• The Korean Journal of Ceramics
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• 제5권4호
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• pp.404-408
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• 1999

Gallium doped zinc oxide(GZO) films were deposited on soda-lime glass substrates without substrate heating $(T_s<50^{\circ}C$) by dc planar magnetron sputtering using GZO ceramic oxide targe with different inert gas (Ar, or Ne). For the GZO films deposited under different total gas pressure $(P_{tot})$, structural and electrical properties were investigated by XRD and Hall effect measurements. Crystallinity of GZO films deposited using Ar was degraded with increase in $(P_{tot})$, suggesting that it was heavily affected by kinetic energy of sputtered Zn particles$(PA_{zn})$ arriving at substrate surface. Whereas, crystallinity of GZO films deposited at lower Ptot than 3.0 Pa using Ne gas was degraded with decrease in $(P_{tot})$. This degradation was considered to be result of film damage caused by the bombardment of high-energy neutrals ($Ne^{\circ}$). On the basis of a hard sphere collision processes, the average final energy of particles (sputtered Zn, $Ar^{\circ}$and $Ne^{\circ}$)arriving at substrate surface were estimated.

• 한국전기전자재료학회:학술대회논문집
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• 한국전기전자재료학회 2010년도 하계학술대회 논문집
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• pp.270-270
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• 2010

OLED device is one of the most attractive and alternative display components, which stems primarily from the self-emission, large intrinsic viewing angle, and fast switching speed. However, because of its relatively short history of development, much remains to be studied in terms of its basic device physics, manufacturing processes, and reliability etc. Especially among several issues, it should be noted that the device characteristics are very sensitive to the surface properties of transparent conducting oxide (TCO) electrode materials. In this study, we have investigated the performance of OLED devices as a function of sheet resistance and surface roughness of TCO thin films. For this purpose, ITO and IZO thin films were deposited by r. f. magnetron sputtering under various ambient gases (Ar, Ar+O2 and Ar+H2, respectively). The crystal structure and surface morphology were examined by using XRD and FESEM. Also, electrical and optical properties were Investigated.

• 한국컴퓨터그래픽스학회논문지
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• 제13권2호
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• pp.47-54
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• 2007

본 논문은 두 대의 카메라로부터 들어온 영상을 보여주는 see-through 장치의 사용 환경하에서 일반적인 사용자도 쉽고 편리하게 컴퓨터 시스템 또는 여러 프로세스들을 제어할 수 있는 사용자 인터페이스를 제안한다. 이를 위해 AR기술을 접목하여 영상이 보이는 화면에 가상의 버튼들을 합성하였으며, 화면상에 보이는 손의 위치를 추적하여 손가락에 의한 버튼의 선택 유무를 판단하고 각 상황에 따른 버튼의 색상 변경을 통해 결과를 나타내었다. 사용자는 단순히 화면을 보며 공중에서 손가락을 움직여 버튼을 선택함으로써 관련 작업을 수행 할 수 있다.

• 한국CDE학회논문집
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• 제17권3호
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• pp.175-187
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• 2012

The BIM simulation systems involve inefficient aspects in delivering real world circumstances because they are operated in the virtual reality (VR) environment without representing the job-site operations. Differently from VR, augmented reality (AR) enhances the reflection of job-site reality to virtual environment. AR influences architecture, design and construction. This reality replaces or merges with the normal physical world and it can be tailored to enhance comprehension for specific design and construction activities. The main objective of this research is to develop an AR-based decision support system for free-form buildings design/construction/maintenance processes. Haewoojae, a free-form housing building built in Seoul area is identified as a model building to generate the system. Seventeen engineers, who are masters or doctorate graduate students at the S university in Seoul and have been working in the Korean construction industry for more than 10 years are invited to validate the system's appropriateness and usability in comparison with its development objectives.

• 한국진공학회:학술대회논문집
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• 한국진공학회 2011년도 제40회 동계학술대회 초록집
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• pp.284-284
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• 2011

Recently, the increasing degree of device integration in the fabrication of Si semiconductor devices, etching processes of nano-scale materials and high aspect-ratio (HAR) structures become more important. Due to this reason, etch selectivity control during etching of HAR contact holes and trenches is very important. In this study, The etch selectivity and etch rate of TEOS oxide layer using ACL (amorphous carbon layer) mask are investigated various process parameters in CH2F2/C4F8/O2/Ar plasma during etching TEOS oxide layer using ArF/BARC/SiOx/ACL multilevel resist (MLR) structures. The deformation and etch characteristics of TEOS oxide layer using ACL hard mask was investigated in a dual-frequency superimposed capacitively coupled plasma (DFS-CCP) etcher by different fHF/ fLF combinations by varying the CH2F2/ C4F8 gas flow ratio plasmas. The etch characteristics were measured by on scanning electron microscopy (SEM) And X-ray photoelectron spectroscopy (XPS) analyses and Fourier transform infrared spectroscopy (FT-IR). A process window for very high selective etching of TEOS oxide using ACL mask could be determined by controlling the process parameters and in turn degree of polymerization. Mechanisms for high etch selectivity will discussed in detail.

