• Title/Summary/Keyword: Al-Co(Al-N)/AlN-Co thin films

Search Result 39, Processing Time 0.026 seconds

A Study on the Properties of AlN Films Deposited with Nitrogen Ion Beam Assisted RF Magnetron Sputtering (질소이온 빔 보조 마그네트론 스퍼터로 증착 된 AlN 박막의 물성연구)

  • Heo, Sung-Bo;Lee, Hak-Min;Jeong, Chul-Woo;Choi, Dae-Han;Lee, Byung-Hoon;Kim, Min-Gyu;You, Yong-Zoo;Kim, Daeil
    • Journal of the Korean Society for Heat Treatment
    • /
    • v.24 no.2
    • /
    • pp.77-81
    • /
    • 2011
  • Aluminum nitride (AlN) thin films were prepared by using nitrogen ion beam assisted reactive radio frequency (RF) magnetron sputtering on the glass substrates without intentional substrate heating. After deposition, the effect of nitrogen ion beam energy on the structural and optical properties of AlN films were investigated by x-ray diffraction (XRD), atomic force microscope (AFM) and UV-Vis. spectrophotometer, respectively. AlN films deposited with $N^+$ ion irradiation at 100 eV show the higher (002) peak intensity in XRD pattern than other films. It means that $N^+$ ion energy of 100 eV is the favorable condition for low temperature crystallization. AFM images also show that surface average roughness is increased from 1.5 to 9.6 nm with $N^+$ ion energy in this study. In an optical observation, AlN films which deposited by $N^+$ ion beam energy of 100 eV show the higher transmittance than that of the films prepared with the other $N^+$ ion beam conditions.

A study on the AlN crystal growth using its thin films grown on SiC substrate (SiC 기판상에 성장된 AlN 박막을 이용한 AlN 결정 성장에 관한 연구)

  • Yin, Gyong-Phil;Kang, Seung-Min
    • Journal of the Korean Crystal Growth and Crystal Technology
    • /
    • v.28 no.4
    • /
    • pp.170-174
    • /
    • 2018
  • AlN crystal is been developing in global site for many years and 1 inch diameter wafer was already developed but it is demanding the efforts for the better quality. On the other hand, also the 2-inch size is developing recently to reduce the unit cost for manufacturing and to use to fabrication of the UV LED chips. In this study, we tried to evaluate the possibility of bulk AlN crystals on his thin films by PVT method. The AlN thin film was grown on SiC single crystal 2" wafer by HVPE method. We successfully grew AlN bulk crystal of a thickness of 7 mm using its thin film of a thickness of $10{\mu}m$ as a seed crystal. The resultants of AlN crystals were identified by metallurgical microscope, optical stereographic microscope and DCXRD measurement.

Effect of ALD-Al2O3 Passivation Layer on the Corrosion Properties of CrAlSiN Coatings (ALD-Al2O3 보호층이 적용된 CrAlSiN 코팅막의 내부식성 특성에 관한 연구)

  • Wan, Zhixin;Lee, Woo-Jae;Jang, Kyung Su;Choi, Hyun-Jin;Kwon, Se Hun
    • Journal of Surface Science and Engineering
    • /
    • v.50 no.5
    • /
    • pp.339-344
    • /
    • 2017
  • Highly corrosion resistance performance of CrAlSiN coatings were obtained by applying ultrathin $Al_2O_3$ thin films using atomic layer deposition (ALD) method. CrAlSiN coatings were prepared on Cr adhesion layer/SUS304 substrates by a hybrid coating system of arc ion plating and high power impulse magnetron sputtering (HiPIMS) method. And, ultrathin $Al_2O_3$ passivation layer was deposited on the CrAlSiN/Cr adhesion layer/SUS304 sample to protect CrAlSiN coatings by encapsulating the whole surface defects of coating using ALD. Here, the high-angle annular dark-field scanning transmission electron microscopy (HAADF-STEM) and energy dispersive X-ray spectrometry (EDX) analysis revealed that the ALD $Al_2O_3$ thin films uniformly covered the inner and outer surface of CrAlSiN coatings. Also, the potentiodynamic and potentiostatic polarization test revealed that the corrosion protection properties of CrAlSiN coatings/Cr/SUS304 sample was greatly improved by ALD encapsulation with 50 nm-thick $Al_2O_3$ thin films, which implies that ALD-$Al_2O_3$ passivation layer can be used as an effect barrier layer of corrosion.

