Comparison of $AlO_x/$ barriers oxidized with $H_2O$ , $O_2$ plasma or $O_3$ in Atomic Layer Deposited $AlO_x/\;HfO_y$ stacks
(단원자 증착법으로 증착한 $AlO_x/\;HfO_y$ 박막에서의 $AlO_x/$ 산화제에 따른 특성 변화)
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- Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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- 2003.07a
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- pp.275-277
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- 2003