• Title/Summary/Keyword: 열화학공정

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Characteristics of CNT Field Effect Transistor (탄소나노튜브 트랜지스터 특성 연구)

  • Park, Yong-Wook;Na, Sang-Yeob
    • The Journal of the Korea institute of electronic communication sciences
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    • v.5 no.1
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    • pp.88-92
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    • 2010
  • Bottom gate and top gate field-effect transistor based carbon nanotube(CNT) were fabricated by CMOS process. Carbon nanotube directly grown by thermal chemical vapor deposition(CVD) using Ethylene ($C_2H_4$) gas at $700^{\circ}C$. The growth properties of CNTs on the device were analyzed by SEM and AFM. The electrical transport characteristics of CNT FET were investigated by I-V measurement. Transport through the nanotubes is dominated by holes at room temperature. By varying the gate voltage, bottom gate and top gate field-effect transistor successfully modulated the conductance of FET device.

Thermodynamic Analysis of Thermochemical Process for Water Splitting (고온열 이용 공정의 열역학적 해석)

  • Kim, Jong-Won;Son, Hyun-Myung;Lee, Sana-Ho;Sim, Kyu-Sung;Jung, Kwang-Deog
    • Transactions of the Korean hydrogen and new energy society
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    • v.13 no.3
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    • pp.204-213
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    • 2002
  • In this work, hydrogen production by a 2-step water-spritting thermochemical cycle based on metal oxides redox pairs was investigated on the bases of the thermodynamics and technical feasibility. Also, a 2nd-law analysis performed on the closed cyclic process indicates a maximum exergy conversion efficiency of 7.1% when using a solar cavity-receiver operated at 2300K and air/Fe3O4 molar ratio = 10.

A determination of economic control limits considering process deterioration (공정의 열화를 고려한 경제적 관리한계 결정)

  • 심윤보;김성집
    • Journal of Korean Society of Industrial and Systems Engineering
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    • v.21 no.45
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    • pp.237-246
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    • 1998
  • In most statistical process control(SPC), control charts are used in which samples are taken and a suitable statistic is determined and plotted. In these control charts, control limits, ${\mu}{\pm}textsc{k{\sigma}}$, from which a decision is made are mostly ${\mu}{\pm}3{\sigma}$ and current literature in control charts are mainly concerned with detecting a shift in the mean. Therefore, when $\sigma$ is increased considerably after a long time, using control limits set at the first time causes a great deal of economic loss. In this paper the solutions to determine new control limits which maximizes the profit per unit produced and reduce $\sigma$ to economically optimal level for a certain cost when $\sigma$ is increased due to process deterioration are proposed. By applying new control limits, $\alpha$ error decreases considerably compared to apply initial control limits when $\sigma$ is increased due to process deterioration. Therefore, false alarm investigation cost drops down to the level of initial a error. And also this solution provides useful information regarding replacement of a process when the process is reviewed regularly.

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Laser-Induced Thermochemical Wet Etching of Mn-Zn Ferrite (Mn-Zn 페라이트의 레이저 유도 열화학 습식식각)

  • Lee, Kyoung-Cheoul;Lee, Cheon
    • Electrical & Electronic Materials
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    • v.10 no.7
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    • pp.668-673
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    • 1997
  • A Single-crystalline Mn-Zn Ferrite (110 orientation) was masklessly etched by focused Ar laser irradiation in an H$_3$PO$_4$ solution. The depth of the etched grooves increases with increasing a laser power, decreasing a scan speed, and increasing the H$_3$PO$_4$concentration. The width of the etched grooves increases with a increasing laser power, but was relatively insensitive to the scan speed and H$_3$PO$_4$concentration. High etching rate of up to 714 ${\mu}{\textrm}{m}$/s and an aspect ratio of 6 for vertical slab structure have been obtained by the light-guiding effect of the laser bean in the H$_3$PO$_4$ solution.

