• Proceedings of the Korean Vacuum Society Conference
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• 2014.02a
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• pp.262.2-262.2
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• 2014

Plasma processing is an essential process for pattern etching and thin film deposition in nanoscale semiconductor device fabrication. It is necessary to maintain plasma chamber in steady-state in production. In this study, we determined plasma chamber state with residual gas analysis with self-plasma optical emission spectroscopy. Residual gas monitoring of fluorocarbon plasma etching chamber was performed with self-plasma optical emission spectroscopy (SPOES) and various chemical elements was identified with a SPOES system which is composed of small inductive coupled plasma chamber for glow discharge and optical emission spectroscopy monitoring system for measuring optical emission. This work demonstrates that chamber state can be monitored with SPOES and this technique can potentially help maintenance in production lines.

• Journal of Sensor Science and Technology
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• v.26 no.2
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• pp.101-106
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• 2017

A novel intravenous (IV) infusion monitoring sensor is presented to measure the drop rate in the drip chamber of an IV infusion set. It is based on a capacitive proximity sensor and detects the variation of the longitudinal electric field induced by the drop falling into the drip chamber. Unlike the conventional capacitor sensor with two semi-cylindrical conductor plates, the proximity sensor for IV monitoring is composed of a pair of conductor rings which are mounted on the outer surface of the drip chamber with a specific gap between them. The characteristics of the proximity sensor for IV monitoring were investigated through three dimensional electrostatic simulations. It showed quite superior performances in comparison with the conventional capacitor sensor. Especially, the proposed proximity sensor exhibits consistent sensitivity regardless of its mounting position on the drip chamber, operates normally though the drip chamber is tilted and shows robustness to the changes of the drop size and the drip factor of the IV infusion set. Thus, the proximity sensor for IV monitoring is more suitable for use in actual environment of IV therapy compared with the conventional capacitor sensor.

• Transactions on Electrical and Electronic Materials
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• v.14 no.5
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• pp.254-257
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• 2013

In-situ optical emission spectroscopy (OES) is employed for PECVD chamber monitoring. OES is used as an addon sensor to monitoring and cleaning end point detection (EPD). On monitoring plasma chemistry using OES, the process gas and by-product gas are simultaneously monitored. Principal component analysis (PCA) enhances the capability of end point detection using OES data. Through chamber cleaning monitoring using OES, cleaning time is reduced by 53%, in general. Therefore, the gas usage of fluorine is also reduced, so satisfying Green Fab challenge in semiconductor manufacturing.

• Journal of Radiation Protection and Research
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• v.34 no.2
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• pp.77-81
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• 2009

An Area Radiation Monitoring System (ARMS) ionization chamber, which had an 11.8 L active volume, was fabricated and performance-tested at KAERI. Low leakage currents, linearities at low and high dose rates were achieved from performance tests. The correlation coefficients between the ionization currents and the dose rates are 1 at high dose rate and 0.99 at low dose rate. In this study, an integration-type ARMS ionization chamber was tested over a year for an evaluation of its long-term stability at a radioisotope (RI) repository of the Young-gwang nuclear power plant. The standard deviation of dose rate of 1 day data and over a 100-days mean value were 6.2 $\mu$R/h and 2.9 $\mu$R/h, respectively. The fabricated ARMS ionization chamber showed stable performance from the results of the long-term tests. Design and performance characteristics of the fabricated ionization chamber for the ARMS from performance-tests are also addressed.

• Nuclear Engineering and Technology
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• v.55 no.9
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• pp.3417-3422
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• 2023

Recently, as the clinically positive biological effects of ultra-high dose rate (UHDR) radiation beams have been revealed, interest in flash radiation therapy has increased. Generally, FLASH preclinical experiments are performed using UHDR electron beams generated by linear accelerators. Real-time monitoring of UHDR beams is required to deliver the correct dose to a sample. However, it is difficult to use typical transmission-type ionization chambers for primary beam monitoring because there is no suitable electrometer capable of reading high pulsed currents, and collection efficiency is drastically reduced in pulsed radiation beams with ultra-high doses. In this study, a monitoring method using bremsstrahlung photons generated by irradiation devices and a water phantom was proposed. Charges collected in an ionization chamber located at the back of a water phantom were analyzed using the bremsstrahlung tail on electron depth dose curves obtained using radiochromic films. The dose conversion factor for converting a monitored charge into a delivered dose was determined analytically for the Advanced Markus® chamber and compared with experimentally determined values. It is anticipated that the method proposed in this study can be useful for monitoring sample doses in UHDR electron beam irradiation.

