• Title/Summary/Keyword: Annealed glass

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A Study on Impact Damage Characteristics of the Window Glass for High Speed Train (고속열차 객실 유리창 충격파손특성 비교 연구)

  • Jeon, Chang-Sung;Kim, Young-Guk;Yun, Su-Hwan;Kwon, Hyeok-Bin;Park, Tae-Won
    • Journal of the Korean Society for Railway
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    • v.15 no.3
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    • pp.217-223
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    • 2012
  • This study describes an experimental investigation about the impact damage characteristics of various types of high speed train window glass. Kinds of impact test standards for glass were studied and impact test considering scattering ballast were developed. Windows with external impact side made with annealed, heat strengthened and tempered glasses are likely to be broken by sharp tipped falling object. Broken shape of annealed glass is like line in part and that of heat strengthened glass is line on the whole. Tempered glass is destroyed to pieces. The change of tip type from sharp to blunt makes the higher destroyed level. Tempered glass has higher strength than annealed glass with blunt tip. When the protective films are attached to glasses, strength against destruction increases. In case of real ballast test, glasses without protective films were destroyed, but those with protective films are hard to be broken.

Effects of Sputtering Conditions on Properties of $CaTiO_3 : Pr$ Phosphor thin Films (Sputtering 조건이 $CaTiO_3 : Pr$ 형광체 박막의 물성에 미치는 영향)

  • 정승묵;김영진;강승구;이기강
    • Korean Journal of Crystallography
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    • v.11 no.3
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    • pp.167-172
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    • 2000
  • CaTiO₃:Pr phosphor thin films were prepared on Si(100), ZnO/glass, Corning glass and ITO/glass by rf magnetron reactive sputtering. The effects of deposition parameters such as oxygen partial pressure, substrate temperature, and annealing conditions on crystallinity and compositional variation of the films were investigated. PL spectra of CaTiO₃:Pr phosphor thin films exhibited red regime peaking at 613 nm and enhanced PL intensity was observed for the film annealed in vacuum atmosphere as compared to the deposit annealed in N₂ environment.

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Corrections for effects of biaxial stresses in annealed glass

  • Nurhuda, Ilham;Lam, Nelson T.K.;Gad, Emad F.;Calderone, Ignatius
    • Structural Engineering and Mechanics
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    • v.39 no.3
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    • pp.303-316
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    • 2011
  • Experimental tests have shown that glass exhibits very different strengths when tested under biaxial and uniaxial conditions. This paper presents a study on the effects of biaxial stresses on the notional ultimate strength of glass. The study involved applying the theory of elasticity and finite element analysis of the Griffith flaw in the micro scale. The strain intensity at the tip of the critical flaw is used as the main criterion for defining the limit state of fracture in glass. A simple and robust relationship between the maximum principal stress and the uniaxial stress to cause failure of the same glass specimen has been developed. The relationship has been used for evaluating the strength values of both new and old annealed glass panels. The characteristic strength values determined in accordance with the test results based on 5% of exceedance are compared with provisions in the ASTM standard.

Study on Self-Organized Ru Dots Using ALD and Low Temperature Rapid Thermal Annealing Process (ALD와 저온 RTA를 이용한 자가정렬 Ru 응집체의 제조와 물성)

  • Park, Jongseung;Noh, Yunyoung;Song, Ohsung
    • Korean Journal of Metals and Materials
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    • v.50 no.8
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    • pp.557-562
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    • 2012
  • Self-organized ruthenium (Ru) dots were fabricated by $400^{\circ}C$ RTA (rapid thermal annealing) and ALD (atomic layer deposition). The dots were produced under the $400^{\circ}C$ RTA conditions for 10, 30 and 60 seconds on all Si(100)/200 nm-SiO2, glass, and glass/fluorine-doped tin oxide (FTO) substrates. Electrical sheet resistance, and surface microstructure were examined using a 4-point probe and FE-SEM (field emission scanning electron microscopy). Ru dots were observed when a 30 nm-Ru layer on a Si(100)/200 nm-SiO2 substrate was annealed for 10, 30 and 60 seconds, whereas the dots were only observed on a glass substrate when a 50 nm-Ru layer was annealed on glass. For a glass/FTO substrate, RTA <30 seconds was needed for 30 nm Ru thick films. Those dots can increase the effective surface area for silicon and glass substrates by up to 5-44%, and by 300% for the FTO substrate with a < $20^{\circ}$ wetting angle.

