• Korean Journal of Materials Research
• /
• v.16 no.4
• /
• pp.225-230
• /
• 2006

Nanoimprint lithography (NIL) is a novel method of fabricating nanometer scale patterns. It is a simple process with low cost, high throughput and resolution. NIL creates patterns by mechanical deformation of an imprint resist and physical contact process. The imprint resist is typically a monomer or polymer formulation that is cured by heat or UV light during the imprinting process. Stiction between the resist and the stamp is resulted from this physical contact process. Stiction issue is more important in the stamps including narrow pattern size and wide area. Therefore, the antistiction layer coating is very effective to prevent this problem and ensure successful NIL. In this paper, an antistiction layer was deposited and characterized by PECVD (plasma enhanced chemical vapor deposition) method for metal stamps. Deposition rates of an antistiction layer on Si and Ni substrates were in proportion to deposited time and 3.4 nm/min and 2.5 nm/min, respectively. A 50 nm thick antistiction layer showed 90% relative transmittance at 365 nm wavelength. Contact angle result showed good hydrophobicity over 105 degree. $CF_2$ and $CF_3$ peaks were founded in ATR-FTIR analysis. The thicknesses and the contact angle of a 50 nm thick antistiction film were slightly changed during chemical resistance test using acetone and sulfuric acid. To evaluate the deposited antistiction layer, a 50 nm thick film was coated on a stainless steel stamp made by wet etching process. A PMMA substrate was successfully imprinting without pattern degradations by the stainless steel stamp with an antistiction layer. The test result shows that antistiction layer coating is very effective for NIL.

• Journal of Sensor Science and Technology
• /
• v.11 no.2
• /
• pp.102-110
• /
• 2002

The chemical and mechanical characteristics of a new surface modifier, dichlorodimethysilane (DDMS, $(CH_3)_3SiCl_2$), for stiction-free polysilicon surfaces are reported. The main strategy is to replace the conventional monoalkyltrichlorosilane(MTS, $RSiCl_3$) such as octadecyltrichlorosilane (ODTS) or 1H,1H,2H,2H-perfluorodecyltrichlorosilane (FDTS) with dialkyldichlorosilane (DDS, $R_2SiCl_2$) with twit short chains, especially DDMS. DDMS, with shorter chains in aprotic media, rapidly deposits on the chemically oxidized polysilicon surface at room temperature and successfully prevents long cantilevers of 3 mm in length from in-use as well as release stiction. DDMS-modified polysilicon surfaces exhibit satisfactory hydrophobicity, long term stability and thermal stability, which are comparable to those of FDTS. DDMS as an alternative to FDTS and ODTS provides a few valuable advantages; ease in handling and long-term storage in solution, low temperature-dependence and low cost. In addition to the new modifier molecule, the simplified process of direct release right after washing the modified surface with isooctane was proposed to cut the processing time.

• International Journal of Precision Engineering and Manufacturing
• /
• v.7 no.1
• /
• pp.13-17
• /
• 2006

Self-Assembled Monolayers (SAMs) formed by alkanethiol adsorption to thin metal film are widely being investigated for applications as coating layer for anti-stiction or friction reduction and in fabrication of micro structure of molecules and bio molecules. Recently, there have been many researches on micro patterning using the advantages of very thin thickness and etching resistance of Self-Assembled Monolayers in selective etching of thin metal film. In this report, we present the several machining method to form the nanoscale structure by Mask-Less laser patterning using alknanethiolate Self-Assembled Monolayers such as thin metal film etching and heterogeneous SAM structure formation.

• Journal of the Korean Society for Precision Engineering
• /
• v.21 no.12
• /
• pp.160-166
• /
• 2004

Self-Assembled Monolayers(SAMs) by alkanethiol adsorption to thin metal film are widely being investigated fer applications as coating layer for anti-stiction or friction reduction and in fabrication of micro structure of molecule and bio molecule. Recently, there have been many researches on micro patterning using the advantages of very thin thickness and etching resistance of Self-Assembled Monolayers in selective etching of thin metal film. In this report, we present the several machining method to form the nanoscale structure by Mask-Less laser patterning using alknanethiolate Self-Assembled Monolayers such as thin metal film etching and heterogeneous SAMs structure formation.

• Proceedings of the Korean Society of Precision Engineering Conference
• /
• 2003.06a
• /
• pp.219-222
• /
• 2003

Self-Assembled Monolayers(SAMs) by alkanethiol adsorption to thin metal film are widely being investigated for applications as coating layer for anti-stiction or friction reduction and in fabrication of micro structure of molecular and bio molecular. Recently, there have been many researches on micro patterning using the advantages of very thin thickness and etching resistance in selective etching of thin metal film of Self- Assembled Monolayers. In this report, we present the micromachining thin metal film by Mask-Less laser patterning of alknanethiolate Self-Assembled Monolayers.

• Proceedings of the KIEE Conference
• /
• 1997.11a
• /
• pp.618-620
• /
• 1997

A $50{\times}50{\mu}m^2$ aluminum micromirror array is fabricated using shadow evaporation process. The fabrication process is very simple with use of shadow evaporation process, and the micromirror array has a high fill-factor. The static and dynamic characteristics such as deflection angle vs. applied voltage, step response, and frequency response are measured using a contact free optical measurement technique. The downward threshold voltage was 8 V, step response time was $13.5{\mu}s$ when 32 V step voltage applied, and a resonance observed at 11kHz. The lifetime of micromirror with anti-stiction coating was tested and micromirror operated successfully over 200 million cycles of touch-down operations.

• Journal of the Korean institute of surface engineering
• /
• v.41 no.6
• /
• pp.331-334
• /
• 2008

The replica of highly ordered nano-sphere array patterns were fabricated using hot embossing method. First, silica nano-sphere array on Si substrate was transferred to PVC film at $130^{\circ}C$ and 7 bar using hot embossing process. Then, silica nano-sphere array on PVC template was removed by soaking the PVC film in buffered oxide etcher. In order to form anti-stiction layer, the PVC template was coated with silicon dioxide layer and self-assembled monolayer. Through UV nanoimprint lithography with the fabricated flexible PVC template, highly ordered nano-sphere array pattern was imprinted on curved substrates with high fidelity.

• Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
• /
• 2007.06a
• /
• pp.219-219
• /
• 2007

Ni stamper위에 100nm의 Si 코팅후 자기조립 단문자막(SAM)을 액상 코팅방식으로 형성 하였고, 내구성 및 열적 안정성을 검증하기 위해 반복적인 이형 및 압력인가test가 실시하였다. 20 회 이상의 이형실험을 통해 열적, 기계적 안정성을 확인하고, 접촉각 측정을 통해 이형특성의 안정성도 고찰하였다. 이를 Imprint공법을 적용 fine pattern의 구조물을 얻을수 있었다. SAM코팅은 TRICHLOROSILANE을 사용하였으며 Hexane과 1000:1의 비율로 섞어서 stirrer에서 mixing하는 방식을 사용했으며, UV-ozone처리를 통한 이형성 제거 효과도 관찰하였다.