• 제목/요약/키워드: Ar Gas

검색결과 1,469건 처리시간 0.028초

The Effect of Enzyme/Microbial Additive on Anaerobic Digestion of Primary Sludge

  • Kim, Hyung-Jin;Song, Chang-Soo;Kim, Dong-Wook;Pagilla, Kishna-R.
    • Environmental Sciences Bulletin of The Korean Environmental Sciences Society
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    • 제10권S_1호
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    • pp.35-40
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    • 2001
  • Effect of the addition of an enzyme/microbial additive(EMA) to enhance anaerobic digestion of the primary sludge was investigated. Two laboratory scale anaerobic digester were operated with primary sludge taken from a municipal wastewater treatment plant. The digester receiving EMA with the sludge feed performed better than the control digester, when both were operated at 10-days and 15-days Solid Retention Time(SRT). Addition of EMA to the experimental digester provided 7%(10-days SRT) and 16%(15-days SRT) higher gas production compared to the control digester when both were fed with the same amount of volatile solids. The reduction in volatile solids was 24% better in the experimental digester compared to the control ar 10-days SRT, and the improvement 10% at 15-day SRT. Improvement in COD reduction, and fecal coliform density reduction were also seen in the experimental digester due to EMA addition compared to the control both ar 10-days SRT and 15-day SRT operation. Preliminary cost benefit analysis for a wastewater treatment plant showed that approximately $115/day in gas production improvements can be realized upon addition of EMA to primary sludge anaerobic digesters operating at 10-day SRT. The value of increased gas production was $172/day if the same digesters are operated with EMA addition at 15-day SRT.

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RF 마그네트론 스퍼터링에 의한 NiO 박막 증착시 산소 유량비가 박막의 결정 배향성에 미치는 영향 (Effects of Oxygen Flow Ratio on the Crystallographic Orientation of NiO Thin Films Deposited by RE Magnetron Sputtering)

  • 류현욱;최광표;노효섭;박용주;박진성
    • 한국세라믹학회지
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    • 제41권2호
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    • pp.106-110
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    • 2004
  • NiO 산화물 타겟을 이용한 RF 마그네트론 스퍼터로 상온에서 Si(100) 기판 위에 NiO 박막을 증착시켜, 스퍼터 가스의 산소 유량비가 NiO 박막의 결정 배향성과 표면 형상에 미치는 영향을 조사하였다. Ar 가스에서 증착된 NiO 박막은 높은결정화도와 (100)면의 우선 배향성을 나타내었으나, $O_2$ 가스에서 증착된 경우에는 (111)면의 우선 배향성을 보였으며 그 증착속도도 감소하였다. 스퍼터 가스의 $O_2$ 함량에 따른 NiO 박막의 결정성과 우선배향성 변화에 대한 요인을 고찰하였으며, 박막의 표면 형상과 거칠기의 변화를 조사하였다.

OLED용 ITO박막의 공정조건과 품질특성 추론에 근거한 품질관리 (Quality Management of ITO Thin Film for OLED Based on Relationship of Fabrication and Characteristics)

  • 서정민;박근영;이상룡;이춘영
    • 제어로봇시스템학회논문지
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    • 제14권4호
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    • pp.336-341
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    • 2008
  • Recently, research on a flat panel display(FPD) has focused on organic light-emitting display(OLED) which has wide angle of view, high contrast ratio and low power consumption. ITO(Indium-Tin-Oxide) films are the most widely used material as a transparent electrode of OLED and also in many other display devices like LCD or PDP. The performance and efficiency of OLED is related to the surface condition of ITO coated glass substrate. The typical surface defect of glass substrate is measured for electric characteristics and physical condition for transmittance and roughness. Since ITO coated glass substrate can be destroyed for inspection about surface roughness, sheet resistance, film thickness and transmittance, precise fabrication condition should be made based on the estimated relationship. In this paper, ITO films were prepared on the commercial glass substrate by the Ion-Plating method changing the partial pressure of gas(Ar, 02) and the chamber temperature between $200^{\circ}C$ and $300^{\circ}C$. The characteristics of films were examined by the 4-point probe, supersonic thickness measurement, transmittance measurement and AFM. We estimated the relationship between processing parameters(Ar gas, O2 gas, Temperature) and properties of ITO films (Sheet Resistance, Film Thickness, Transmittance, Surface Roughness).