Magnetic anisotropy of Al/Tb-Fe-Co multilayer thin films (Al/Tb-Fe-Co 다층박막의 자기적 이방특성)

  • 김명한;문정탁;신웅식;임기조
    • Electrical & Electronic Materials
    • /
    • v.5 no.1
    • /
    • pp.8-13
    • /
    • 1992
  • 일련의 Al/Tb-Fe-Co 다층박막 시편이 DC마그네트론 스퍼터링에 의해 제조되었다. 이 박막들은 (xA/yB)n의 형태이고 여기서 x와 y는 각각 Al 및 Tb-Fe-Co 박막의 두께를 나타내고 n은 각 박막의 수를 나타낸다. 각 박막의 두께는 2~40nm이다. Al과 Tb-Fe-Co박막의 두께변화에 따른 다층박막의 자기적 성질이 vibration sample magnetometry(VSM)에 의해 측정되었다. 이들 다층박막은 동일한 스퍼터링조건에서 제조되고 수평 자기적 이방성 특성을 보이고 있는 단층 Tb-Fe-Co박막을 기준시편으로 하여 자기적 성질이 비교되었다. 다층박막 시스템에서는 현저한 계면 또는 박막두께의 효과가 발견되었으며 이들 효과에 의해 단층박막의 수평자기체가 다층박막에서는 강한 수직자기체로 변화되는 것을 알 수 있고, 또한 Al과 Tb-Fe-Co합금 경계구역에 스퍼터링에 따른 약 2nm두께의 dead layer가 존재함이 입증 되었다.

  • PDF

Electrical Properties of PVP Gate Insulation Film on Polyethersulfone(PES) and Glass Substrates (Polyethersulfone(PES) 및 유리 기판위에 제작된 PVP 게이트 절연막의 전기적 특성)

  • Shin, Ik-Sup;Gong, Su-Cheol;Lim, Hun-Seoung;Park, Hyung-Ho;Chang, Ho-Jung
    • Journal of the Microelectronics and Packaging Society
    • /
    • v.14 no.1
    • /
    • pp.27-31
    • /
    • 2007
  • The cpapcitors with MIM(metal-insulator-metal) structures using PVP gate insulation films were prepared for the application of flexible organic thin film transistors (OTFT). The co-polymer organic insulation films were synthesized by using PVP(poly-4-vinylphenol) as a solute and PGMEA(propylene glycol monomethyl ether acetate) as a solvent. The cross-linked PVP insulation films were also prepared by addition of poly(melamine-co-formaldehyde) as thermal hardener. The leakage current of the cross- linked PVP films was found to be about 1.3 nA on Al/PES(polyethersulfone) substrate, whereas, on ITO/ glass substrate was about 27.5 nA indicating improvement of the leakage current at Al/PES substrates. Also, the capacitances of all prepared samples on ITO/glass and Al/PES substrates w ere ranged from 1.0 to $1.2nF/cm^2$, showing very similar result with the calculated capacitance values.

  • PDF

Coating and Characterization of Al2O3-CoO Thin Films by the sol-gel Process (졸-겔법을 이용한 Al2O3-CoO계 박막의 제조와 특성에 관한 연구)

  • Shim, Moonsik;Lim, Yongmu
    • Journal of Korean Ophthalmic Optics Society
    • /
    • v.4 no.2
    • /
    • pp.123-128
    • /
    • 1999
  • This paper reports the preparation and characterization of colored coatings of $Al_2O_3$-CoO. Films of 25mol% CoO doped $Al_2O_3$, have been prepared on soda-lime-silica slide glasses by the sol-gel process from Al-alkoxide and Co-nitrate. The films have been characterized by a photospectroscopy and hardness tester. The color, spectral reflectance and spectral transmittance of the films was expressed in Lab color chart and on spectra plot. Microhardness of the films increased with increasing of the heating temperature. Transmittance and reflectance of the films decreased with increase of the heating temperature and coating times. The coating films showed various light-yellow, deep-yellow, greenish-yellow color as a function of the coating times and heating temperature.

  • PDF

Soft Magnetic Properties of CoFeAlO Thin Films for Ultrahigh Frequency Applications (고주파용 CoFeAlO계 박막의 자기적 특성)

  • Kim, Hyeon-Bin;Yun, Dae-Sik;Ha, N.-D.;Kim, Jong-O
    • Journal of the Korean Magnetics Society
    • /
    • v.15 no.1
    • /
    • pp.17-20
    • /
    • 2005
  • The influence of $O_2$ partial pressure on saturation mgnetization, coercivity, anisotropy field and effective permeability (over 1GHz) of as-deposited Co-Fe-Al-O thin films, which were fabricated by RF magnetron reactive sputtering method, were investigated. The $Co_{69.9}Fe_{20.5}A_{14.4O_{5.2}$ thin film fabricated at $O_2$ partial pressure of 4% exhibits the best magnetic softness with saturation magnetization 4${$pi}$Ms of 18.1 kG, coercivity of 0.82 Oe, anisotropy field ($H_k$) of Oe, and effective permeability (${\mu}_{eff}$) about 1,024 above 1 GHz. the electrical resistivity of Co-Fe-Al-O thin films were increased with increasing $O_2$ partial pressure, the electrical resistivity of $Co_{69.9}Fe_{20.5}A_{14.4O_{5.2}$ thin film with the best soft magnetic properties was 560.7 ${\mu}{\Omega}$am. Therefore, It is assumed that the good soft magnetic properties of $Co_{69.9}Fe_{20.5}A_{14.4O_{5.2}$ thin film results from high electrical resistivity and large anisotropy field.

