• 제목/요약/키워드: Cleaning Monitoring

검색결과 103건 처리시간 0.028초

레이저 충격파 클리닝 공정에서 음향 모니터링에 관한 연구 (Investigation of acoustic monitoring on laser shock cleaning process)

  • 김태훈;이종명;조성호;김도훈
    • 한국레이저가공학회지
    • /
    • 제6권2호
    • /
    • pp.27-33
    • /
    • 2003
  • A laser shock cleaning technology is a new dry cleaning methodology for the effective removal of small particles from the surface. This technique uses a plasma shock wave produced by a breakdown of air due to an intense laser pulse. In order to optimize the laser shock cleaning process, it needs to evaluate the cleaning performance quantitatively by using a monitoring technique. In this paper, an acoustic monitoring technique was attempted to investigate the laser shock cleaning process with an aim to optimize the cleaning process. A wide-band microphone with high sensitivity was utilized to detect acoustic signals during the cleaning process. It was found that the intensity of the shock wave was strongly dependent on the power density of laser beam and the gas species at the laser beam focus. As a power density was larger, the shock wave became stronger. It was also seen that the shock wave became stronger in the case of Ar gas compared with air and N$_2$ gas.

  • PDF

PECVD Chamber Cleaning End Point Detection (EPD) Using Optical Emission Spectroscopy Data

  • Lee, Ho Jae;Seo, Dongsun;Hong, Sang Jeen;May, Gary S.
    • Transactions on Electrical and Electronic Materials
    • /
    • 제14권5호
    • /
    • pp.254-257
    • /
    • 2013
  • In-situ optical emission spectroscopy (OES) is employed for PECVD chamber monitoring. OES is used as an addon sensor to monitoring and cleaning end point detection (EPD). On monitoring plasma chemistry using OES, the process gas and by-product gas are simultaneously monitored. Principal component analysis (PCA) enhances the capability of end point detection using OES data. Through chamber cleaning monitoring using OES, cleaning time is reduced by 53%, in general. Therefore, the gas usage of fluorine is also reduced, so satisfying Green Fab challenge in semiconductor manufacturing.

빌딩청소용 이동로봇을 위한 원격 모니터링 시스템 (Remote Monitoring System for a Building Cleaning Mobile Robot)

  • 이수영;조원호;최병욱
    • 로봇학회논문지
    • /
    • 제4권1호
    • /
    • pp.74-80
    • /
    • 2009
  • This paper presents a remote monitoring and simulation system for a building cleaning mobile robot. It provides a tool of convenient 3D graphical map construction including network camera image viewer and status information of the robot. The 3D map is reconstructed from existing 2D building CAD data with DXF format using OpenGL graphic API. Through this system, it is possible to monitor and control the cleaning mobile robot from remote place. A practical experiment is performed to show the reliability and convenience of the monitoring system. The proposed system is expected to give efficient way of control and monitoring to building cleaning mobile robot.

  • PDF

수계 세정시스템의 세정액/헹굼수의 모니터링 및 재활용 기술 분석 (Analysis of Monitoring and Recycling Technology Technologies of Cleaning Solution and Rinse Water in the Aqeous Cleaning System)

  • 한상원;이호열;배제흠;유종훈;박병덕;전성덕
    • 청정기술
    • /
    • 제7권4호
    • /
    • pp.225-242
    • /
    • 2001
  • 산업체에서 부품을 가공하거나 완성품을 제조하는 과정에서 세정 공정은 필수적으로 사용하고 있고 현재 국내외 대부분의 제조업체에서는 오존파괴물질인 CFC-113이나 1,1,1-TCE 대신에 보다 환경친화적인 수계 세정제로의 대체가 진행중이다. 그러나 수계 세정시스템은 세정공정이나 헹굼공정에서 다량의 물을 사용하기 때문에 많은 폐수를 발생시키는 단점이 있다. 따라서 수계 세정시스템에서는 이러한 발생을 최소화하고 세정액과 헹굼수의 성능을 오랫동안 유지시키기 위한 모니터링 기술과 재활용 기술의 도입이 긴요하다. 본고에서는 수계 세정시스템에 사용하는 세정제와 주요 오염물질인 절삭유를 조사 분석하였고 산업현장에서 도입 가능한 수계 세정시스템의 모니터링 기술과 재활용 기술 등을 분석 평가하였다.

