• Journal of the Korean Crystal Growth and Crystal Technology
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• v.30 no.1
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• pp.1-6
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• 2020

In this research, 50 nm thick AlN thin films were deposited on the patterned sapphire (0001) substrate by using HVPE (Hydride Vapor Phase Epitaxy) system and then epitaxial layer structure was grown by MOCVD (metal organic chemical vapor deposition). The surface morphology of the AlN buffer layer film was observed by SEM (scanning electron microscopy) and AFM (atomic force microscope), and then the crystal structure of GaN films of the epitaxial layer structure was investigated by HR-XRC (high resolution X-ray rocking curve). The XRD peak intensity of GaN thin film of epitaxial layer structure deposited on AlN buffer layer film and sapphire substrate was rather higher in case of that on PSS than normal sapphire substrate. In AFM surface image, the epitaxial layer structure formed on AlN buffer layer showed rather low pit density and less defect density. In the optical output power, the epitaxial layer structure formed on AlN buffer layer showed very high intensity compared to that of the epitaxial layer structure without AlN thin film.

• Journal of the Korean Crystal Growth and Crystal Technology
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• v.30 no.5
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• pp.168-173
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• 2020

To analyze and describe the behavior and mechanisms occurring in the thermal oxidation process of AlN, bulk AlN single crystals were thermally treated with different temperatures. As a result, it was confirmed that full-scale oxidation of bulk AlN and growth of Al-oxide occurred from the temperature of 800℃, which confirmed that the weight% of O elements tended to increase while the N elements decreased with increasing the temperature. In the case of thermal treatment at 900℃, the grown Al-oxides were merged with neighboring Al-oxides and began to form α-Al₂O₃ poly-crystals. During thermal treatment at the temperature of 1000℃, hexagonal pyramidal shaped poly-crystalline α-Al₂O₃ was clearly observed. Through the X-ray diffraction pattern analysis, the changes of surface crystal structure according to the temperature of bulk AlN were investigated in detail.

• Journal of the Korean Crystal Growth and Crystal Technology
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• v.19 no.5
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• pp.242-245
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• 2009

AlN crystals were grown by a sublimation process without seed crystals and the growth morphology of them was characterized. The grown AlN crystals were a polycrystalline phase, which had a diameter of $60\sim200\;{\mu}m$ and were grown with a growth rate of $0.2\sim0.5\;{\mu}n/hr$. It was observed that the as-grown crystals had a hexagonal crystal structure and revealed that these crystals were grown with a morphology of columnar morphology in the initial stage of the growth before they were enlarged in a way of a lateral growth behavior in the final stage. On the surface, a lot of pinholes were observed on the surface of crystals grown. The evolution of a growth morphology was characterized by optical and scanning electron microscopic observation.

• Journal of the Korean Crystal Growth and Crystal Technology
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• v.23 no.6
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• pp.279-282
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• 2013

Recently, it has been interested much that AlN (Aluminum Nitride) crystals can be applied to UV LEDs and high power devices as like GaN and SiC crystals. The reports about commercial grade of AlN wafers in the world have been absent, however several results for growth of large size of AlN single crystals have been reported from abroad. In this report, the result of AlN single crystals of a diameter of about 8 mm grown are reported. Optical microscopic characterization was applied to observe the form of the crystals and the crystal quality was evaluated by FWHM measurement by DCXRD rocking curve analysis.

• Journal of the Korean Crystal Growth and Crystal Technology
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• v.22 no.6
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• pp.265-268
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• 2012

The growth of AlN single crystals of large size and good quality is of prime importance for UV LEDs and power devices applications. However, the crystals having the size of more than 1 inch and high quality have not been reported in the world. In the PVT growth of AlN, the crystal morphology of as grown were important because the preferred orientation of growth of it was evaluated for growth rate increase. In the present study, the AlN single crystals grown by PVT process were evaluated by the side of the growth morphology. Optical microscopic characterization was carried out to observe the shape of the crystals and the growth facets. Furthermore the growth habit of it were discussed by observation of the surface of AlN crystals.

