• Environmental Sciences Bulletin of The Korean Environmental Sciences Society
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• v.10 no.S_1
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• pp.35-40
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• 2001

Effect of the addition of an enzyme/microbial additive(EMA) to enhance anaerobic digestion of the primary sludge was investigated. Two laboratory scale anaerobic digester were operated with primary sludge taken from a municipal wastewater treatment plant. The digester receiving EMA with the sludge feed performed better than the control digester, when both were operated at 10-days and 15-days Solid Retention Time(SRT). Addition of EMA to the experimental digester provided 7%(10-days SRT) and 16%(15-days SRT) higher gas production compared to the control digester when both were fed with the same amount of volatile solids. The reduction in volatile solids was 24% better in the experimental digester compared to the control ar 10-days SRT, and the improvement 10% at 15-day SRT. Improvement in COD reduction, and fecal coliform density reduction were also seen in the experimental digester due to EMA addition compared to the control both ar 10-days SRT and 15-day SRT operation. Preliminary cost benefit analysis for a wastewater treatment plant showed that approximately $115/day in gas production improvements can be realized upon addition of EMA to primary sludge anaerobic digesters operating at 10-day SRT. The value of increased gas production was $172/day if the same digesters are operated with EMA addition at 15-day SRT.

• Journal of the Korean Ceramic Society
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• v.41 no.2
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• pp.106-110
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• 2004

Nickel oxide (NiO) thin films were prepared on Si(100) substrates at room temperature by RF magnetron sputtering using a NiO target. The effects of oxygen flow ratio for the plasma gas on the preferred orientation and surface morphology of the NiO films were investigated. Highly crystalline NiO film with (100) orientation was obtained when it was deposited in pure Ar gas. For NiO film deposited in pure O$_2$ gas, on the other hand, the orientation of the film changed from (100) to (111) and its deposition rate decreased. The origin of the preferred orientation of the films was discussed. NiO films also showed different surface morphologies and roughnesses with the oxygen flow ratio.

• Journal of Institute of Control, Robotics and Systems
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• v.14 no.4
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• pp.336-341
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• 2008

Recently, research on a flat panel display(FPD) has focused on organic light-emitting display(OLED) which has wide angle of view, high contrast ratio and low power consumption. ITO(Indium-Tin-Oxide) films are the most widely used material as a transparent electrode of OLED and also in many other display devices like LCD or PDP. The performance and efficiency of OLED is related to the surface condition of ITO coated glass substrate. The typical surface defect of glass substrate is measured for electric characteristics and physical condition for transmittance and roughness. Since ITO coated glass substrate can be destroyed for inspection about surface roughness, sheet resistance, film thickness and transmittance, precise fabrication condition should be made based on the estimated relationship. In this paper, ITO films were prepared on the commercial glass substrate by the Ion-Plating method changing the partial pressure of gas(Ar, 02) and the chamber temperature between $200^{\circ}C$ and $300^{\circ}C$. The characteristics of films were examined by the 4-point probe, supersonic thickness measurement, transmittance measurement and AFM. We estimated the relationship between processing parameters(Ar gas, O2 gas, Temperature) and properties of ITO films (Sheet Resistance, Film Thickness, Transmittance, Surface Roughness).

• Journal of Sensor Science and Technology
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• v.16 no.3
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• pp.197-201
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• 2007

The magnetron reactive ion etching (RIE) characteristics of polycrystalline (poly) 3C-SiC grown on $SiO_{2}$/Si substrate by APCVD were investigated. Poly 3C-SiC was etched by $CHF_{3}$ gas, which can form a polymer as a function of side wall protective layers, with additive $O_{2}$ and Ar gases. Especially, it was performed in magnetron RIE, which can etch SiC at a lower ion energy than a commercial RIE system. Stable etching was achieved at 70 W and the poly 3C-SiC was undamaged. The etch rate could be controlled from $20\;{\AA}/min$ to $400\;{\AA}/min$ by the manipulation of gas flow rates, chamber pressure, RF power, and electrode gap. The best vertical structure was improved by the addition of 40 % $O_{2}$ and 16 % Ar with the $CHF_{3}$ reactive gas. Therefore, poly 3C-SiC etched by magnetron RIE can expect to be applied to M/NEMS applications.

• The Transactions of The Korean Institute of Electrical Engineers
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• v.63 no.11
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• pp.1533-1537
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• 2014

$WO_3/Ag/WO_3$ multilayer was researched by using RF magnetron sputtering with transparent electrode. Process gas flow ratio with $Ar/O_2$ were selected the optimum conditions at 70sccm/2sccm and $WO_3$ thin film at its conditions was appeared at transmittance about 80% in the visible light region to the average. $WO_3/Ag/WO_3$ multilayer thin films were fabricated from the same process condition which was the same gas flow ratio of Ar and $O_2$ $WO_3/Ag/WO_3$ thin films were appeared transmittance about 93% and sheet resistance about $6.41{\Omega}/{\square}$. From the SEM images, each thin films were appeared when $WO_3$ is 40nm and $O_2$ is 10nm.

