• Title/Summary/Keyword: Active layer thickness

검색결과 191건 처리시간 0.025초

능동층 구조에 따른 비정질산화물반도체 박막트랜지스터의 특성 (The Characteristics of Amorphous-Oxide-Semiconductor Thin-Film-Transistors According to the Active-Layer Structure)

  • 이호년
    • 한국산학기술학회논문지
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    • 제10권7호
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    • pp.1489-1496
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    • 2009
  • 비정질 인듐-갈륨-아연 산화물 박막트랜지스터를 모델링 하여서, 능동층의 구조, 두께, 평형상태의 전자밀도에 대응하는 박막트랜지스터의 특성을 연구하였다. 단일 능동층 박막트랜지스터의 경우, 능동층이 얇을 때 높은 전계효과이동도를 보였다. 문턱전압의 절대값은 능동층의 두께가 20 nm일 때 최저치를 보였으며, 문턱전압이하 기울기는 두께에 대한 의존성을 보이지 않았다. 복층구조 능동층의 경우, 하부의 능동층이 높은 평형상태 전자밀도를 가질 때보다 우수한 스위칭 특성을 보였다. 이 경우에도 능동층의 두께가 얇을 때에 높은 전계효과 이동도를 보였다. 높은 평형상태 전자밀도의 능동층의 두께를 증가시키면 문턱전압은 음의 방향으로 이동하였다. 문턱전압이하 기울기는 능동층의 구조에 대하여 특별한 의존성을 보이지 않았다. 이상과 같은 데이터는 산화물반도체 박막트랜지스터 능동층의 구조, 두께, 도핑비율을 최적화함에 효과적으로 사용될 것으로 기대된다.

활성층 두께 및 열처리 온도에 따른 비정질 인듐갈륨징크옥사이드 박막트랜지스터의 전기적 특성 변화 (Electrical Properties Depending on Active Layer Thickness and Annealing Temperature in Amorphous In-Ga-Zn-O Thin-film Transistors)

  • 백찬수;임기조;임동혁;김현후
    • 한국전기전자재료학회논문지
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    • 제25권7호
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    • pp.521-524
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    • 2012
  • We report on variations of electrical properties with different active layer thickness and post-annealing temperature in amorphous In-Ga-Zn-O (IGZO) thin-film transistors (TFTs). In particular, subthreshold swing (SS) of the IGZO-TFTs was improved as increasing the active layer thickness at an given post-annealing temperature, accompanying the negative shift in turn-off voltage. However, as increasing post-annealing temperature, only turn-off voltage was shifted negatively with almost constant SS value. The effect of the active layer thickness and post-annealing temperature on electrical properties, such as SS, field effect mobility and turn-off voltage in IGZO-TFTs has been explained in terms of the variation of trap density in IGZO channel layer and at gate dielectric/IGZO interface.

Characteristics of Polymer Solar Cells Depending on the Thickness of Active Layer

  • Lee, Dong-Gu;Noh, Seung-Uk;Suman, C.K.;Kim, Jun-Young;Lee, Seong-Hoon;Lee, Chang-Hee
    • 한국정보디스플레이학회:학술대회논문집
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    • 한국정보디스플레이학회 2009년도 9th International Meeting on Information Display
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    • pp.1204-1207
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    • 2009
  • We investigated the device performance of bulk heterojunction solar cells depending on the active layer thickness. For the systematic comparison, the polymer solar cells comprising RR-P3HT:PCBM (1:0.8 (wt%:wt%)) blend films with different thickness were characterized by impedance spectroscopy, and J-V measurement in dark and solar simulated illumination. The device with 120 nm thickness of active layer exhibited maximum power conversion efficiency of 3.5 % under AM 1.5 100mW/$cm^2$ illumination condition.

