• JSTS:Journal of Semiconductor Technology and Science
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• 제3권1호
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• pp.21-26
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• 2003

4H-SiC Schottky rectifiers were exposed to pure Ar discharges in a planar coil Inductively Coupled Plasma system, as a function of source power, of chuck power and process pressure. The reverse breakdown voltage ($V_B$) decreased as a result of plasma exposure due to the creation of surface defects associated with the ion bombardment. The magnitude of the decrease was a function of both ion flux and ion energy. The forward turn-on voltage ($V_F$), on-state resistance ($R_{ON}$) and diode ideality factor (n) all increased after plasma exposure. The changes in all of the rectifier parameters were minimized at low power, high pressure plasma conditions.

• 전자공학회논문지D
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• 제36D권7호
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• pp.66-79
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• 1999

본 논문에서는 얕은 양자 우물(extremely shaliow quantum wells, ESQWs)을 사용한 광 쌍안정 대칭형 자기 전광 소자(symmetric self elctrooptic effect device, S-SEED)의 성능에 있어서 높은 입사 광전력의 영향을 조사한다 . 다음과 같은 네 가지 ESQWs S-SEED 구조를 고려하였다. 무 반사 입힘(AR-coated) ESQWs S-SEED, back-to-back ARcoated ESQWs S-SEED, 비대칭 공명구조(AFP) ESQWs S-SEED, back-toback AFP ESQWs S-SEED. 입사 광 전력이 증가함에 따라 On/Off 대조비, On/Off 반사율 차이와 같은 소자성능은 ohmic heating 과 여기자 포화(exciton saturation)의 영향으로 심각하지 않게 저하된다. 한편 소자의 스위칭 속도는 지속적으로 증가하다가 특정 입사 광 전력 하에서 점차 감소하기 시작한다. 직렬 광 연결 시스템(cascading optical interconnection system)에 있어서 소자의 최대 속도 스위칭 동작을 위한 최대 입사 광 전력의 최적화를 바탕으로 0 V와 5 V의 외부 전압 조건에서 양자우물의 수를 변화시키면서 $5{\times}5{\mu}m^2$의 mesa 영역에 대하여 네 가지 ESQWs S-SEED의 시스템 비트 레이트를 모의 실험하고 그 결과를 분석하였다.

• 한국전기전자재료학회:학술대회논문집
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• 한국전기전자재료학회 2009년도 추계학술대회 논문집
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• pp.192-192
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• 2009

AZO films were prepared by $Ar:H_2$ gas RF magnetron sputtering system with a AZO (2wt% $Al_2O_3$) ceramic target at a low temperature of $100^{\circ}C$. To investigate the influence of $H_2$ flow ratio on the properties of AZO films, $H_2$ flow ratio was changed from 0.5% to 2%. As a result, the AZO films deposited with 1% $H_2$ addition showed electrical properties with a resistivity of $5.06{\times}10^{-3}{\Omega}cm$. The spectrophotometer-measurements showed the transmittance of 86.5% was obtained by the film deposited with $H_2$ flow ratio of 1% in the range of 940nm for GaAs/GaAlAs LED.

• 한국전기전자재료학회:학술대회논문집
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• 한국전기전자재료학회 2001년도 춘계학술대회 논문집 반도체재료
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• pp.12-16
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• 2001

We investigated the etching characteristics of $YMnO_3$ thin films in high-density plasma etching system. In this study. $YMnO_3$ thin films were etched with $CF_{4}/Ar$ gas chemistries in inductively coupled plasma (ICP). Etch rates of $YMnO_3$ were measured according to gas mixing ratios. The maximum etch rate of $YMnO_3$ is 18 nm/min at $CF_{4}/(CF_{4}+Ar)$ of 20%. In optical emission spectroscopy (OES) analysis, F radical and Ar* ions in plasma at various gas chemistries decreased with increasing $CF_4$ content. Chemical states of $YMnO_3$ films exposed in plasma were investigated with x-ray photoelectron spectroscopy (XPS) and secondary ion mass spectrometry (SIMS). There is a chemical reaction between metal (Y, Mn) and F and metal-fluorides were removed effectively by Ar ion sputtering. $YF_x$, $MnF_x$ such as YF, $YF_2$, $YF_3$ and $MnF_3$ Were detected using SIMS analysis. The etch slope is about $65^{\circ}C$ and free of residues.

• 한국전기전자재료학회논문지
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• 제21권8호
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• pp.727-732
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• 2008

In this work, the etch characteristics of $VO_2$ thin films were investigated using inductively coupled plasma (ICP) of $Cl_2/Ar$ gas mixtures. To analyze the plasma characteristics, a quadrupole mass spectrometer (QMS), an optical emission spectroscopy (OES), and a Langmuir probe measuring system were used. The surface reaction of the $VO_2$ thin films was investigated using X-ray photoelectron spectroscopy (XPS). It was found that an increase in Ar fraction in the $Cl_2/Ar$ plasma at fixed gas pressure, input power, and bias power resulted in increasing $VO_2$ etch rate which reached a maximum value of 87.6 nm/min at 70-75 % Ar. It was confirmed that the etch rate of the $VO_2$ films was mainly controlled by the ion flux. On the basis of measuring results, we will discuss possible etching mechanism of $VO_2$ film in the $Cl_2/Ar$ plasma.

