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http://dx.doi.org/10.3795/KSME-B.2003.27.2.188

Role of Liquid Vaporization in Liquid-Assisted Laser Cleaning  

Lee, Joo-Chul (포항공대 기계공학과 대학원)
Jang, Deok-Suk (포항공대 기계공학과 대학원)
Kim, Dong-Sik (포항공대 기계공학과)
Publication Information
Transactions of the Korean Society of Mechanical Engineers B / v.27, no.2, 2003 , pp. 188-196 More about this Journal
Abstract
Liquid-assisted cleaning technology utilizing a nanosecond laser pulse is effective for removing submicron particulates from a variety of solid substrates. In the technique, saturated vapor is condensed on a solid surface to form a thin liquid film and the film is evaporated explosively by laser heating. The present work studies the role of liquid-film evaporation in the cleaning process. First, optical interferometry is employed for in-situ monitoring the displacement of the laser-irradiated sample in the cleaning process. The experiments are performed for estimating the recoil force exerted on the target with and without liquid deposition. Secondly, time-resolved visualization and optical reflectance probing are also conducted for monitoring the phase-change kinetics and plume dynamics in vaporization of thin liquid layers. Discussions are made on the effect of liquid-film thickness and dynamics of plume and acoustic wave. The results confirm that cleaning force is generated when the bubble nuclei initially grow in the strongly superheated liquid.
Keywords
Laser Cleaning; Liquid Film; Vaporization; Interferometor; Reflectance; Laser Flash Photography;
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