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위상 최적화를 이용한 능동 감쇠층의 설계 (Design of an Active Damping Layer Using Topology Optimization)

  • 김태우;김지환
    • 한국소음진동공학회:학술대회논문집
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    • 한국소음진동공학회 2003년도 추계학술대회논문집
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    • pp.660-664
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    • 2003
  • The optimal thickness distribution of an active damping layer is sought so that it satisfies a certain constraint on the dynamic performance of a system minimizing control efforts. To obtain a topologically optimized configuration, which includes size and shape optimization, thickness of the active damping layer is interpolated using linear functions. With the control energy as the objective function to be minimized, the state error energy is introduced as the dynamic performance criterion for the system and used lot a constraint. The optimal control gains are evaluated from LQR simultaneously as the optimization of the layer position proceeds. From numerical simulation, the topologically optimized distribution of the active damping layer shows the same dynamic performance and cost as the Idly covered counterpart, which is optimized only in terms of control gains, with less amount of the layer.

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Low Reverse Saturation Current Density of Amorphous Silicon Solar Cell Due to Reduced Thickness of Active Layer

  • Iftiquar, S M;Yi, Junsin
    • Journal of Electrical Engineering and Technology
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    • 제11권4호
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    • pp.939-942
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    • 2016
  • One of the most important characteristic curves of a solar cell is its current density-voltage (J-V) curve under AM1.5G insolation. Solar cell can be considered as a semiconductor diode, so a diode equivalent model was used to estimate its parameters from the J-V curve by numerical simulation. Active layer plays an important role in operation of a solar cell. We investigated the effect thicknesses and defect densities (Nd) of the active layer on the J-V curve. When the active layer thickness was varied (for Nd = 8×1017 cm-3) from 800 nm to 100 nm, the reverse saturation current density (Jo) changed from 3.56×10-5 A/cm2 to 9.62×10-11 A/cm2 and its ideality factor (n) changed from 5.28 to 2.02. For a reduced defect density (Nd = 4×1015 cm-3), the n remained within 1.45≤n≤1.92 for the same thickness range. A small increase in shunt resistance and almost no change in series resistance were observed in these cells. The low reverse saturation current density (Jo = 9.62×10-11 A/cm2) and diode ideality factor (n = 2.02 or 1.45) were observed for amorphous silicon based solar cell with 100 nm thick active layer.

Improving Device Efficiency for n-i-p Type Solar Cells with Various Optimized Active Layers

  • Iftiquar, Sk Md;Yi, Junsin
    • Transactions on Electrical and Electronic Materials
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    • 제18권2호
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    • pp.70-73
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    • 2017
  • We investigated n-i-p type single junction hydrogenated amorphous silicon oxide solar cells. These cells were without front surface texture or back reflector. Maximum power point efficiency of these cells showed that an optimized device structure is needed to get the best device output. This depends on the thickness and defect density ($N_d$) of the active layer. A typical 10% photovoltaic device conversion efficiency was obtained with a $N_d=8.86{\times}10^{15}cm^{-3}$ defect density and 630 nm active layer thickness. Our investigation suggests a correlation between defect density and active layer thickness to device efficiency. We found that amorphous silicon solar cell efficiency can be improved to well above 10%.

Photoacryl을 게이트 절연층으로 사용한 유기 박막 트랜지스터의 전기적 특성에 관한 연구 (A Study on the Electrical Characteristics of Organic Thin Film Transistor using Photoacryl as Gate Dielectric Layer)

  • 김윤명;표상우;심재훈;김영관;김정수
    • 한국전기전자재료학회:학술대회논문집
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    • 한국전기전자재료학회 2001년도 하계학술대회 논문집
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    • pp.247-250
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    • 2001
  • Organic semiconductors based on vacuum-deposited films of fused-ring polycyclic aromatic hydrocarbon have great potential to be utilized as an active layer for electronic and optoelectronic devices. We have fabricated organic thin film transistors(OTFTs) and discuss electrical characteristics of the devices. For the gate dielectric layer, OPTMER PC403 photoacryl(JSR Co.) was spin-coated and cured at 220$^{\circ}C$. Electrical characteristics of the device were investigated, where the photoacryl dielectric layer thickness and pentacene active layer thickness were about 0.6$\mu\textrm{m}$ and 800${\AA}$.

