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A Study on the Characteristics of the Functional Groups of the Alkanethiol Molecules in UV Laser Photochemical Patterning and Wet Etching Process  

Huh, Kab-Soo (한국기계연구원 나노공정장비연구센터)
Chang, Won-Seok (한국기계연구원 나노공정장비연구센터)
Publication Information
Journal of the Korean Society for Precision Engineering / v.24, no.5, 2007 , pp. 104-109 More about this Journal
Abstract
Photochemical patterning of self-assembled mono layers (SAMs) has been performed by diode pumped solid state (DPSS) 3rd harmonic Nd:$YVO_4$ laser with wavelength of 355 nm. SAMs patternings of parallel lines have subsequently been used either to generate compositional chemical patterns or fabricate microstructures by a wet etching. This paper describes a selective etching process with patterned SAMs of alkanetiolate molecules on the surface of gold. SAMs formed by the adsorption of alkanethiols onto gold substrate employs as very thin photoresists. In this paper, the influence of the interaction between the functional group of SAMs and the etching solution is studied with optimal laser irradiation conditions. The results show that hydrophobic functional groups of SAMs are more effective for selective chemical etching than the hydrophilic ones.
Keywords
Self-assembled monolayers; alkanethiol molecules; functional group; photochemical patterning; wet etching process; hydrophilic; hydrophobic; photo-oxidation reaction; Pseudo-continuous wave UV laser;
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