• Journal of the Korean Institute of Telematics and Electronics D
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• v.35D no.9
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• pp.48-53
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• 1998

We have fabricated electrostatic lens with novel structure by mixing surface- and bulk-micromachining technology. Polysilicon was used for both the structure and sacrificial layer, and the structure layer was passivated with thermal oxide in order not to be attacked during the silicon wet etching. Compared with conventional electrostatic lens used in microcolumn, this device has the advantages in ; 1) hole alignment, throughput, reliability, damage of lens, 2) the possibility of arrayed lithography through the integration of microcolumn.

• Proceedings of the Korean Society of Machine Tool Engineers Conference
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• 2004.04a
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• pp.500-503
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• 2004

본 연구에서는 금속 원자를 단열 팽창시켜 클러스터를 만들고, 생성된 클러스터를 이온화시킨 후 집속렌즈 및 electric quadrupole을 이용하여 기판으로 증착 하였다. 집속렌즈의 설계에서는 단일 초점 방식의 렌즈보다 성능을 높이기 위하여 이중 초점과 핀홀을 써서 집속 효과 및 효율을 높였다. 렌즈의 설계는 일반적으로 하전입자의 에너지 손실 없이 집속할수 있는 Einzel 렌즈를 기본으로 하였으며, SIMION software 를 사용하여 시뮬레이션 하였다. 시뮬레이션 후 실제 렌즈계 및 정전압원을 제작하여 금(Au)의 클러스터를 생성하여 렌즈계를 통과한 후 실제 기판위로 증착이 되는 것을 AFM(Atomic force microscopy)과 XPS(X-ray photoemission spectroscopy)를 이용해 조사하여 렌즈계가 실제로 동작함을 확인하였다.

• Journal of the Korean Society for Precision Engineering
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• v.26 no.4
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• pp.128-133
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• 2009

Focused-ion-beam (FIB) system is capable of both machining and measuring in nano-scale; hence nano-scale focusing quality is important. This paper investigates design parameters of two electrostatic lenses in order to achieve the best ion beam focusing performance. Commercial SIMION simulator is used to optimize the dimensions of the condenser and objective lenses and investigate the influence of assembly error on focusing quality The simulation results show that the beam focusing quality is not influenced by angle deviation within ${\pm}0.02\;deg$ and geometrical eccentricity within ${\pm}50$ micrometers.

• Proceedings of the Korean Society of Precision Engineering Conference
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• 2010.05a
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• pp.429-430
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• 2010

• Proceedings of the Korean Vacuum Society Conference
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• 1999.02a
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• pp.33-33
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• 1999

• Journal of the Korean Institute of Telematics and Electronics
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• v.26 no.9
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• pp.1348-1358
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• 1989

We analyzed electrostatic lens with axi-symmetic configurations using the analytic equation for a single apertured lens. The developed computer code afforded to estimate ion optical properties such as ion trajectories, aberrations and ion beam diameters, and was found to have advantages of a shorter calculation time. The calculated ion optical properties for several types of electrostatic lens were in good agreement with Burghard's ones and it was seem that 20% reduction of ion beam diameter could be obtained by the change of aperture diameters.

• Journal of the Korean Vacuum Society
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• v.2 no.3
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• pp.304-313
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• 1993

집속 이온빔 기술은 고해상도의 이온빔 리토그라피, 마스크가 필요없는 이온주입, 그리고 Ion beam induced deposition 등 반도체 소자의 미세가공에 널리 이용되어 왔다. 좋은 안정도와 높은 전류밀도, 적은 에너지 퍼짐 그리고 낮은 에미턴스와 높은 선명도를 갖는 집속 이온빔 장비를 위한 액체 갈륨 이온원이 한국에서 개발 시업되었다. 이온빔의 전압이 15kV, 렌즈전압이 7kV 그리고 렌즈상단에 위치한 aperture의 직경이 0.2mm일 때, 0.1$mu extrm{m}$의 빔 직경으로 집속되는 정전 einzel렌즈가 설계 조립되었고, FIB 진공 chamber는 렌즈부와의 차 등 진공시스템으로 구성되어 설계제작되었다. FIB 장비가 조만간 한국에서 이온빔 밀링, ion beam induced deposition 그리고 잘못된 부분의 수정 등 반도체 제작공정에서의 응용에 큰 기여를 할 것이라 기대된다.

• Proceedings of the Korean Society of Precision Engineering Conference
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• 2008.06a
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• pp.633-634
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• 2008

• Journal of the Korea Academia-Industrial cooperation Society
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• v.19 no.11
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• pp.1-7
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• 2018

In a microcolumn, a miniaturized electrostatic deflector is often adopted to scan an electron beam. Usually, a double octupole deflector is used because it can avoid excessive spherical aberrations by controlling the electron beam path close to the optical axis of the objective lens and has a wide scan field. Studies on microcolumns have been performed to improve the low throughput of an electron column through multiple column applications. On the other hand, as the number of microcolumns increases, the number of wires connected to the components of the microcolumn increases. This will result in practical problems during the process of connecting the wires to electronic controllers outside of the vacuum chamber. To reduce this problem, modified quadrupole and octupole deflectors were examined through simulation analysis by selecting an ultraminiaturized microcolumn with the Einzel lens eliminated. The modified deflectors were designed changing the size of each electrode of the conventional Si octupole deflector. The variations of the scan field and electric field strength were studied by changing the size of active electrodes to which the deflection voltage was to be applied. The scan field increased linearly with increasing deflection voltage. The scan field of the quadrupole deflector and the electric field strength at the center were calculated to be approximately 1.3 ~ 2.0 times larger than those of the octupole deflector depending on the electrode size.

• Korean Journal of Optics and Photonics
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• v.19 no.5
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• pp.365-369
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• 2008

The optimal condition for focusing an electron beam was investigated employing an electrostatic deflector in a low voltage micro-column. At fixed voltage of the electron emission tip, the focusing electron beam with source lens showed a larger scan field size and poorer visibility than those with an Einzel lens. Theoretical 3-D simulation indicated that a focusing electron beam with a source lens should have a larger spot size and deflection than those of a focusing Einzel lens.