• Title/Summary/Keyword: 355nm UV laser

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A Study on Laser Micro-Patterning using UV Curable Polymer (광경화성 폴리머를 이용한 레이저 미세패터닝의 기초연구)

  • 김정민;신보성;김재구;장원석;양성빈
    • Proceedings of the Korean Society of Precision Engineering Conference
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    • 2003.06a
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    • pp.612-615
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    • 2003
  • Maskless laser patterning process is developed using 3rd harmonic Diode Pumped Solid State Laser with near visible wavelength of 355 nm. Photo-sensitive curable polymer is irradiated by UV laser and developed using polymer solvent to obtain quasi-3D patterns. We performed basic experiments for the various process conditions such as laser power, writing speed, laser focus, and polymer optical property to gain the optimal conditions. Experimentally, the patterns of trapezoidal shape were manufactured into dimension of 8${\mu}{\textrm}{m}$ width and 5.4${\mu}{\textrm}{m}$ height. This process could be applied to fabricate a single mode waveguide without expensive mask projection method.

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UV Emission Characterization of ZnO Thin Films Depending on the Variation of Oxygen Pressure (분위기 산소압변화에 따른 ZnO박막의 UV발광 특성분석)

  • Baek, Sang-Hyeok;Lee, Sang-Yeol;Jin, Beom-Jun;Im, Seong-Il
    • The Transactions of the Korean Institute of Electrical Engineers C
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    • v.49 no.2
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    • pp.103-106
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    • 2000
  • ZnO is a wide-bandgap II-IV semiconductor and has a variety of potnetial applications. ZnO exhibits good piezoelectric, photoelectric and optical properties, and is a good candidate for an electroluminescence device. ZnO films have been deposited on (001) sapphire by PLD technique. Nd:YAG pulsed laser was operated at a wavelength of $\lambda=355nm$. The ZnO films were deposited at oxygen pressures from base to 500 mTorr. The substrate temperatures was increased from $200^{\circ}C\; to\;700^{\circ}C$ films showed strong UV emission by increasing the partial oxygen pressure. We have investigated the relationship between partial oxygen pressure and the intensity of UV emission.

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UV emission characterization of ZnO films depending on the variation of substrata temperature (기판온도에 변화에 따른 ZnO 박막의 UV 발광특성 연구)

  • Bae, Sang-Hyuck;Lee, Sang-Yeol
    • Proceedings of the KIEE Conference
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    • 1999.11d
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    • pp.888-890
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    • 1999
  • ZnO thin films on (001) sapphire substrates have been deposited by pulsed laser deposition using a Nd:YAG laser with the wavelength of 355 nm at an oxygen pressure of 350 mTorr. In order to investigate the effect of the substrate temperature on the properties of ZnO thin films, the experiment has been performed at various substrate temperatures in the range of $200^{\circ}C$ to $700^{\circ}C$. According to XRD, (002) textured ZnO films of high crystalline quality have been obtained by pulsed laser deposition technique. However, the intensity of UV emission is mostly depending on the stoichiometry of ZnO films.

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The study of UV emission in ZnO thin films fabricated by Pulsed Laser Deposition (레이저 증착법에 의해 제작된 ZnO 박막의 UV 발광특성연구)

  • 배상혁;이상렬;진범준;우현수;임성일
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 1999.11a
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    • pp.95-98
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    • 1999
  • ZnO thin films on (001) sapphire substrates have been deposited by pulsed laser deposition technique using a Nd:YAG laser with the wavelength of 355 nm. In order to investigate the effect of the deposition conditions on the properties of ZnO thin films at an oxygen pressure of 350 mTorr, the experiment has been Performed at various substrate temperatures in the range of 20$0^{\circ}C$ to $700^{\circ}C$. According to XRD, (002) textured ZnO films of high crystalline quality have been obtained and the intensity of UV emission was the highest at 40$0^{\circ}C$ substrate temperature.

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Basic Experimental Investigations to UV Laser Micro-Machining of Nano-Porous Alumina Ceramic Material (나노 다공 구조를 가진 알루미나 재료의 UV 레이저 미세가공에 관한 실험적 기초 연구)

  • Shin, Bo-Sung;Lee, Jung-Han
    • Journal of the Korean Society of Manufacturing Process Engineers
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    • v.11 no.1
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    • pp.62-67
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    • 2012
  • Recently UV laser is widely used to process micro parts using various materials such as polymers, metals and ceramics because it has a very high intensity at the focused spot area. It is generally known that there are still some difficulties for alumina($Al_2O_3$) ceramics to directly make micro patterns like holes and lines on the surface of working material using 355nm UV laser because the alumina has a very low absorption coefficient at that wavelength. But nowadays new alumna with nano-porous holes is developed and applied to advanced micro functional parts of IT, BT and BT industries. In this paper, we are going to show the mechanism of photo-thermal ablation for nano-porous ceramics. Inside hole there is a lot of multiple reflections along the depth of hole. Experimentally we can find the micro hole drilling and micro grooving on the surface of nano-porous alumina.

