• Tribology and Lubricants
• /
• v.38 no.1
• /
• pp.1-7
• /
• 2022

Chemical-mechanical polishing (CMP) process is a semiconductor process that planarizes a wafer surface using mechanical friction between a polishing pad and a substrate surface during a specific chemical reaction. During the CMP process, polishing pad conditioning is applied to prevent the rapid degradation of the polishing quality caused by polishing pad glazing through repeated material removal processes. However, during the conditioning process, uneven wear on the polishing pad is inevitable because the disk on which diamond particles are electrodeposited is used. Therefore, the abrasion of the polishing pad should be considered not only for the variables during the conditioning process but also when designing the CMP conditioning system. In this study, three design variables of the conditioning system were analyzed, and the effect on the pad wear profile during conditioning was investigated. The three design variables considered in this study were the length of the conditioner arm, diameter of the conditioner disk, and distance between centers. The Taguchi method was used for the experimental design. The effect of the three design variables on pad wear and uniformity was assessed, and new variables used in conditioning system design were proposed.

• Transactions on Electrical and Electronic Materials
• /
• v.8 no.1
• /
• pp.26-31
• /
• 2007

The goal of this study is to determine if High Pressure Micro Jet (HPMJ) conditioning can be used as a substitute for, or in conjunction with, conventional diamond pad conditioning. Five conditioning methods were studied during which 50 ILD wafers were polished successively in a 100-mm scaled polisher and removal rate (RR), coefficient of friction (COF), pad flattening ratio (PFR) and scanning electron microscopy (SEM) measurements were obtained. Results indicated that PFR increased rapidly, and COF and removal rate decreased significantly, when conditioning was not employed. With diamond conditioning, both removal rate and COF were stable from wafer to wafer, and low PFR values were observed. SEM images indicated that clean grooves could be achieved by HPMJ pad conditioning, suggesting that HPMJ may have the potential to reduce micro scratches and defects caused by slurry abrasive particle residues inside grooves. Regardless of different pad conditioning methods, a linear correlation was observed between temperature, COF and removal rate, while an inverse relationship was seen between COF and PFR.

• Tribology and Lubricants
• /
• v.38 no.4
• /
• pp.152-161
• /
• 2022

Chemical mechanical planarization (CMP) is a technology that planarizes the surfaces of semiconductor devices using chemical reaction and mechanical material removal, and it is an essential process in manufacturing highly integrated semiconductors. In the CMP process, a conditioning process using a diamond conditioner is applied to remove by-products generated during processing and ensure the surface roughness of the CMP pad. In previous studies, prediction of pad wear by CMP conditioning has depended on numerical analysis studies based on mathematical simulation. In this study, using an artificial neural network, the ratio of conditioner coverage to the distance between centers in the conditioning system is input, and the average conditioning density, standard deviation, nonuniformity (NU), and conditioning density distribution are trained as targets. The result of training seems to predict the target data well, although the average conditioning density, standard deviation, and NU in the contact area of wafer and pad and all areas of the pad have some errors. In addition, in the case of NU, the prediction calculated from the training results of the average conditioning density and standard deviation can reduce the error of training compared with the results predicted through training. The results of training on the conditioning density profile generally follow the target data well, confirming that the shape of the conditioning density profile can be predicted.

• Journal of The Korean Society of Grassland and Forage Science
• /
• v.19 no.3
• /
• pp.251-258
• /
• 1999

A field experiment was carried out to determine the effects of chemical /mechanical treatments at mowing on the field drying rate and hay quality of rye (Secale cereale L.). The chemical drying agent/mower conditioner ($K_2CO_3$ 2%, conditioning, $K_2CO_3$ 2% + conditioning and control) were treated at different harvest stage (late boot, heading and bloom stage) for hastening hay-making in the spring of 1996. After field dry, square bales were made by hay baler, and the dry matter(DM) loss, visual estimation and nutritive value of rye hay were evaluated after storing two months. The field drying rate of rye was higher with delayed stage of harvest, and mechanical and chemical + mechanical treatment, but the effectiveness of chemical alone was very low. With mower conditioning, the duration of field dry was shortened by 1.5 to 2 days compared with control. The DM loss of rye hay was reduced by late harvest and mechanical, and chemical + mechanical combined treatment, but the efficiency by chemical alone was very low. The visual score (Ieafiness, green color, odor and softness) of hay after storing was high in mechanical and chemical + mechanical, but the score by chemical alone was very low. The nutritive value (ADF, NDF, digestibility, and relative feed value) of hay was also high with treatment of mechanical and chemical + mechanical, but the quality by chemical alone was similar compared with control. The quality of hay was very low when harvested at bloom stage. In conclusion, mower conditioning can enhance the field drying rate of rye, but the drying effectiveness of chemical drying agent was very low. The effect of chemical/mechanical combined treatment was very similar when compared with mechanical alone. Harvest at early heading to heading stage was recommended for high quality rye hay.

• Transactions on Electrical and Electronic Materials
• /
• v.8 no.2
• /
• pp.67-72
• /
• 2007

High Pressure Micro Jet (HPMJ) pad conditioning system was investigated as an alternative to diamond disc conditioning in copper CMP. A series of comparative 50-wafer marathon runs were conducted at constant wafer pressure and sliding velocity using Rohm & Haas IC1000 and Asahi-Kasei EMD Corporation (UNIPAD) concentrically grooved pads under ex-situ diamond conditioning or HPMJ conditioning. SEM images indicated that fibrous surface was restored using UNIPAD pads under both diamond and HPMJ conditioning. With IC1000 pads, asperities on the surface were significantly collapsed. This was believed to be due to differences in pad wear rates for the two conditioning methods. COF and removal rate were stable from wafer to wafer using both diamond and HPMJ conditioning when UNIPAD pads were used. Also, HPMJ conditioning showed higher COF and removal rate when compared to diamond conditioning for UNIPAD. On the other hand, COF and removal rates for IC1000 pads decreased significantly under HPMJ conditioning. Regardless of pad conditioning method adopted and the type of pad used, linear correlation was observed between temperature and COF, and removal rate and COF.

