• Title/Summary/Keyword: 동작가스

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A Combination Study on the Elevation Motion Friction Compensation Parameters in Gas Spring (1) (가스 스프링 Elevation 동작 마찰력 보상 변수 조합 연구 (1))

  • Lee, Jeong-Ick
    • Journal of the Korea Academia-Industrial cooperation Society
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    • v.18 no.5
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    • pp.657-666
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    • 2017
  • In this study, factor analysis was performed to reduce the friction in the elevation motion of a stand for a 50-inchtelevision. Pipe type cross-section control was used for accurate positioning control of the piston rod. The pipe type was also compared with a labyrinth-type crosssection for the orifice. The frictional force was then reduced using gas seal lip technology. Specifications were chosen, and a volume compensation experiment was carried out using an apparatus for compensating the volume of the cylinder, which is compressed by the volume of the piston rod. Based on CAE and experimental considerations, the labyrinth-type orifice is preferred for reducing friction. For the gas seal lip technology, outer and inner diameters of ${\Phi}20$ and ${\Phi}8$ for the hollow rod were more appropriate when assuming the weight of a 50-inch television to be 30kgf. The third is that the result of total consideration in stability problem and performance of volume compensation for specification decision and volume compensation experiment is determined the final speculation of hollow rod ?8x?4 and riveting system. The last is that the labyrinth orifice is not founded that of the ${\O}0.4{\sim}0.6$ orifice both tests on 300 mm intervals.

Fabrication and Temperature Compensation of Silicon Piezoresistive Absolute Pressure Sensor for Gas Leakage Alarm System (가스누출 감지용 실리콘 압저항형 절대압센서의 제조 및 온도보상)

  • Son, Seung-Hyun;Kim, Woo-Jeong;Choi, Sie-Young
    • Journal of Sensor Science and Technology
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    • v.7 no.3
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    • pp.171-178
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    • 1998
  • Silicon piezoresistive absolute pressure sensor for gas leakage alarm system was developed. This sensor must operate normally in the range of $0{\sim}600\;mmH_{2}O$ pressure, and $0{\sim}100^{\circ}C$ temperature. To make the most of this sensor for gas leakage alarm system, gas must not leak from the sensor itself when the diaphragm of the sensor fractures. Thus, the sealed diaphragm cavity was anodically bonded to pyrex 7740 glass under the condition of $10^{-4}$ torr, at $400^{\circ}C$. The sensitivity of developed sensor was $4.06{\mu}V/VmmH_{2}O$ for $600\;mmH_{2}O$ full-scale pressure range. And temperature compensation method of this sensor is to change bridge-in put-voltage linearly in proportion to the temperature variation by using diode(PXIN4001) or Al thin film resistor. By these methods the temperature effect in the range of $0{\sim}100^{\circ}C$ was compensated over 80 % for offset drift, 95 % for sensitivity.

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Characteristics of Si Floating Gate Nonvolatile Memory Based on Schottky Barrier Tunneling Transistor (쇼트키 장벽 관통 트랜지스터 구조를 적용한 실리콘 나노점 부유 게이트 비휘발성 메모리 특성)

  • Son, Dae-Ho;Kim, Eun-Kyeom;Kim, Jeong-Ho;Lee, Kyung-Su;Yim, Tae-Kyung;An, Seung-Man;Won, Sung-Hwan;Sok, Jung-Hyun;Hong, Wan-Shick;Kim, Tae-You;Jang, Moon-Gyu;Park, Kyoung-Wan
    • Journal of the Korean Vacuum Society
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    • v.18 no.4
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    • pp.302-309
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    • 2009
  • We fabricated a Si nano floating gate memory with Schottky barrier tunneling transistor structure. The device was consisted of Schottky barriers of Er-silicide at source/drain and Si nanoclusters in the gate stack formed by LPCVD-digital gas feeding method. Transistor operations due to the Schottky barrier tunneling were observed under small gate bias < 2V. The nonvolatile memory properties were investigated by measuring the threshold voltage shift along the gate bias voltage and time. We obtained the 10/50 mseconds for write/erase times and the memory window of $\sim5V$ under ${\pm}20\;V$ write/erase voltages. However, the memory window decreased to 0.4V after 104seconds, which was attributed to the Er-related defects in the tunneling oxide layer. Good write/erase endurance was maintained until $10^3$ write/erase times. However, the threshold voltages moved upward, and the memory window became small after more write/erase operations. Defects in the LPCVD control oxide were discussed for the endurance results. The experimental results point to the possibility of a Si nano floating gate memory with Schottky barrier tunneling transistor structure for Si nanoscale nonvolatile memory device.