A Study on UV Laser Ablation for Micromachining of PCB Type Substrate (다층 PCB 기판의 미세 가공을 위한 UV레이저 어블레이션에 관한 연구)

  • 장원석;김재구;윤경구;신보성;최두선
    • Proceedings of the Korean Society of Precision Engineering Conference
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    • 1997.10a
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    • pp.887-890
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    • 1997
  • Recently micromachining using DPSSL(Diode Pumped Solid State Laser) with 3rd harmonic wavelength is actively studied in laser machining area. Micromachining using DPSSL have outstanding advantages as UV source comparing with excimer laser in various aspect such a maintenance cost, maskless machining, high repetition rate and so on. In this study micro-drilling of PCB type substrate which consists of Cu-PI-Cu layer was performed using DPSS Nd:YAG laser(355nm, wavelength) in vector scanning method. Experimental and numerical method(Matlab simulation, FEM) are used to optimize process parameter and control machining depth. The man mechanism of this process is laser ablation. It is known that there is large gap between energy threshold of copper and that of PI. Matlab simulation considering energy threshold of material is performed to effect of duplication of pulse and FEM thermal analysis is used to predict the ablation depth of copper. This study could be widely used in various laser micromachining including via hole microdrilling of PCB, and micromachining of semiconductor components, medical parts and printer nozzle and so on.

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Emission Properties of ZnO Grown by PLD (PLD로 증착한 ZnO 박막의 발광 특성 분석)

  • Bae, Sang-Hyuck;Lee, Sang-Yeol
    • Proceedings of the KIEE Conference
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    • 2000.11c
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    • pp.422-424
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    • 2000
  • ZnO thin films for light emission device have been deposited on sapphire and silicon substrates by pulsed laser deposition technique(PLD). A Nd:YAG laser was used with the wavelength of 355 nm. In order to investigate the emission properties of ZnO thin films, PL measurements with an Ar ion laser as a light source using an excitation wavelength of 351 nm and a power of 100 mW are used. All spectra were taken at room temperature by using a grating spectrometer and a photomultiplier detector. ZnO exhibited PL bands centered around 390, 510 and 640 nm, labeled near ultra-violet (UV), green and orange bands. Structural properties of ZnO thin films are analized with X-ray diffraction (XRD).

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A Study on the Characteristics of the Functional Groups of the Alkanethiol Molecules in UV Laser Photochemical Patterning and Wet Etching Process (UV Laser를 이용한 광화학적 패터닝과 습식에칭에 따른 알칸티올 분자 작용기의 특성 연구)

  • Huh, Kab-Soo;Chang, Won-Seok
    • Journal of the Korean Society for Precision Engineering
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    • v.24 no.5
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    • pp.104-109
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    • 2007
  • Photochemical patterning of self-assembled mono layers (SAMs) has been performed by diode pumped solid state (DPSS) 3rd harmonic Nd:$YVO_4$ laser with wavelength of 355 nm. SAMs patternings of parallel lines have subsequently been used either to generate compositional chemical patterns or fabricate microstructures by a wet etching. This paper describes a selective etching process with patterned SAMs of alkanetiolate molecules on the surface of gold. SAMs formed by the adsorption of alkanethiols onto gold substrate employs as very thin photoresists. In this paper, the influence of the interaction between the functional group of SAMs and the etching solution is studied with optimal laser irradiation conditions. The results show that hydrophobic functional groups of SAMs are more effective for selective chemical etching than the hydrophilic ones.

A Study on Water Advanced Water Treatment by Photochemical Reaction (광화학 반응을 이용한 고도 수처리에 관한 연구)

  • Kim Min-Sik;Sung Dae-Dong
    • Journal of Environmental Science International
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    • v.8 no.6
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    • pp.699-704
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    • 1999
  • The Photodegradation efficient of total organic compounds in the drinking water has been studied using the methods of photocatalytic reaction and laser beam irradation. The results are summarized as follows; 1. The photodegradation efficiency of total organic compounds shows as $50\%\;to\;80\%$ as within one hour and after this the efficiency is decreased slowly. 2. The photodegradation efficiency of total organic compounds shows as 65 to $90\%$ within 3.3min. when Nd : YAG beam is irradiated to the water layer. 3. An excellent observation of the organic compound removal efficiency gives revealed in that case of the longest wavelength of 532nm is irradiated among the three kinds of laser beam sources of 532nm, 355nm and 266nm. 4. The organic compound removal efficiency shows high in the case of UV beam irradiation in the thin layer of water. However the efficiency is not depended on the thickness of water layer severely. 5. The removal efficiency of the organic compounds in the direct irradiation shows higher than the indirect irradiation in the case of UV beam, but the efficiency is not depended on the direction of irradiation in the case of Nd : YAG beam irradiation.

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A Fundamental Study on Polymer/Metal Additive Method using a UV Laser for Consumer-oriented 3D Helmet Products (소비자 지향 3차원 헬멧제품 제작을 위한 UV레이저 기반의 폴리머/금속적층에 대한 기초연구)

  • Kang, Bo-Seok;Ahn, Dong-Gyu;Shin, Bo-Sung;Shin, Jong-Kuk
    • Journal of the Korean Society of Manufacturing Process Engineers
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    • v.15 no.6
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    • pp.89-94
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    • 2016
  • Consumer orientation requires that companies understand consumer needs and produce products that meet their expectations. This study proposes a new additive method that creates a polymer/metal bonding layer and thus can lighten the weight of helmets to develop a consumer-oriented 3D printing helmet. The composite solution is experimentally prepared with copper formate and a photopolymer resin. Stereolithography apparatus and photothermal reactions are introduced to fabricate an adhesive hybrid layer of copper metal and polymer. A UV pulse laser with a 355 nm wavelength was installed to simplify this process. Resistance, adhesion, and accuracy were investigated to evaluate the properties of the layer produced.