• The Transactions of the Korean Institute of Electrical Engineers C
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• v.51 no.8
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• pp.382-389
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• 2002

We present experimental results on the multiplexed and stack-wise recording of near-field holograms. Experiments on angular multiplexing show that the angular selectivity of near-field hologram is better than that of the conventional hologram. Experiments on stack-wise recording prove that near-fields originated from sub-diffraction-limit-size objects could be stored in a photorefractive crystal at 2mm apart from the crystal surface. In addition, to improve the data access and transfer time, a silicon nano-aperture array was introduced and applied to the recording of near-field holograms.

• Proceedings of the Korean Society of Machine Tool Engineers Conference
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• 2005.05a
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• pp.19-23
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• 2005

In order to develop a high brightness ion source using plasma, the ion beam extraction system with an aperture of $100{\mu}m$ in diameter has been designed and constructed. It is observed that over 500nA of He ion beam current can be extracted. With such an optimized condition, $\~10^3\;A/cm^2sr$ beam brightness can be measured by emittance scanner, which is believed to be a promising result for developing next generation FIB.

• The Transactions of The Korean Institute of Electrical Engineers
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• v.60 no.2
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• pp.431-434
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• 2011

In this paper, bandwidth enhanced design of dielectric resonator antenna fabricated in multi-layer substrate is introduced. The proposed dielectric resonator antenna is operating with fundamental TE101 mode and higher-order TM111 mode. Each resonance frequency is dependent on resonator dimensions. As increasing the height of radiating aperture, the higher-order TM111 mode resonance frequency approach the fundamental TE101 mode resonance frequency and the antenna bandwidth increase by double resonance. Three different aperture height size antennas that operated at 7GHz are fabricated in FR4 multi-layer substrate. Measured 10 dB matching bandwidth is 8 percent for single resonace antenna and 18 percent for double resonance antenna.

• The Journal of Korean Institute of Electromagnetic Engineering and Science
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• v.16 no.5 s.96
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• pp.465-471
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• 2005

A method of calculation fur propagating and focusing of focused beams generated in antenna arrays, using BPM(Beam Propagation Method), is presented in this paper. Based on the diffraction theory, the beam focusing and Propagation is studied specially for the case of the antenna way fed by the Rotman lens that is able to focus microwave power on its focal arc or generate multiple beams. There are difficulties in performing a full-wave simulation using a commercial EM simulation tool for propagating and focusing of beams because of the structural complexity and the feeding assignment of the antenna array. Therefore, as an alternative solution, the BPM is presented to calculate the beam propagation from the aperture-type antennas. From the point of view of optics, the propagations of the lens have been simplified from the Fresnel diffraction integral to the Fourier transform. Using Fourier Transform, a beam propagation method is developed to show improvement of the resolution by controlling the wavefront of wave Propagating from an aperture-type antenna array. The beam width(or spot size) and the intensity are calculated for a focused beam propagating from an array having $10\lambda$ of its size. For the beams with $20\lambda,\;30\lambda$, and $50\lambda$ of geometrical focal length, the half-power beam widths(or spot size) are about 1.1\lambda,\;1.3\lambda,\;and\;1.9\lambda$ respectively.

• Journal of Advanced Navigation Technology
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• v.6 no.3
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• pp.181-187
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• 2002

In this paper, we propose a resolution enhancement method for estimating direction-of-arrival(DOA) of narrowband incoherent signals incident on a general array. The resolution of DOA algorithm is dependent on the aperture size of antenna array. But it is very impractical to increase the physical size of antenna array in real environment. We propose the method that improves resolution performance by virtually expanding the sensor spacing of original antenna array and then averaging the spatial spectrum of each virtual array which has a different aperture size. Superior resolution capabilities achieved with this method are shown by simulation results in comparison with the standard MUSIC for incoherent signals incident on a uniform circular array.

