• Title/Summary/Keyword: 트렌치 게이트

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A novel TIGBT tructure with improved electrical characteristics (향상된 전기적 특성을 갖는 트렌치 게이트형 절연 게이트 바이폴라 트랜지스터에 관한 연구)

  • Koo, Yong-Seo;Son, Jung-Man
    • Journal of IKEEE
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    • v.11 no.4
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    • pp.158-164
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    • 2007
  • In this study, three types of a novel Trench IGBTs(Insulated Gate Bipolar Transistor) are proposed. The first structure has P-collector which is isolated by $SiO_2$ layer to enhance anode-injection-efficiency and enable the device to have a low on-state voltage drop(Von). And the second structure has convex P-base region between both gates. This structure may be effective to distributes electric-field crowded to gate edge. So this structure can have higher breakdown voltage(BV) than conventional trench-type IGBT(TIGBT). The process and device simulation results show improved on-state, breakdown and switching characteristics in each structure. The first one was presented lower on state voltage drop(2.1V) than that of conventional one(2.4V). Also, second structurehas higher breakdown voltage(1220V) and faster turn off time(9ns) than that of conventional structure. Finally, the last one of the proposed structure has combined the two structure (the first one and second one). This structure has superior electric characteristics than conventional structure about forward voltage drop and blocking capability, turnoff characteristics.

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A SOI LDMOS with Trench Drain and Graded Gate (트렌치 드레인과 경사진 게이트를 갖는 SOI LDMOS)

  • Kim, Sun-Ho;Choi, Yearn-Ik
    • Proceedings of the KIEE Conference
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    • 2000.07c
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    • pp.1797-1799
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    • 2000
  • A SOI LDMOS with trench drain and graded gate is proposed to improve the on resistance. The proposed structure can decrease the on resistance by reducing the path of electron current. Simulation results by SUPREM and MEDICI have shown that the on resistance of the LDMOS with trench drain and graded gate was 14.8 % lower than conventional LDMOS with graded gate.

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1200V 50A All-in-one Converter and Inverter 12-Switch Low Loss Inteligent Power Module (1200V 50A급 컨버터 인버터 일체형 12-스위치 저 손실 지능형 전력모듈)

  • Lee, Min-Sub;Song, Jun-Ho;Lee, Jun-Bae;Chung, Dae-Woong;Lee, Nam-Won
    • Proceedings of the KIPE Conference
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    • 2010.07a
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    • pp.367-371
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    • 2010
  • 본 논문에서는 1200V, 50A급의 컨버터 인버터 일체형 12-스위치 저 손실 지능형 전력모듈을 소개한다. 게이트 구동회로, 보호회로, IGBT 모듈을 통합한 이 전력모듈은 최적의 게이트 구동회로, 시스템 고밀도화 그리고 인피니언의 트렌치 필드스톱2 IGBT와 FRD를 사용한 높은 효율의 컨버터와 인버터 일체형으로 구현하였다. 본 논문을 통해 높은 파워가 요구되는 가전기기, 산업용 인버터의 애플리케이션에 적합하게 설계된 전력모듈에 대한 소개와 함께 그 특징 및 시스템 구성을 위한 고려사항에 대하여 기술하였다.

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The Intelligent Power Modules Assembly with Reverse Conduction IGBTs and SOI Driver for Low Power Motor Drives (저전력 모터 구동을 위한 SOI 드라이브 IC 와 RC-IGBT를 탑재한 지능형 반도체 모듈)

  • Cho, JeongSu;Park, SungBum;Lee, JunBae;Chung, DaeWoong
    • Proceedings of the KIPE Conference
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    • 2011.07a
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    • pp.287-289
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    • 2011
  • 본 논문은 인피니언 테크놀로지스의 RC-IGBT (Reverse Conducting Isolated Gate Bipolar Transistor)와 SOI 드라이브 IC(Integrated Circuit)를 사용한 DIL(Dual-In-Line) 구조의 저전력 모듈인 CIPOS TM (Control Integrated POwer System) 제품을 소개한다. 이 전력 모듈은 최적의 게이트 구동회로, 트렌치 필드스톱의 RC-IGBT를 사용하여 기존의 IGBT 와 Diode를 사용하는 구조에서 최소화 된 패키지 크기를 사용하여 높은 효율을 구현할 수 있다. 본 논문을 통하여 인버터의 어플리케이션에 적합하게 설계된 전력모듈에 대한 소개와 그 특징 및 시스템 구성을 위한 고려사항에 대하여 기술하였다.

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Trench-gate SOI LIGBT with improved latch-up capability (향상된 Latch-up 특성을 갖는 트렌치 게이트 SOI LIGBT)

  • 이병훈;김두영;유종만;한민구;최연익
    • Journal of the Korean Institute of Telematics and Electronics A
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    • v.32A no.1
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    • pp.103-110
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    • 1995
  • Trench-Gate SOI LIGBT with improved latch-up capability has been proposed and verified by MEDICI simulation. The new SOI LIGBT exhibits 6 time larger latch-up capability of the new device is almost preserved independent of lifetime. the large latch-up capability of the new SOI LIGBT may be realized due to the fact that the hole current in the new device would bypass through the shorted cathode contact without passing the p-well region under the n+ cathode. Forward voltage drop is increased by 25% when a epi thickness is 6$\mu$m. However, the increase of the forward voltage is negligible when the epi thickness is increased to 10$\mu$m. It is found that the swithcing time of the new device is almost equal to the conventional devices. Evaluated breakdown voltage of proposed SOILIGBT is 250 V and that of the conventional SOI LIGBT is 240 V, where the thickness of the vuried oxide and n- epi is 3$\mu$m and 6$\mu$m, respectively.