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The Instability Behaviors of Spray-pyrolysis Processed nc-ZnO/ZnO Field-effect Transistors Under Illumination (스프레이 공정을 이용한 nc-ZnO/ZnO 전계효과트랜지스터의 광학적 노출에 대한 열화 현상 분석)

  • Junhee Cho
    • Journal of the Semiconductor & Display Technology
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    • v.22 no.1
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    • pp.78-82
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    • 2023
  • Metal oxide semiconductor (MOS) adapting spray-pyrolysis deposition technique has drawn large attention based on their high quality of intrinsic and electrical properties in addition to simple and low-cost processibility. To fully utilize the merits of MOS field-effect transistors (FETs) , transparency, it is important to understand the instability behaviors of FETs under illumination. Here, we studied the photo-induced properties of nc-ZnO/ZnO field-effect transistors (FETs) based on spray-pyrolysis under illumination which incorporating ZnO nanocrystalline nanoparticles into typical ZnO precursor. Our experiments reveal that nc-ZnO in active layer suppressed the light instabilities of FETs.

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Removal of Tar from Biomass Gasification Process (Biomass Gasification 공정에서 발생하는 Tar 제거연구)

  • Kim, Ju-Hoe;Jo, Young-Min;Kim, Jong-Su;Kim, Sang-Bum
    • Journal of the Korea Academia-Industrial cooperation Society
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    • v.19 no.8
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    • pp.552-561
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    • 2018
  • Biomass, a carbon-neutral resource, is an alternative energy source for exhaustion of fossil fuel and environmental problems. Most of energy production systems using biomass operate with a thermal chemical conversion method. Amongst them, gasification generates syngas and applies to boilers or engines for the production of heat and electricity. However, Tar could be formed during the production of syngas and it is condensed at low temperature which may cause to clog the pipelines and combustion chamber, ultimately resulting in decrease of process efficiency. Thus this work utilized water and oily materials such as soybean oil, waste cooking oil and mineral oil for scrubbing liquid. The removal efficiency of Tar appeared 97%, 70%, 63% and 30% for soybean oil, waste cooking oil, mineral oil and water respectively.

Safety Assessments for the IS(Iodine Sulfur) Process in a Hydrogen Production Facility (수소생산시설에서의 요오드-황 공정에 대한 안전성 평가연구)

  • Lee, Hyon-Woo;Jae, Moo-Sung;Cho, Nam-Chul;Yang, Jon-Eon;Lee, Won-Jae
    • Journal of the Korean Society of Safety
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    • v.24 no.3
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    • pp.54-58
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    • 2009
  • A substitute energy development has been required due to the exhaust of the fossil fuel and an environmental problem. Consequently, possible technologies producing hydrogen from water that does not release carbon is a very promising technology. Also, Iodine-Sulfur(IS) thermochemical water decomposition is one of the promising processes that are used to produce hydrogen efficiently using the high temperature gas-cooled reactor(HTGR) as an energy source that is possible to supply heat over 900$^{\circ}C$. In this study, to make a initiating events identification for the IS process, Master Logic Diagram(MLD) is used and 9 initiating events that cause a leakage of the chemical material are identified. Also, 6 events are identified among 9 initiating events above and are quantified using event tree.

Degradation of electrical characteristics in Bio-FET devices by O2 plasma surface treatment and improving by heat treatment (O2 플라즈마 표면처리에 의한 Bio-FET 소자의 특성 열화 및 후속 열처리에 의한 특성 개선)

  • Oh, Se-Man;Jung, Myung-Ho;Cho, Won-Ju
    • Journal of the Korean Vacuum Society
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    • v.17 no.3
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    • pp.199-203
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    • 2008
  • The effects of surface treatment by $O_2$ plasma on the Bio-FETs were investigated by using the pseudo-MOSFETs on the SOI substrates. After a surface treatment by $O_2$ plasma with different RF powers, the current-voltage and field effect mobility of pseudo-MOSFETs were measured by applying back gate bias. The subthreshold characteristics of pseudo-MOSFETs were significantly degraded with increase of RF power. Additionally, a forming gas anneal process in 2 % diluted $H_2/N_2$ ambient was developed to recover the plasma process induced surface damages. A considerable improvement of the subthreshold characteristics was achieved by the forming gas anneal. Therefore, it is concluded that the pseudo-MOSFETs are a powerful tool for monitoring the surface treatment of Bio-FETs and the forming gas anneal process is effective for improving the electrical characteristics of Bio-FETs.

