• 전기학회논문지
• /
• 제63권10호
• /
• pp.1448-1454
• /
• 2014

In this study, a new type of electrode device is implemented to measure the capacitance energy and interpret it as the ECG (Electrocardiogram) data. The main idea of this new electrode system is to estimate the capacitance on the skin by assembling a capacitive-coupled circuits and translate into the ECG signal. To measure the coupling energy and estimate the aquired data in terms of heart activity, the capacitive-coupled electrode is garmented with fabrics in the form of a chest band or a vest jacket. To compare the ECG data from the capacitive-coupled electrode with the conventional electrode(Ag-AgCl) system, the corelation coefficient between two signals is computed as 0.9517. Thus, we can conclude the fact that capacitive-coupled electrode system can measure a person's heart activity without any contact to his or her skin and can the interpreted as the ECG data.

• 대한의용생체공학회:의공학회지
• /
• 제35권6호
• /
• pp.203-210
• /
• 2014

Wearable medical device has been a resurgence of interest thanks to the development of technology and propagation of smart phone in recent years. Various types of wearable devices have been introduced and available in market. Capacitive coupled electrode which measures electrocardiogram over cloth is able to be applied wearable device. In previous approaches of capacitive electrode, they need proper pressure for stable contact of the electrode to body surface. However, wearable device that gives pressure on body surface is not suitable for long-term monitoring. In this study, we proposed adhesive polyurethane-based capacitive electrode for patch-type wearable electrocardiogram (ECG) monitoring device. Self-adhesive polyurethane make the electrode and whole system be adhered to the surface of skin without any pressure. The patch-type system is consisted of analog filter, analog-to-digital converter and wireless transmission module and designed to be attached on the body as a patch. To validate the feasibility of the developed system, we measured ECG signal in stable and active state and extracted heart rate. Therefore, we observed skin response after long-term attachment for biocompatibility of the adhesive polyurethane and adhesive strength of it. The result shows the possibility of applying the developed system for ECG monitoring in real-life.

• 한국진공학회:학술대회논문집
• /
• 한국진공학회 2014년도 제46회 동계 정기학술대회 초록집
• /
• pp.247.1-247.1
• /
• 2014

The capacitive coupled plasma is used widely in the semiconductor industries. Especially, the uniformity of the industrial plasma is heavily related with defect ratio of devices. Therefore, the industries need the capacitive coupled plasma source which can generate the uniform plasma and control the plasma's uniformity. To achieving the uniformity of the large area plasma, we designed multi-powered electrodes. We controlled the uniformity by controlling the power of each electrode. After this work, we started to research another concept of the plasma device. We make the plasma chamber that has multi-ground electrodes imaginary (CST microwave studio) and simulate the electric field. The shape of the multi-ground electrodes is ring type, and it is same as the shape of the multi-power electrodes that we researched before. The diameter of the side electrode's edge is 300mm. We assumed that the plasma uniformity is related with the impedance of ground electrodes. Therefore we simulated the imaginary chamber in three cases. First, we connected L (inductor) and C (capacitor) at the center of multi-ground electrodes. Second, we changed electric conductivity of multi-ground electrode. Third, we changed the insulator's thickness between the center ground electrode and the side ground electrode. The driving frequency is 2, 13.56 and 100 MHz. We switched our multi-powered electrode system to multi-ground electrode system. After switching, we measured the plasma uniformity after installing a variable vacuum capacitor at the ground line. We investigate the effect of ground electrodes' impedance to plasma uniformity.

• 반도체디스플레이기술학회지
• /
• 제13권4호
• /
• pp.1-5
• /
• 2014

The plasma density distribution in between the electrode and lateral wall of a narrow gap CCP was investigated. The plasma density distribution was obtained using single Langmuir probe, having two peaks of density distribution at the center of electrode and at the peripheral area of electrodes. The plasma density distribution was compared with the RF fluctuation of plasma potential taken from capacitive probe. Ionization reactions obtained from numerical analysis using CFD-$ACE^+$ fluid model based code. The peaks in two region for plasma density and voltage fluctuation have similar spatial distribution according to input power. It was found that plasma density distribution between the electrode and the lateral wall is closely related with the local ionization.

