• Tribology and Lubricants
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• v.38 no.3
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• pp.101-108
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• 2022

The structure and properties of tetrahedral amorphous carbon (ta-C) coatings depend on the main process parameters and bending angles of the magnetic field filter used in the filtered cathodic vacuum arc (FCVA). During the process, it is possible to effectively control the plasma flux of carbon ions incident on the substrate by controlling the arc discharge current, thereby influencing the mechanical properties of the coating film. Furthermore, we can control the size and amount of large particles mixed during carbon film formation while conforming with the bending angle of the mechanical filter mounted on the FCVA; therefore, it also influences the mechanical properties. In this study, we consider tribological characteristics for filtered bending angles of 45° and 90° as a function of arc discharge currents of 60 and 100 A, respectively. Experiment results indicate that the frictional behavior of the ta-C coating film is independent of the bending angle of the filter. However, its sliding wear behavior significantly changes according to the bending angle of the FCVA filter, unlike the effect of the discharge current. Further, upon changing the bending angle from 45° to 90°, abrasive wear gets accelerated, thereby changing the size and mixing amount of macro particles inside the coating film.

• Asian Journal of Atmospheric Environment
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• v.6 no.2
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• pp.73-82
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• 2012

This study was aimed to thoroughly estimate the characteristics of indoor particulate matter (PM) collected on subway platforms by the cooperative approach of semi-bulk and single particle analyses. The size-resolved PM and its number concentration were measured on the platform in a heavily traveled subway station in Fukuoka, Japan. Particle Induced X-ray Emission (PIXE) and micro-PIXE techniques were applied to the chemical analyses of semi-bulk and single particle, respectively. There was the close resemblance of timely fluctuation between PM number concentration and train service on the third basement floor (B3F) platform compared to the second basement floor (B2F) and its maximum level was marked in rush hour. Higher number counts in large particles ($>1{\mu}m$) and lower number counts in fine particles ($<1{\mu}m$) were shown on the platform compared to an above ground. PM2.5 accounted for 58.2% and 38.2 % of TSP on B3F and on B2F, respectively. The elements that were ranked at high concentration in size-resolved semi-bulk PM were Fe, Si, Ca, S, and Na. The major elements tending to have more elevated levels on B3F than B2F were Fe (4.4 times), Ca (17.3 times), and Si (46.4 times). Although concentrations were very low, Cr ($11.9ng\;m^{-3}$ on B3F, $2.4ng\;m^{-3}$ on B2F), Mn ($3.4ng\;m^{-3}$ on B3F, $0.9ng\;m^{-3}$ on B2F), and Pb ($0.6ng\;m^{-3}$ on B3F, $1.6ng\;m^{-3}$ on B2F) were detected from PM2.5. Individual PM was nearly all enriched in Fe with Si and Ca. Classifying and source profiling of the individual particles by elemental maps and particle morphology were tried and particles were presumably divided into four groups (i.e., train/rail friction, train-rail sparking, ballast/abrasive, and cement).

• Composites Research
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• v.13 no.6
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• pp.1-8
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• 2000

The fabrication Process of $Al_2O_{3p}$/AC8A composites by pressureless infiltration technique and the effects of additive Mg content and volume fraction of particulate reinforcement on mechanical and wear properties were investigated. It was found that the bending strength decreased with increasing volume fraction of $Al_2O_{3p}$ particles. Whereas hardness increased with volume fraction of $Al_2O_{3p}$ particles. The decrement of strength in case of high volume fraction of $Al_2O_{3p}$ particles was attributed to high porosity level. In terms of additive Mg content, $Al_2O_{3p}$/AC8A composites containing around 5~7wt% of additive Mg indicated the highest strength, and hardness values increased with additive Mg contents. Wear resistance of AC8A alloy were improved by reinforcement of $Al_2O_{3p}$ particles especially at high sliding velocity. Wear property of $Al_2O_{3p}$/AC8A composites and AC8A alloy exhibited different aspects. $Al_2O_{3p}$/AC8A composites indicated more wear loss than AC8A alloy at slow velocity region. However a transition point of wear loss was found at middle velocity region which shows the minimum wear loss and wear loss at high velocity region exhibited almost same value as at slow velocity region, whereas wear loss of AC8A alloy almost linearly increased with sliding velocity. It was found that $Al_2O_{3p}$/AC8A composites containing $Al_2O_{3p}$ volume fraction of 20% exhibited abrasive wear surface regardless of sliding velocity and $Al_2O_{3p}$/AC8A composites containing $Al_2O_{3p}$ volume fraction of 40% showed slightly adhesive wear surface at low sliding velocity, and it progressed to severe wear as increasing the sliding velocity.

