• Journal of the Institute of Electronics Engineers of Korea TC
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• v.44 no.3 s.357
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• pp.105-110
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• 2007

We have built the millimeter-wave passive imaging system with a lens and mechanical scan antenna. The lens was designed based on optical theory in order to focus millimeter-wane. A full image was taken from image points scanned by Placing antenna at the representative focal plane selectively. An integrated antenna array device for low-loss and low-noise with the array of 4 by 1, where components such as antenna, balun, MMIC, and detector were assembled on a sin91e substrate, and a fermi tapered slot antenna with high-gain and low-side lobe were used for elements of this millimeter-wave passive imaging system. Two dimensional antenna arrangement on focal plane was achieved in this imaging system.

• Transactions of the Korean Society of Machine Tool Engineers
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• v.16 no.5
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• pp.96-100
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• 2007

Condenser lens and objective lens are used to demagnify the image of the crossover to the final spot size. In lens, electrons are focused by magnetic fields. This fields is fringing field. It is important in electron focusing. Electron focusing occurs the radial component field and axial component field. Radial component produces rotational force and axial component produces radial force. Radial force causes the electron's trajectory to curve toward the optic axis and corss it. Focal length decreases as the current of lens increases. In this paper, we use the focal length for desiging the hardware of lens current control and present the results.

• Proceedings of the Korean Society of Precision Engineering Conference
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• 2008.06a
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• pp.633-634
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• 2008

• Journal of the Korean Society of Manufacturing Technology Engineers
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• v.19 no.5
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• pp.705-709
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• 2010

It is quite complex to draw the geometry of electron trajectories in electron optics because such trajectories have various aberrations that cannot be easily calculated. However, if we need to know roughly the geometry, the focal length and the principal planes in order to understand the properties of column, a simple numerical solution can be a useful method. We are developing the electron beam machining system based on SEM. In this paper, we show rough geometry, focal length and principal planes by a numerical solution for electron lens I in our column. These results will be utilized in developing a simulation program for electron optics.

• The Journal of Korean Institute of Electromagnetic Engineering and Science
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• v.27 no.9
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• pp.817-824
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• 2016

In this paper, a modified elliptical lens antenna design is proposed to improve the performance of 100 GHz mini-lens antennas used in the ECEI(Electron Cyclotron Emission Imaging) module at KSTAR. A hemispherical lens is added on the bottom plate of the conventional elliptic lens antenna, and a 100 GHz dipole antenna is located on the end point of the hemispherical lens. Using geometrical optics, antenna radiated EM fields are designed to be totally reflected from the inner surface of the hemispherical lens, and thereby the antenna patterns are more focused toward the main beam. The validity of the proposed design is confirmed by the 3D EM simulator. The modified elliptical lens antenna provides 23.8 dB maximum gain, which is 2.2 dB gain improvement as compared with the conventional elliptic lens. Also, the side love levels of E- and H-planes are decreased by 2.6 dB and 3.4 dB, respectively.

• Journal of the Korean Vacuum Society
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• v.10 no.4
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• pp.396-402
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• 2001

MgO thin films with 1000 $\AA$ thickness were deposited on Cu substrates by using an electron gun evaporator at room temperature. A 1000 $\AA$ thick Al layer was deposited on the MgO for removing the charging effect of the MgO thin film during the measurements of the sputtering yields. A Ga ion liquid metal was used as the focused ion beam(FIB) source. The ion beam was focused by using double einzel lenses, and a deflector was employed to scan the ion beams into the MgO layer. Both currents of the secondary particle and the probe ion beam were measured, and they dramatically changed with varying the applied acceleration voltage of the source. The sputtering yield of the MgO layer was determined using the values of the analyzed probe current, the secondary particle current, and the net current. When the acceleration voltage of the FIB system was 15 kV, the sputtering yield of the MgO thin film was 0.30. The sputtering yield of the MgO thin film linearly increases with the acceleration voltage. These results indicate that the FIB system is promising for the measurements of the sputtering yield of the MgO thin film.

• Transactions of the Korean Society of Mechanical Engineers A
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• v.33 no.3
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• pp.185-189
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• 2009

Focused ion beam system was designed, which includes LMIS, electrostatic lens and high voltage power supply. Control program is updated for high speed image processing. The details of vibration-free vacuum system and other important electrical parts were trouble-shooted for appropriately controlling high acceleration voltages.

• Proceedings of the Korean Society of Precision Engineering Conference
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• 2012.05a
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• pp.653-654
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• 2012

• The Journal of Korean Institute of Electromagnetic Engineering and Science
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• v.16 no.5 s.96
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• pp.465-471
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• 2005

A method of calculation fur propagating and focusing of focused beams generated in antenna arrays, using BPM(Beam Propagation Method), is presented in this paper. Based on the diffraction theory, the beam focusing and Propagation is studied specially for the case of the antenna way fed by the Rotman lens that is able to focus microwave power on its focal arc or generate multiple beams. There are difficulties in performing a full-wave simulation using a commercial EM simulation tool for propagating and focusing of beams because of the structural complexity and the feeding assignment of the antenna array. Therefore, as an alternative solution, the BPM is presented to calculate the beam propagation from the aperture-type antennas. From the point of view of optics, the propagations of the lens have been simplified from the Fresnel diffraction integral to the Fourier transform. Using Fourier Transform, a beam propagation method is developed to show improvement of the resolution by controlling the wavefront of wave Propagating from an aperture-type antenna array. The beam width(or spot size) and the intensity are calculated for a focused beam propagating from an array having $10\lambda$ of its size. For the beams with $20\lambda,\;30\lambda$, and $50\lambda$ of geometrical focal length, the half-power beam widths(or spot size) are about 1.1\lambda,\;1.3\lambda,\;and\;1.9\lambda$ respectively.

• Transactions of the Korean Society of Machine Tool Engineers
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• v.15 no.2
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• pp.24-29
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• 2006

The use electron-beam(E-beam) manufacturing system provides a means to alleviate optic exposure equipment's problems. We are developing an E-beam manufacturing system with scanning electron microscope(SEM) function. The E-beam manufacturing system consist of high voltage generator, beam blanker, condenser lenses, object lenses, stigmator and stage. The development of E-beam manufacturing system is used on the method of remaking SEM's structure. The functions of SEM are developed. It is important for the test of E-beam performance. In E-beam manufacturing system and SEM, beam focus is important function. In this paper, we propose intelligent remote control function for beam focus in E-beam manufacturing system. The function extends the user's function and gives convenience.