• 대한전기학회:학술대회논문집
• /
• 대한전기학회 2006년도 제37회 하계학술대회 논문집 C
• /
• pp.1657-1658
• /
• 2006

An external electrode fluorescent lamps (EEFLs) have the advantage of a long lifetime in the early stages of the study on plasma discharge, interest in the lamp continues. Studies on the operation of external electrode fluorescent lamps have focused mainly on its use of a type of high frequency (MHz). By performing high brightness using a square wave operation method with the low frequency below 100kHz, which is applied to a narrowed tube type lamp that has several mm of lamp diameter. To solve these problems of CCFL, EEFL (External Electrode Fluorescent Lamp) is introduced. Because electrode of EEFL is on the outer surface of discharge tube, the electrode is perfectly prevented from the sputtering by accelerated ions. And it is possible to drive the many CCFLs at the same time, because EEFL shows the positively resistant characteristic. But EEFL has the large non-radiative power loss in sheath. In this study the novel electrode structure was introduced in order to reduce non-radiative power loss in sheath of EEFL. The novel electrode structure comes from the idea to combine conceptually capacitive discharge with inductive discharge. Thus, this study verifies the change in the optical characteristics according to the change in electrode structure through a Maxwell's electromagnetic field simulation and examines the relationship between the change in the EEFL electrode structure and brightness by measuring the optical characteristics.

• 한국진공학회:학술대회논문집
• /
• 한국진공학회 2012년도 제42회 동계 정기 학술대회 초록집
• /
• pp.508-508
• /
• 2012

CST microwave studio is used to simulate the plasma profile of the 450mm CCP source. Standing wave effect becomes important at the high frequency as the electrode radius increases. To solve plasma non-uniformity problem, we designed multi electrode chamber to decreasing standing wave effect. Simulation showed the ratio of input power of each electrode is related with electric field strength. The multi electrode was constructed and measured by 2D probe arrays using floating harmonic method. Uniformity of 450 mm CCP was changed by the ratio of input power of each electrode. We described this dependence with circuit model.

• 한국진공학회:학술대회논문집
• /
• 한국진공학회 2015년도 제49회 하계 정기학술대회 초록집
• /
• pp.136.2-136.2
• /
• 2015

반도체 제조는 chip의 성능 향상 및 단가 하락을 위해 지속적으로 pattern size가 nano size로 감소해 왔고, capacitor 용량은 증가해 왔다. 이러한 현상은 contact hole의 aspect ratio를 지속적으로 증가시킨바, 그에 따라 최적의 HARC (high aspect ratio contact)을 확보하는 적합한 dry etch process가 필수적이다. 그러나 HARC dry etch process는 많은 critical plasma properties 에 의존하는 매우 복잡한 공정이다. 따라서, critical plasma properties를 적절히 조절하여 higher aspect ratio, higher etch selectivity, tighter critical dimension control, lower P2ID과 같은 plasma characteristics을 확보하는 것이 요구된다. 현재 critical plasma properties를 제어하기 위해 다양한 plasma etching 방법이 연구 되어왔다. 이 중 plasma를 낮은 kHz의 frequency에서 on/off 하는 pulsed plasma etching technique은 nanoscale semiconductor material의 etch 특성을 효과적으로 향상 시킬 수 있다. 따라서 본 실험에서는 dual-frequency capacitive coupled plasma (DF-CCP)을 사용하여 plasma operation 동안 duty ratio와 pulse frequency와 같은 pulse parameters를 적용하여 plasma의 특성을 각각 제어함으로써 etch selectivity와 uniformity를 향상 시키고자 하였다. Selective SiO2 contact etching을 위해 top electrode에는 60 MHz pulsed RF source power를, bottom electrode에는 2MHz pulse plasma를 인가하여 synchronously pulsed dual-frequency capacitive coupled plasma (DF-CCP)에서의 plasma 특성과 dual pulsed plasma의 sync. pulsing duty ratio의 영향에 따른 etching 특성 등을 연구 진행하였다. 또한 emissive probe를 통해 전자온도, OES를 통한 radical 분석으로 critical Plasma properties를 분석하였고 SEM을 통한 etch 특성분석과 XPS를 통한 표면분석도 함께 진행하였다. 그 결과 60%의 source duty percentage와 50%의 bias duty percentage에서 가장 향상된 etch 특성을 얻을 수 있었다.

