Korean Journal of Crystallography (한국결정학회지)

Korean Crystallographic Association (한국결정학회)
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Effects of Sputtering Conditions on Properties of $CaTiO_3 : Pr$ Phosphor thin Films

Sputtering 조건이 $CaTiO_3 : Pr$ 형광체 박막의 물성에 미치는 영향

  • 정승묵 (경기대학교 첨단산업공학부 신소재전공) ;
  • 김영진 (경기대학교 첨단산업공학부 신소재전공) ;
  • 강승구 (경기대학교 첨단산업공학부 신소재전공) ;
  • 이기강 (경기대학교 첨단산업공학부 신소재전공)
  • Published : 2000.09.01
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Abstract

CaTiO₃:Pr phosphor thin films were prepared on Si(100), ZnO/glass, Corning glass and ITO/glass by rf magnetron reactive sputtering. The effects of deposition parameters such as oxygen partial pressure, substrate temperature, and annealing conditions on crystallinity and compositional variation of the films were investigated. PL spectra of CaTiO₃:Pr phosphor thin films exhibited red regime peaking at 613 nm and enhanced PL intensity was observed for the film annealed in vacuum atmosphere as compared to the deposit annealed in N₂ environment.

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