• Title/Summary/Keyword: AlGaAs

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Effect of Annealing Temperature on the Luminescence Properties of Digital-Alloy InGaAlAs Multiple Quantum Wells (디지털 합금 InGaAlAs 다중 양자 우물의 열처리 온도에 따른 발광 특성)

  • Cho, Il Wook;Byun, Hye Ryoung;Ryu, Mee-Yi;Song, Jin Dong
    • Journal of the Korean Vacuum Society
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    • v.22 no.6
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    • pp.321-326
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    • 2013
  • The effect of rapid thermal annealing (RTA) on the optical properties of digital-alloy InGaAlAs multiple quantum well (MQW) structures have been investigated by using photoluminescence (PL) and time-resolved PL measurements as a function of RTA temperature. The MQW samples were annealed from $700^{\circ}C$ to $850^{\circ}C$ for 30 s in a nitrogen atmosphere. The MQW sample annealed at $750^{\circ}C$ exhibited the strongest PL intensity and the narrowest FWHM (Full width at half maximum), indicating the reduced nonradiative recombination centers and the improved interfaces between the wells and barriers. The MQW samples annealed at $800^{\circ}C$ and $850^{\circ}C$ showed the decreased PL intensities and blueshifted PL peaks compared to $750^{\circ}C$-annealed sample. The blueshift of PL peak with increasing RTA temperatures are ascribed to the increase of aluminum due to intermixing of gallium (Ga) and aluminum (Al) in the interfaces of InGaAs/InAlAs short-period superlattices. The decrease of PL intensity after annealing at $800^{\circ}C$ and $850^{\circ}C$ are attributed to the interface roughening and lateral composition modulation caused by the interdiffusion of Ga and Al and indium segregation, respectively. With increasing RTA temperature the PL decay becomes slower, indicating the decrease of nonradiative defect centers. The optical properties of digital-alloy InGaAlAs MQW structures can be improved significantly with optimum RTA conditions.

Chatacterization of GaAs/AlGaAs optical phase modulator fabricated by self-aligned process (자기정렬공정에 의한 GaAs/AlGaAs 광위상변조기의 제작 및 특성 측정)

  • 김병성;정영철;변영태;박경현;김선호;임동건
    • Korean Journal of Optics and Photonics
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    • v.7 no.3
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    • pp.287-294
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    • 1996
  • An optical phase modulator is fabricated in GaAs/AlGaAs doble heterostructure wafer grown by MOCVD. A self-aligned process, in which the same photoresist pattern is used for both the waveguide etching and the insulation layer formation, is developed and is found to be very useful, Fabry-Perot interference technique is applied to the measurement and the phase modulation efficiency is measured to be 22.5$^{\circ}$/Vmm at 1.31 ${\mu}{\textrm}{m}$ for TE polarization.

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Emitter structure dependence of the high frequency performance of AlGaAs/GaAs HBTs (에미터 구조변화에 따른 AlGaAs/GaAs HBT의 고주파 특성)

    • Journal of the Korean Vacuum Society
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    • v.9 no.2
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    • pp.167-171
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    • 2000
  • Emitter structure effects on the characteristics of AlGaAs/GaAs HBTs have been investigated. Cut-off frequency and maximum oscillation frequency were changed with emitter dimension, and it was attributed to the variation of resistance and junction capacitance with emitter structure. Emitter perimeter and junction area also affected the high frequency performance of HBTs.

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Observation of Gain Asymmetry in InGaAs/AlGaAs Quantum-Wire Array Structures (InGaAs/AlGaAs V-형 양자선 어레이 구조에서 이득 이방성의 관찰)

  • Kim, Kyoung-Chan;Kim, Tae-Geun
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2004.05a
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    • pp.83-85
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    • 2004
  • MOCVD(metalorganic chemical vapor deposition)에 의해 성장된 InGaAs/AlGaAs 물질을 이용하여 V-형 양자선 (V-groove quantum-wire) 어레이(array) 구조에서 이득 결합(gain-coupling)에 의한 분포 광귀환(distributed optical feedback) 특성을 조사하였다. 분포 귀환형 (distributed feedback, DFB) 구조를 제작하는 동안 격자 재성장(grating overgrowth)을 피하기 위하여, 새롭게 개발된 constant MOCVD 성장 방법을 적용하였고, Bragg 파장에서 DFB 방향으로 광귀환의 결과인 스펙트럼의 이득 이방성(gain asymmetry)을 실험적으로 관찰하였다.

