• Proceeding of EDISON Challenge
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• 2016.03a
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• pp.365-367
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• 2016

나노와이어 FET은 natural length가 작아 단채널 효과가 MOSFET에 비해 줄어든다는 장점이 있어 미래의 소자 구조로 주목 받고 있다. 그런데 나노와이어 FET을 공정할 때 채널 etching에서 채널이 완벽하게 원형 구조를 가지는 것이 어렵다. 본 논문에서는 gate-all-around 실리콘 나노와이어 FET의 aspect ratio에 따른 트랜지스터의 특성 변화를 알아 보았다. 시뮬레이션 결과, aspect ratio가 작을수록 나노와이어 FET에서의 단채널 효과가 줄어드는 경향을 보였다.

• Proceedings of the IEEK Conference
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• 2003.07b
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• pp.747-750
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• 2003

We have studied PHEMTs optimization by means of fabrication of PHEMTs. All PHEMTs have been fixed with a gate length of 0.1 ${\mu}{\textrm}{m}$, a gate head size of 0.75${\mu}{\textrm}{m}$, and two gate fingers. We have measured the characteristics of PHEMTs with variation of source-drain spacing, pad size, and gate width. As a result, we have found the enhanced characteristics of $I_{dss}$, $S_{21}$, $h_{21}$, $f_{T}$, $f_{max}$, and $G_{ms}$ with increasing gate width. Also, $g_{m}$ has improved with decreasing source-drain spacing, and $S_{21}$ has improved with deceasing pad size.e.e.e.e.

• JSTS:Journal of Semiconductor Technology and Science
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• v.10 no.2
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• pp.152-159
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• 2010

We propose a semi-analytical current conduction model for depletion-mode n-type nanowire field-effect transistors (NWFETs) with top-gate structure. The NWFET model is based on an equivalent circuit consisting of two back-to-back Schottky diodes for the metal-semiconductor (MS) contacts and the intrinsic top-gate NWFET. The intrinsic top-gate NWFET model is derived from the current conduction mechanisms due to bulk charges through the center neutral region as well as of accumulation charges through the surface accumulation region, based on the electrostatic method, and thus it includes all current conduction mechanisms of the NWFET operating at various top-gate bias conditions. Our previously developed Schottky diode model is used for the MS contacts. The newly developed model is integrated into ADS, in which the intrinsic part of the NWFET is developed by utilizing the Symbolically Defined Device (SDD) for an equation-based nonlinear model. The results simulated from the newly developed NWFET model reproduce considerably well the reported experimental results.

• Journal of Electrical Engineering and Technology
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• v.9 no.2
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• pp.649-654
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• 2014

In this paper, an analytical model for Surrounding Gate (SG) metal-oxide- semiconductor field effect transistors (MOSFETs) considering quantum effects is presented. To achieve this goal, we have used variational approach for solving the Poission and Schrodinger equations. This model is developed to provide an analytical expression for inversion charge distribution function for all regions of device operation. This expression is used to calculate the other important parameters like inversion charge density, threshold voltage, drain current and gate capacitance. The calculated expressions for the above parameters are simple and accurate. This paper also focuses on the gate tunneling issue associated with high dielectric constant. The validity of this model was checked for the devices with different dimensions and bias voltages. The calculated results are compared with the simulation results and they show good agreement.

• Journal of the Korean Society of Manufacturing Process Engineers
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• v.9 no.5
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• pp.28-33
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• 2010

A computer code was developed to simulate all three stages of the injection molding process: filling, packing and cooling by finite element method. The constitutive equation used here was compressible Leonov model. The PVT relationship was assumed to follow the Tait equation. The flow-induced birefringence was related to the calculated flow stresses through the linear stress-optical law. Based on the simulation, the Taguchi method was used to investigate the influences of injection molding conditions on the birefringence of a center gate disk. In addition, the optimal processing conditions were selected to minimize the birefringence and the birefringence difference along the positions of the disk.

