• Title/Summary/Keyword: Ar flow rate

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Substrate dependence of the deposition behavior of $CeO_2$ buffer layer prepared by MOCVD method (MOCVD 법에 의해 제조된 $CeO_2$ 버퍼층 증착 거동의 기판 의존성)

  • Jun, Byung-Hyu;Choi, Jun-Kyu;Jung, Woo-Young;Lee, Hee-Gyoun;Hong, Gye-Won;Kim, Chan-Joong
    • Progress in Superconductivity
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    • v.7 no.2
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    • pp.130-134
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    • 2006
  • Buffer layers such as $CeO_2\;and\;Yb_2O_3$ films for YBCO coated conductors were deposited on (100) $SrTiO_3$ single crystals and (100) textured Ni substrates by a metal organic chemical vapor deposition (MOCVD) system of the hot-wall type. The substrates were moved with the velocity of 40 cm/hr. Source flow rate, $Ar/O_2$ flow rate and deposition temperature were main processing variables. The degree of film epitaxy and surface morphology were investigated using XRD and SEM, respectively. On a STO substrate, the $CeO_2$ film was well grown epitaxially above the deposition temperature of $450^{\circ}C$. However, on a Ni substrate, the XRD showed NiO (111) and (200) peaks due to Ni oxidation as well as (111) and (200) film growth. For the films deposited with $O_2$ gas as oxygen source, it was found that the NiO film was formed at the interface between the buffer layer and the Ni substrate. The NiO layer interrupts the epitaxial growth of the buffer layer. It seems that the epitaxial growth of the buffer layer on Ni metal substrates using $O_2$ gas is difficult. We are considering a new method avoiding Ni oxidation with $H_2O$ vapor instead of $O_2$ gas.

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The effect of $O_2$ flow rate on die characteristics of ATO Thin Films by RF Magnetron Sputtering (RF Magnetron Sputtering을 이용한 ATO 박막의 산소 유량에 따른 특성 변화)

  • Kyeon, Dong-Min;Lee, Sung-Uk;Park, Mi-Ju;Kim, Young-Ryeol;Choi, Won-Seok;Hong, Byung-You
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2007.11a
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    • pp.336-337
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    • 2007
  • 현재 투명전극의 재료로 ITO, ZnO, $SnO_2$등의 재료가 주로 이용되며, 낮은 저항률을 장점으로 가지는 ITO 박막이 가장 널리 이용되고 있으나, 가격이 비싸다는 단점을 가지고 있다. 이 밖에도 ITO 박막보다 가격이 저렴한 ZnO박막에 대한 연구가 많이 진행되고 있으나, 고온에서의 열적 불안정성 등의 문제로 상용화되지는 못하고 있다. 그러나 $SnO_2$ 박막은 ITO와 ZnO 박막보다 저항률이 다소 높지만, 우수한 열적, 화학적 안정성과 저렴한 가격으로 ITO 박막을 대체할 투명전도막 재료로 주목받고 있다. 본 연구에서는 $SnO_2$박막의 저항률 향상을 위하여 ATO(Antimony doped Tin Oxide) 박막을 RF Magnetron Sputtering 법으로 Coming glass위에 증착하였으며, 박막 증착시 산소 유량의 변화가 ATO 박막의 구조적, 전기적 그리고 광학적 특성에 미치는 효과를 연구하였다. 본 실험에서는 동작압력을 10 mTorr, RF power를 250W로 고정하고 $O_2$ 유량을 부분적으로 변화시키면서 증착되어진 ATO 박막을 분석한 결과 Ar:$O_2$의 비가 90:10일 때 최적의 가스비율로써 우수한 구조적, 전기적 그리고 광학적 특성을 보임을 확인하였다.

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Determination of bromine in 1000 ㎍/g Cl standard solution by ID-ICPMS (동위원소희석 질량분석법에 의한 1000 ㎍/g 염소 표준용액 중 브롬 불순물 분석)

  • Park, Chang Joon;Suh, Jung Kee;Song, Hyun Joo;Lee, Dong Soo
    • Analytical Science and Technology
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    • v.19 no.1
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    • pp.1-8
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    • 2006
  • The isotope dilution method was used for the determination of Br impurity in $1000{\mu}g/g$ Cl standard solution. Since relatively pure KCl salt was used for the preparation of the Cl standard solution, the Br impurity determination suffers from both spectral and non-spectral interferences due to the presence of a large amount of K and Cl matrices. AG2-X8 anion-exchange resin was employed to separate the Br analyte from the matrices, and RF power was raised to 1500 W and nebulizer gas flow rate was lowered to 0.77 L/min to reduce background from the $ArArH^+$ molecular ions. The Br impurity in the $1000{\mu}g/g$ Cl standard solution was determined to be 43.7 ng/g with the standard addition method. The analytical result was in good agreement with 41.2 ng/g (RSD 1.6%) determined by the isotope dilution method to lower uncertainty from poor reproducibility of the anion-exchange process.

