• Title/Summary/Keyword: 상변화메모리

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The Phase-change Memory Characteristics of Ge1Se1Te2 Thin Films for Sb Photo Doping (Sb 광도핑에 의한 Ge1Se1Te2 박막의 상변화 메모리 특성)

  • Nam, Ki-Hyun;Kim, Jang-Han;Chung, Hong-Bay
    • Journal of the Korean Institute of Electrical and Electronic Material Engineers
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    • v.25 no.5
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    • pp.329-333
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    • 2012
  • For phase transition method, good record sensitivity, low heat radiation, fast crystallization and hi-resolution are essential. Also, a retention time is very important part for phase-transition. In our past papers, we chose composition of $Ge_1Se_1Te_2$ material to use a Se factor which has good optical sensitivity than conventional Sb. Sb/Ge-Se-Te thin films are fabricated and irradiated with UV light source to investigate a reversible phase change by Sb-doped condition. Because of Sb atoms, the Sb inserted sample showed better performance than conventional one. We should note that this novel one showed another possibility for phase-change random access memory.

An Improved Contrast Control Method for LCD Monitor (LCD 모니터를 위한 개선된 콘트라스트 제어 방식)

  • 김철순;곽경섭
    • Journal of Korea Multimedia Society
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    • v.5 no.6
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    • pp.609-615
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    • 2002
  • In this paper, we propose a contrast for the improvement of multi-gray scale image on display system. The proposed method distinguishes a maximum value and a minimum value in input fields or frames. By this judgement, the improvement degree of image quality is decided. This method does not require field and frame memory. Moreover, its lower hardware complexity than conventional methods make it easy to apply this method for flat panel display(FPD) which requires real-time processing. And the contrast of input gray level can be controled flexibly by varying the weight the weight value which controls the contrast range. The proposed method gives an image by controlling weighting slope selectively at intervals according to the brightness-control algorithm and the type of image in the look-up table. The function of the proposed method has been verified through Synopsys VHDL and computer simulation. And its results show that the proposed method can improve the quality of image.

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PC-based CMS Development (개인용 컴퓨터를 이용한 Choropleth Map System 개발)

  • 구자용;황철수;김재한;유근배
    • Spatial Information Research
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    • v.2 no.2
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    • pp.107-116
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    • 1994
  • Choropleth map is a type of thematic maps in which areal units are shaded with a color or pattern that symbolizes some characteristic of the mapped unit. CMS was first developed to produce choropleth maps on ordinary microcomputer environments in 1988. Since then there have been significant technological developments and enhancements in user environments, which have affected the field of choropleth mapping systems posi¬tively. A new version of CMS was developed in accordance with these changes. CMS II requires an IBM PC, or compatible, with the minimum 640KB memory and VGA graphic board. It supports HP laser jet printers to output a high resolution map. The program can use Hangul letters for main menu, map title, and legend. And dBase file format (DEW) was implemented to exchange attribute files effectively.

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Conductivity Characteristics of ${Ge_1}{Se_1}{Te_2}$ Amorphous Chalcogenide Thin Film for the Phase-Change Memory Application (상변화 메모리 응용을 위한 ${Ge_1}{Se_1}{Te_2}$ 비정질 칼코게나이드 박막의 전도 록성)

  • Choi, Hyuk;Kim, Hyun-Gu;Cho, Won-Ju;Chung, Hong-Bay
    • Proceedings of the KIEE Conference
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    • 2006.10a
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    • pp.32-33
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    • 2006
  • As next generation nonvolatile memory, chalcogenide-based phase change memory can substitute for a conventional flash memory from its high performance. Also, fast writing speed, low writing voltage, high sensing margin, low power consumption and repetition reliability over $10^{15}$ cycle shows its possibility. At our laboratory, we invented ${Ge_1}{Se_1}{Te_2}$ material to alternate with conventional ${Ge_2}{Sb_2}{Te_5}$ for improve its ability. We respect the ${Ge_1}{Se_1}{Te_2}$ material can be a solution for high power consumption problem and long time at 'set' performance. A conductivity experiment from variable temperature was performed to see reliability of repetition at read and write performance. Compare with conventional ${Ge_2}{Sb_2}{Te_5}$ material, these two materials are used as complex compound to get the finest parameter.

