• Title/Summary/Keyword: CMOS transistor

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Integrated Circuit Design Based on Carbon Nanotube Field Effect Transistor

  • Kim, Yong-Bin
    • Transactions on Electrical and Electronic Materials
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    • v.12 no.5
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    • pp.175-188
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    • 2011
  • As complementary metal-oxide semiconductor (CMOS) continues to scale down deeper into the nanoscale, various device non-idealities cause the I-V characteristics to be substantially different from well-tempered metal-oxide semiconductor field-effect transistors (MOSFETs). The last few years witnessed a dramatic increase in nanotechnology research, especially the nanoelectronics. These technologies vary in their maturity. Carbon nanotubes (CNTs) are at the forefront of these new materials because of the unique mechanical and electronic properties. CNTFET is the most promising technology to extend or complement traditional silicon technology due to three reasons: first, the operation principle and the device structure are similar to CMOS devices and it is possible to reuse the established CMOS design infrastructure. Second, it is also possible to reuse CMOS fabrication process. And the most important reason is that CNTFET has the best experimentally demonstrated device current carrying ability to date. This paper discusses and reviewsthe feasibility of the CNTFET's application at this point of time in integrated circuits design by investigating different types of circuit blocks considering the advantages that the CNTFETs offer.

High Performance Current Sensing Circuit for Current-Mode DC-DC Buck Converter

  • Jin, Hai-Feng;Piao, Hua-Lan;Cui, Zhi-Yuan;Kim, Nam-Soo
    • Transactions on Electrical and Electronic Materials
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    • v.11 no.1
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    • pp.24-28
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    • 2010
  • A simulation study of a current-mode direct current (DC)-DC buck converter is presented in this paper. The converter, with a fully integrated power module, is implemented by using sense method metal-oxide-semiconductor field-effect transistor (MOSFET) and bipolar complementary metal-oxide-semiconductor (BiCMOS) technology. When the MOSFET is used in a current sensor, the sensed inductor current with an internal ramp signal can be used for feedback control. In addition, the BiCMOS technology is applied in the converter for an accurate current sensing and a low power consumption. The DC-DC converter is designed using the standard $0.35\;{\mu}m$ CMOS process. An off-chip LC filter is designed with an inductance of 1 mH and a capacitance of 12.5 nF. The simulation results show that the error between the sensing signal and the inductor current can be controlled to be within 3%. The characteristics of the error amplification and output ripple are much improved, as compared to converters using conventional CMOS circuits.

Si CMOS Extension and Ge Technology Perspectives Forecast Through Metal-oxide-semiconductor Junctionless Field-effect Transistor

  • Kim, Youngmin;Lee, Junsoo;Cho, Seongjae
    • JSTS:Journal of Semiconductor Technology and Science
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    • v.16 no.6
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    • pp.847-853
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    • 2016
  • Applications of Si have been increasingly exploited and extended to More-Moore, More-than-Moore, and beyond-CMOS approaches. Ge is regarded as one of the supplements for Si owing to its higher carrier mobilities and peculiar band structure, facilitating both advanced and optical applications. As an emerging metal-oxide device, the junctionless field-effect transistor (JLFET) has drawn considerable attention because of its simple process, less performance fluctuation, and stronger immunity against short-channel effects due to the absence of anisotype junctions. In this study, we investigated lateral field scalability, which is equivalent to channel-length scaling, in Si and Ge JLFETs. Through this, we can determine the usability of Si CMOS and hypothesize its replacement by Ge. For simulations with high accuracy, we performed rigorous modeling for ${\mu}_n$ and ${\mu}_p$ of Ge, which has seldom been reported. Although Ge has much higher ${\mu}_n$ and ${\mu}_p$ than Si, its saturation velocity ($v_{sat}$) is a more determining factor for maximum $I_{on}$. Thus, there is still room for pushing More-Moore technology because Si and Ge have a slight difference in $v_{sat}$. We compared both p- and n-type JLFETs in terms of $I_{on}$, $I_{off}$, $I_{on}/I_{off}$, and swing with the same channel doping and channel length/thickness. $I_{on}/I_{off}$ is inherently low for Ge but is invariant with $V_{DS}$. It is estimated that More-Moore approach can be further driven if Si is mounted on a JLFET until Ge has a strong possibility to replace Si for both p- and n-type devices for ultra-low-power applications.