Effectiveness of medical coating materials in decreasing friction between orthodontic brackets and archwires

  • Arici, Nursel;Akdeniz, Berat S.;Oz, Abdullah A.;Gencer, Yucel;Tarakci, Mehmet;Arici, Selim
    • The korean journal of orthodontics
    • /
    • v.51 no.4
    • /
    • pp.270-281
    • /
    • 2021
  • Objective: The aim of this in vitro study was to evaluate the changes in friction between orthodontic brackets and archwires coated with aluminum oxide (Al2O3), titanium nitride (TiN), or chromium nitride (CrN). In addition, the resistance of the coatings to intraoral conditions was evaluated. Methods: Stainless steel canine brackets, 0.016-inch round nickel-titanium archwires, and 0.019 × 0.025-inch stainless steel archwires were coated with Al2O3, TiN, and CrN using radio frequency magnetron sputtering. The coated materials were examined using scanning electron microscopy, an X-ray diffractometer, atomic force microscopy, and surface profilometry. In addition, the samples were subjected to thermal cycling and in vitro brushing tests, and the effects of the simulated intraoral conditions on the coating structure were evaluated. Results: Coating of the metal bracket as well as nickel-titanium archwire with Al2O3 reduced the coefficients of friction (CoFs) for the bracket-archwire combination (p < 0.01). When the bracket and stainless steel archwire were coated with Al2O3 and TiN, the CoFs were significantly lower (0.207 and 0.372, respectively) than that recorded when this bracket-archwire combination was left uncoated (0.552; p < 0.01). The friction, thermal, and brushing tests did not deteriorate the overall quality of the Al2O3 coatings; however, some small areas of peeling were evident for the TiN coatings, whereas comparatively larger areas of peeling were observed for the CrN coatings. Conclusions: Our findings suggest that the CoFs for metal bracket-archwire combinations used in orthodontic treatment can be decreased by coating with Al2O3 and TiN thin films.

Influence of Cu Composition on the Mechanical Properties and Microstructure of Ti-Al-Si-Cu-N thick films (Ti-Al-Si-Cu-N 후막의 Cu 조성에 따른 기계적 특성과 미세구조 변화에 관한 연구)

  • Yeon-Hak Lee;Sung-Bo Heo;In-Wook Park;Daeil Kim
    • Journal of Surface Science and Engineering
    • /
    • v.56 no.5
    • /
    • pp.335-340
    • /
    • 2023
  • Quinary component of 3㎛ thick Ti-Al-Si-Cu-N films were deposited onto WC-Co and Si wafer substrates by using an arc ion plating(AIP) system. In this study, the influence of copper(Cu) contents on the mechanical properties and microstructure of the films were investigated. The hardness of the films with 3.1 at.% Cu addition exhibited the hardness value of above 42 GPa due to the microstructural change as well as the solid-solution hardening. The instrumental analyses revealed that the deposited film with Cu content of 3.1 at.% was a nano-composites with nano-sized crystallites (5-7 nm in dia.) and a thin layer of amorphous Si3N4 phase.

A study on the growth behavior of AlN single crystal according to the change of N2 in HVPE propcess (HVPE(Hydride Vapor Phase Epitaxy) 법을 적용한 N2 양의 변화에 따른 AlN 단결정의 성장 거동에 관한 연구)

  • Kyung-Pil Yin;Seung-Min Kang
    • Journal of the Korean Crystal Growth and Crystal Technology
    • /
    • v.34 no.2
    • /
    • pp.61-65
    • /
    • 2024
  • HVPE (Hydride vapor phase epitaxy) is a method of manufacturing thin films or single crystals using gaseous raw materials. This is a method that applies the principles of chemical vapor deposition to grow a single crystal of a material with low meltability or high melting point, and is one of the methods that can obtain a gallium nitride (GaN) single crystal. Recently, much research has been conducted to grow aluminum nitride (AlN) single crystals using this method, but good results have not yet been obtained. In this study, we attempted to grow AlN single crystals using the HVPE method. Nitrogen was used as a carrier gas in the growth process, and the growth results according to changes in the amount of nitrogen (N2) were examined. Changes in growth crystals as the amount of nitrogen increased were confirmed. The shape of the grown AlN single crystal was observed using an optical microscope, and the rocking curve was measured using double crystal X-ray diffractometry (DCXRD) to confirm the creation of the AlN crystal. The crystallinity of single crystals was also investigated.