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Stack-Structured Phase Change Memory Cell for Multi-State Storage (멀티비트 정보저장을 위한 적층 구조 상변화 메모리에 대한 연구)

  • Lee, Dong-Keun;Kim, Seung-Ju;Ryu, Sang-Ouk
    • Journal of the Semiconductor & Display Technology
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    • v.8 no.1
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    • pp.13-17
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    • 2009
  • In PRAM applications, the devices can be made for both binary and multi-state storage. The ability to attain intermediate stages comes either from the fact that some chalcogenide materials can exist in configurations that range from completely amorphous to completely crystalline or from designing device structure such a way that mimics multiple phase chase phenomena in single cell. We have designed stack-structured phase change memory cell which operates as multi-state storage. Amorphous $Ge_xTe_{100-x}$ chalcogenide materials were stacked and a diffusion barrier was chosen for each stack layers. The device is operated by crystallizing each chalcogenide material as sequential manner from the bottom layer to the top layer. The amplitude of current pulse and the duration of pulse width was fixed and number of pulses were controlled to change overall resistance of the phase change memory cell. To optimize operational performance the thickness of each chalcogenide was controlled based on simulation results.

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Fabrication and Structural Properties of Ge-Sb-Te Thin Film by MOCVD for PRAM Application (상변화 메모리 응용을 위한 MOCVD 방법을 통한 Ge-Sb-Te 계 박막의 증착 및 구조적인 특성분석)

  • Kim, Ran-Young;Kim, Ho-Gi;Yoon, Soon-Gil
    • Journal of the Korean Institute of Electrical and Electronic Material Engineers
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    • v.21 no.5
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    • pp.411-414
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    • 2008
  • The germanium films were deposited by metal organic chemical vapor deposition using $Ge(allyl)_4$ precursors on TiAlN substrates. Deposition of germanium films was only possible with a presence of $Sb(iPr)_3$, which means that $Sb(iPr)_3$ takes a catalytic role by a thermal decomposition of $Sb(iPr)_3$ for Ge film deposition. Also, as Sb bubbler temperature increases, deposition rate of the Ge films increases at a substrate temperature of $370^{\circ}C$. The GeTe thin films were fabricated by MOCVD with $Te(tBu)_2$ on Ge thin film. The GeTe films were grown by the tellurium deposition at $230-250^{\circ}C$ on Ge films deposited on TiAlN electrode in the presence of Sb at $370^{\circ}C$. The GeTe film growth on Ge films depends on the both the tellurium deposition temperature and deposition time. Also, using $Sb(iPr)_3$ precursor, GeSbTe films with hexagonal structures were fabricated on GeTe thin films. GeSbTe films were deposited in trench structure with 200 nm*120 nm small size.

The properties of Sb-doped $Ge_{1}Se_{1}Te_{2}$ thin films application for Phase-Change Random Access Memory (상변화 메모리 응용을 위한 Sb-doped $Ge_{1}Se_{1}Te_{2}$ 박막의 특성)

  • Nam, Ki-Hyeon;Choi, Hyuk;Ju, Long-Yun;Chung, Hong-Bay
    • Proceedings of the KIEE Conference
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    • 2007.07a
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    • pp.1329-1330
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    • 2007
  • Phase-change random access memory(PRAM) has many advantages compare with the existing memory. For example, fast programming speed, low programming voltage, high sensing margin, low power consume and long cyclability of read/write. Though it has many advantages, there are some points which must be improved. So, we invented and studied new constitution of $Ge_{1}Se_{1}Te_{2}$ chalcogenide material. Actually, the performance properties have been improved surprisingly. However, crystallization time was as long as ever for amorphization time. In this paper, we studied in order to make set operation time and reset operation voltage reduced. In the present work, by alloying Sb in $Ge_{1}Se_{1}Te_{2}$. we could confirm that improved its set operation time and reset operation voltage. As a result, the method of Sb-alloyed $Ge_{1}Se_{1}Te_{2}$ can be solution to decrease the set operation time and reset operation voltage.