• Laser Solutions
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• v.7 no.3
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• pp.37-46
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• 2004

The shape and size variations of the nanopatterns produced on a polymer film using a near-field scanning optical microscope(NSOM) are investigated with respect to the process variables. A cantilever type nanoprobe having a 100nm aperture at the apex of the pyramidal tip is used with the NSOM and a He-Cd laser at a wavelength of 442nm as the illumination source. Patterning characteristics are examined for different laser beam power at the entrance side of the aperture($P_{in}$), scan speed of the piezo stage(V), repeated scanning over the same pattern, and operation modes of the NSOM(DC and AC modes). The pattern size remained almost the same for equal linear energy density. Pattern size decreased for lower laser beam power and greater scan speed, leading to a minimum pattern width of around 50nm at $P_{in}=1.2{\mu}W\;and\;V=12{\mu}m/s$. Direct writing of an arbitrary pattern with a line width of about 150nm was demonstrated to verify the feasibility of this technique for nanomask fabrication. Application on high-density data storage is discussed.

• Journal of the Korean Society for Precision Engineering
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• v.25 no.4
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• pp.134-139
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• 2008

A spirally arrayed nano-pattern is designed as a model pattern for the next generation optical storage media. The pattern consists off types of embossed rectangular dot, which are 50nm, 100nm, 150nm and 200nm in length and 50nm in width. The height of the dot is designed to be 50nm. The pitch of the spiral track of the pattern is 100nm. A ER(Electron resist) master for this pattern is fabricated by e-beam lithography process. The ER is first spin-coated to be 50nm thick on a Si wafer and then the model pattern is written on the coated ER layer by e-beam. After developing this pattern written wafer in the solution, a ER pattern master is fabricated. The most conventional e-beam machine can write patterns in orthogonal way, so we made our own pattern generator which can write the pattern in circular or spiral way. This program generates the patterns to be compatible with the e-beam machine from Raith(Raith 150). To fabricate 50nm pattern master precisely, a series of experiments were done including the design compensation for the pattern size, optimization of the dose, acceleration voltage, aperture size and developing. Through these experiments, we conclude that the higher accelerating voltages and smaller aperture size are better for mastering the nano pattern which is in order of 50nm. With the optimized e-beam lithography process, a spiral arrayed 50nm pattern master adopting PMMA resist was fabricated to have dimensional accuracy over 95% compared to the designed. Using this pattern master, a metal pattern stamp will be fabricated by Ni electro plating for injection molding of the patterned plastic substrate.

• The Journal of Korean Institute of Electromagnetic Engineering and Science
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• v.11 no.6
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• pp.920-928
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• 2000

In this paper, using newly proposed size reduction technique, the aperture coupled microstrip patch antenna for a repeater system in a mobile communication cellular band (824~849 MHz) is developed with a wide bandwidth, small size, light weight, and low cost. The resonant frequency of microstrip antennas is related to the electric field distribution of the radiating patch. The field strength of $TM_{01}$ mode of a rectangular patch antenna is strongest at each of the extremities of the radiating patch, but negligible at center. Therefore, the size of a patch antenna can be effectively minimized by inserting the narrow rectangular dielectric into just under the edges of the resonant Patch. This Paper also proposes the bandwidth improvement technique by using under-coupling technique with a tuning stub. The VSWR is less than 1.5 : 1 for the whole cellular band. The simulation tool was HFSS, Agilent Technologies, Inc.

• Proceedings of the KIEE Conference
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• 1989.07a
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• pp.629-632
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• 1989

The scattered light intensity from a spherical particle passing through the cross-over region of two coherent laser beams, varies periodically. Photodetection of this light beams produces a periodic signal of varying amplitude. The phase of the signal varies with the particle size and refractive index, the beam crossing angle and wavelength, and the position and size of the scattered ligth collecting aperture. In this paper the phase variation with respect to the particle absorptive index of retraction, collecting lens size and beam crossing angle is calculated using both Mie scattering theory and reflection theory. The two theories show good agreement in phase predictions, especially for large absorptive indices and for small collection lenses. Both theories predict phase to be inversely proportional to the beam crossing angle.

• Proceedings of the Acoustical Society of Korea Conference
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• 1998.06c
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• pp.221-224
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• 1998

간섭신호가 원하는 신호에 coherent한 경우에는 원하는 신호와 간섭신호간의 cross correlation에 의해 공분산 행렬의 rank가 줄어들게 되어 coherent한 간섭신호의 도래각을 추정할 수 없게 된다. 이러한 문제를 해결하기 위해 발표된 기존의 방법중 대칭 어레이(Symmetric array)방법은 계산량이 많아지고 공간 스무딩(Spatial Smoothing)방법은 array aperture size에서 손해를 보게 되어 분해능이 떨어지는 단점이 있다[1,2,3].