A High Voltage NMOSFET Fabricated by using a Standard CMOS Logic Process as a Pixel-driving Transistor for the OLED on the Silicon Substrate

  • Lee, Cheon-An;Jin, Sung-Hun;Kwon, Hyuck-In;Cho, Il-Whan;Kong, Ji-Hye;Lee, Chang-Ju;Lee, Myung-Won;Kyung, Jae-Woo;Lee, Jong-Duk;Park, Byung-Gook
    • Journal of Information Display
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    • v.5 no.1
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    • pp.28-33
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    • 2004
  • A high voltage NMOSFET is proposed to drive top emission organic light emitting device (OLED) used in the organic electroluminescent (EL) display on the single crystal silicon substrate. The high voltage NMOSFET can be fabricated by utilizing a simple layout technique with a standard CMOS logic process. It is clearly shown that the maximum supply voltage ($V_{DD}$) required for the pixel-driving transistor could reach 45 V through analytic and experimental methods. The high voltage NMOSFET was fabricated by using a standard 1.5 ${\mu}m$, 5 V CMOS logic process. From the measurements, we confirmed that the high voltage NMOSFET could sustain the excellent saturation characteristic up to 50 V without breakdown phenomena.

An Implemention of Low Power 16bit ELM Adder by Glitch Reduction (글리치 감소를 통한 저전력 16비트 ELM 덧셈기 구현)

  • 류범선;이기영;조태원
    • Journal of the Korean Institute of Telematics and Electronics C
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    • v.36C no.5
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    • pp.38-47
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    • 1999
  • We have designed a 16bit adder which reduces the power consumption at each level of architecture, logic and transistor. The conventional ELM adder has a major disadvantage which makes glitch in the G cell when the particular input bit patterns are applied, because of the block carry generation signal computed by the input bit pattern. Thus, we propose a low power adder architecture which can automatically transfer each block carry generation signal to the G cell of the last level to avoid glitches for particular input bit patterns at the architecture level. We also use a combination of logic styles which is suitable for low power consumption with static CMOS and low power XOR gate at the logic level. Futhermore, The variable-sized cells are used for reduction of power consumption according to the logic depth of the bit propagation at the transistor level. As a result of HSPICE simulation with $0.6\mu\textrm{m}$ single-poly triple-metal LG CMOS standard process parameter, the proposed adder is superior to the conventional ELM architecture with fixed-sized cell and fully static CMOS by 23.6% in power consumption, 22.6% in power-delay-product, respectively.

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High Temperature Characterization of PSA-BiCMOS (PSA-BiCMOS의 고온특성에 관한 연구)

  • 조정호;구용서안철
    • Proceedings of the IEEK Conference
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    • 1998.10a
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    • pp.577-580
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    • 1998
  • This paper presents the characteristics of each MOS device and Bipolar device, then investigates about how these devices take effect on BiCMOS inverter from 300K to 470K. The turn-off and Logic swing characteristics of BiCMOS inverter are degraded by the electrical characteristics of the MOS to around 400K, but over that temperature enhanced by the characteristics of the Bipolar transistor.

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The Study and characteristics of integrated CMOS sensor's packaging (집적화된 CMOS 센서의 팩키징 연구 및 특성 평가)

  • Roh, Ji-Hyoung;Kwon, Hyeok-Bin;Shin, Kyu-Sik;Cho, Nam-Kyu;Moon, Byung-Moo;Lee, Dae-Sung
    • Proceedings of the KIEE Conference
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    • 2009.07a
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    • pp.1551_1552
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    • 2009
  • In this paper, we presented the packaging technologies of CMOS ISFET(Ion Sensitive Field Effect Transistor) pH sensor using post-CMOS process and MCP(Multi Chip Packaging). We have proposed and developed two types of packaging technology. one is one chip, which sensing layer is deposited on the gate metal of standard CMOS ISFET, the other is two chip type, which sensing layer is separated from CMOS ISFET and connected by bonding wire. These proposed packaging technologies would make it easy to fabricate CMOS ISFET pH sensor and to make variety types of pH sensor.