Plasma-Induced Grafting of Poly(N-vinyl-2-pyrrolidone) onto Polypropylene Surface (폴리프로필렌 표면 위에 폴리비닐피롤리돈의 플라즈마 유도 그래프트 공중합)

  • Ji, Han-Sol;Jung, Si-In;Hur, Ho;Choi, Ho-Suk;Kim, Jae-Ha;Park, Han-Oh
    • Polymer(Korea)
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    • v.36 no.3
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    • pp.302-308
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    • 2012
  • The objective of this study is to investigate optimum reaction conditions for the grafting of poly($N$-vinyl- 2-pyrrolidone) (PVP) onto the surface of plasma-treated polypropylene film. The plasma treatment conditions were fixed as 200 W rf power, 6 LPM Ar flow rate, 30 sec treatment time, and 5 min exposure time after treatment. For graft copolymerization, we investigated the change of grafting degree with respect to reaction time, reaction temperature and $N$-vinyl-2-pyrrolidone concentration. Maximum grafting degree was obtained at the conditions of 6 h reaction time, $90^{\circ}C$ reaction temperature, and 40% $N$-vinyl-2-pyrrolidone concentration. The introduction of PVP was confirmed by ATR-FTIR, XPS, and SEM analysis.

Effect of Plasma Treatment on Permeability and Selectivity Characteristics of Mixture Gas through Polyimide Membrane (플라즈마 처리된 폴리이미드 막의 기체투과특성)

  • 배성렬;노상호;류대선;박희진
    • Membrane Journal
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    • v.11 no.1
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    • pp.38-49
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    • 2001
  • The surface of polyimide membrane was modified by plasma treatment using Ar and NH~. and the permeability and selectivity for the mixture gas $(CO_2/N_2=20/80 vol%)$ were measured. The per¬meation experiments were performed by a variable volume method at $30^{\circ}$C and total pressure of 5 atm, The effect of the plasma conditions such as treatment time, power input, gas flow rate and pressure in the reactor on the transport Dwperties of modified membranes was investigated. The surface of the plasma treated membrane was analyzed by means of FTlR - ATH, ESCA and AFM. The dependences of the wettability and the etching on plasma treatment time were investigated by use of the contact angle and the weight loss measurement. Measurements of gas pcnneability characteristic were performed using both dry and wet membranes. The effects of experimental conditions such as temperature on the membrane performance were studied.

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Deposition Characteristic of InNx Films by Reactive DC Magnetron Sputtering (반응성 직류 스퍼터법에 의한 질화 인듐 박막의 제막 특성)

  • 송풍근;류봉기;김광호
    • Journal of the Korean Ceramic Society
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    • v.40 no.8
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    • pp.739-745
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    • 2003
  • In $N_{x}$ films were deposited on soda-lime glass without substrate heating by reactive dc magnetron sputtering using indium (In) metal target. Depositions were carried out under various total gas pressures ( $P_{tot}$) of mixture gases (Ar+$N_2$ or He+$N_2$). He gas was introduced to $N_2$ gas in order to enhance the reactivity of nitrogen on film surface by the "penning ionization". Plasma impedance decreased greatly when 20% or more introduced the $N_2$ gas. This is due to the In $N_{x}$ layers formed on target surface because a secondary electron emission rate of InN is small compared with In metal. XRD patterns of the films revealed that <001> preferred oriented polycrystalline In $N_{x}$ films, where the crystallinity of the films was improved with decrease of $P_{tot}$ and with increase of $N_2$ flow ratio. The improvement of the crystallinity and stoichimetry of the In $N_{x}$ films were considered to be caused by an increase in the activated nitrogen radicals and also by an increase in the kinetic energy of sputtered In atoms arriving at growing film surface, which should enhance the chemical reaction and surface migration on the growing film surface, respectively. Furthermore, the films deposited using mixture gases of He+$N_2$ showed higher crystallinity compared with the film deposited by the mixture gases of Ar+$N_2$.$.EX>.