$CO_2$ 클러스터 표면 처리를 이용한 그래핀 특성 향상에 관한 연구

  • Choe, Hu-Mi;Kim, Jang-A;Jo, Yu-Jin;Hwang, Tae-Hyeon;Lee, Jong-U;Kim, Tae-Seong
    • Proceedings of the Korean Vacuum Society Conference
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    • 2013.02a
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    • pp.655-655
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    • 2013
  • 그래핀은 높은 전자 이동도, 열전도도, 기계적 강도, 유연성 등의 고유한 특성으로 다양한 분야에 응용하기 위한 연구가 수행되고 있으며, 특히 전자 소자에의 적용에 관한 연구가 활발히 이루어지고 있다. 전자 소자에 적용하기 위해서는 성장 및 물성에 관한 규명, 응용 소자에 따른 특성 평가가 필요하다. 이러한 소자 특성은 그래핀 물성에 의한 영향이 기본적이지만 에칭, 전사 등의 공정 중 발생하는 오염, 표면 특성, 잔여물 등에 의한 물성 변화 또한 분석 및 제어에 관한 연구가 필요하다. 열화학증착법(thermal chemical vapor deposition)을 이용한 그래핀 합성은 구리 기판을 사용하며, 합성된 그래핀의 에칭, 박리 및 전사 공정이 있다. 이러한 공정 중 발생하는 오염 입자가 그래핀 표면에 흡착되거나, 제거되지 않은 PMMA 잔여물이 그래핀의 특성에 영향을 미치게 된다. 따라서 본 연구에서는 $CO_2$ 클러스터의 표면 충돌을 이용하여 이러한 오염 물질 및 잔여물을 제거하고 그래핀 표면을 평탄화하는 것에 관한 연구를 수행하였다. 가스 클러스터란 작동기체의 분자가 수십에서 수백 개 뭉쳐 있는 형태를 뜻하며 이렇게 형성된 클러스터는 수 nm 크기를 형성하게 된다. 그리고 짧은 시간의 응축에 의해 수십 nm 크기 까지 성장 하게 된다. 클러스터를 이용한 표면 처리는 충돌에 의한 제거에 기반 한다. 따라서 생성 및 가속되는 클러스터로부터 대상으로 전달되는 운동량의 정도가 세정 특성에 영향을 미치며 이는 생성되는 클러스터의 크기에 종속적이다. 생성 클러스터의 크기 분포는 분사거리, 유량, 분사 각도, 노즐 냉각 온도 등의 변수에 관한 함수이다. 본 연구에서는 이러한 변수들을 제어하여 클러스터를 이용한 그래핀 표면 처리 실험을 수행하였다. 평가는 클러스터 표면 처리 전과 후의 특성 비교에 기반 하였으며, 광학 현미경을 이용한 표면 형상 측정, 라만분광 분석, AFM을 이용한 표면 조도 측정, 그래핀 면저항 측정 결과를 비교하였다. 평가 결과를 통하여 표면 처리를 하지 않은 그래핀에 비하여 면저항과 표면 조도가 낮아지는 것을 확인 할 수 있었다. 또한 클러스터 세정은 300 mm 웨이퍼 크기 이상의 대면적을 짧은 시간에 건식으로 세정할 수 있다는 장점이 있어 향후 최적화를 통해 그래핀 양산 시 특성 향상을 위한 후처리 방법으로 사용될 수 있음을 확인하였다.

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Passivation properties of SiNx and SiO2 thin films for the application of crystalline Si solar cells (결정질 실리콘 태양전지 응용을 위한 SiNx 및 SiO2 박막의 패시베이션 특성 연구)

  • Jeong, Myung-Il;Choi, Chel-Jong
    • Journal of the Korean Crystal Growth and Crystal Technology
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    • v.24 no.1
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    • pp.41-45
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    • 2014
  • We have investigated the passivation property of $SiN_x$ and $SiO_2$ thin films formed using various process conditions for the application of crystalline Si solar cells. An increase in the thickness of $SiN_x$ deposited using plasma enhanced chemical vapor deposition (PECVD) led to the improvement of passivation quality. This could be associated with the passivation of Si dangling bonds by hydrogen atoms which were supplied during PECVD deposition. The $SiO_2$ thin films grown using dry oxidation process exhibited better passivation behavior than those using wet oxidation process, implying the dry oxidation process was more effective in the formation of high quality $SiO_2$ thin films. The relative effective life time gradually decreased with increasing dry oxidation temperature. Such a degradation of passivation behavior could be attributed to the increase in interface trap density caused by thermal damages.