  • PDF

빌딩청소로봇을 위한 그래픽 사용자 인터페이스 시스템 (Graphic User Interface System for a Building Cleaning Robot)

  • 조원호;이수영;최병욱
    • 로봇학회논문지
    • /
    • 제5권3호
    • /
    • pp.209-215
    • /
    • 2010
  • This paper presents a graphic user interface system consisting of graphic simulator and remote control system for a building cleaning robot. It provides a tool of convenient 3D graphical map construction for real world. The 3D map is reconstructed from existing 2D building CAD data with DXF format by using OpenGL graphic API. Through this system, graphic display of robot's status information, remote control and cleaning scheduling can be done for a building cleaning robot. This proposed system is expected to give efficient way of graphic simulation and remote monitoring and control system for a building cleaning robot.

반도체 웨이퍼 세정 장비 모니터링 시스템을 위한 기본 요소의 분석 및 설계 (Design and Analysis of the Basic Components for the Semiconductor Wafer Cleaning Equipment Monitoring System)

  • 강호석;임성락
    • 한국정보처리학회논문지
    • /
    • 제7권1호
    • /
    • pp.115-125
    • /
    • 2000
  • 본 논문에서는 반도체 웨이퍼 세정 장비를 위한 모니터링 시스템의 기본 요소와 이를 기반으로 모니터링 시스템 모델을 제시한다. 기본 요소는 모니터링 시스템에서 요구되는 필수적인 기능으로써 제어 시스템과의 통신, 사용자 인터페이스, 원격 감시 시스템과의 통신, 감시 데이터 관리, 테스크간 통신으로 구성된다. 기본 요소들의 기능과 기본 요소들 간의 관계를 정의하여 독립된 테스크로 설계한다. 제시한 모델의 타당성을 평가하기 위하여 Windows NT에서 Visual C++를 사용하여 기본 요소들을 구현하여 반도체 웨이퍼 세정 장비의 모니터링 시스템에 적용해 보았다.

  • PDF

RS-485 통신을 이용한 배관청소 로봇의 모니터링 시스템 개발 (Development of a Monitoring System for a Pipe Cleaning Robot with RS-485)

  • 김민욱;이헌석;오진석
    • 한국정보통신학회논문지
    • /
    • 제20권5호
    • /
    • pp.923-930
    • /
    • 2016
  • 상 하수도, 해양플랜트 등 다양한 배관이 산업현장에 이용되고 있으며, 이러한 배관의 유지보수 작업은 필수적이다. 특히 산업현장에서 배관 유지보수 작업은 전문 인력이 배관 내 투입되어 작업이 진행되거나, 인력 투입이 불가능한 경우 와이어에 연결된 스크래퍼를 배관에 삽입하는 방식을 이용한다. 그러나 이 방식은 교통체증, 막대한 예산의 투입 등의 문제를 야기한다. 이런 문제점을 해결하기 위한 배관 청소 로봇의 연구, 개발이 진행되고 있다. 현재 배관청소 로봇은 작업 및 운용 상태를 실시간으로 확인할 수 없는 문제점이 있다. 본 논문에서는 배관 청소로봇의 운용, 배관 내부 및 청소 상태를 확인할 수 있도록 카메라로부터 촬영된 영상을 수집하며, 수집된 데이터는 RS-485 통신을 이용하여 모니터링 시스템에 전송하여 사용자가 실시간으로 상태를 확인할 수 있게 구성하였다.

액막 보조 레이저 세척에서 액체 기화의 역할 (Role of Liquid Vaporization in Liquid-Assisted Laser Cleaning)

  • 이주철;장덕석;김동식
    • 대한기계학회논문집B
    • /
    • 제27권2호
    • /
    • pp.188-196
    • /
    • 2003
  • Liquid-assisted cleaning technology utilizing a nanosecond laser pulse is effective for removing submicron particulates from a variety of solid substrates. In the technique, saturated vapor is condensed on a solid surface to form a thin liquid film and the film is evaporated explosively by laser heating. The present work studies the role of liquid-film evaporation in the cleaning process. First, optical interferometry is employed for in-situ monitoring the displacement of the laser-irradiated sample in the cleaning process. The experiments are performed for estimating the recoil force exerted on the target with and without liquid deposition. Secondly, time-resolved visualization and optical reflectance probing are also conducted for monitoring the phase-change kinetics and plume dynamics in vaporization of thin liquid layers. Discussions are made on the effect of liquid-film thickness and dynamics of plume and acoustic wave. The results confirm that cleaning force is generated when the bubble nuclei initially grow in the strongly superheated liquid.