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A Study on Clock Feedthrough Compensation of Current Memory Device using CMOS switch for wireless PAN MODEM Improvement (CMOS Switch를 이용한 무선PAN 모뎀 구현용 전류메모리소자의 Clock Feedthrough 대책에 관한 연구)

  • Jo, Ha-Na;Lee, Chung-Hoon;Kim, Keun-O;Lee, Kwang-Hee;Cho, Seung-Il;Park, Gye-Kack;Kim, Seong-Gweon;Cho, Ju-Phil;Cha, Jae-Sang
    • Proceedings of the Korean Institute of Intelligent Systems Conference
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    • 2008.04a
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    • pp.247-250
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    • 2008
  • 최근 무선통신용 LSI는 배터리 수명과 관련하여, 저전력 동작이 중요시되고 있다. 따라서 Digital CMOS 신호처리와 더불어 동작 가능한 SI (Switched-Current) circuit를 이용하는 Current-mode 신호처리가 주목받고 있다. 그러나 SI circuit의 기본인 Current Memory는 Charge Injection에 의한 Clock Feedthrough라는 문제점을 갖고 있기 때문에, 전류 전달에 있어서 오차를 발생시킨다. 본 논문에서는 Current Memory의 문제점인 Clock Feedthrough의 해결방안으로 CMOS Switch의 연결을 검토하였고, 0.25${\mu}m$ CMOS process에서 Memory MOS와 CMOS Switch의 Width의 관계는 simulation 결과를 통하여 확인하였으며, MOS transistor의 관계를 분명히 하여, 설게의 지침을 제공한다.

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Design of a Low-Power MOS Current-Mode Logic Circuit (저 전력 MOS 전류모드 논리회로 설계)

  • Kim, Jeong-Beom
    • The KIPS Transactions:PartA
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    • v.17A no.3
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    • pp.121-126
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    • 2010
  • This paper proposes a low-power MOS current-mode logic circuit with the low voltage swing technology and the high-threshold sleep-transistor. The sleep-transistor is used to high-threshold voltage PMOS transistor to minimize the leakage current. The $16{\times}16$ bit parallel multiplier is designed by the proposed circuit structure. Comparing with the conventional MOS current-model logic circuit, the circuit achieves the reduction of the power consumption in sleep mode by 1/104. The proposed circuit is achieved to reduce the power consumption by 11.7% and the power-delay-product by 15.1% compared with the conventional MOS current-model logic circuit in the normal mode. This circuit is designed with Samsung $0.18\;{\mu}m$ standard CMOS process. The validity and effectiveness are verified through the HSPICE simulation.

Design of an NMOS-Diode eFuse OTP Memory IP for CMOS Image Sensors (CMOS 이미지 센서용 NMOS-Diode eFuse OTP 설계)

  • Lee, Seung-Hoon;Ha, Pan-Bong;Kim, Young-Hee
    • Journal of the Korea Institute of Information and Communication Engineering
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    • v.20 no.2
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    • pp.306-316
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    • 2016
  • In this paper, an NMOS-diode eFuse OTP (One-Time Programmable) memory cell is proposed using a parasitic junction diode formed between a PW (P-Well), a body of an isolated NMOS (N-channel MOSFET) transistor with the small channel width, and an n+ diffusion, a source node, in a DNW (Deep N-Well) instead of an NMOS transistor with the big channel width as a program select device. Blowing of the proposed cell is done through the parasitic junction formed in the NMOS transistor in the program mode. Sensing failures of '0' data are removed because of removed contact voltage drop of a diode since a NMOS transistor is used instead of the junction diode in the read mode. In addition, a problem of being blown for a non-blown eFuse from a read current through the corresponding eFuse OTP cell is solved by limiting the read current to less than $100{\mu}A$ since a voltage is transferred to BL by using an NMOS transistor with the small channel width in the read mode.