• 마이크로전자및패키징학회지
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• 제14권3호
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• pp.15-20
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• 2007

플라스틱 기판에 적용이 가능한 최대 공정온도 $270^{\circ}C$ 이하에서 ZnO-TFT 소자를 제작하였다. ZnO-TFT 소자는 bottom gate 구조로 제작되었으며, ICP-CVD로 형성된 $SiO_2$ 산화물 게이트 공정을 제외하고는 모든 박막증착 공정은 RF-magnetron sputtering process를 이용하였다. ZnO 박막은 Ar과 $O_2$ gas 유량의 비율에 따라 여러 가지 조건에서 RF-magnetron sputtering 시스템을 이용하여 상온에서 증착하였다. Ar과 $O_2$ gas의 비율에 따라 제작된 TFT 소자는 모두 enhancement 모드의 소자특성을 나타내었고, 또한 가시광선영역에 있어 80% 이상의 높은 투과율을 보였다. ZnO 증착시 순수 Ar을 사용하여 제작된 ZnO-TFT의 경우에, $1.2\;cm^2/Vs$의 field effect mobility, 8.5 V의 threshold voltage, 그리고 $5{\times}10^5$의 높은 on/off ratio, 1.86 V/decade의 swing voltage로 가장 우수한 전기적 특성을 보였다.

• 한국광학회지
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• 제4권1호
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• pp.9-14
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• 1993

Amplitude filter와 phase filter가 결합된 CFAP(Combined Filter of Amplitude and Phase)의 결상 특성을 조사하기 위해 Bessel beam을 도입하였다. 이 논문에서는 무수차계와 수차를 포함하는 광학계에 대한 PSF와 encircled energy(E), transmission ratio(TR), gain(G)을 Bessel beam의 node수에 따라 계산하였다. 이 결과 Bessel beam은 amplitude filter와 다른 PSF 특성을 보였으며, 또한 구면수차가 포함된 경우 compensating effect가 크게 나타났다. 특히 Bessel beam의 central spot의 size가 Airy disk 반경보다 적게 나타나므로, 고집적 반도체 소자 제작에 이용가능하리라 생각된다.

• Applied Science and Convergence Technology
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• 제25권6호
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• pp.145-148
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• 2016

This paper, Al-doped ZnO(AZO) thin films for application as transparent conducting oxide films were deposited on the Corning glass substrate by using RF magnetron sputtering system. The effects of various Argon gas flow rates on optical and electrical characteristics of AZO films were investigate sputtering method. The Carrier Concentration is enhanced as Ar gas rate increases, and also the oxygen vacancy concentration. The figure of merit obtained in this study means that AZO films which deposited Ar gas rate of 75 sccm have the highest Carrier concentration and Hall mobility, which have the highest photoelectrical performance that it could be used as transparent electrodes.

• 천문학회지
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• 제32권2호
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• pp.127-136
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• 1999

In this study we present the study of solar active regions based on BOAO vector magnetograms and H$\alpha$ filtergrams. With the new calibration method we analyzed BOAO vector magnetograms taken from the SOFT observational system to compare with those of other observing systems. In this study it has been demonstrated that (1) our longitudinal magnetogram matches very well the corresponding Mitaka's magnetogram to the extent that the maximum correlation yields r=0.962 between our re-scaled longitudinal magnetogram and the Mitaka's magnetogram; (2) according to a comparison of our magnetograms of AR 8422 with those taken at Mitaka solar observatory their longitudinal fields are very similar to each other while transverse fields are a little different possibly due to large noise level; (3) main features seen by our longitudinal magnetograms of AR 8422 and AR 8419 and the corresponding Kitt Peak magnetograms are very similar to each other; (4) time series of our vector magnetograms and H-alpha observations of AR 8419 during its flaring (M3.1/1B) activity show that the filament eruption followed the sheared inversion line of the quadrupolar configuration of sunspots, indicating that the flare should be associated with the quadrupolar field configuration and its interaction with new filament eruption. Finally, it may be concluded that the Solar Flare Telescope at BOAO works normally and it is ready to do numerous observational and theoretical works associated with solar activities such as flares.

• 한국광학회:학술대회논문집
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• 한국광학회 1990년도 제5회 파동 및 레이저 학술발표회 5th Conference on Waves and lasers 논문집 - 한국광학회
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• pp.162-166
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• 1990

Photoinduced anisotropy (PIA) in amorphous As2S3 (a-As2S3 ) thin film, deposited by vacuum evaporation, is investigated. PIA is induced by linearly polarized Ar+ laser beam (λ=514.5nm) and probed by weak Ar+ laser (λ=514.5nm) and He-Ne laser (λ=632.8nm) beam through the crossed analyzer. Keeping pump beam intensity constantly, rotation of pump beam polarization direction induces reorientation phenomina of anisotropic axis. Introducing directional factor into simplified 3-level system, which is used to analyze photodarkening phenomina, an analytical expression of PIA is derived. Temporal behavior of PIAand its reorientation phenomina are investigated andcompared with theory. In the experiment pump beam intensity is 100mW/$\textrm{cm}^2$ and thickness of a-As2S3 thin film is 3${\mu}{\textrm}{m}$. In those condition, time constant of photoinduced anisotropy obtained by method of least square curve fitting is 4.0$\times$10-2sec-1. The time constant of PIA we obtained is larger than that of photodarkening, 2.8$\times$10-2sec-1.