Surface Characteristics of PLA(Polylactic acid) Film Treated by Atmospheric Pressure Plasma (대기압 플라즈마 처리에 따른 PLA(polylactic acid) 필름의 표면특성 변화)

  • Jung, Jin Suk;Liu, Xuyan;Choi, Ho Suk
    • Korean Chemical Engineering Research
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    • v.47 no.1
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    • pp.59-64
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    • 2009
  • This study investigated the surface characteristics of polylactic acid (PLA) film after one atmospheric pressure plasma treatment. We used de-ionized water and diiodomethane as polar and non-polar solvents, respectively, for measuring contact angles, and subsequently calculated the surface free energy of PLA film. The contact angle and free energy of PLA surface were optimized at the treatment time of 30 sec, RF-power of 70 W, Ar gas flow rate of 6 lpm and air exposure time of 5 min. We analyzed the change of chemical functional groups on the surface of PLA film through XPS and were able to observe the change of polar functional groups such as -C=O, -CO, -COO on the surface of PLA film after one atmospheric pressure plasma treatment.

Effects of Spraying Conditions on the Porosity and Hardness of Plasma Sprayed MgO Stabilized Zirconic Thermal Barrier Coatings (Plasma 용사된 MgO 안정화 지르코니아 단열피복의 기공도와 경도에 미치는 용사조건의 영향)

  • Park, Yeong-Gyu;Choe, Guk-Seon;Lee, Dong-Hui
    • Korean Journal of Materials Research
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    • v.2 no.2
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    • pp.85-94
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    • 1992
  • The size, morphology and distribution of pores which affect on the physical properties of thermal barrier coatings were investigated to find the relationship with spraying parameters. The plasma-sprayed zirconia coatings contained numerous micropores as well as macropores which were appeared as spherical and irregular pores, and cracks. The pore formation process and its characteristics were varied with spraying distance. Porosity itself was varied with spraying parameters such as spray gun current, gas flow rate and the gas used(Ar or $N_2). The Porosity of coatings was ranged from 10 to 18% with the variation of spraying conditions. The relative hardness measured by the scratch test, showed strong dependence on the porosity of coatings rather than spraying parameters.

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Comparative studies for the performance of a natural gas steam reforming in a membrane reactor (분리막 반응기를 이용한 천연가스 개질반응의 성능에 관한 비교 분석)

  • Lee, Boreum;Lim, Hankwon
    • Journal of the Korean Institute of Gas
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    • v.20 no.6
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    • pp.95-101
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    • 2016
  • For a natural gas steam reforming, comparative studies of the performance in a conventional packed-bed reactor and a membrane reactor, a new conceptual reactor consisting of a reactor with series of hydrogen separation membranes, have been performed. Based on experimental kinetics reported by Xu and Froment, a process simulation model was developed with Aspen $HYSYS^{(R)}$, a commercial process simulator, and effects of various operating conditions like temperature, $H_2$ permeance, and Ar sweep gas flow rate on the performance in a membrane reactor were investigated in terms of reactant conversion and $H_2$ yield enhancement showing improved $H_2$ yield and methane conversion in a membrane reactor. In addition, a preliminary cost estimation focusing on natural gas consumption to supply heat required for the system was carried out and feasibility of possible cost savings in a membrane reactor was assessed with a cost saving of 10.94% in a membrane reactor.

Study on super-hydrophobic electro-spray micro thruster and measurement of micro scale thrust (초소수성 전기 분무 마이크로 추진 장치 및 마이크로 추력 측정)

  • Lee, Young-Jong;Yoo, Yong-Hoon;Tran, Si Bui Quang;Kim, Sang-Hoon;Park, Bae-Ho;Buyn, Do-Young
    • Journal of the Korean Society for Aeronautical & Space Sciences
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    • v.37 no.2
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    • pp.175-180
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    • 2009
  • In this article, we fabricated polytetrafluoroethylene(PTFE) nozzle treated by ion beam, in order to fabricate polymer based electrospray micro thruster with super hydrophobic nozzle. To obtain the super hydrophobic surface, PTFE surface is treated by argon and oxygen plasma treatment process. The optimal condition is investigated argon and oxygen flow rate as well as the paalied energy level for the treatment process. Fabricated nozzle was evaluated by measuring contact angle, and the surface morphology was examined by using scanning electron microscope(SEM) and atomic force microscope(AFM). We observe that jetting becomes more stable and repeatable on the treated nozzle. And to evaluate performance of fabricated nozzle, we measure micro scale thrust using a cantilever and a nozzle treated by ion beam laser displacement sensor.