• 한국소음진동공학회:학술대회논문집
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• 한국소음진동공학회 2005년도 추계학술대회논문집
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• pp.236-239
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• 2005

본 연구에서는 정밀 측정/검사장비의 운영상 발생하는 에러의 원인을 규명하기 위함이다. C/R에 사용되어지는 정밀측정/검사장비는 장비 기초에 대하여 진동허용규제치를 장비 제작업체 제공한다. 이에 C/R 구조 및 장비 기초에 대하여 진동원 차단 방안등을 수행하게된다. 이러한 진동허용규제치를 만족시키기 위한 방안을 수행함에도 공조 소음등과 같은 요인에 의한 장비의 운영상 발생하는 진동과 관련된 에러를 규명하고 이를 제어하기 위한 연구를 수행하였다.

• 소음진동
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• 제6권3호
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• pp.363-373
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• 1996

In the case of a precision equipment, it requires a vibration free environment to provide its proper function. Especially, lithography and inspection devices, which have sub-nanometer class high accuracy and resolution, have come to necessity for producing more improved giga class semiconductor wafers. This high technology equipments require very strict environmental vibration standard in promotion to the accuracy of the manufacturing, inspecting devices. The vibration criteria are usually obtained either by the real vibration exciting test on the equipment or by the analytical calculation. The former is accurate but requires a great deal of time and efforts while the latter lacks reliability. This paper proposes a new method to solve this problem at a time. The permissible vibration level to a precision equipment can be easily obtained by analyzing the process of Frequency Response Function(FRF). This paper also demonstrates its effectiveness by applying the proposed method to finding the permissible vibration criteria of a Computer Hard Disk Drive.

• 한국소음진동공학회논문집
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• 제17권8호
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• pp.726-735
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• 2007

Inside the factory buildings of aprecision industry (which produces semiconductors or TFT-LCD), thousands of vibration-sensitive precision equipments operate in the clean rooms. Various utility equipments that are installed around them for proper operation cause various sources of noise and of vibration to exist inside the clean rooms and thus deteriorate the noise and the vibration environment within. In this study, we check if the existing transient vibration phenomenon is caused by the vibrations that arise from operating the utility installed near these equipments; compare and evaluate the vibration criteria of precision equipments regarding the transient vibration phenomenon; and check the efficiency of these criteria.

• 한국소음진동공학회:학술대회논문집
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• 한국소음진동공학회 2006년도 추계학술대회논문집
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• pp.352-355
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• 2006

본 연구에서는 건축 구조물 용도에 따라 구조물의 직접적인 손상을 방지하기 위하여 규제하는 기준치, 인간의 감각 통하여 느껴지는 진동으로 안락한 주거 환경 또는 작업 환경을 유지하기 위한 규제치, 구조조물에 설치된 장비, 특히 반도체, 통신장비등과 같이 정밀장비의 경우 구조물에서 발생되는 진동으로부터 장비의 성능을 유지시켜주기 위한 기준 등을 확인하여 건물 용도에 최적의 진동 허용 규제치를 제안하며 기준에 따른 초기설계단계에서 최적저감대책을 수립하고자 함이다.

• 한국소음진동공학회:학술대회논문집
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• 한국소음진동공학회 1995년도 춘계학술대회논문집; 전남대학교, 19 May 1995
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• pp.233-239
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• 1995

정밀장비의 내진 및 방진설계에 대한 일반적인 procedure를 제시하고 이를 정밀제어 장비인 HDD CELL에 적용하였다. 정밀장비의 내진 설계를 위해서 는 정확한 진동 허용규제치와 정밀장비가 설치되는 구조물의 진동 환경에 대한 데이터를 확보하는 것이 우선적으로 해야할 일이다. 구조물의 진동은 직접 측정을 하거나 설계 자료를 이용하는 것이 가능하지만 진동 허용규제치는 장비 제작사에서 진동환경시험을 통하여 얻어진 자료를 사용 자에게 제시하는 것이 일반적인 과정이다. 그러나 고도의 정밀성을 요하는 장비 전체를 가진 테이블에 설치하여 진동환경시험을 수행하는 일은 시간과 경제적인 측면에서 유익하지 못하다. 그러한 면에서 본 논문에 제시한 진동 허용가진력 규제치를 이용한 정밀장비의 내진 및 방진의 정량적인 설계뿐만 아니라 진동 허용규제치를 손쉽게 구할 수 있다는 점에서 유익하다 하겠다.

