• Resources Recycling
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• v.26 no.5
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• pp.97-104
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• 2017

Nuclear fuel cladding tubes are manufactured through pilgering and the annealing process. In order to remove the oxidized layer and impurities on the surface of the tube, a pickling process is required. Zirconium (Zr) is dissolved in a HF and $HNO_3$ acid mixture during the process and the pickling waste acid, including the dissolved Zr, is completely discarded after neutralization. This study observes the effects of the residual impurities (Ba) in the pickling solution regenerated from the $BaF_2$ precipitation process on the waste pickling solution. In addition, the concentration of Ba and Zr for the actual nuclear fuel cladding tube process was optimized. The regenerated pickling solution was tested through a pilot plant pickling process device that simulates the commercial pickling process of nuclear fuel cladding tubes, and the pickling efficiency was analyzed through AFM analysis of the roughness of the cladding tube surface.

• Journal of the Institute of Electronics and Information Engineers
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• v.50 no.7
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• pp.102-108
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• 2013

In manufacturing of solution-processed organic electronic devices, a spin coating method is frequently used, but which has a big problem. Solvent in a solution has a decisive effect such as physical and chemical damage for successive solution-based film deposition. Such a severe damage by solvent restricts for fabricating building blocks of multi-layered films from solutions. In this work, it will be shown that a proper combination of well-known solvents gives a chance to fabricate multi-layered film, also this new method was applied to make organic field effect transistor. Two types of bottom gate, bottom contact transistors were fabricated, one of which is fabricated by conventional single spin coating method, the other fabricated by double spin coating method. Compared with the electrical characteristics in a single spin coated transistor, the leakage current between source and gate electrode was decreased, ON state current was increased, and the extracted saturation mobility was multiplied more than 2.7 time for double spin coated transistors. It is suggested that the multiple coated gate dielectric structure is more desirable for high performance organic ferroelectric field effect transistors.

• Resources Recycling
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• v.25 no.2
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• pp.33-41
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• 2016

A scale up tests (380 kg/day) using a continuous solvent extraction and electro-winning system was carried out to separate and recover cobalt from a solution containing 1.91 g/L Co and 14.65 g/L Ni. The solution was obtained during a process including solvent extraction and precipitation stages for removal of Cu and Fe from a synthetic sulfuric acid solution of manganese nodule matte. The optimal condition for solvent extraction was : solvent concentration of 0.22M Na-Cyanex 272 (45% saponified with NaOH) and O:A phase ratios of 1:1.5, 10:1 and 1.5:1 used in extraction, scrubbing and stripping stages, respectively. The extraction and stripping efficiencies were found to be 99.8% and 99.88%, respectively. The stripped solution contained 40.27 g/L Co with 4 ppm Ni. Cobalt metal of 99.963% purity was yielded with current efficiency of 67% and current density of $0.563A/dm^2$ during the electro-winning process.

• Membrane Journal
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• v.28 no.3
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• pp.157-168
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• 2018

Potassium tannate (TA-K), which is prepared by base treatment of the bio-renewable tannic acid (TA), was evaluated for its potential application as a draw solute for water purification by forward osmosis. The forward osmosis and recovery properties of TA-K were systematically investigated. In the application of forward osmosis through the active layer facing feed solution (AL-FS) method, the water flux of TA-K draw solution was significantly higher than that of the TA draw solution, while that of the latter was not identified. At a low concentration of 100 mM, the osmotic pressure (1,135 mOsmol/kg) of the TA-K draw solution was approximately 6.5 times that (173 mOsmol/kg) of the NaCl draw solution. Furthermore, the water flux and specific salt flux (6.14 LMH, 1.26 g/L) of the TA-K draw solution at 100 mM were approximately 2.5 and 0.5 times those of the NaCl draw solution (2.46 LMH, 2.63 g/L) at the same concentration, respectively. For reuse, TA-K was precipitated by using a metal ion and recovered through membrane filtration. This study demonstrates the applicability of a phytochemical material as a draw solute for forward osmosis.