• KSII Transactions on Internet and Information Systems (TIIS)
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• 제16권2호
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• pp.467-479
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• 2022

Working memory (WM), which plays a vital role in daily activities, is a memory system that temporarily stores and processes information when people are engaged in complex cognitive activities. The influence of music on WM has been widely studied. In this work, we conducted a series of n-back memory experiments with different task difficulties and multiple trials on 14 subjects under the condition of no music and Alpha wave leading music. The analysis of behavioral data show that the change of music condition has significant effect on the accuracy and time of memory reaction (p<0.01), both of which are improved after the stimulation of Alpha wave music. Behavioral results also suggest that short-term training has no significant impact on working memory. In the further analysis of electrophysiology (EEG) data recorded in the experiment, auto-regressive (AR) model is employed to extract features, after which an average classification accuracy of 82.9% is achieved with support vector machine (SVM) classifier in distinguishing between before and after WM enhancement. The above findings indicate that Alpha wave leading music can improve WM, and the combination of AR model and SVM classifier is effective in detecting the brain activity changes resulting from music stimulation.

• Journal of the Korean Statistical Society
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• 제23권2호
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• pp.483-498
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• 1994

Suppose that a stationary process ${X_t}$ has a marginal distribution whose support consists of sufficiently large integers. We are concerned with some analogous law of large numbers for such distribution function F. In particular, we determine a weak law of large numbers for maximum queueing length in $M/M\infty$ system. We also present a limiting behavior for the maxima based on AR(1) process with binomial thining and poisson marginals (INAR(1)) introduced by E. Mckenzie. It turns out that the result of AR(1) process is the same as that of $M/M/\infty$ queueing process in limit when we observe the queues at regularly spaced intervals of time.

• 응용통계연구
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• 제23권4호
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• pp.683-692
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• 2010

본 논문에서는 연속형-GARCH 시계열 자료인 금융 시계열 자료에 대해서 클리핑(clipping)을 통해 얻은 이항(binary) 범주형 시계열을 분석하고 응용하는 방안에 대해 연구하고 있다. 모수추정 방법을 소개하고 있으며 이를 이용하여 이분산 시계열과 연관된 확률을 추정하는 방법을 예시하였다.

• 한국결정성장학회지
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• 제27권2호
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• pp.75-79
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• 2017

고밀도 플라즈마 식각 및 lift-off 두 가지 공정으로 honeycomb 형상의 Ag-grid 투명전극층을 제작하였고 제조 공법에 따른 광학적 및 전기적 특성을 비교하였다. 플라즈마 식각 조건 선정을 위하여 Ag 박막의 $10CF_4/5Ar$ 유도결합 플라즈마 식각특성을 조사하였다. 비교적 낮은 ICP source power 또는 rf chuck power 영역에서는 power 증가에 따라 Ag 식각속도가 증가하였고, 높은 power 조건에서는 $Ar^+$ 이온 에너지 감소 또는 $Ar^+$ 이온에 의한 F radical 제거로 인해 식각속도가 감소하였다. $10CF_4/5Ar$ 플라즈마 식각 공정에 의해 제작된 Ag-grid 전극층은 lift-off 공정으로 제작된 전극층에 비해 grid 패턴 형상의 왜곡이나 단절이 없는 더 우수한 grid 패턴 전사 효율과 가시광선 영역에서 더 높은 83.3 %(pixel 크기 $30{\mu}m$/선폭 $5{\mu}m$)와 71 %(pixel 크기 $26{\mu}m$/선폭 $8{\mu}m$)의 광투과율을 각각 나타내었다. 반면에 lift-off 공정으로 제작된 Ag-grid 전극층은 플라즈마 식각 공정 시편보다 더 우수한 $2.163{\Omega}/{\square}$(pixel 크기 $26{\mu}m$/선폭 $8{\mu}m$)과 $4.932{\Omega}/{\square}$(pixel 크기 $30{\mu}m$/선폭 $5{\mu}m$)의 면저항 특성을 나타내었다.

• 대한수학회지
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• 제33권4호
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• pp.823-855
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• 1996

We study Dirichlet forms and the associated diffusion processes for the Gibbs measures related to the quantum unbounded spin systems (lattice boson systems) interacting via superstable and regular potentials. This work is a continuation of the author's previous study on the classical systems [LPY] to the quantum cases. In [LPY], we constructed Dirichlet forms and the associated diffusion processes for the Gibbs measures of classical unbounded spin systems. Furthermore, we also showed the essential self-adjointness of the Dirichlet operator and the log-Sobolev inequality for any Gibbs measure under appropriate conditions on the potentials. In this atudy we try to extend the results of the classical systems to the quantum cases. Because of some technical difficulties, we are only able to construct a Dirichlet form and the associated diffusion process for any Gibbs measure of the quantum systems. We utilize the general scheme of the previous work on the theory in infinite dimensional spaces [AH-K1-2, AKR, AR1-2, Kus, MR, Ro, Sch] and the ideas we employed in our study of the calssical systems ]LPY].