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Electrical Properties of Phase Change Memory Device with Novel GST/TiAlN structure (Novel GST/TiAlN 구조를 갖는 상변화 메모리 소자의 전기적 특성)

  • Lee, Nam-Yeal;Choi, Kyu-Jeong;Yoon, Sung-Min;Ryu, Sang-Ouk;Park, Young-Sam;Lee, Seung-Yun;Yu, Byoung-Gon
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2005.07a
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    • pp.118-119
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    • 2005
  • PRAM (Phase Change Random Access Memory) is well known to use reversible phase transition between amorphous (high resistance) and crystalline (low resistance) states of chalcogenide thin film by electrical Joule heating. In this paper, we introduce a stack-type PRAM device with a novel GST/TiAlN structures (GST and a heating layer of TiAlN), and report its electrical switching properties. XRD analysis result of GST thin film indicates that the crystallization of the GST film start at about $200^{\circ}C$. Electrical property results such as I-V & R-V show that the phase change switching operation between set and reset states is observed, as various input electrical sources are applied.

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A high performance nonvolatile memory cell with phase change material of $Ge_1Se_1Te_2$ ($Ge_1Se_1Te_2$ 상변화 재료를 이용한 고성능 비휘발성 메모리에 대한 연구)

  • Lee, Jae-Min;Shin, Kyung;Chung, Hong-Bay
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2005.07a
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    • pp.15-16
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    • 2005
  • Chalcogenide phase change memory has high performance to be next generation memory, because it is a nonvolatile memory processing high programming speed, low programming voltage, high sensing margin, low consumption and long cycle duration. We have developed a new material of PRAM with $Ge_1Se_1Te_2$. This material has been propose to solve the high energy consumption and high programming current. We have investigated the phase transition behaviors in function of various process factor including contact size, cell size, and annealing time. As a result, we have observed that programming voltage and writing current of $Ge_1Se_1Te_2$ are more improved than $Ge_2Sb_2Te_5$ material.

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Electrical Characteristics of and Temperature Distribution in Chalcogenide Phase Change Memory Devices Having a Self-Aligned Structure (자기정렬구조를 갖는 칼코겐화물 상변화 메모리 소자의 전기적 특성 및 온도 분포)

  • Yoon, Hye Ryeon;Park, Young Sam;Lee, Seung-Yun
    • Journal of the Korean Institute of Electrical and Electronic Material Engineers
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    • v.32 no.6
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    • pp.448-453
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    • 2019
  • This work reports the electrical characteristics of and temperature distribution in chalcogenide phase change memory (PCM) devices that have a self-aligned structure. GST (Ge-Sb-Te) chalcogenide alloy films were formed in a self-aligned manner by interdiffusion between sputter-deposited Ge and $Sb_2Te_3$ films during thermal annealing. A transmission electron microscopy-energy dispersive X-ray spectroscopy (TEM-EDS) analysis demonstrated that the local composition of the GST alloy differed significantly and that a $Ge_2Sb_2Te_5$ intermediate layer was formed near the $Ge/Sb_2Te_3$ interface. The programming current and threshold switching voltage of the PCM device were much smaller than those of a control device; this implies that a phase transition occurred only in the $Ge_2Sb_2Te_5$ intermediate layer and not in the entire thickness of the GST alloy. It was confirmed by computer simulation, that the localized phase transition and heat loss suppression of the GST alloy promoted a temperature rise in the PCM device.