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http://dx.doi.org/10.5695/JKISE.2008.41.6.331

Fabrication of High Ordered Nano-sphere Array on Curved Substrate by Nanoimprint Lithography  

Hong, S.H. (Department of Materials Science and Engineering, Korea University)
Bae, B.J. (Department of Materials Science and Engineering, Korea University)
Kwak, S.U. (RND center, Kornic System Co.)
Lee, H. (Department of Materials Science and Engineering, Korea University)
Publication Information
Journal of the Korean institute of surface engineering / v.41, no.6, 2008 , pp. 331-334 More about this Journal
Abstract
The replica of highly ordered nano-sphere array patterns were fabricated using hot embossing method. First, silica nano-sphere array on Si substrate was transferred to PVC film at $130^{\circ}C$ and 7 bar using hot embossing process. Then, silica nano-sphere array on PVC template was removed by soaking the PVC film in buffered oxide etcher. In order to form anti-stiction layer, the PVC template was coated with silicon dioxide layer and self-assembled monolayer. Through UV nanoimprint lithography with the fabricated flexible PVC template, highly ordered nano-sphere array pattern was imprinted on curved substrates with high fidelity.
Keywords
Nano-sphere; Flexible template; UV nanoimprint lithography; Curved substrate;
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