• 제목/요약/키워드: Bipolar device

검색결과 223건 처리시간 0.049초

PSA-BiCMOS의 고온특성에 관한 연구 (High Temperature Characterization of PSA-BiCMOS)

  • 조정호;구용서안철
    • 대한전자공학회:학술대회논문집
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    • 대한전자공학회 1998년도 추계종합학술대회 논문집
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    • pp.577-580
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    • 1998
  • This paper presents the characteristics of each MOS device and Bipolar device, then investigates about how these devices take effect on BiCMOS inverter from 300K to 470K. The turn-off and Logic swing characteristics of BiCMOS inverter are degraded by the electrical characteristics of the MOS to around 400K, but over that temperature enhanced by the characteristics of the Bipolar transistor.

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1000V 급 바이폴라 접합 트랜지스터에 대한 고내압화의 설계 및 제작 (Design and fabrication for high breakdown voltage on 1000V bipolar junction transistor)

  • 허창수;추은상;박종문;김상철
    • 대한전기학회논문지
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    • 제44권4호
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    • pp.490-495
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    • 1995
  • A bipolar junction transistor which exihibits 1000V breakdown voltage is designed and fabricated using FLR (Field Limiting Rings). Three dimensional effects on the breakdown voltage is investigated in the cylindrical coordinate and the simulation results are compared with the results in the rectangular coordinate. Breakdown voltage of the device with 3 FLR is simulated to be 1420V in the cylindrical coordinate while it is 1580V in rectangular coordinate. Bipolar junction transistor has been fabricated using the epitaxial wafer of which resistivity is 86 .OMEGA.cm and thickness is 105 .mu.m. Si$_{3}$N$_{4}$ and glass are employed for the passivation. Breakdown of the fabricated device is measured to be 1442V which shows better greement with the simulation results in cylindrical coordination.

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SOI 트렌치-모스 바이폴라-모드 전계효과 트랜지스터 구조의 설계 및 수치해석 (Design and Numerical Analyses of SOI Trench-MOS Bipolar-Mode Field Effect Transistor)

  • 김두영;오재근;한민구;최연익
    • 대한전기학회논문지:전기물성ㆍ응용부문C
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    • 제49권5호
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    • pp.270-277
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    • 2000
  • A new Lateral Trench-MOS Bipolar-Mode Field-Effect Transistor(LTMBMFET) is proposed and verified by MEDICI simulation. By using a trench MOS structure, the proposed device can enhance the current gain without sacrificing other device characteristics such as the breakdown voltage. The channel region of the proposed device is formed between the trench MOS structure. So the effect of the substrate voltage is negligible when compared with the conventional device which has a channel region between the gate junction and the buried oxide layer.

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Paper-Based Bipolar Electrochemistry

  • Renault, Christophe;Scida, Karen;Knust, Kyle N.;Fosdick, Stephen E.;Crooks, Richard M.
    • Journal of Electrochemical Science and Technology
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    • 제4권4호
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    • pp.146-152
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    • 2013
  • We demonstrate that carbon electrodes screen-printed directly on cellulose paper can be employed to perform bipolar electrochemistry. In addition, an array of 18 screen-printed bipolar electrodes (BPEs) can be simultaneously controlled using a single pair of driving electrodes. The electrochemical state of the BPEs is read-out using electrogenerated chemiluminescence. These results are important because they demonstrate the feasibility of coupling bipolar electrochemistry to microfluidic paperbased analytical devices (${\mu}PADs$) to perform highly multiplexed, low-cost measurements.

Bi-directional Two Terminal Switching Device based on SiGe for Spin Transfer Torque (STT) MRAM

  • Yang, Hyung-Jun;Kil, Gyu-Hyun;Lee, Sung-Hyun;Song, Yun-Heub
    • 한국진공학회:학술대회논문집
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    • 한국진공학회 2012년도 제42회 동계 정기 학술대회 초록집
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    • pp.385-385
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    • 2012
  • A two terminal N+/P/N+ junction device to replace the conventional selective transistor was studied as a bilateral switching device for spin transfer torque (STT) MRAM based on 3D device simulation. An N+/P/N+ junction structure with $30{\times}30nm$ area requires bi-directional current flow enough to write a data by a drain induced barrier lowering (DIBL) under a reverse bias at N+/P (or P/N+ junction), and high current on/off ratio of 106. The SiGe materials are widely used in hetero-junction bipolar transistors, bipolar compensation metal-oxide semiconductors (BiCMOS) since the band gap of SiGe materials can be controlled by changing the fraction and the strain epilayers, and the drift mobility is increased with the increasing Ge content. In this work, N+/P/N+ SiGe material based junction provides that drive current is increased from 40 to $130{\mu}A$ by increased Ge content from 10~80%. When Ge content is about 20%, the drive current density of SiGe device substantially increased to 2~3 times better than Si-based junction device in case of 28 nm P length, which is sufficient current to operation of STT-MRAM.