Diffusion Behaviors and Electrical Properties in the In-Ga-Zn-O Thin Film Deposited by Radio-frequency Reactive Magnetron Sputtering

  • Lee, Seok Ryeol;Choi, Jae Ha;Lee, Ho Seong
    • Journal of the Korean institute of surface engineering
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    • v.48 no.6
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    • pp.322-328
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    • 2015
  • We investigated the diffusion behaviors, electrical properties, microstructures, and composition of In-Ga-Zn-O (IGZO) oxide thin films deposited by radio frequency reactive magnetron sputtering with increasing annealing temperatures. The samples were deposited at room temperature and then annealed at 300, 400, 500, 600 and $700^{\circ}C$ in air ambient for 2 h. According to the results of time-of-flight secondary ion mass spectrometry and X-ray photoelectron spectroscopy, no diffusion of In, Ga, and Zn components were observed at 300, 400, 500, $600^{\circ}C$, but there was a diffusion at $700^{\circ}C$. However, for the sample annealed at $700^{\circ}C$, considerable diffusion occurred. Especially, the concentration of In and Ga components were similar at the IGZO thin film but were decreased near the interface between the IGZO and glass substrate, while the concentration of Zn was decreased at the IGZO thin film and some Zn were partially diffused into the glass substrate. The high-resolution transmission electron microscopy results showed that a phase change at the interface between IGZO film and glass substrate began to occur at $500^{\circ}C$ and an unidentified crystalline phase was observed at the interface between IGZO film and glass substrate due to a rapid change in composition of In, Ga and Zn at $700^{\circ}C$. The best values of electron mobility of $15.5cm^2/V{\cdot}s$ and resistivity of $0.21{\Omega}cm$ were obtained from the sample annealed at $600^{\circ}C$.

DC Sputtering Process of 2-Dimensional Tungsten Disulfide Thin Films on Soda-Lime Glass Substrates (DC 스퍼터링을 이용한 소다라임 유리 기판상에 2차원 황화텅스텐 박막 형성 공정)

  • Ma, Sang Min;Kwon, Sang Jik;Cho, Eou Sik
    • Journal of the Semiconductor & Display Technology
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    • v.17 no.3
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    • pp.31-35
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    • 2018
  • Tungsten disulfide($WS_2$) thin films were directly deposited by direct-current(DC) sputtering and annealed by rapid thermal processing(RTP) to materialize two-dimensional p-type transition metal dichalcogenide (TMDC) thin films on soda-lime glass substrates without any complicated exfoliation/transfer process. $WS_2$ thin films deposited at various DC sputtering powers from 80 W to 160W were annealed at different temperatures from $400^{\circ}C$ to $550^{\circ}C$ considering the melting temperature of soda-lime glass. The optical microscope results showed the stable surface morphologies of the $WS_2$ thin films without any defects. The X-ray photoelectron spectroscopy (XPS) results and the Hall measurement results showed stable binding energies of W and S and high carrier mobilities of $WS_2$ thin films.

Effects of Wafer Cleaning and Heat Treatment in Glass/Silicon Wafer Direct Bonding (유리/실리콘 기판 직접 접합에서의 세정과 열처리 효과)

  • 민홍석;주영창;송오성
    • Journal of the Korean Institute of Electrical and Electronic Material Engineers
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    • v.15 no.6
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    • pp.479-485
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    • 2002
  • We have investigated the effects of various wafers cleaning on glass/Si bonding using 4 inch Pyrex glass wafers and 4 inch silicon wafers. The various wafer cleaning methods were examined; SPM(sulfuric-peroxide mixture, $H_2SO_4:H_2O_2$ = 4 : 1, $120^{\circ}C$), RCA(company name, $NH_4OH:H_2O_2:H_2O$ = 1 : 1 : 5, $80^{\circ}C$), and combinations of those. The best room temperature bonding result was achieved when wafers were cleaned by SPM followed by RCA cleaning. The minimum increase in surface roughness measured by AFM(atomic force microscope) confirmed such results. During successive heat treatments, the bonding strength was improved with increased annealing temperatures up to $400^{\circ}C$, but debonding was observed at $450^{\circ}C$. The difference in thermal expansion coefficients between glass and Si wafer led debonding. When annealed at fixed temperatures(300 and $400^{\circ}C$), bonding strength was enhanced until 28 hours, but then decreased for further anneal. To find the cause of decrease in bonding strength in excessively long annealing time, the ion distribution at Si surface was investigated using SIMS(secondary ion mass spectrometry). tons such as sodium, which had been existed only in glass before annealing, were found at Si surface for long annealed samples. Decrease in bonding strength can be caused by the diffused sodium ions to pass the glass/si interface. Therefore, maximum bonding strength can be achieved when the cleaning procedure and the ion concentrations at interface are optimized in glass/Si wafer direct bonding.