• 한국소음진동공학회:학술대회논문집
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• 한국소음진동공학회 2011년도 추계학술대회 논문집
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• pp.758-759
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• 2011

• 반도체디스플레이기술학회지
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• 제1권1호
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• pp.1-7
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• 2002

Modem technology depends on the reliability of extremely high precision equipments. In the production of semiconductor wafer, optical and electron microscopes, ion-beam, laser device must maintain their alignments within a sub-micrometer. This equipment requires a vibration free environment to provide its proper function. Therefore, this high technology equipments require very strict environmental vibration criteria because it is used as basic data for the design of building structure and structural dynamics of equipment. In this paper, the new approach is proposed to investigate the mismatch problem of time and frequency domain for vibration criteria of sensitive equipment. The proposed approach is based on a vibration measurement data and a relative transfer function which can be obtained by experiment or analysis.

• 한국소음진동공학회:학술대회논문집
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• 한국소음진동공학회 1998년도 춘계학술대회논문집; 용평리조트 타워콘도, 21-22 May 1998
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• pp.302-307
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• 1998

In the production of semiconductor wafer, optical and electron microscopes, ion-beam, laser device must maintain their alignments within a sub-micrometer. This equipment requires a vibration free environment to provide its proper function. Especially, lithography and inspection devices, which have sub-nanometer class high accuracy and resolution, have come to necessity for producing more improved giga and tera class semiconductor wafers. This high technology equipments require very strict environmental vibration standard, vibration criteria, in proportion to the accuracy of the manufacturing, inspecting devices. The vibration criteria of high sensitive equipment should be represented in the form of exactness and accuracy, because this is used as basic data for the design of building structure and structural dynamics of equipment. The study on the evaluation of the factors affecting the permissible vibration criteria is required to design the efficient isolation system of the semiconductor manufacturing of equipment. This paper deals with the properties of the effected factor for vibration criteria of high sensitive equipment.

• 소음진동
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• 제9권6호
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• pp.1227-1233
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• 1999

Modern technology depends on the reliability of extremely high technology equipments. In the production of semiconductor wafer, optical and electron microscopes, ion-beam, laser device must maintain their alignments within a nanometer. This equipment requires a vibration free environment to provide its proper function. Especially, lithography and inspection devices, which have sub-nanometer class high accuracy and resolution, have come to necessity for producing more improved giga and tera class semiconductor wafers. This high technology equipments require very strict environmental vibration standard, vibration criteria, in proportion to the accuracy of the manufacturing, inspecting devices. This paper deals with the structural dynamic design in high class semiconductor factory in order to be satisfied more strict vibration criteria for high sensitive equipment.

• 한국소음진동공학회:학술대회논문집
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• 한국소음진동공학회 1997년도 춘계학술대회논문집; 경주코오롱호텔; 22-23 May 1997
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• pp.362-369
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• 1997

In the case of a precision equipment, it requires a vibration free environment to provide its proper function. Especially, lithography and inspection devices, which have sub-nanometer class high accuracy and resolution, have come to necessity for producing more improved giga class semiconductor wafers. This high technology equipments require very strict environmental vibration standard in proportion to the accuracy of the manufacturing, inspecting devices. The vibration criteria of high sensitive equipment should be expressed in the form of 'exactness' and 'accuracy', because this is made basic data in the use of building structure design. This paper made a study on the specification of high sensitive equipment and proposed a contents of the specification.