$^{32}$P-postlabelling법을 이용한 유기용제 작업장 근로자의 유전독성 평가 (An Assessment of Genotoxicity on Organic Solvent Workers by $^{32}$P-postlabelling Method)

  • 홍대용;김장락;이장호;문중갑;이한우;김동일;박성학;정주화;이홍근
    • Environmental Analysis Health and Toxicology
    • /
    • 제9권1_2호
    • /
    • pp.37-51
    • /
    • 1994
  • To evaluate the genotoxicities of workers exposed to glue and glue cleaning solution, ambient air monitoring of working place, animal study and human monitoring were carried out. By GC-MS analysis, air samples collected from shoesmaking plant were found to be toluene, xylene, cyclohexane, n-hexane, methyl ethyl ketone, trichloroethylene, butylacetate, isopropyl alcohol. Glue and glue cleaning solution from shoesmaking plant were applicated topically to the CD-1 mice. DNA was isolated from skin 24 hr following the application and analysed for DNA-adducts using the nuclease $P_1$version of $^{32}$P-postlabelling assay. RAL (Relative Adduct Labelling, adducts$10^8$ nucleotides) was significantly increased in a dose-dependent manner in the glue cleaning solution treated mice skin. Peripheral blood DNA-adducts of workers exposed to glue and glue cleaning solution were also analysed by the same method, but there were not significant differences in the peripheral blood DNA-adducts level between exposed and control workers. In addition, glue cleaning solution from shoes factory was evaluated for mutagenicity in the Salmonella plate incorporation assay using strains TA 100 and TA 1535 in the presence and absence of Arochlor 1254-induced rat liver S$_{9}$. There was evident mutagenicity for cleaning solution in TA 100 regardless of $S_9$, but TA 1535 showed positive only in the absence of $S_9$when predicted by Stead model of mutagenicity prediction (p=0.0000). The urine concentrates from workers and controls were also assayed for mutagenicity towards strain TA 100 of Salmonella typhimurium in the presence of $S_9$ using Kado's microsuspension assay, but their mutagenic activities were not found to be significant. These data suggest that shoesmaking workers are exposed to genotoxic compounds and need to be monitored by testing the mutagenicity of human urines. However, $^{32}$P-postlabelling application requires further validation for the routine monitoring of human exposure.osure.

  • PDF

In-Situ Dry-cleaning (ISD) Monitoring of Amorphous Carbon Layer (ACL) Coated Chamber

  • Lee, Ho-Jae;Park, George O.;Hong, Sang-Jeen
    • 한국진공학회:학술대회논문집
    • /
    • 한국진공학회 2012년도 제42회 동계 정기 학술대회 초록집
    • /
    • pp.183-183
    • /
    • 2012
  • In the era of 45 nm or beyond technology, conventional etch mask using photoresist showed its limitation of etch mask pattern collapse as well as pattern erosion, thus hard mask in etching became necessary for precise control of etch pattern geometry. Currently available hard mask materials are amorphous carbon and polymetric materials spin-on containing carbon or silicon. Amorphous carbon layer (ACL) deposited by PECVD for etch hard mask has appeared in manufacturing, but spin-on carbon (SOC) was also suggested to alleviate concerns of particle, throughput, and cost of ownership (COO) [1]. SOC provides some benefits of reduced process steps, but it also faced with wiggling on a sidewall profile. Diamond like carbon (DLC) was also evaluated for substituting ACL, but etching selectivity of ACL was better than DLC although DLC has superior optical property [2]. Developing a novel material for pattern hard mask is very important in material research, but it is also worthwhile eliminating a potential issue to continuously develop currently existing technology. In this paper, we investigated in-situ dry-cleaning (ISD) monitoring of ACL coated process chamber. End time detection of chamber cleaning not only provides a confidence that the process chamber is being cleaned, but also contributes to minimize wait time waste (WOW). Employing Challenger 300ST, a 300mm ACL PECVD manufactured by TES, a series of experimental chamber cleaning runs was performed after several deposition processes in the deposited film thickness of $2000{\AA}$ and $5000{\AA}$. Ar Actinometry and principle component analysis (PCA) were applied to derive integrated and intuitive trace signal, and the result showed that previously operated cleaning run time can be reduced by more than 20% by employing real-time monitoring in ISD process.

  • PDF