• ETRI Journal
• /
• 제44권5호
• /
• pp.859-874
• /
• 2022

This paper presents a low-power and lightweight human body communication (HBC) receiver with an embedded dummy electrode for improved signal acquisition. The clock data recovery (CDR) circuit in the receiver operates with a low supply voltage and utilizes a clock phase inversion scheme. The receiver is equipped with a main electrode and dummy electrode that strengthen the capacitive-coupled signal at the receiver frontend. The receiver CDR circuit exploits a clock inversion scheme to allow 0.9-V operation while achieving a shorter lock time than at 3.3-V operation. In experiments, a receiver chip fabricated using 130-nm complementary metal-oxide-semiconductor technology was demonstrated to successfully receive the transmitted signal when the transmitter and receiver are placed separately on each hand of the user while consuming only 4.98 mW at a 0.9-V supply voltage.

• Radiation Oncology Journal
• /
• 제5권1호
• /
• pp.49-58
• /
• 1987

환부에 열을 가하여 종양을 치료할 수 있는 온열요법의 생물학적 효과는 상당히 고무적이며 새로운 암 치료 수단으로 등장되었다. 그러나 체내 깊숙히 위치하고 있는 종양에 일정한 열을 계속 부여하면서 온도와 열의 분포를 정확히 측정하기가 어려웠다. 연세 암센터는 연세대학교 공과대학과 녹십자 의료 공업주식회사와 산학협동으로 라디오파 유전가열형 온열장치(가칭 Greenytherm-GY8)를 개발 제작하고 임상응용을 위해 기초 연구를 실시하였다. 개발된 온열장치는 $8{\sim}10MHz$ 라디오파 발생기와 유전가열 전극, 온도계측용 열정대, 냉각장치 및 제어용 개인 컴퓨터로 구성되었다. 온열장치의 성능을 시험하기 위하여 인체크기의 한천팬텀과 동물 및 인체의 악성종양에 대한 치료온도와 온열분포를 측정하였다. 라디오파 발생전력을 $200{\sim}1,500W$까지 조절할 수 있으며 유전가열을 위한 라디오파의 주파수는 $8{\sim}10MHz$ 범위를 얻을 수 있었다. 피부에 근접된 종양의 가열온도는 $200{\sim}500W$의 RF 전력으로 10분이 내 치료가능온도$(42.5^{\circ}C)$ 이상으로 가열할 수 있었으며 정상조직 쪽의 전극은 $5{\sim}10^{\circ}C$로 냉각시키므로서 피부손상을 방지할 수 있었다. $5{\sim}10cm$ 깊이에 존재하는 종양의 가열온도는 치료 가능한 $40{\sim}43^{\circ}C$까지 가열이 가능하였으며 냉각보러스와 정합회로에 의해 피부의 자극을 줄일 수 있었다. 이상과 같은 실험결과로 유전가열형 온열장치는 임상응용에 적합하다고 판단되며 임상경험을 통하여 더 예민한 정합장치와 전기적 자극을 완전히 줄일 수 있는 방법 및 편리한 전극 등의 개발이 가능한 기본자료가 될 수 있다.

• 조명전기설비학회논문지
• /
• 제23권7호
• /
• pp.8-13
• /
• 2009

Plasma enhanced chemical vapor deposition (PECVD) is commonly used for Carbon nanotubes (CNTs) fabrication, and the process can easily be applied to industrial production lines. In this works, we developed novel magnetized radio frequency PECVD system for one line process of CNTs fabrication for charge storable electrode application. The system incorporates aspects of physical and chemical vapor deposition using capacitive coupled RF plasma and magnetic confinement coils. Using this magnetized RF-PECVD system, we firstly deposited Fe layer (about 200[nm]) on Si substrate by sputter method at the temperature of 300[$^{\circ}$] and hence prepared CNTs on the Fe catalyst layer and investigated fundamental properties by scanning electron microscopy (SEM) and Raman spectroscopy (RS). High-density, aligned CNTs can be grown on Fe/Si substrates at the temperature of 600[$^{\circ}$] or less.