• Journal of the Korean Crystal Growth and Crystal Technology
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• v.25 no.1
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• pp.32-34
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• 2015

AlN Single Crystal were grown by PVT (Physical vapor transport) method on bulk seed. It was performed by high-frequency induction-heating coil. AlN source powder was loaded at bottom side of the carbon crucible and the crystal seed was loaded at the upper side of the crucible. The temperature conditions of the growth was varied $2000{\sim}2100^{\circ}C$ and the surrounding pressure was $1{\times}10^{-1}{\sim}200$ Torr. And the hot-zone of the heating position was controlled elaborately according to growth. The 17 mm-diameter, 7 mm-thickness AlN single crystal is obtained for about 600 hours growing. It was recognized that the growth direction of as grown crystal was R[011] by the Laue X-Ray camera measurement.

• Journal of the Korean Vacuum Society
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• v.10 no.1
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• pp.22-26
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• 2001

Microstructures of AlN thin films on Si substrates grown by plasma assisted molecular beam epitaxy were analyzed with various growth temperatures and substrate orientations. Reflection high energy electron diffraction (RHEED) patterns were checked for the in-situ monitoring of the growth condition. X-ray diffraction(XRD), double crystal X-ray diffraction (DCXD), and transmission electron microscopy/diffraction (TEM/TED) techniques were employed to characterize the microstructure of the films after growth. On Si(100) sub-strates, AlN thin films were grown mostly along the hexagonal c-axis orientation at temperature higher than $850^{\circ}C$. On the other hand the AlN films on Si(111) were epitaxially grown with directional coherencies in AlN(0001)/Si(111), AlN(1100)/Si(110), and AlN(1120)/Si(112). The microstructure of AlN thin films on Si(111) substrates, with a full width at half maximum of almost 3000 arcsec at 2$\theta$=$36.2^{\circ}$, showed that the single crystal films were grown, even if they includ a lot of crystal defects such as dislocations and stacking faults.

• Journal of the Korean Crystal Growth and Crystal Technology
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• v.24 no.2
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• pp.54-58
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• 2014

AlN (Aluminum Nitride) crystals were grown by a PVT (Physical Vapor Transport) method and were characterized to phases on the growth temperature. The crystals phase and morphology were analyzed using an optical stereo-microscope and the optimum temperature for the growing was determined. In this report, the characteristics of the AlN crystals grown at various temperatures were reported.

• Journal of the Korean Crystal Growth and Crystal Technology
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• v.34 no.3
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• pp.98-102
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• 2024

In this study, the crystal characteristics of commercial AlN powders with sizes of "㎛" and "nm" were selected through XRD analysis and then sintered at different temperatures through an induction heating furnace to investigate the optimized sintering temperature and physical properties. The sintering temperature was 1,500, 1,700, and 1,900℃ in the N₂ atmosphere, and the optimized sintering temperature conditions were established for the sintered AlN pellets using SEM, XRD, and Raman analysis. Additionally, impedance analysis was performed to confirm the electrical properties of the optimized AlN pellet without sintering additives.

• Journal of the Korean Ceramic Society
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• v.50 no.4
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• pp.280-287
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• 2013

Plate-type phosphor is a promising substitute in overcoming the issues related to the powder phosphor paste mixed with resin. In this research, $Ca-{\alpha}-SiAlON:Eu^{2+}$ plate phosphor ($Ca_xSi_{12-(m+n)}Al_{m+n}O_nN_{16-n}:Eu_y$) was investigated for the varied compositions (m,n) of the host crystal with the fixed Eu content (y). Densification was promoted for the compositions with increasing 'm' values for the m=2n relationship. Dictated by the Eu concentration inside the phosphor crystal, photoluminescence intensity was stronger in ${\alpha}2$ specimen (m = 3.0, n = 1.5) containing the second phases when compared to ${\alpha}1$ specimen (m = 1.5, n = 0.75) comprising a single-phase ${\alpha}$-SiAlON. The concentration of Eu in the non-emitting amorphous interfacial glass phase was 2~4 times of the designed Eu concentration inside the ${\alpha}$-SiAlON crystal.