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Low-Frequency Noise 측정을 통한 Bottom-Gated ZnO TFT의 문턱전압 불안정성 연구 (Analysis of the Threshold Voltage Instability of Bottom-Gated ZnO TFTs with Low-Frequency Noise Measurements)

  • 정광석;김영수;박정규;양승동;김유미;윤호진;한인식;이희덕;이가원
    • 한국전기전자재료학회논문지
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    • 제23권7호
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    • pp.545-549
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    • 2010
  • Low-frequency noise (1/f noise) has been measured in order to analyze the Vth instability of ZnO TFTs having two different active layer thicknesses of 40 nm and 80 nm. Under electrical stress, it was found that the TFTs with the active layer thickness of 80 nm shows smaller threshold voltage shift (${\Delta}V_{th}$) than those with thickness of 40 nm. However the ${\Delta}V_{th}$ is completely relaxed after the removal of DC stress. In order to investigate the cause of this threshold voltage instability, we accomplished the 1/f noise measurement and found that ZnO TFTs exposed the mobility fluctuation properties, in which the noise level increases as the gate bias rises and the normalized drain current noise level($S_{ID}/{I_D}^2$) of the active layer of thickness 80 nm is smaller than that of active layer thickness of thickness 40 nm. This result means that the 80 nm thickness TFTs have a smaller density of traps. This result correlated with the physical characteristics analysis performmed using XRD, which indicated that the grain size increases when the active layer thickness is made thicker. Consequently, the number of preexisting traps in the device increases with decreasing thickness of the active layer and are related closely to the $V_{th}$ instability under electrical stress.

Effect of Channel Scaling on Zinc Oxide Thin-Film Transistor Prepared by Atomic Layer Deposition

  • Choi, Woon-Seop
    • Transactions on Electrical and Electronic Materials
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    • 제11권6호
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    • pp.253-256
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    • 2010
  • Different active layer thicknesses for zinc oxide (ZnO) bottom-contact thin-film transistors (TFTs) were fabricated with a poly-4-vinyphenol polymeric dielectric using injector type atomic layer deposition. The properties of the ZnO TFTs were influenced by the active thickness and width-to-length (W/L) ratio of the device. The threshold voltage of ZnO TFTs shifted positively as the active layer thickness decreased, while the subthreshold slope decreased. The W/L ratio of ZnO TFTs also affected the mobility and subthreshold slope. An optimized TFT structure exhibited an on-tooff current ratio of above 106 with solid saturation.

Micropower energy harvesting using high-efficiency indoor organic photovoltaics for self-powered sensor systems

  • Biswas, Swarup;Lee, Yongju;Kim, Hyeok
    • 센서학회지
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    • 제30권6호
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    • pp.364-368
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    • 2021
  • We developed a highly efficient organic photovoltaic (OPV) cell with a poly[4,8-bis(5-(2-ethylhexyl)thiophen-2-yl)benzo[1,2-b;4,5-b']dithiophene-2,6-diyl-alt-(4-(2-ethylhexyl)-3-fluorothieno[3,4-b]thiophene-)-2-carboxylate-2-6-diyl)]:[6,6]-phenyl-C71-butyric acid methyl ester active layer for harvesting lower-intensity indoor light energy to power various self-powered sensor systems that require power in the microwatt range. In order to achieve higher power conversion efficiency (PCE), we first optimized the thickness of the active layer of the OPV cell through optical simulations. Next, we fabricated an OPV cell with optimized active layer thickness. The device exhibited a PCE of 12.23%, open circuit voltage of 0.66 V, short-circuit current density of 97.7 ㎂/cm2, and fill factor of 60.53%. Furthermore, the device showed a maximum power density of 45 ㎼/cm2, which is suitable for powering a low-power (microwatt range) sensor system.