• Title/Summary/Keyword: 포논-표면 산란

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Direct Determination of Spectral Phonon-Surface Scattering Rate from Experimental Data on Spectral Phonon Mean Free Path Distribution (실험적 포논 평균자유행로 스펙트럼 분포를 이용한 포논 스펙트럼 포논-표면 산란율 모델)

  • Jin, Jae Sik
    • Transactions of the Korean Society of Mechanical Engineers B
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    • v.40 no.9
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    • pp.621-627
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    • 2016
  • In this study, we present a model that can be used to calculate the phonon-surface scattering rate directly from the experimental data on phonon mean free path (MFP) spectra of nanostructures. Using this model and the recently reported length-dependent thermal conductivity measurements on $Si_{0.9}Ge_{0.1}$ nanowires (NWs), we investigate the spectral reduced MFP distribution and the spectral phonon-surface scattering rate in the $Si_{0.9}Ge_{0.1}$ NWs. From the results, it is found that the phonon transport properties with the material and the phonon frequency dependency of the spectral phonon-surface scattering rate per unit length of the NW. The model presented in this study can be used for developing heat transfer analysis models of nanomaterials, and for determining the optimum design for tailoring the heat transfer characteristics of nanomaterials for future applications of phonon nanoengineering.

표면 거칠기에 따른 전하 이동도 특성 평가

  • Sin, Hye-Seon;Im, Gyeong-Seok;Jang, Mun-Gyu
    • Proceedings of the Korean Vacuum Society Conference
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    • 2016.02a
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    • pp.342-342
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    • 2016
  • 최근 반도체 제조 공정 기술이 발전함에 따라, 나노 영역에서의 열 및 전기 특성에 관련하여 깊이 있는 연구들이 많이 수행되고 있다. 그 중 반도체 기판의 표면 거칠기는 열전도도 및 전하 이동도와 밀접한 관련이 있으며 나노 소자의 특성을 결정짓는 중요한 요소가 된다. 표면이 거친 정도에 따라 포논 산란 작용이 열적 특성에 영향을 미치며 표면 거칠기와 상응하는 포논의 파장은 이를 산란시켜 열전도도를 감소시키는 것으로 보고되었다[1]. 또한, 트랜지스터의 소형화에 따라 수직 전계가 증가하며 그 결과, 표면 거칠기 성분이 표면에서의 전자 및 홀의 이동 특성에 영향을 미친다. 따라서 원자 층 두께의 표면 거칠기의 중요성이 부각되며 이에 대한 물성 연구가 수행되어야 한다. <100> 벌크 실리콘에서 약산 용액인 500-MIF를 이용하여 시간에 따라 dipping을 진행한 후 표면 거칠기의 변화를 profiler (Tencor P-2)로 측정하여 확인하였다. 거칠기는 dipping을 시작한 후 10분부터 18분까지 약 $3{\AA}/min$의 변화를 가지는 것으로 관측이 되었다. 또한 Hall measurement system으로 벌크 실리콘에서의 온도에 따른 전하 이동도를 측정하였다. 측정 결과, 300 K일 때 p-type 벌크 실리콘의 전형적인 전하 이동도 값인 약 $450cm^2/V{\cdot}s$을 얻었으며, 저온에서는 높은 이동도를 가지다가 온도가 증가할수록 이동도가 감소하는 형태를 확인하였다. 서로 다른 표면 거칠기를 가지는 반도체 기판을 저온부터 상온 이상까지 온도의 변화를 주어 그에 따른 전하 이동도를 측정하고 열전도도 및 전하 이동도의 특성을 분석하였다.

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An analytical model for inversion layer electron mobility in MOSFET (MOS소자 반전층의 전자이동도에 대한 해석적 모델)

  • 신형순
    • Electrical & Electronic Materials
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    • v.9 no.2
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    • pp.174-179
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    • 1996
  • We present a new physically based analytical equation for electron effective mobility in MOS inversion layers. The new semi-empirical model is accounting expicitly for surface roughness scattering and screened Coulomb scattering in addition to phonon scattering. This model shows excellent agreement with experimentally measured effective mobility data from three different published sources for a wide range of effective transverse field, channel doping and temperature. By accounting for screened Coulomb scattering due to doping impurities in the channel, our model describes very well the roll-off of effective mobility in the low field (threshold) region for a wide range of channel doping level (Na=3.0*10$^{14}$ - 2.8*10$^{18}$ cm$^{-3}$ ).

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The Behavior of the Mobility Degradation in Pocket Implanted MOSFETS (Halo 구조의 MOSFET에서 이동도 감소 현상)

  • Lee Byung-Heon;Lee Kie-Young
    • Journal of the Institute of Electronics Engineers of Korea SD
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    • v.42 no.4 s.334
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    • pp.1-8
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    • 2005
  • The increased effective impurity due to the pocket ion implantation is well blown to give rise to a reduction of the effective mobility of halo MOSFETs. However, further decrease of the effective mobility can be observed in pocket implanted MOSFETs above the mobility reduction due to the Coulomb impurity scattering and the gate bias dependency of the effective mobility can also differ from the simple model describing the mobility behavior in terms of the effective impurity. Phonon scattering and surface scattering as well as impurity Coulomb scattering are also shown to be effective in the degradation of the carrier mobility of pocket implanted MOSFETs. Using the 1-D regional approximation the effect of the distribution of the inversion charge density along the channel on the drain current is investigated. The inhomogeneous channel charge distribution due to pocket implantation is also shown to contribute to the further reduction of the effective mobility in halo MOSFETs.

Effect of Multi-wall Carbon Nanotube Surface Treatment on the Interface and Thermal Conductivity of Carbon Nanotube-based Composites (다중벽탄소나노튜브 복합재료의 계면 및 열전도도에 표면처리 방법이 미치는 영향)

  • Yoo, Gi-Moon;Lee, Sung-Goo;Kim, Sung-Ryong
    • Journal of Adhesion and Interface
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    • v.11 no.4
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    • pp.174-180
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    • 2010
  • The effect of carbon nanotube surface treatment on the interface and thermal conductivity of carbon nanotube-based poly(methylmethacrylate) (PMMA) composites was investigated. Coagulation and atomic-transfer radical polymerization (ATRP) was applied to modify the surface of multi-wall carbon nano-tube. The composite of ATRP method used carbon nanotube showed the higher transparency and thermal conductivities than that of the coagulation method used. In comparison to the thermal conductivity of pure PMMA, 0.21 W/mK, the ATRP carbon nanotube used PMMA/MWNT composite showed a thermal conductivity of 0.38 W/mK. The interface between carbon nanotube and PMMA was observed by scanning electron microscope and uniform dispersion of carbon nanotube was observed without any void in the PMMA matrix. It may be beneficial to transport the phonon without any scattering and it may result in a higher thermal conductivity.