• Asian-Australasian Journal of Animal Sciences
• /
• v.13 no.8
• /
• pp.1109-1112
• /
• 2000

A field experiment was carried out to determine the effects of mechanical and chemical conditioning at mowing on field drying rate and quality of grass hay in 1996. Mower conditioner and/or chemical drying agent $(K_2CO_3)$ were used at different harvest stages (late boot, heading and bloom stages) for hastening hay-making. After field drying, square bales were made by hay baler, and the visual estimation and nutritive value of hay were evaluated after storing two months. In mower conditioning, the duration of field drying was shortened by 0.5 to 1 day compared with drying agent, and by 1 to 2 days compared with control. The drying matter loss of hay was reduced by late harvest and mechanical conditioning. The visual score (leafiness, green color, odor and softness), and acid detergent fiber (ADF), neutral detergent fiber (NDF), in vitro dry matter digestibllity (IVDMD), and relative feed value (RFV) of hay were improved with mechanical conditioning, but chemical alone had little effect on quality. The quality of hay harvested at bloom stage was much lower than that of hay harvested at late boot and heading stage. In conclusion, mower conditioning can enhance the field drying rate of grass hay, however the drying efficiency of chemical drying agent is very low. Also the effects of chemical/mechanical combined conditioning are very similar compared with mechanical conditioning alone. Harvesting at late boot to heading stage is recommended for the production of high quality hay.

• Journal of Ginseng Research
• /
• v.13 no.2
• /
• pp.189-197
• /
• 1989

A new quaternary ammonium compound, hydrolyzed ginseng-saponin quaternary (HGSQ), from Korean ginseng saponin and 2,3-epoxypropyltrimethylammonium chloride has been developed as a conditioning agent in cosmetics. This structure has a hydrophobic group from the aglycone of ginseng saponin which is biologically active and considered to be the most important component of the Korean ginseng. Its properties : surface tension, critical micelle concentration (CMC), eye irritation, sorption onto hair, force reduction(%) and moisture retention effect were studied. Its cationic character allows the molecule to be more substantive than ginseng saponin. HGSQ had good physical properties and was safe. enough as a cosmetic raw material. Also half-head tests of HGSQ-containing shampoo were carried out to compare the conditioning effects in shampoos. HGSQ was an excellent conditioning agent in shampoo..

• The Magazine of the Society of Air-Conditioning and Refrigerating Engineers of Korea
• /
• v.22 no.5
• /
• pp.325-340
• /
• 1993

• Journal of The Korean Society of Grassland and Forage Science
• /
• v.21 no.2
• /
• pp.67-74
• /
• 2001

A field experiment was carried out to determine the effects of chemical/mechanical treatments at mowing on the field drying rate and hay quality of alfalfa(Medicago sativa L., cv. Vernal) and spring oats(Avena satvia L., cv. Swan). The chemical drying agent of 2% $K_2CO_3$, mechanical mower conditioning, and no treatment(control) were treated for hastening hay-making in the spring of 1997. The forages were harvested at early bloom stage in alfalfa and heading stage in oats. After field dry, square bales were made by hay baler, and the dry matter(DM) loss, visual estimation and nutritive value of hay were evaluated after storing two months. The field drying rates of alfalfa and oats were high at mechanical treatment, but the drying effectiveness of chemical agents alone was very low. With mower conditioning, the duration of field dry was shortened by 1 day compared with control. therefore, mower conditioning enhance the field drying rate of alfalfa and oats. The DM loss of alfalfa and oats hay was reduced by mechanical treatment, but the efficiency by chemical alone was low. The visual score(leafiness, green color, odor and softness) of hay at mechanical treatment was slightly higher than that of chemical and control. The nutritive value(ADF, NDF, in vitro digestibility, and relative feed value) of hay was also high with treatment of mechanical, but those of chemical alone were similar compared with control. The nutritive value of hay after two months in both alfalfa and oats was decreased when compared with at harvest.

• Journal of the korean academy of Pediatric Dentistry
• /
• v.23 no.2
• /
• pp.347-355
• /
• 1996

The purpose of this study was to compare the bond strengths of different kinds of glass ionomer cements (GIC), which is recently increasing the clinical application in the field of pediatric dentistry and measure the repaired bond strengths in order to examine the clinical applicabilty of partial repaired cases. By using one kind of the light cured type GIC and three kinds of the chemical cured type GIC, the bond strengths of the followings were compared : unrepaired group as control, repaired conditioning group, which was treated the repaired surface using 25% polyacrylic acid and repaired non-conditioning group without surface treatment. Three point bending test was performed under Universal Testing Machine in order to measure the compressive bond strengths. The results were as follows : 1. Light cured GIC had higher bond strength than chemical cured type GIC in both of repaired and unrepaired groups. 2. In repaired cases, all of the materials decreased the bond strength when compared to the control group. In the light cured type, the bond strength of repaired conditioning group decreased 31.6%, repaired non-conditioning group decreased 40.8%. In chemical cured types, the bond strength of repaired conditining group decreased 11.8%, repaired non-conditioning group decreased 20.9%. 3. All the materials, in the case of the chemical treatment on the repaired surface using 25% polyacrylic acid had higher bond strength than untreated but, lower than control group.