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Semi-insulation Behavior of GaN Layer Grown on AlN Nucleation Layer

  • Lee, Min-Su;Kim, Hyo-Jeong;Lee, Hyeon-Hwi
    • Proceedings of the Korean Vacuum Society Conference
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    • 2011.08a
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    • pp.132-132
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    • 2011
  • The sheet resistance (Rs) of undoped GaN films on AlN/c-plane sapphire substrate was investigated in which the AlN films were grown by R. F. magetron sputtering method. The Rs was strongly dependent on the AlN layer thickness and semi-insulating behavior was observed. To clarify the effect of crystalline property on Rs, the crystal structure of the GaN films has been studied using x-ray scattering and transmission electron microscopy. A compressive strain was introduced by the presence of AlN nucleation layer (NL) and was gradually relaxed as increasing AlN NL thickness. This relaxation produced more threading dislocations (TD) of edge-type. Moreover, the surface morphology of the GaN film was changed at thicker AlN layer condition, which was originated by the crossover from planar to island grains of AlN. Thus, rough surface might produce more dislocations. The edge and mixed dislocations propagating from the interface between the GaN film and the AlN buffer layer affected the electric resistance of GaN film.

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Structural and Optical Characteristics of InAs/InAlGaAs Quantum Dots Grown on InP/InGaAs/InP Distributed Feedback Grating Structure (InP/InGaAs/InP 분포귀환형 회절격자 위에 성장된 InAs/InAlGaAs 양자점의 구조적.광학적 특성)

  • Kwack, H.S.;Kim, J.S.;Lee, J.H.;Hong, S.U.;Choi, B.S.;Oh, D.K.;Cho, Y.H.
    • Journal of the Korean Vacuum Society
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    • v.15 no.3
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    • pp.294-300
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    • 2006
  • We fabricated the distributed feedback (DFB) InP/InGaAs/InP grating structures on InP (100) substrates by metal-organic chemical vapor deposition, and their structural properties were investigated by atomic force microscopy and scanning electron microscopy. Self-assembled InAs/InAlGaAs quantum dots (QDs) were grown on the InP/InGaAs/InP grating structures by molecular beam epitaxy, and their optical properties were compared with InAs/InAlGaAs QDs without grating structure. The duty of the grating structures was about 30%. The PL peak position of InAs/InAlGaAs QDs grown on the grating structure was 1605 nm, which was red-shifted by 18 nm from that of the InAs/InAlGaAs QDs without grating structure. This indicates that the formation of InAs/InAlGaAs QDs was affected by the existence of the DFB grating structures.

The Immediate Effects of 975-nm GaAlAs Low-level Laser Therapy on Myofacial Triger Point of Upper Trapezius Muscle in Subjects with Rounded Shoulder Posture (둥근 어깨 자세를 가진 자의 등세모근 위 섬유의 압통점에 975-nm GaAlAs 저출력레이저 적용에 대한 즉각적인 효과)

  • Kim, Byeong-Jo;Lee, Jung-Hoon
    • Journal of the Korean Society of Physical Medicine
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    • v.9 no.4
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    • pp.433-438
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    • 2014
  • PURPOSE: The purpose of our study was to compare a 975-nm, 500-mW GaAlAs low-level laser therapy versus placebo low-level laser therapy with regard to the immediate changes on the myofascial trigger point of the dominant upper trapezius muscle in subjects with rounded shoulder posture. METHODS: Thirty-two male college students with rounded shoulder posture and shoulder pain consented to participate in the experiment. The subjects were randomly assigned to a 2-minute procedure with either an active GaAlAs low-level laser or a placebo GaAlAs low-level laser. The pressure-pain threshold and visual analog scale on tenderness at 3 kg were measured with an algometer before and after the laser treatments. RESULTS: The active GaAlAs low-level laser group showed significant changes in pressure-pain threshold and visual analog scale on tenderness at 3 kg (p<0.05). The placebo GaAlAs low-level laser group showed no significant changes in either pressure-pain threshold or visual analog scale on tenderness at 3 kg (p>0.05). CONCLUSION: An immediate effect was observed in pressure-pain threshold and visual analog scale on tenderness at 3 kg following a 2-minute application ($857.14J/cm^2$) of a 975-nm, 500-mW GaAlAs low-level laser to the myofascial trigger point of the dominant upper trapezius muscle in patients with rounded shoulder posture.