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Electrical Characteristics of Floating Island IGBT Using Trench Gate Structure (트렌치 게이트를 이용한 Floating Island IGBT의 전기적 특성에 관한 고찰)

  • Cho, Yu-Seup;Jung, Eun-Sik;Oh, Kum-Mi;Sung, Man-Young
    • Journal of the Korean Institute of Electrical and Electronic Material Engineers
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    • v.25 no.4
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    • pp.247-252
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    • 2012
  • IGBT (insulated gate bipolar transistor) has been widely used around the power industry as it has good switching performance and its excellent conductance. In order to reduce power loss during switch turn-on state, it is essential to reduce its resistance. However, trade off relationship between breakdown voltage and device conductance is the greatest obstacle on the way of improvement. Floating island structure is one of the solutions. Still, under optimized device condition for the best performance, improvement rate is negligible. Therefore, this paper suggests adding trench gate on floating island structure to eliminate JFET (junction field effect transistor) area to reduce resistance and activate floating island effect. Experimental result by 2D simulation using TCAD, shows 20% improvement of turn-on state voltage drop.

A Study on the Formation of Trench Gate for High Power DMOSFET Applications (고 전력 DMOSFET 응용을 위한 트렌치 게이트 형성에 관한 연구)

  • 박훈수;구진근;이영기
    • Journal of the Korean Institute of Electrical and Electronic Material Engineers
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    • v.17 no.7
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    • pp.713-717
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    • 2004
  • In this study, the etched trench properties including cross-sectional profile, surface roughness, and crystalline defects were investigated depending on the various silicon etching and additive gases, For the case of HBr$He-O_2SiF_4$ trench etching gas mixtures, the excellent trench profile and minimum defects in the silicon trench were achieved. Due to the residual oxide film grown by the additive oxygen gas, which acts as a protective layer during trench etching, the undercut and defects generation in the trench were suppressed. To improve the electrical characteristics of trench gate, the hydrogen annealing process after trench etching was also adopted. Through the hydrogen annealing, the trench corners might be rounded by the silicon atomic migration at the trench corners having high potential. The rounded trench corner can afford to reduce the gate electric field and grow a uniform gate oxide. As a result, dielectric strength and TDDB characteristics of the hydrogen annealed trench gate oxide were remarkably increased compared to the non-hydrogen annealed one.

An Analysis of IGBT(Insulator Gate Bipolar Transistor) Structure with an Additional Circular Trench Gate using Wet Oxidation (습식 산화를 이용한 원형 트렌치 게이트 IGBT에 관한 연구)

  • Kwak, Sang-Hyeon;Kyoung, Sin-Su;Sung, Man-Young
    • Journal of the Korean Institute of Electrical and Electronic Material Engineers
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    • v.21 no.11
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    • pp.981-986
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    • 2008
  • The conventional IGBT has two problems to make the device taking high performance. The one is high on state voltage drop associated with JFET region, the other is low breakdown voltage associated with concentrating the electric field on the junction of between p base and n drift. This paper is about the structure to effectively improve both the lower on state voltage drop and the higher breakdown voltage than the conventional IGBT. For the fabrication of the circular trench IGBT with the circular trench layer, it is necessary to perform the only one wet oxidation step for the circular trench layer. Analysis on both the on state voltage drop and the breakdown voltage show the improved values compared to the conventional IGBT structure. Because the circular trench layer disperses electric field from the junction of between p base and n drift to circular trench, the breakdown voltage increase. The on state voltage drop decrease due to reduction of JFET region and direction changed of current path which pass through reversed layer channel. The electrical characteristics were studied by MEDICI simulation results.

The Optimal Design and Electrical Characteritics of 1,700 V Class Double Trench Gate Power MOSFET Based on SiC (1,700 V급 SiC 기반의 단일 및 이중 트렌치 게이트 전력 MOSFET의 최적 설계 및 전기적 특성 분석)

  • Ji Yeon Ryou;Dong Hyeon Kim;Dong Hyeon Lee;Ey Goo Kang
    • Journal of the Korean Institute of Electrical and Electronic Material Engineers
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    • v.36 no.4
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    • pp.385-390
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    • 2023
  • In this paper, the 1,700 V level SiC-based power MOSFET device widely used in electric vehicles and new energy industries was designed, that is, a single trench gate power MOSFET structure and a double trench gate power MOSFET structure were proposed to analyze electrical characteristics while changing the design and process parameters. As a result of comparing and analyzing the two structures, it can be seen that the double trench gate structure shows quite excellent characteristics according to the concentration of the drift layer, and the breakdown voltage characteristics according to the depth of the drift layer also show excellent characteristics of 200 V or more. Among them, the trench gate power MOSFET device can be applied not only to the 1,700 V class but also to a voltage range above it, and it is believed that it can replace all Si devices currently applied to electric vehicles and new energy industries.

A Study on the Modeling of a High-Voltage IGBT for SPICE Simulations (고전압 IGBT SPICE 시뮬레이션을 위한 모델 연구)

  • Choi, Yoon-Chul;Ko, Woong-Joon;Kwon, Kee-Won;Chun, Jung-Hoon
    • Journal of the Institute of Electronics and Information Engineers
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    • v.49 no.12
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    • pp.194-200
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    • 2012
  • In this paper, we proposed a SPICE model of high-voltage insulated gate bipolar transistor(IGBT). The proposed model consists of two sub-devices, a MOSFET and a BJT. Basic I-V characteristics and their temperature dependency were realized by adjusting various parameters of the MOSFET and the BJT. To model nonlinear parasitic capacitances such as a reverse-transfer capacitance, multiple junction diodes, ideal voltage and current amplifiers, a voltage-controlled resistor, and passive devices were added in the model. The accuracy of the proposed model was verified by comparing the simulation results with the experimental results of a 1200V trench gate IGBT.