• International Journal of Precision Engineering and Manufacturing
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• v.6 no.3
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• pp.51-55
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• 2005

This study addresses the contamination sensitivity test of a typical fuel pump for an automotive vehicle. The objective of the study is to find the contamination sensitivity coefficient of a fuel pump on specific contaminant particle sizes so that an optimal fuel filter could be selected. To achieve the objective, the degradation of discharge flow rate of the fuel pump is measured under the experiments of various contaminants size ranges of ISO test dust up to $80\;{\mu}m$. The fundamental theory of contamination sensitivity is introduced and the contamination sensitivity coefficients are estimated using the experimental data. Maximum contamination sensitivity coefficient of $5\chi\;10^{-6}\;L/min{\cdot}Ea$ is found in the contaminant size range of $40\;{\mu}m\~50\;{\mu}m$. The magnified picture of the surface of vane disc reveals that the abrasive wear is the principal cause of discharge flow rate degradation. Hence, this study reveals that a high efficiency filter for contaminant particles especially in the size range of $30\;{\mu}m\~70\;{\mu}m$ especially should be used to maintain the service life of the fuel filter.

• Tribology and Lubricants
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• v.34 no.3
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• pp.115-122
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• 2018

Chemical mechanical polishing (CMP) is a hybrid processing method in which the surface of a wafer is planarized by chemical and mechanical material removal. Since mechanical material removal in CMP is caused by the rolling or sliding of abrasive particles, interfacial friction during processing greatly influences the CMP results. In this paper, the trend of tribology research on CMP process is discussed. First, various friction force monitoring methods are introduced, and three elements in the CMP tribo-system are defined based on the material removal mechanism of the CMP process. Tribological studies on the CMP process include studies of interfacial friction due to changes in consumables such as slurry and polishing pad, modeling of material removal rate using contact mechanics, and stick-slip friction and scratches. The real area of contact (RCA) between the polishing pad and wafer also has a significant influence on the polishing result in the CMP process, and many researchers have studied RCA control and prediction. Despite the fact that the CMP process is a hybrid process using chemical reactions and mechanical material removal, tribological studies to date have yet to clarify the effects of chemical reactions on interfacial friction. In addition, it is necessary to clarify the relationship between the interface friction phenomenon and physical surface defects in CMP, and the cause of their occurrence.

• Tribology and Lubricants
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• v.24 no.6
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• pp.297-301
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• 2008

In many dynamic seals such as lip seal and compression packings, it is well known that wear occur at the surface of heat treated steel shaft as results of the intervened wear particle. It is widely understood that the dominant wear mechanism related in sealing surfaces is abrasive wear. However, little analytical and experimental studies about this problems have been done until now. In this paper, a contact analysis is carried out using MARC to investigate the wear mechanism in contact seal applications considering elastomeric seal, a elastic perfect-plastic micro-spherical particle and steel surface. Deformed seal shapes, contact and von-Mises stress distributions for various particle sizes and interference are showed. The maximum von-Mises stress within steel shaft was exceeded its yield strength and plastic deformation occurred at steel surface. Therefore, the sealing surface can be also worn by sub-surface fatigue due to wear particles together with well known abrasion. The numerical methods and models used in this paper can be applied in design of dynamic sealing systems, and further intensive studies are required.