• Journal of the Semiconductor & Display Technology
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• v.20 no.3
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• pp.27-31
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• 2021

VI probe, which is one of various in-situ plasma monitoring sensor, is frequently used for in-situ process monitoring in mass production environment. In this paper, we correlated the plasma etch results with VI probe data with the small amount of gas flow rate changes to propose usefulness of the VI probe in real-time process monitoring. Several different sized contact holes were employed for the etch experiment, and the etched profiles were measured by scanning electron microscope (SEM). Although the shape of etched hole did not show satisfactory relationship with VI probe data, the chamber status changed along the incremental/decremental modification of the amount of gas flow was successfully observed in terms of impedance monitoring.

• Proceedings of the Korean Vacuum Society Conference
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• 2012.02a
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• pp.183-183
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• 2012

In the era of 45 nm or beyond technology, conventional etch mask using photoresist showed its limitation of etch mask pattern collapse as well as pattern erosion, thus hard mask in etching became necessary for precise control of etch pattern geometry. Currently available hard mask materials are amorphous carbon and polymetric materials spin-on containing carbon or silicon. Amorphous carbon layer (ACL) deposited by PECVD for etch hard mask has appeared in manufacturing, but spin-on carbon (SOC) was also suggested to alleviate concerns of particle, throughput, and cost of ownership (COO) [1]. SOC provides some benefits of reduced process steps, but it also faced with wiggling on a sidewall profile. Diamond like carbon (DLC) was also evaluated for substituting ACL, but etching selectivity of ACL was better than DLC although DLC has superior optical property [2]. Developing a novel material for pattern hard mask is very important in material research, but it is also worthwhile eliminating a potential issue to continuously develop currently existing technology. In this paper, we investigated in-situ dry-cleaning (ISD) monitoring of ACL coated process chamber. End time detection of chamber cleaning not only provides a confidence that the process chamber is being cleaned, but also contributes to minimize wait time waste (WOW). Employing Challenger 300ST, a 300mm ACL PECVD manufactured by TES, a series of experimental chamber cleaning runs was performed after several deposition processes in the deposited film thickness of $2000{\AA}$ and $5000{\AA}$. Ar Actinometry and principle component analysis (PCA) were applied to derive integrated and intuitive trace signal, and the result showed that previously operated cleaning run time can be reduced by more than 20% by employing real-time monitoring in ISD process.

• Journal of the Korea Convergence Society
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• v.9 no.6
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• pp.61-68
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• 2018

This paper propose the remote monitoring system using LoRa networks about storm overflow chamber, which is a device designed to discharge rainwater directly to a sewage treatment plant when it reaches a certain amount of rainfall during precipitation. In this system, when the information produced by the sensor is transmitted to the LoRa network server and updated, the application server can automatically receive data through the implemented communication interface. The application server carries out management functions of storm overflow chamber devices and subscription information, collects measured flow rate and opening-closing information, and provides statistical information using the collected data. The android app performs a firebase-based notification function to prompt the user of malfunctioning of the storm overflow chamber device.

• Proceedings of the Korean Geotechical Society Conference
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• 2002.03a
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• pp.673-678
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• 2002

Laboratory calibration chamber tests for cone penetrometers, pressuremeters and dilatometers in cohesionless soil specimens have been conducted by numerous researchers. However, there have been only few applications to compacted or preconsolidated cohesive soils. Therefore, for the first time, Calibration Chamber System was developed in Korea University. This can be attributed to the extremely time consuming and laborious process involved in the preparation of large cohesive soil specimens in addition to other complexities involving instrumentation for pore pressure monitoring and the need for maintaing saturation by back pressure. Chamber System with similar principle as LSU Chamber System was made of more strengthen and complementary form by increasing system diameter(1.2m), carrying out 1st and 2nd consolidation process in one system for smooth and safe work, accurate Data Aquisition.

• Particle and aerosol research
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• v.12 no.3
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• pp.57-63
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• 2016

The laser-induced breakdown spectroscopy (LIBS) has been used for rapid detection of elemental compositions of various materials in multi-media (solid, liquid, gas, and aerosols). In this study, the aerosol-LIBS has been developed for real-time monitoring of process-induced particles produced during the semiconductor manufacturing. The developed aerosol-LIBS mainly consists of laser, optics, spectrometer, and aerosol chamber. A new aerosol chamber was constructed for the aerosol-LIBS to be applied for various semiconductor manufacturing process, including exhaust tubes, and low pressure and high temperature chamber. The aerosol-LIBS was evaluated by using laboratory generated aerosols for detection of various elements. As a result, P, Fe, Mg, Cu, Co, Ni, Ca, Na, and K emission lines were successfully detected by the aerosol-LIBS. Further evaluation of the aerosol-LIBS is being conducted.