DC and RF Characteristics of AlGaN/InGaN HEMTs Grown by Plasma-Assisted MBE (AlGaN/InGaN HEMTs의 고성능 초고주파 전류 특성)

  • 이종욱
    • The Journal of Korean Institute of Electromagnetic Engineering and Science
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    • v.15 no.8
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    • pp.752-758
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    • 2004
  • This paper reports on the DC and RF characteristics of AlGaN/InGaN/GaN high electron-mobility transistors (HEMTs) grown by molecular beau epitaxy(MBE) on sapphire substrates. The devices with a 0.5 ${\mu}$m gate-length exhibited relatively flat transconductance(g$\_$m/), which results from the enhanced carrier confinement of the InGaN channel. The maximum drain current was 880 mA/mm with a peak g$\_$m/ of 156 mS/mm, an f$\_$T/ of 17.3 GHz, and an f$\_$MAX/ or 28.7 GHz. In addition to promising DC and RF results, pulsed I-V and current-switching measurements showed little dispersion in the unpassivated AlGaN/InGaN HEMTs. These results suggest that the addition of In to the GaN channel improves the electron transport characteristics as well as suppressing current collapse that is related to the surface trap states.

Effect of Moisture on Cu(In,Ga)Se2 Solar Cell with (Ga,Al) Co-doped ZnO as Window Layer ((Ga,Al)이 도핑된 ZnO를 투명전극으로 가진 Cu(In,Ga)Se2 태양전지에 수분이 미치는 영향)

  • Yang, So Hyun;Bae, Jin A;Song, Yu Jin;Jeon, Chan Wook
    • Current Photovoltaic Research
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    • v.5 no.4
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    • pp.135-139
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    • 2017
  • We fabricated two different transparent conducting oxide thin films of ZnO doped with Ga ($Ga_2O_3$ 0.9 wt%) as well as Al ($Al_2O_3$ 2.1 wt%) (GAZO) and ZnO doped only with Al ($Al_2O_3$ 3 wt%) (AZO). It was investigated how it affects the moisture resistance of the transparent electrode. In addition, $Cu(In,Ga)Se_2$ thin film solar cells with two transparent oxides as front electrodes were fabricated, and the correlation between humidity resistance of transparent electrodes and device performance of solar cells was examined. When both transparent electrodes were exposed to high temperature distilled water, they showed a rapid increase in sheet resistance and a decrease in the fill factor of the solar cell. However, AZO showed a drastic decrease in efficiency at the beginning of exposure, while GAZO showed that the deterioration of efficiency occurred over a long period of time and that the long term moisture resistance of GAZO was better.

Analysis of Current-Voltage characteristics of AlGaN/GaN HEMTs with a Stair-Type Gate structure (계단형 게이트 구조를 이용한 AlGN/GaN HEMT의 전류-전압특성 분석)

  • Kim, Dong-Ho;Jung, Kang-Min;Kim, Tae-Geun
    • Journal of the Institute of Electronics Engineers of Korea SD
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    • v.47 no.6
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    • pp.1-6
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    • 2010
  • We present simulation results on DC characteristics of AlGaN/GaN HEMT having stair-type gate electrodes, in comparison with those of the conventional single gate AlGaN/GaN HEMTs and field-plate enhanced AlGaN/GaN HEMTs. In order to reduce the internal electric field near the gate electrode of conventional HEMT and thereby to increase their DC characteristics, we applied three-layered stacking electrode schemes to the standard AlGaN/GaN HEMT structure. As a result, we found that the internal electric field was decreased by 70% at the same drain bias condition and the transconductance (gm) was improved by 11.4% for the proposed stair-type gate AlGaN/GaN HEMT, compared with those of the conventional single gate and field-plate enhanced AlGaN/GaN HEMTs.