Deposition Characteristic of InNx Films by Reactive DC Magnetron Sputtering |
송풍근
(아오야마가꾸인대학 이공학부 화학과)
류봉기 (부산대학교 무기재료공학과) 김광호 (부산대학교 무기재료공학과) |
1 |
Monte Carlo Simulation of the Particle Transport Process in Sputter Deposition
/
DOI ScienceOn |
2 |
Study on Crystallinity of Tin-doped Indium Oxide Films Deposited by DC Magnetron Sputtering
/
DOI |
3 |
/
|
4 |
Optical and Structural Properties of Ⅲ-Ⅴ Nitrides under Pressure
/
DOI ScienceOn |
5 |
The Microstructure of Sputter-deposited Coatings
/
|
6 |
Gallium Nitride, Aluminum Nitride and Indium Nitride : A Review
/
DOI |
7 |
Crystallinity and Stochiometry of <TEX>$InN_{x}$</TEX> Films Deposited by Reactive DC Magnetron Sputtering
/
DOI ScienceOn |
8 |
Mechanisms of Reactive Sputtering of Indium, Ⅱ : Growth of Indium Oxynitride in Mixed Ar-N₂ Discharges
/
DOI ScienceOn |
9 |
Mechanisms of Reactive Sputtering of Indium, I : Growth of InN in Mixed Ar-N₂ Discharges
/
DOI ScienceOn |
10 |
/
|
11 |
Structural and Electrochromic Properties of InN Thin Films
/
DOI ScienceOn |
12 |
Structural Control of TCO Films
/
|
13 |
Crystallinity of Gallium-doped Zinc Oxide Films Deposited by DC Magnetron Sputtering Using Ar, Ne or Kr Gas
/
DOI |
14 |
Elemental Composition of Reactively Sputtered Indium Nitride Thin Films
/
DOI |