마그네트론 RIE을 이용한 M/NEMS용 다결정 3C-SiC 식각 연구 (A study on polycrystalline 3C-SiC etching with magnetron applied reactive ion etching for M/NEMS applications)

  • 정귀상;온창민;남창우
    • 센서학회지
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    • 제16권3호
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    • pp.197-201
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    • 2007
  • The magnetron reactive ion etching (RIE) characteristics of polycrystalline (poly) 3C-SiC grown on $SiO_{2}$/Si substrate by APCVD were investigated. Poly 3C-SiC was etched by $CHF_{3}$ gas, which can form a polymer as a function of side wall protective layers, with additive $O_{2}$ and Ar gases. Especially, it was performed in magnetron RIE, which can etch SiC at a lower ion energy than a commercial RIE system. Stable etching was achieved at 70 W and the poly 3C-SiC was undamaged. The etch rate could be controlled from $20\;{\AA}/min$ to $400\;{\AA}/min$ by the manipulation of gas flow rates, chamber pressure, RF power, and electrode gap. The best vertical structure was improved by the addition of 40 % $O_{2}$ and 16 % Ar with the $CHF_{3}$ reactive gas. Therefore, poly 3C-SiC etched by magnetron RIE can expect to be applied to M/NEMS applications.

RF 마그네트론 스퍼터링을 이용한 WO3/Ag/WO3 투명전극의 전기·광학적 특성 연구 (A Electrical and Optical studies of WO3/Ag/WO3 Transparent Electrode by RF Magnetron Sputtering)

  • 강동수;이붕주;권홍규;신백균
    • 전기학회논문지
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    • 제63권11호
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    • pp.1533-1537
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    • 2014
  • $WO_3/Ag/WO_3$ multilayer was researched by using RF magnetron sputtering with transparent electrode. Process gas flow ratio with $Ar/O_2$ were selected the optimum conditions at 70sccm/2sccm and $WO_3$ thin film at its conditions was appeared at transmittance about 80% in the visible light region to the average. $WO_3/Ag/WO_3$ multilayer thin films were fabricated from the same process condition which was the same gas flow ratio of Ar and $O_2$ $WO_3/Ag/WO_3$ thin films were appeared transmittance about 93% and sheet resistance about $6.41{\Omega}/{\square}$. From the SEM images, each thin films were appeared when $WO_3$ is 40nm and $O_2$ is 10nm.

평등전계중의 절연유에 미치는 첨가물의 영향 (A study on the effect of additives in insulating oil under uniform electric field)

  • 국상훈
    • 전기의세계
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    • 제30권6호
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    • pp.357-365
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    • 1981
  • When electronegative gas SF$_{6}$ is dissolved and charged with insulating oil, the effect caused in the process by electronegative characteristic is studied and also the pressure effect caused by electronegative SF$_{6}$ acting on the liquid-level is examined respectively. When inert gas Ar is used to find a pressure effect acting on the liquid-level, its effect on dielectric strength is considered in the experiment. With three kinds of impulse voltage different in the duration of wave front and wave tail, a brief experiment if carried out ot see the effects on the dielectric breakdown characteristic as the wave is changing; either if I$_{2}$ and SF$_{6}$ are added to the insulating oil, or if the oil pressure is increased by Ar the dielectric strength becomes great and the longer the duration of wave front is, the greater the increase of the breakdown voltage, because I$_{2}$ added by a small quantity brings about some hirderance in the formation of gas phase. Likewise, the greater the changed pressure is, the greater the incerase of the breakdown voltage. When SF$_{6}$ is charged, the electronegative characteristic is prevailing at the time of low balanced pressure, and the pressure effect at the time of high balanced pressure.ressure.

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ICP 광원 시스템의 Ne:Xe, Ne:Ar 혼합가스의 단일탐침법을 이용한 플라즈마 진단 (Plasma Diagnosis of Ne:Xe, Ne:Ar Mixed Gases by Single Langmuir Probe in Inductively Coupled Plasma Light Source System)

  • 최용성;이우기;;이경섭;이상헌
    • 한국전기전자재료학회:학술대회논문집
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    • 한국전기전자재료학회 2006년도 영호남 합동 학술대회 및 춘계학술대회 논문집 센서 박막 기술교육
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    • pp.91-95
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    • 2006
  • In whole world consciousness of environment maintenance have increased very quickly for the end of the 20th century. To use and disuse toxic substances have been controled at the field of industry. Also the field of lighting source belong to environmental control. And in the future the control will be strong. In radiational mechanism of fluorescence lamp mechanism is the worst environmental problem. In radiational mechanism of fluorescence lamp mercury is the worst environmental problem root. In the mercury free lighting source system the Xe gas lamp is one type. And the Ne:Xe mixing gas lamp improvements firing voltage of Xe gas lamp. Purpose and subject of this study are understand, efficiency, ideal of Ne:Xe plasma which mercury free lamp. Before ICP was designed, basic parameters of plasma, which are electron temperature and electron density, were measured and calculated by Langmuir probe data. Property of electron temperature and electron density were confirmed by changing ratio of Ne:Xe.