• Proceedings of the Materials Research Society of Korea Conference
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• 2011.05a
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• pp.32.2-32.2
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• 2011

반도체 생산공정에서 CMP (Chemical-mechanical planarization) 공정은 우수한 전기전도성 재료인 Cu의 사용과 다층구조의 소자를 형성하기 위해서 도입되었으며, 최근 소자의 집적도가 증가함에 따라 CMP 공정 비중은 점점 높아지고 있다. Cu CMP 공정에서 연마제인 슬러리는 금속 표면과의 물리적 화학적 반응을 동시에 사용하여 표면을 연마하게 되며, 연마특성을 향상시키기 위해 산화제, 부식방지제, 분산제 및 다양한 계면활성제가 첨가된다. 하지만 슬러리는 Cu 표면을 평탄화하는 동시에 오염입자, 유기오염물, 스크레치, 표면부식 등을 발생시키며 결과적으로 소자의 결함을 야기시킨다. 특히 부식방지제로 사용되는 BTA (Benzotriazole)은 Cu CMP 공정 중 Cu-BTA 형태로 표면에 흡착되어 오염원으로 작용하며 입자오염을 증가시시고 건조공정에서 물반점 등의 표면 결함을 발생시킨다. 이러한 문제점을 해결하기 위해 Cu 표면에서 식각과 부식반응을 최소화하며, 오염입자 제거 및 유기오염물을 효과적으로 제거하기 위한 Post-CMP 세정 공정과 세정액 개발이 요구된다. 본 연구에서는 오염입자 및 유기물 제거와 동시에 표면 거칠기와 부식현상을 제어할 수 있는 post Cu CMP 세정액을 개발 평가하였다. 오염입자 및 유기오염물을 제거하기 위해서 염기성 용액인 TMAH 사용하였으며, Cu 이온을 용해할 수 있는 Chelating agent와 표면 부식을 억제하는 부식 방지제를 사용하여 세정액을 합성하였다. 접촉각 측정과 FESEM(field Emission Scanning Electron Microscope) 분석을 통하여 CMP 공정에서 발생하는 유기오염물과 오염입자의 흡착과 제거를 확인하였으며 Cu 웨이퍼 세정 전후의 표면 거칠기의 변화와 식각량을 AFM(Atomic Force Microscope)과 4-point probe를 사용하여 각각 평가하였다. 또한 세정액 내에서의 연마입자의 zeta-potential을 측정 및 조절하여 세정력을 향상시켰다. 개발된 세정액과 Cu 표면에서의 화학반응 및 부식방지력은 potentiostat를 이용한 전기화학 분석법을 통해서 chelating agent와 부식방지제의 농도를 최적화 시켰다. 개발된 세정액을 적용함으로써 Cu-BTA 형태의 유기오염물과 오염입자들이 효과적으로 제거됨을 확인하였다.

• 한국신재생에너지학회:학술대회논문집
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• 2010.06a
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• pp.76.1-76.1
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• 2010

Furnace를 이용한 $POCl_3$ 확산 공정은 실리콘 태양전지 제작과정에서 일반적으로 이용되는 에미터 층 형성 공정이다. 하지만, 확산 공정을 통해 P-N Junction을 형성할 경우 전면과 후면의 contact현상이 발생하게 되고 이를 제거하기 위해 Edge isolation 공정을 거치게 된다. 최근에는 레이저로 V 모양의 홈을 형성하는 방법이 이용되고 있다. 본 연구에서는 p-type 실리콘 웨이퍼 기판에 insulating barrier를 형성하여 edge isolation 공정을 없앤 Non-edge isolation공정을 제시한다. Non p-type 실리콘 웨이퍼에 insulating barrier를 형성한다. Insulating barrier가 형성된 BOE용액과 KOH에서의 견딤성 실험을 진행 하였다. 이후, p-type 단결정 실리콘 태양전지의 확산 공정을 진행하여 Non edge isolation 공정을 진행한 경우와 laser를 이용한 edge isolation 공정을 진행한 태양전지를 제작하여 특성을 비교하였다.

