• Laser Solutions
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• v.6 no.2
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• pp.27-33
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• 2003

A laser shock cleaning technology is a new dry cleaning methodology for the effective removal of small particles from the surface. This technique uses a plasma shock wave produced by a breakdown of air due to an intense laser pulse. In order to optimize the laser shock cleaning process, it needs to evaluate the cleaning performance quantitatively by using a monitoring technique. In this paper, an acoustic monitoring technique was attempted to investigate the laser shock cleaning process with an aim to optimize the cleaning process. A wide-band microphone with high sensitivity was utilized to detect acoustic signals during the cleaning process. It was found that the intensity of the shock wave was strongly dependent on the power density of laser beam and the gas species at the laser beam focus. As a power density was larger, the shock wave became stronger. It was also seen that the shock wave became stronger in the case of Ar gas compared with air and N$_2$ gas.

• Transactions on Electrical and Electronic Materials
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• v.14 no.5
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• pp.254-257
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• 2013

In-situ optical emission spectroscopy (OES) is employed for PECVD chamber monitoring. OES is used as an addon sensor to monitoring and cleaning end point detection (EPD). On monitoring plasma chemistry using OES, the process gas and by-product gas are simultaneously monitored. Principal component analysis (PCA) enhances the capability of end point detection using OES data. Through chamber cleaning monitoring using OES, cleaning time is reduced by 53%, in general. Therefore, the gas usage of fluorine is also reduced, so satisfying Green Fab challenge in semiconductor manufacturing.

• The Journal of Korea Robotics Society
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• v.4 no.1
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• pp.74-80
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• 2009

This paper presents a remote monitoring and simulation system for a building cleaning mobile robot. It provides a tool of convenient 3D graphical map construction including network camera image viewer and status information of the robot. The 3D map is reconstructed from existing 2D building CAD data with DXF format using OpenGL graphic API. Through this system, it is possible to monitor and control the cleaning mobile robot from remote place. A practical experiment is performed to show the reliability and convenience of the monitoring system. The proposed system is expected to give efficient way of control and monitoring to building cleaning mobile robot.

• Clean Technology
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• v.7 no.4
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• pp.225-242
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• 2001

Cleaning process is necessary for machining parts or manufacturing finished products in the industry. Most of domestic and foreign companies are now trying to adopt environment-friendly aqueous cleaning agents instead of CFC-113 and 1,1,1-TCE which are ozone-depleting substances. However, the aqueous cleaning system has a disadvantage due to its generation of lots of waste water since the system utilizes water in cleaning and rinsing processes. Thus, it is very important that monitoring and recycling technologies of the cleaning solution and the rinse water should be introduced in the aqueous cleaning system in order to minimize generation of waste water and to maintain its cleaning performance for a quite long time. In this paper, the cleaning agents utilized in the aqueous cleaning system and cutting oils which are main contaminants were examined and analyzed. And the monitoring and recycling technologies of the aqueous cleaning system which can be employed in the industrial fields were also reviewed and evaluated.

• The Journal of Korea Robotics Society
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• v.5 no.3
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• pp.209-215
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• 2010

This paper presents a graphic user interface system consisting of graphic simulator and remote control system for a building cleaning robot. It provides a tool of convenient 3D graphical map construction for real world. The 3D map is reconstructed from existing 2D building CAD data with DXF format by using OpenGL graphic API. Through this system, graphic display of robot's status information, remote control and cleaning scheduling can be done for a building cleaning robot. This proposed system is expected to give efficient way of graphic simulation and remote monitoring and control system for a building cleaning robot.

• The Transactions of the Korea Information Processing Society
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• v.7 no.1
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• pp.115-125
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• 2000

In this paper, we suggest the basic components of monitoring system for the semiconductor wafer cleaning equipment and a monitoring system model based on these components. Basic component is defined as a mandatory function which consists of communication with the control system, user interface, communication with the remote monitoring system, management of monitoring data and inter-task communication. We have defined the function of each component and the relation among them, and designed each component as a task. To evaluate the validity of the suggested model, we have implemented the basic components using the Visual C++ on Windows NT and applied them to the Monitoring System for the semiconductor wafer cleaning equipment.

• Journal of the Korea Institute of Information and Communication Engineering
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• v.20 no.5
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• pp.923-930
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• 2016

Various pipes are used in the many industrial field such as water supply, drainage system and marine plants, so a maintenance of these pipes is essential. Especially, the maintenance of the piping in the industrial field, some professional staffs enter and clean the pipe. If the professional staffs can not enter and clean the pipe, the workers has to use the method of inserting a scraper connected to wire inside the pipe. However, this method demands huge budget and causes a number of problems such as traffic congestion. To solve these problems, pipe cleaning robot has been researching and developing. Many Pipe cleaning robots have a problem, that is impossible to confirm the operating condition of the robot in a real time. This paper suggest pipe cleaning robot with RS-485 which transmit operating and cleaning condition of robot and inner pipe filmed by camera, that user can check.