• 전기의세계
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• v.30 no.6
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• pp.357-365
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• 1981

When electronegative gas SF$_{6}$ is dissolved and charged with insulating oil, the effect caused in the process by electronegative characteristic is studied and also the pressure effect caused by electronegative SF$_{6}$ acting on the liquid-level is examined respectively. When inert gas Ar is used to find a pressure effect acting on the liquid-level, its effect on dielectric strength is considered in the experiment. With three kinds of impulse voltage different in the duration of wave front and wave tail, a brief experiment if carried out ot see the effects on the dielectric breakdown characteristic as the wave is changing; either if I$_{2}$ and SF$_{6}$ are added to the insulating oil, or if the oil pressure is increased by Ar the dielectric strength becomes great and the longer the duration of wave front is, the greater the increase of the breakdown voltage, because I$_{2}$ added by a small quantity brings about some hirderance in the formation of gas phase. Likewise, the greater the changed pressure is, the greater the incerase of the breakdown voltage. When SF$_{6}$ is charged, the electronegative characteristic is prevailing at the time of low balanced pressure, and the pressure effect at the time of high balanced pressure.ressure.

• Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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• 2006.05a
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• pp.91-95
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• 2006

In whole world consciousness of environment maintenance have increased very quickly for the end of the 20th century. To use and disuse toxic substances have been controled at the field of industry. Also the field of lighting source belong to environmental control. And in the future the control will be strong. In radiational mechanism of fluorescence lamp mechanism is the worst environmental problem. In radiational mechanism of fluorescence lamp mercury is the worst environmental problem root. In the mercury free lighting source system the Xe gas lamp is one type. And the Ne:Xe mixing gas lamp improvements firing voltage of Xe gas lamp. Purpose and subject of this study are understand, efficiency, ideal of Ne:Xe plasma which mercury free lamp. Before ICP was designed, basic parameters of plasma, which are electron temperature and electron density, were measured and calculated by Langmuir probe data. Property of electron temperature and electron density were confirmed by changing ratio of Ne:Xe.

• Bulletin of the Korean Chemical Society
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• v.24 no.3
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• pp.285-290
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• 2003

An analytical method for the simultaneous determination of trace Ge, As and Se in biological samples by inductively coupled plasma/mass spectrometry has been investigated. The effects of added organic gas into the coolant argon gas on the analyte signal were studied to improve the detection limit, accuracy and precision. The addition of a small amount of methane (10 mL/min.) into the coolant gas channel improved the ionization of Ge, As and Se. The analytical sensitivity of the proposed Ar/CH₄system was superior by at least two-fold to that of the conventional Ar method. In the present method, the detection limits obtained for Ge, As and Se were 0.014, 0.012 and 0.064 ㎍/L, respectively. The analytical reliability of the proposed method was evaluated by analyzing the certified standard reference materials (SRM). Recoveries of 99.9% for Ge, 103% for As, 96.5% for Se were obtained for NIST SRM of freeze dried urine sample. The proposed method was also applied to the biological samples.

• Journal of the Korean Chemical Society
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• v.40 no.4
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• pp.235-242
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• 1996

A surfatron-type microwave induced plasma (MIP) cavity has been constructed, which can be easily interfaced with a gas chromatograph. Various plasma gases such as He, Ar and N2 were used to generate the MIP and small amounts of CO2 gases were injected through the MIP to obtain characteristic spectrum of each plasma gas and to study feasibility of the MIP as a soft ionization source. Since He and Ar plasmas have high metastable state energy, it was not possible to detect sample gas in molecular state. With N2 plasma, however, a strong emission of molecular ions could be detected owing to its low metastable state energy.

• The Transactions of The Korean Institute of Electrical Engineers
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• v.60 no.3
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• pp.669-673
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• 2011

This study explores the numerical analysis method of fluid dynamics in the reaction section to improve the gas processing efficiency in the hazardous gas removal by atmospheric thermal plasma. This study also intends to contribute in technology advance to improve the processing efficiency and make the process more stable. Numerical analysis of temperature distribution in the reaction section dependent on the change in flow velocity of Ar and plasma temperature change, which are major control variables in the cracking process of HFC-23 using arc plasma, was done. The characteristic of incoming oxygen by temperature suggested that when temperature increased to 1600K, 1700K, 1800K respectively, the range of cracking temperature 1500K increased to 75.0%, 83.3%, 90.2% respectively. The temperature change of Ar by velocity change was widest in the area higher than 1500K when the velocity was 2.5m/s; however, since there was no big difference when the velocity was 2m/s, it is believed that 2 m/s would be most proper.