Improvement of Electrical Characteristics in Double Gate a-IGZO Thin Film Transistor

  • Lee, Hyeon-U;Jo, Won-Ju
    • Proceedings of the Korean Vacuum Society Conference
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    • 2016.02a
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    • pp.311-311
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    • 2016
  • 최근 고성능 디스플레이 개발이 요구되면서 기존 비정질 실리콘(a-Si)을 대체할 산화물 반도체에 대한 연구 관심이 급증하고 있다. 여러 종류의 산화물 반도체 중 a-IGZO (amorphous indium-gallium-zinc oxide)가 높은 전계효과 이동도, 저온 공정, 넓은 밴드갭으로 인한 투명성 등의 장점을 가지며 가장 연구가 활발하게 보고되고 있다. 기존에는 SG(단일 게이트) TFT가 주로 제작 되었지만 본 연구에서는 DG(이중 게이트) 구조를 적용하여 고성능의 a-IGZO 기반 박막 트랜지스터(TFT)를 구현하였다. SG mode에서는 하나의 게이트가 채널 전체 영역을 제어하지만, double gate mode에서는 상, 하부 두 개의 게이트가 동시에 채널 영역을 제어하기 때문에 채널층의 형성이 빠르게 이루어지고, 이는 TFT 스위칭 속도를 향상시킨다. 또한, 상호 모듈레이션 효과로 인해 S.S(subthreshold swing)값이 낮아질 뿐만 아니라, 상(TG), 하부 게이트(BG) 절연막의 계면 산란 현상이 줄어들기 때문에 이동도가 향상되고 누설전류 감소 및 안정성이 향상되는 효과를 얻을 수 있다. Dual gate mode로 동작을 시키면, TG(BG)에는 일정한 positive(or negative)전압을 인가하면서 BG(TG)에 전압을 가해주게 된다. 이 때, 소자의 채널층은 depletion(or enhancement) mode로 동작하여 다른 전기적인 특성에는 영향을 미치지 않으면서 문턱 전압을 쉽게 조절 할 수 있는 장점도 있다. 제작된 소자는 p-type bulk silicon 위에 thermal SiO2 산화막이 100 nm 형성된 기판을 사용하였다. 표준 RCA 클리닝을 진행한 후 BG 형성을 위해 150 nm 두께의 ITO를 증착하고, BG 절연막으로 두께의 SiO2를 300 nm 증착하였다. 이 후, 채널층 형성을 위하여 50 nm 두께의 a-IGZO를 증착하였고, 소스/드레인(S/D) 전극은 BG와 동일한 조건으로 ITO 100 nm를 증착하였다. TG 절연막은 BG 절연막과 동일한 조건에서 SiO2를 50 nm 증착하였다. TG는 S/D 증착 조건과 동일한 조건에서, 150 nm 두께로 증착 하였다. 전극 물질과, 절연막 물질은 모두 RF magnetron sputter를 이용하여 증착되었고, 또한 모든 patterning 과정은 표준 photolithography, wet etching, lift-off 공정을 통하여 이루어졌다. 후속 열처리 공정으로 퍼니스에서 질소 가스 분위기, $300^{\circ}C$ 온도에서 30 분 동안 진행하였다. 결과적으로 $9.06cm2/V{\cdot}s$, 255.7 mV/dec, $1.8{\times}106$의 전계효과 이동도, S.S, on-off ratio값을 갖는 SG와 비교하여 double gate mode에서는 $51.3cm2/V{\cdot}s$, 110.7 mV/dec, $3.2{\times}108$의 값을 나타내며 훌륭한 전기적 특성을 보였고, dual gate mode에서는 약 5.22의 coupling ratio를 나타내었다. 따라서 산화물 반도체 a-IGZO TFT의 이중게이트 구조는 우수한 전기적 특성을 나타내며 차세대 디스플레이 시장에서 훌륭한 역할을 할 것으로 기대된다.