• Transactions of Materials Processing
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• v.21 no.5
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• pp.312-318
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• 2012

With an increasing trend toward miniaturization, electrical discharge machining(EDM) has been receiving a lot of attention as a suitable production technology for micro-parts, since it enables the machining of hard conductive materials with a high degree of repeatability and without alteration to the material. When a micro-hole is fabricated by EDM, however, the diameter of the inlet hole is larger than that of the outlet region due to the additional discharge effect caused by the eroded particles. In this paper, a shot blasting surface treatment, in which an abrasive material is accelerated through a pressurized nozzle and directed at the surface of a part, is suggested as an effective method to reduce the tapered shape of EDM micro-hole. In addition, the influence of process parameters such as spark-on time and electrode diameter on the machining performance was investigated. It is shown quantitatively that the difference in diameter between the inlet and outlet holes decreases with the shot blasting treatment and with decreasing spark-on time.

• Proceedings of the Korean Society of Precision Engineering Conference
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• 2006.05a
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• pp.497-498
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• 2006

Tribological properties of a Magneto-Rheological(MR) fluid in a polishing process are studied. For this polishing process, abrasive wear model is proposed as a function of shear force, normal force and actual mean velocity of MR particles at workpiece surface. Experimental conditions are changed by varying the gap distance between workpiece and tool and the rotational speed of tool. From the experimental results, a modified Stribeck curve is obtained, and the friction coefficient turns out to have linear relationship with a modified Sommerfeld number. The validity of the wear model is supported by additional experiments performed for measuring material removal rates.

• Journal of the Korean Institute of Electrical and Electronic Material Engineers
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• v.16 no.12S
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• pp.1181-1186
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• 2003

Chemical Mechanical Polishing (CMP) is an essential dielectric planarization in multilayer microelectronic device fabrication. In the CMP process, it is necessary to minimize the extent of surface defect formation while maintaining good planarity and optimal material removal rates. The polishing mechanism of W-CMP process has been reported as the repeated process of passive layer formation by oxidizer and abrasion action by slurry abrasives. Thus, it is important to understand the effect of oxidizer on W passivation layer, in order to obtain higher removal rate (RR) and very low non-uniformity (NU %) during W-CMP process. In this paper, we compared the effects of oxidizer or W-CMP process with three different kind of oxidizers with 5 wt% hydrogen peroxide such as Fe(NO$_3$)$_3$, H$_2$O$_2$, and KIO$_3$. The difference in removal rate and roughness of W in stable and unstable slurries are believed to caused by modification in the mechanical behavior of Al$_2$O$_3$ particles in presence of surfactant stabilizing the slurry.

• Journal of the Korean Institute of Electrical and Electronic Material Engineers
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• v.17 no.2
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• pp.138-143
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• 2004

CMP (Chemical Mechanical Polishing) technology for global planarization of multilevel interconnection structure has been widely studied for the next generation devices. Among the consumables for CMP process, especially, slurry and their chemical compositions play a very important role in the removal rates and within-wafer non-uniformity (WIWNU) for global planarization ability of CMP process. However, CMP slurries contain abrasive particles exceeding 1 ${\mu}{\textrm}{m}$ size, which can cause micro-scratch on the wafer surface after CMP process. Such a large size particle in these slurries may be caused by particle agglomeration in slurry supply-line. In this work, to investigate the effects of agglomeration on the performance of oxide CMP slurry, we have studied an aging effect of silica slurry as a function of particle size distribution and aging time during one month. We Prepared and compared the self-developed silica slurry by adding of alumina powders. Also, we have investigated the oxide CMP characteristics. As an experimental result, we could be obtained the relatively stable slurry characteristics comparable to aging effect of original silica slurry. Consequently, we can expect the saving of high-cost slurry.