• Proceedings of the Korean Society of Precision Engineering Conference
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• 2005.10a
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• pp.305-309
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• 2005

A computer code was developed to simulate all three stages of the injection molding process ? filling, packing and cooling by finite element method. The constitutive equation used here was compressible Leonov model. The PVT relationship was assumed to follow the Tait equation. The flow-induced birefringence was related to the calculated flow stresses through the linear stress-optical law. Based on the simulation, the Taguchi method was used to investigate the influences of injection molding conditions on the birefringence of a center gate disk. In addition, the optimal processing conditions were selected to minimize the birefringence and the birefringence difference along the positions of the disk.

• Journal of the Korean Society of Costume
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• v.53 no.2
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• pp.171-182
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• 2003

The purpose of this study was to determine dimension of service quality, there by to analyze difference of service quality according to the types of fashion retail stores. and to investigate consumer variables (demographic characteristics, purchase behavior) and service quality which affect consumer satisfaction. The subject were 451 women in the age of twenty to forty years old who live in Seoul and the suburban of Seoul. The results of the study were as follows : First, it was found that fashion retail store's service quality was classified 5 factors: (1)salesperson. (2)convenience of shopping, (3)variety of product and facility. (4)store policy, (5)efficiency of movement. Second, departmentstore was evaluated the highest in terms of all factors. Discountstore was evaluated highly in terms of store policy and lowly in terms of variety of production and facility. East & South gate fashion shopping mall was evaluated the lowest in terms of all factors except variety of product and facility. Third, service quality and satisfaction showed significant differences in demographic characteristics. Purchase behavior of each fashion retail stores showed significant differences. The difference of service quality and satisfaction depending on purchase behavior showed a significant positive relation. Forth, service quality of discountstore and East & South gate fashion shopping mall were affected by purchase behavior partially. Departmentstore users were affected by salesperson and store policy. Discountstore users were affected by all factors except convenience of shopping. East & South fate fashion shopping mall users were affected by all factors.

• Korean Journal of Materials Research
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• v.13 no.11
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• pp.711-716
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• 2003

Gate length, height, and silicide thickness have all been shrinking linearly as device density has progressively increased over the years. We investigated the effect of the cobalt diffusion during the silicide formation process on the 60$\AA$-thick gate oxide lying underneath the Ti/Co and Co/Ti bilayers. We prepared four different cobalt silicides, which have similar sheet resistance, made from the film structure of Co/Ti(interlayer), and Ti(capping layer)/Co, and peformed the current-voltage, time-to-break down, and capacitance-voltage measurements. Our result revealed that the cobalt silicide process without the Ti capping layer allowed cobalt atoms to diffuse into the upper interface of gate oxides. We propose that 100$\AA$-thick titanium interlayer may lessen the diffusion of cobalt to gate oxides in 1500-$\AA$ height polysilicon gates.

• JSTS:Journal of Semiconductor Technology and Science
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• v.11 no.4
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• pp.278-286
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• 2011

In this paper, we present a compact model of gate-voltage-dependent quantum effects in short-channel surrounding-gate (SG) metal-oxide-semiconductor field-effect transistors (MOSFETs). We based the model on a two-dimensional (2-D) analytical solution of Poisson's equation using cylindrical coordinates. We used the model to investigate the electrostatic potential and current sensitivities of various gate lengths ($L_g$) and radii (R). Schr$\ddot{o}$dinger's equation was solved analytically for a one-dimensional (1-D) quantum well to include quantum effects in the model. The model takes into account quantum effects in the inversion region of the SG MOSFET using a triangular well. We show that the new model is in excellent agreement with the device simulation results in all regions of operation.

• Journal of the Korean Institute of Electrical and Electronic Material Engineers
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• v.36 no.4
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• pp.385-390
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• 2023

In this paper, the 1,700 V level SiC-based power MOSFET device widely used in electric vehicles and new energy industries was designed, that is, a single trench gate power MOSFET structure and a double trench gate power MOSFET structure were proposed to analyze electrical characteristics while changing the design and process parameters. As a result of comparing and analyzing the two structures, it can be seen that the double trench gate structure shows quite excellent characteristics according to the concentration of the drift layer, and the breakdown voltage characteristics according to the depth of the drift layer also show excellent characteristics of 200 V or more. Among them, the trench gate power MOSFET device can be applied not only to the 1,700 V class but also to a voltage range above it, and it is believed that it can replace all Si devices currently applied to electric vehicles and new energy industries.