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Study on High-speed Cyber Penetration Attack Analysis Technology based on Static Feature Base Applicable to Endpoints (Endpoint에 적용 가능한 정적 feature 기반 고속의 사이버 침투공격 분석기술 연구)

  • Hwang, Jun-ho;Hwang, Seon-bin;Kim, Su-jeong;Lee, Tae-jin
    • Journal of Internet Computing and Services
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    • v.19 no.5
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    • pp.21-31
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    • 2018
  • Cyber penetration attacks can not only damage cyber space but can attack entire infrastructure such as electricity, gas, water, and nuclear power, which can cause enormous damage to the lives of the people. Also, cyber space has already been defined as the fifth battlefield, and strategic responses are very important. Most of recent cyber attacks are caused by malicious code, and since the number is more than 1.6 million per day, automated analysis technology to cope with a large amount of malicious code is very important. However, it is difficult to deal with malicious code encryption, obfuscation and packing, and the dynamic analysis technique is not limited to the performance requirements of dynamic analysis but also to the virtual There is a limit in coping with environment avoiding technology. In this paper, we propose a machine learning based malicious code analysis technique which improve the weakness of the detection performance of existing analysis technology while maintaining the light and high-speed analysis performance applicable to commercial endpoints. The results of this study show that 99.13% accuracy, 99.26% precision and 99.09% recall analysis performance of 71,000 normal file and malicious code in commercial environment and analysis time in PC environment can be analyzed more than 5 per second, and it can be operated independently in the endpoint environment and it is considered that it works in complementary form in operation in conjunction with existing antivirus technology and static and dynamic analysis technology. It is also expected to be used as a core element of EDR technology and malware variant analysis.

$In_2O_3$ Thin Film Ozone Sensor Prepared by Sol-Gel Method (졸-겔법을 이용한 $In_2O_3$ 박막의 오존 센서)

  • Lee, Yun-Su;Song, Kap-Duk;Choi, Nak-Jin;Joo, Byung-Su;Kang, Bong-Hwi;Lee, Duk-Dong
    • Journal of Sensor Science and Technology
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    • v.10 no.2
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    • pp.101-107
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    • 2001
  • A highly selective, sensitive and reliable ozone sensing $In_2O_3$ thin film was fabricated by a sol-gel method. The fabricated film is operated at a relatively lower temperature than ever developed thin films and saved operating power. $In_2O_3$ films deposited by sol-gel technique has been recently attracted because it is an economical and energy saving method and precisely controlled microstructure. Indium alkoxide precursor was synthesized from the reaction between indium hydroxide and butanol. PVA binder was used to improve adhesion of the films. The $In_2O_3$ thin films were obtained by spin coating from 1 to 5 times followed by drying at $100^{\circ}C$ and calcining at $600^{\circ}C$ for 1h. The film thickness was controlled by the number of coating time. The morphology and the thickness of the $In_2O_3$ films were examined by a SEM and XRD. The $In_2O_3$ thin films show a high sensitive to ozone gas at operating temperature of $250^{\circ}C$. The $In_2O_3$ sensor has very good selectivity to $CH_4$, CO, $C_4H_{10}$ and ethanol.

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$CO_{2}$ sensing characteristics of solid electrolyte gas sensor with the sensing membrane prepared by the mixture of alkali metal carbonate and binder (알카리 금속 탄산염과 결착제의 혼합물을 감지물질로 하는 고체전해질 가스센서의 $CO_{2}$ 감응 특성)

  • Chai, Yu-Sug;Song, Kap-Duk;Kang, Bong-Hwi;Seo, Moo-Gyo;Lee, Duk-Dong
    • Journal of Sensor Science and Technology
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    • v.7 no.2
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    • pp.111-116
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    • 1998
  • The simple solid electrolyte carbon dioxide sensor with heaters were fabricated by using Li ionic conductor. Two Au electrodes were used for the reference and sensing electrode respectively. Two types of gas sensors, type ( I ) and type (II), were fabricated. Type ( I ) sensor was fabricated by the method of melting and crystallizing alkali metal carbonate at the temperature of $420{\sim}500^{\circ}C$. The sensing membrane of type (II) sensor was formed by the printing method on sensing electrode after metal carbonate was mixed with binder. The response characteristics of sensors fabricated for the carbon dioxide were investigated for a range of $CO_{2}$ concentration from 950 ppm to 9,950 ppm at operating temperature $420^{\circ}C$. Type ( I ) sensor and type (II) sensor showed the sensitivity of 62 mV/decade and 65 mV/decade respectively. The emf/decade of type (II) sensor tested at $420^{\circ}C$ almost followed the theoretical value of Nernst's equation and showed stable response characteristics with the fast response time of $15{\sim}20$ sec. Also type (II) sensor showed excellent stability and reproduction properties for 60 days.