• Transactions of the Korean Society of Mechanical Engineers B
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• v.27 no.2
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• pp.188-196
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• 2003

Liquid-assisted cleaning technology utilizing a nanosecond laser pulse is effective for removing submicron particulates from a variety of solid substrates. In the technique, saturated vapor is condensed on a solid surface to form a thin liquid film and the film is evaporated explosively by laser heating. The present work studies the role of liquid-film evaporation in the cleaning process. First, optical interferometry is employed for in-situ monitoring the displacement of the laser-irradiated sample in the cleaning process. The experiments are performed for estimating the recoil force exerted on the target with and without liquid deposition. Secondly, time-resolved visualization and optical reflectance probing are also conducted for monitoring the phase-change kinetics and plume dynamics in vaporization of thin liquid layers. Discussions are made on the effect of liquid-film thickness and dynamics of plume and acoustic wave. The results confirm that cleaning force is generated when the bubble nuclei initially grow in the strongly superheated liquid.

• Environmental Analysis Health and Toxicology
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• v.9 no.1_2
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• pp.37-51
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• 1994

To evaluate the genotoxicities of workers exposed to glue and glue cleaning solution, ambient air monitoring of working place, animal study and human monitoring were carried out. By GC-MS analysis, air samples collected from shoesmaking plant were found to be toluene, xylene, cyclohexane, n-hexane, methyl ethyl ketone, trichloroethylene, butylacetate, isopropyl alcohol. Glue and glue cleaning solution from shoesmaking plant were applicated topically to the CD-1 mice. DNA was isolated from skin 24 hr following the application and analysed for DNA-adducts using the nuclease $P_1$version of $^{32}$P-postlabelling assay. RAL (Relative Adduct Labelling, adducts$10^8$ nucleotides) was significantly increased in a dose-dependent manner in the glue cleaning solution treated mice skin. Peripheral blood DNA-adducts of workers exposed to glue and glue cleaning solution were also analysed by the same method, but there were not significant differences in the peripheral blood DNA-adducts level between exposed and control workers. In addition, glue cleaning solution from shoes factory was evaluated for mutagenicity in the Salmonella plate incorporation assay using strains TA 100 and TA 1535 in the presence and absence of Arochlor 1254-induced rat liver S$_{9}$. There was evident mutagenicity for cleaning solution in TA 100 regardless of $S_9$, but TA 1535 showed positive only in the absence of $S_9$when predicted by Stead model of mutagenicity prediction (p=0.0000). The urine concentrates from workers and controls were also assayed for mutagenicity towards strain TA 100 of Salmonella typhimurium in the presence of $S_9$ using Kado's microsuspension assay, but their mutagenic activities were not found to be significant. These data suggest that shoesmaking workers are exposed to genotoxic compounds and need to be monitored by testing the mutagenicity of human urines. However, $^{32}$P-postlabelling application requires further validation for the routine monitoring of human exposure.osure.

• Proceedings of the Korean Vacuum Society Conference
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• 2012.02a
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• pp.183-183
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• 2012

In the era of 45 nm or beyond technology, conventional etch mask using photoresist showed its limitation of etch mask pattern collapse as well as pattern erosion, thus hard mask in etching became necessary for precise control of etch pattern geometry. Currently available hard mask materials are amorphous carbon and polymetric materials spin-on containing carbon or silicon. Amorphous carbon layer (ACL) deposited by PECVD for etch hard mask has appeared in manufacturing, but spin-on carbon (SOC) was also suggested to alleviate concerns of particle, throughput, and cost of ownership (COO) [1]. SOC provides some benefits of reduced process steps, but it also faced with wiggling on a sidewall profile. Diamond like carbon (DLC) was also evaluated for substituting ACL, but etching selectivity of ACL was better than DLC although DLC has superior optical property [2]. Developing a novel material for pattern hard mask is very important in material research, but it is also worthwhile eliminating a potential issue to continuously develop currently existing technology. In this paper, we investigated in-situ dry-cleaning (ISD) monitoring of ACL coated process chamber. End time detection of chamber cleaning not only provides a confidence that the process chamber is being cleaned, but also contributes to minimize wait time waste (WOW). Employing Challenger 300ST, a 300mm ACL PECVD manufactured by TES, a series of experimental chamber cleaning runs was performed after several deposition processes in the deposited film thickness of $2000{\AA}$ and $5000{\AA}$. Ar Actinometry and principle component analysis (PCA) were applied to derive integrated and intuitive trace signal, and the result showed that previously operated cleaning run time can be reduced by more than 20% by employing real-time monitoring in ISD process.