SEM column usually contains two condenser lenses and an objective lens. The condenser lenses generate a magnetic field that forces the electron beams to form crossovers at desired locations. The objective lens then focuses the electron beams on the specimen. The present work concerns finite element analysis for the electron magnetic lenses so as to analyze their magnetic characteristics. To improve the performance of the magnetic lenses, the effect of the excitation current and pole-piece design on the amount of resulting magnetic fields and their peak locations are analyzed through the finite element analysis.

• 한국광학회지
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• 제22권5호
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• pp.239-244
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• 2011

본 논문에서는 LCD 디스플레이용 색채계 렌즈에 관해 근축광학적인 방법에 의한 비결상 광학설계를 소개한다. 색채계란 디스플레이 상의 측정영역으로부터 방출된 광을 빛의 3원색인 빨강, 녹색, 초록으로 분해하는 측정기기로써, 결상렌즈가 아닌 집광렌즈를 필요로 한다. 집광렌즈는 비결상 렌즈이고 측정영역과 감지영역 간의 특정한 압축비 조건을 만족해야 한다. 총체적인 비결상 광학조건을 이해하기 위해, 근축광학을 사용하여 필요충분조건을 해석적인 표현식으로 유도하였고, 나아가 간단한 공식으로 발전시켰다. 이 공식의 타당성은 CODE V와 Light-Tools를 사용하여 검증하였다. 이 공식은 색채계용 집광렌즈 뿐만 아니라, 레이저 빔의 세기를 균일하게 만들기 위한 어레이 렌즈의 설계에도 유용하게 확장 적용될 수 있다.

• Journal of the Korean Wood Science and Technology
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• 제41권5호
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• pp.399-405
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• 2013

This study demonstrates the utilization of light microscopy and Fast Fourier Transform-Peak Finding (FPF) method for microfibril angle (MFA) measurement from unstained sections of red pine (Pinus densiflora). To obtain an image with optimal contrast and resolution for MFA measurement, effects of numerical aperture (NA) of condenser lens and color filters were investigated. About 60% of NA of the maximum condenser NA produced an image with optimal contrast, but a color filter with short wavelength range (DAPI) created images with improved resolution. Manual angle measurement and the FPF method were applied to the image with optimal contrast for MFA measurement. The experimental results from the FPF method were considered to be more repeatable and less subjective than those from the manual angle measurement.

• 한국정밀공학회:학술대회논문집
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• 한국정밀공학회 2004년도 추계학술대회 논문집
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• pp.401-404
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• 2004

The electron beam machining provides very high resolution up to nanometer scale, hence the E-beam writing technology is rapidly growing in MEMS and nano-engineering areas. In the optical column of the e-beam writer, there are several lenses condensing and focusing electron beams from electron gun with fringing magnetic fields. To achieve small spot size as 1-2 nm for higher power of electron beam, magnetic lenses should be designed considering their magnetic field distribution. In this paper, the magnetic field at two condenser lenses and object lens are calculated with finite element method and discussed its performances.

• 대한기계학회논문집A
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• 제39권1호
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• pp.1-9
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• 2015

이 논문은 SEM(Scanning Electron Microsopy) 경통부에서 전자빔의 집속특성을 최적화하기 위한 방법을 다루고 있다. SEM 에서 물체 표면을 확대하기 위해서는 경통부를 지나는 전자빔을 효과적으로 집속하여 표면에 충돌하는 프로브 직경을 줄이는 것이 중요하다. 이 전자빔의 집속정도를 나타내는 지표가 반배율이다. 본 연구는 전자빔의 집속특성을 효과적으로 구현하기 위해 그에 영향을 끼치는 경통부의 설계 인자들을 렌즈 해석과 광선 추적을 통해 알아본다. 이 결과를 근거로 민감도 분석을 수행하여 설계 인자들이 빔의 집속에 끼치는 영향의 정도를 정량적으로 비교해 볼 수 있다. 이러한 전자빔의 특성에 따른 설계 인자의 분석은 경통부 설계에 있어 중요한 기초 정보로 활용될 수 있다.

• International Journal of Precision Engineering and Manufacturing
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• 제9권3호
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• pp.51-54
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• 2008

A novel stereolithography method using evanescent light has been proposed as a means to realize 100-nanometer resolution. An in-process measurement system with high accuracy has been introduced to the nanostereolithography apparatus. Specifically, an optical microscopic system was developed to monitor the exposure process and a confocal positioning system was established to improve the longitudinal positioning accuracy in the layer-by-layer process. A high-power objective lens, a tube lens, and a charge coupled device (CCD) were included in the optical microscopic system, whereas a laser, a high-power objective lens, a piezoelectric (PZT) stage, a condenser lens, a pinhole, and a photomultiplier (PMT) made up the confocal microscopic system. Two verification experiments were conducted, and the results indicated that the optical microscopic system had a horizontal resolution of 200 nm and that the confocal positioning system provided a depth resolution of 30.8 nm. These results indicate that nanostereolithography can be successfully performed with this system.

• Journal of the Optical Society of Korea
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• 제20권3호
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• pp.407-412
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• 2016

We analyzed through numerical simulations the properties of a square beam homogenizer near the target for laser shock peening. The efficiency was calculated near the target by considering the plasma threshold of the metals. We defined the depth of focus of the square beam homogenizer with a given efficiency near the target. Then, we found the relationship between the depth of focus for the laser shock peening and four main parameters of the square beam homogenizer: the plasma threshold of the metal, the number of lenslets in the array-lens, the focal length of the condenser lens and the input beam size.

• 대한기계학회논문집A
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• 제30권9호
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• pp.1166-1172
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• 2006

This paper describes an alignment method of the ion column which is used for a focused-ion-beam machining system. The alignment parameters for mechanical and electrical components are introduced, and also sample images are used for evaluating the experiments. The experimental results show that geometrical positions of mechanical components have an influence on the quality of emitted ion beam. In addition, we can successfully align the traveling axis of ions by using mechanical and electrical methods.