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Gas Flow Rate Dependency of Etching Result: Use of VI Probe for Process Monitoring  

Song, Wan Soo (Department of Electronics Engineering, Myongji University)
Hong, Sang Jeen (Department of Electronics Engineering, Myongji University)
Publication Information
Journal of the Semiconductor & Display Technology / v.20, no.3, 2021 , pp. 27-31 More about this Journal
Abstract
VI probe, which is one of various in-situ plasma monitoring sensor, is frequently used for in-situ process monitoring in mass production environment. In this paper, we correlated the plasma etch results with VI probe data with the small amount of gas flow rate changes to propose usefulness of the VI probe in real-time process monitoring. Several different sized contact holes were employed for the etch experiment, and the etched profiles were measured by scanning electron microscope (SEM). Although the shape of etched hole did not show satisfactory relationship with VI probe data, the chamber status changed along the incremental/decremental modification of the amount of gas flow was successfully observed in terms of impedance monitoring.
Keywords
VI Probe; Impedance; Chamber Status; Mass Production;
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