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Investigation of Spatial Distribution of Plasma Density between the Electrode and Lateral Wall of Narrow-gap CCP Source  

Choi, Myung-Sun (Department of Energy Systems Engineering, Seoul National University)
Jang, Yunchang (Department of Energy Systems Engineering, Seoul National University)
Lee, Seok-Hwan (Department of Energy Systems Engineering, Seoul National University)
Kim, Gon-Ho (Department of Energy Systems Engineering, Seoul National University)
Publication Information
Journal of the Semiconductor & Display Technology / v.13, no.4, 2014 , pp. 1-5 More about this Journal
Abstract
The plasma density distribution in between the electrode and lateral wall of a narrow gap CCP was investigated. The plasma density distribution was obtained using single Langmuir probe, having two peaks of density distribution at the center of electrode and at the peripheral area of electrodes. The plasma density distribution was compared with the RF fluctuation of plasma potential taken from capacitive probe. Ionization reactions obtained from numerical analysis using CFD-$ACE^+$ fluid model based code. The peaks in two region for plasma density and voltage fluctuation have similar spatial distribution according to input power. It was found that plasma density distribution between the electrode and the lateral wall is closely related with the local ionization.
Keywords
Capacitively coupled plasma; diffusion region; plasma density distribution; Capacitive probe; CFD-$ACE^+$;
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Times Cited By KSCI : 1  (Citation Analysis)
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