• Journal of the Microelectronics and Packaging Society
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• v.19 no.4
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• pp.51-56
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• 2012

In order to fabricate through-Si-vias for thermal vias by using wet etching process, anisotropic etching behavior of Si substrate was investigated as functions of concentration and temperature of TMAH solution in this study. The etching rate of 5 wt%, 10 wt%, and 25 wt% TMAH solutions, of which temperature was maintained at $80^{\circ}C$, was $0.76{\mu}m/min$, $0.75{\mu}m/min$, and $0.30{\mu}m/min$, respectively. With changing the temperature of 10 wt% TMAH solution to $20^{\circ}C$ and $50^{\circ}C$, the etching rate was reduced to $0.067{\mu}m/min$ and $0.233{\mu}m/min$, respectively. Through-Si-vias of $500{\mu}m$-depth could be fabricated by etching a Si substrate for 5 hours in 10 wt% TMAH solution at $80^{\circ}C$ after forming same via-pattern on each side of the Si substrate.

• Journal of Adhesion and Interface
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• v.24 no.3
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• pp.86-94
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• 2023

To fabricate all-solution-processed flexible Organic Light-Emitting Diodes (OLEDs), we demonstrated a bonding technology using a polyethyleneimine (PEI) as an adhesion layer between the two substrates. As the adhesion layer requires not only a high adhesion strength, but also a high current density, we have tried to find out the optimum condition which meets the two requirements at the same time by changing experimental factors such as PEI concentration, thickness of the layer and by mixing some additives into the PEI. The adhesion strength and the electrical current density were investigated by tensile tests and electron only device (EOD) experiments, respectively. The results showed that at higher PEI concentration the adhesion strength showed higher value, but the electrical current through the PEI layer decreased rapidly due to the increased PEI layer thickness. We added Sorbitol and PolyEthyleneGlycohol (PEG) into the 0.1 wt% PEI solution to enhance the adhesion and electrical properties. With the addition of the 0.5 wt% PEG into the 0.1 wt% PEI solution, the device showed an electrical current density of 900 mA/cm² and a good adhesion characteristic also. These data demonstrated the possibility of fabricating all-solution-processed OLEDs using two-substrate bonding technology with the PEI layer as an adhesion layer.

• Applied Chemistry for Engineering
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• v.35 no.1
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• pp.61-65
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• 2024

The effectiveness of CuSCN as a hole injection layer in large-area organic light-emitting diodes, organic solar cells, and thin-film transistors has been well demonstrated. Therefore, in this study, the surface, optical, and electrical analyses of CuSCN were carried out according to the solution process conditions in order to propose optimized film conditions. Various CuSCN solution concentrations were prepared to determine the film surface characteristics and to determine whether the film surface affects the electrical performance of the device. When the CuSCN solution concentration was low, the CuSCN film was not formed and coated in the form of islands, and when the solution concentration was increased, the CuSCN film was formed uniformly, which contributed to improving the conductivity of the device. In addition, a hole-only device was fabricated to demonstrate the role of CuSCN as a hole transport layer.

• Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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• 2006.11a
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• pp.123-124
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• 2006

본 연구에서는 KOH 용액을 사용한 Si 습식 이방성 식각실험 진행 후, 나타나는 표면의 거친 현상을 완화하는 데에 중점을 두고 연구를 진행하였다. 이를 위해 $SiO_2$ 웨이퍼 위에 Photo-lithography 공정으로 형성시킨 PMER 패턴을 Mask로 사용하여 HF 용액으로 $SiO_2$를 식각시켰으며, 형성된 $SiO_2$를 Mask로 사용하여 KOH 용액으로 Si을 식각시켰다. 이 때, KOH와 혼합하는 용액으로 IPA와 Ethan이을 각각 사용하여 실험을 진행하였으며, ESEM을 이용하여 표면을 비교하였다.