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Application of Methane Mixed Plasma for the Determination of Ge, As, and Se in Serum and Urine by ICP/MS

  • Park, Kyung-Su;Kim, Sun-Tae;Kim, Young-Man;Kim, Yun-je;Lee, Won
    • Bulletin of the Korean Chemical Society
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    • 제24권3호
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    • pp.285-290
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    • 2003
  • An analytical method for the simultaneous determination of trace Ge, As and Se in biological samples by inductively coupled plasma/mass spectrometry has been investigated. The effects of added organic gas into the coolant argon gas on the analyte signal were studied to improve the detection limit, accuracy and precision. The addition of a small amount of methane (10 mL/min.) into the coolant gas channel improved the ionization of Ge, As and Se. The analytical sensitivity of the proposed Ar/CH₄system was superior by at least two-fold to that of the conventional Ar method. In the present method, the detection limits obtained for Ge, As and Se were 0.014, 0.012 and 0.064 ㎍/L, respectively. The analytical reliability of the proposed method was evaluated by analyzing the certified standard reference materials (SRM). Recoveries of 99.9% for Ge, 103% for As, 96.5% for Se were obtained for NIST SRM of freeze dried urine sample. The proposed method was also applied to the biological samples.

저출력 마이크로파 유도 플라스마 방출스펙트럼의 특성과 $CO_2$ 분석 (Characteristics of Low-power Microwave Induced Plasma Emission Spectrum and Detection of $CO_2$)

  • 노승만;박창준;김영상
    • 대한화학회지
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    • 제40권4호
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    • pp.235-242
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    • 1996
  • 기체 크로마토그래피와 쉽게 연결할 수 있는 Surfatron형의 MIP(Microwave Induced Plasma)용 cavity를 제작하고 헬륨, 아르곤, 질소 등을 플라스마 가스로 사용하여 플라스마를 생성시키고 스펙트럼을 비교하였다. 또한 헬륨과 아르곤, 질소에 미량의 CO2를 혼합하여 각 기체의 스펙트럼을 비교 분석하였으며, 제작한 MIP cavity가 질량분석기와 연결되었을 때 분자이온을 생성시킬 수 있는 이온원으로서의 가능성을 연구하였다. 헬륨과 아르곤 MIP는 높은 준안정 준위의 에너지를 가지기 때문에 분자들이 거의 다 깨어지므로 분자상태로 시료기체의 검출은 거의 불가능하였다. 그러나 질소는 다른 비활성기체에 비하여 낮은 준안정 준위의 어네지를 가지므로 검출하려는 기체성분이 상당부분 분자상태로 존재함을 알 수 있었다.

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반응부의 유동해석을 통한 열플라즈마 가스처리기의 효율 개선 (A Study in The Efficiency Improvement of Thermal Plasma Gas Processor Through Fluid Dynamics Analysis of Reaction Zone)

  • 서문준;정진도;구경완
    • 전기학회논문지
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    • 제60권3호
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    • pp.669-673
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    • 2011
  • This study explores the numerical analysis method of fluid dynamics in the reaction section to improve the gas processing efficiency in the hazardous gas removal by atmospheric thermal plasma. This study also intends to contribute in technology advance to improve the processing efficiency and make the process more stable. Numerical analysis of temperature distribution in the reaction section dependent on the change in flow velocity of Ar and plasma temperature change, which are major control variables in the cracking process of HFC-23 using arc plasma, was done. The characteristic of incoming oxygen by temperature suggested that when temperature increased to 1600K, 1700K, 1800K respectively, the range of cracking temperature 1500K increased to 75.0%, 83.3%, 90.2% respectively. The temperature change of Ar by velocity change was widest in the area higher than 1500K when the velocity was 2.5m/s; however, since there was no big difference when the velocity was 2m/s, it is believed that 2 m/s would be most proper.