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Novel Host materials for Phosphorescent OLEDs with long lifetime

  • Kim, Young-Hoon;Yu, Eun-Sun;Kim, Nam-Soo;Jung, Sung-Hyun;Kim, Hyung-Sun;Lee, Ho-Jae;Kang, Eui-Su;Chae, Mi-Young;Chang, Tu-Won
    • 한국정보디스플레이학회:학술대회논문집
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    • 한국정보디스플레이학회 2008년도 International Meeting on Information Display
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    • pp.549-552
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    • 2008
  • We have developed a novel bipolar host material with both electron and hole transporting characteristics. Since CGH(Cheil Green Host) has some electron transporting characteristics, it shows increased luminance efficiency in device including TCTA and without HBL(hole blocking layer:BAlq). Maximum power efficency of CGH was 27.4lm/W at the device structure ITO/DNTPD(60)/NPB(20)/TCTA(10)/EML(30)/Alq3(20)/LIF(1)/Al. We measured device performance again without HBL. The result of CGH showing 26.0lm/W is outstanding compared to that of CBP showing 19.1lm/W without holeblocking layer. We also measured lifetime and found to be 205hr at 3000nit, that is significant result compared to the life time of CBP device showing 82hr. CGH shows high device performance with holeblocking layer. Moreover, it shows better device performance and life time than those of CBP without holeblocking.

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과도 해석 시뮬레이션을 위한 IGBT소자의 논리적인 모델링 (Analytical Modeling of the IGBT Device for Transient Analysis Simulation)

  • 서영수;장성철;김영춘;조문택;서수호
    • 대한전기학회:학술대회논문집
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    • 대한전기학회 1993년도 정기총회 및 추계학술대회 논문집 학회본부
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    • pp.148-150
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    • 1993
  • The IGBT(Insulated Gate Bipolar Transistor) is a power semiconductor device that has gained acceptance among power electronic circuit design engineers for motor drive and Power converter applications. The device-circuit interaction of power insulated gate bipolar transistor for a series-inductor load, both with and without a snubber are, simulated. An analytical model for the transient operation of the IGBT is used in conjunction with the load circuit state equations for the simulations.

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새로운 구조의 고속-고내압 SOI Smart Power 소자 설계에 관한 연구 (A Study on the Design of the New Structural SOI Smart Power Device with High Switching Speed and Voltage Characteristics)

  • 원명규;구용서;안철
    • 대한전자공학회:학술대회논문집
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    • 대한전자공학회 1999년도 하계종합학술대회 논문집
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    • pp.239-242
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    • 1999
  • In this paper, we report the process/device design of high-speed, high-voltage SOI smart power IC for mobile communication system, high-speed HDD system and the electronic control system of automobiles. The high voltage LDMOS with 70V breakdown voltage under 0.8${\mu}{\textrm}{m}$ design rule, the high voltage bipolar with 40V breakdown voltage for analog signal processing, the high speed bipolar with cut-off frequency over 20㎓ and LDD NMOS for high density were proposed and simulated on a single chip by the simulator DIOS and DESSIS. And we extracted the process/device parameters of the simulated devices.

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비대칭 소스/드레인 수직형 나노와이어 MOSFET의 1T-DRAM 응용을 위한 메모리 윈도우 특성 (Memory window characteristics of vertical nanowire MOSFET with asymmetric source/drain for 1T-DRAM application)

  • 이재훈;박종태
    • 한국정보통신학회논문지
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    • 제20권4호
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    • pp.793-798
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    • 2016
  • 본 연구에서는 1T-DRAM 응용을 위해 Bipolar Junction Transistor 모드 (BJT mode)에서 비대칭 소스/드레인 수직형 나노와이어 소자의 순방향 및 역방향 메모리 윈도우 특성을 분석하였다. 사용된 소자는 드레인 농도가 소스 농도보다 높으며 소스 면적이 드레인 면적보다 큰 사다리꼴의 수직형 gate-all-around (GAA) MOSFET 이다. BJT모드의 순방향 및 역방향 이력곡선 특성으로부터 순방향의 메모리 윈도우는 1.08V이고 역방향의 메모리 윈도우는 0.16V이었다. 또 래치-업 포인트는 순방향이 역방향보다 0.34V 큰 것을 알 수 있었다. 측정 결과를 검증하기 위해 소자 시뮬레이션을 수행하였으며 시뮬레이션 결과는 측정 결과와 일치하는 것을 알 수 있었다. 1T-DRAM에서 BJT 모드를 이용하여 쓰기 동작을 할 때는 드레인 농도가 높은 것이 바람직함을 알 수 있었다.

PMOS가 삽입된 SCR 기반의 ESD 보호 회로에 관한 연구 (A Study on SCR-Based ESD Protection Circuit with PMOS)

  • 곽재창
    • 전기전자학회논문지
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    • 제23권4호
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    • pp.1309-1313
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    • 2019
  • 본 논문에서는 Gate grounded NMOS(GGNMOS)와 Gate grounded Lateral insulated gate bipolar transistor(GGLIGBT), Silicon Controlled Rectifier(SCR), 그리고 제안된 ESD 보호 소자에 대한 전기적 특성을 비교 및 분석하였다. 우선 각 소자에 대한 I-V 특성 곡선을 시뮬레이션 함으로써 트리거 전압과 홀딩 전압을 확인하였다. 그 후에 각 소자에 대한 HBM 4k 시뮬레이션을 통해서 감내 특성을 확인하였다. HBM 4k 시뮬레이션 결과, 제안된 ESD 보호소자의 최대 온도가 GGNMOS와 GGLIGBT와 SCR에 비해서 낮기 때문에 그만큼 감내 특성이 개선되었다고 할 수 있으며, 이는 신뢰성 측면에서 우수한 ESD 보호소자임을 의미한다.