Crystallization and Molecular Relaxation of Poly(Ethylene Terephthalate) Annealed in Supercritical Carbon Dioxide

  • Jung, Yong-Chae;Cho, Jae-Whan
    • Fibers and Polymers
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    • v.6 no.4
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    • pp.284-288
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    • 2005
  • Poly(ethylene terephthalate) was annealed at different temperature and pressure of supercritical carbon dioxide $(CO_2)$ using samples quenched from the melt. Crystallization and molecular relaxation behavior due to $CO_2-annealing$ of samples were investigated using differential scanning calorimetric and dynamic mechanical measurements. The glass transition and crystallization temperatures significantly decreased with increasing temperature and pressure of $CO_2$. The dynamic mechanical measurement of samples annealed at $150^{\circ}C$ in supercritical $CO_2$ showed three relaxation peaks, corresponding to existence of different amorphous regimes such as rigid, intermediate, and mobile domains. As a result, the mobile chains were likely to facilitate crystallization in supercritical state. It also led to the decreased modulus of $CO_2-annealed$ samples with increasing pressure.

Hydrothermal Synthesis of Red-Emitting Y(V0.5,P0.5)O4:Eu Nanophosphors and their Application to Transparent Plasma Display Fabrication (적색발광 Y(V0.5,P0.5)O4:Eu 나노형광체의 수열 합성 및 투명 플라즈마 디스플레이 소자 제작으로의 응용)

  • Song, Woo-Seuk;Yang, Hee-Sun
    • Journal of the Korean Ceramic Society
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    • v.48 no.1
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    • pp.86-93
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    • 2011
  • Transparent plasma display can be realized by developing the synthetic chemistry of appropriate nanophosphors and generating nanophosphor-based transparent luminescent layers. For this goal, red-emitting $Y(V_{0.5},\;P_{0.5})O_4$:Eu nanophosphors were synthesized by a facile hydrothermal route at $200^{\circ}C$ for 48 h and the resulting nanophosphors were subsequently annealed at $800^{\circ}C$ at an ambient atmosphere. The crystallographic structure, morphology, and emission property of the as-synthesized and annealed nanophosphors were compared. Choosing 2-methoxyethanol as a dispersion medium and applying a standard sonication, well-dispersed nanophosphor solutions could be prepared. Using these dispersions, visible transparent nanophosphor layers were spin-deposited on glass substrates. By combining $Y(V_{0.5},\;P_{0.5})O_4$:Eu nanophosphor layer/glass substrate as a rear plate with a front plate used in a conventional plasma display panels (PDPs), mini-sized transparent red-emitting PDPs were constructed. Transmittance and luminance properties of two transparent test panels using as-synthesized versus $800^{\circ}C$-annealed nanophosphors were characterized and compared.

Determination of Stress Profiles by Fractography in Single Ion-exchanged Glass (파괴분석을 이용한 단일이온교환된 유리의 응력 형성 관찰)

  • 이회관;강원호
    • Journal of the Microelectronics and Packaging Society
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    • v.10 no.4
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    • pp.61-64
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    • 2003
  • The fractography was used to observe the stress profile on a single ion-exchanged glass. In the processing, the temperature was varied during the ion exchange, and then the stress profile on the single ion-exchanged glass was shifted from glass surface to slightly below the glass surface. The hackle mark and mirror surface were varied according to process conditions, and the glass strength was increased with increasing the number of hackle markers. In case of breaking the stress profile by using indenter, the breaking property was similar to the annealed glass.

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