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마이크로볼로미터 IR 소자의 응답도 특성의 진공도 의존성 연구

  • Han, Myeong-Su;Han, Seok-Man;Sin, Jae-Cheol;Go, Hang-Ju;Kim, Hyo-Jin
    • Proceedings of the Korean Vacuum Society Conference
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    • 2013.02a
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    • pp.361-361
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    • 2013
  • 비냉각 적외선 검출소자는 빛이 전혀 없는 환경에서도 사물을 감지하는 열상장비의 핵심소자이다. 마이크로볼로미터 적외선 검출기는 상온에서 동작하며, 온도안정화를 위해 TEC를 장착하여 진공패키지로 조립된다. 패키지는 진공을 유지할 수 있도록 일반적으로 메탈로 제작되며, 단가 감소 및 생산성 증대를 위해 wafer level packaging 방법을 이용한다. 마이크로볼로미터의 특성은 패키지의 진공 변화에 매우 민감하다. 센서의 감도를 증가시키기 위해서는 진공환경을 유지해야 한다. 볼로미터 소자의 특성은 상압에서 열전도는 기판과 멤브레인 사이의 에어갭을 통해 열손실을 야기하므로 센서의 반응도가 현저히 줄어든다. 에어갭이 1 um 정도 되더라도 그 사이에 존재하는 열전도가 가능하므로 진공을 유지하여 열고립 상태를 증대시킬 수 있다. 이에 본 연구에서는 소자의 동작시 압력, 즉 진공도가 볼로미터 소자의 반응도 특성에 미치는 영향을 조사하였다. 마이크로볼로미터 소자는 $2{\times}8$ 어레이 형태로 제작하였으며, metal pad를 각 단위셀에 배치하였으며, 공통전극으로 한 개의 metal pad를 넣어 설계하였다. 흡수체로써 VOx를 사용하였으며, 열 고립구조를 위해 2.5 um 공명 흡수층의 floating 구조로 멤브레인을 형성하였다. 진공패키지는 메탈패키지를 제작하여 볼로미터 칩을 TEC 위에 장착하였으며, 신호의 감지를 위해 가변저항을 매칭시켰다. 반응도는 신호 대 잡음 값을 획득하여 소자에 도달하는 적외선 에너지에 대해 반응하는 값을 계산에 의해 얻어내는 것이다. 픽셀 크기는 $50{\times}50$ um이며, 패키지 조립 공정 후 온도변화에 따른 저항 측정을 통해 TCR 값을 얻었다. 이때 TCR은 약 -2.5%/K으로 나타났다. $2{\times}8$의 4개 단위소자에 대해 측정한 값은 균일하게 TCR 값이 나타났다. 광반응 특성은 볼로미터 단위소자에 대해서 먼저 고진공(5e-6 torr) 하에서 측정하였으며, 반응도는 25,000 V/W의 값을 나타내었고, 탐지도는 약 2e+8 $cmHz_{1/2}$/W로 나타났다. 패키지의 압력 조절을 위해 TMP 및 로터리 펌프를 이용하여 100 torr에서 1e-4 torr의 범위에서 압력조절 밸브를 이용하여 질소가스의 압력으로 진공도를 변화시켰다. 적외선 반응신호는 압력이 증가함에 따라 감소하였으며, 2e-1 torr의 압력에서 신호의 크기가 감소하기 시작하여 5 torr에서 반응도의 1/2 값을 나타냄을 알 수 있었다. 30 torr 이상에서는 신호가 잡음값 과거의 동일하여 신호대 잡음비가 1로 나타남을 알 수 있었다. 또한 진공도 변화에 대해, 흑체온도에 따른 반응도 및 탐지도의 특성을 조사한 결과를 발표한다. 반응도의 증가를 위해 진공도는 진공도는 1e-2 torr 이하의 압력을 유지해야 함을 본 실험을 통해 알 수 있었다.

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Electrical Properties of ITO and ZnO:Al Thin Films and Brightness Characteristics of PDP Cell with ITO and ZnO:Al Transparent Electrodes (ITO와 ZnO:Al 투명전도막의 전기적 특성 및 PDP 셀의 휘도 특성)

  • Kwak, Dong-Joo
    • Journal of the Korean Institute of Illuminating and Electrical Installation Engineers
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    • v.20 no.7
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    • pp.6-13
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    • 2006
  • Tin doped indium oxide(ITO) and Al doped zinc oxide(ZnO:Al) films, which are widely used as a transparent conductor in optoelectronic devices, were prepared by using the capacitively coupled DC magnetron sputtering method. ITO and ZnO:Al films with the optimum growth conditions showed each resistivity of $1.67{\times}10^{-3}[{\Omega}-cm],\;2.2{\times}10^{-3}[{\Omega}-cm]$ and transmittance of 89.61[%], 90.88[%] in the wavelength range of the visible spectrum. The two types of 5 inch-PDP cells with ZnO:Al and ITO transparent electrodes were made under the same manufacturing conditions. The PDP cell with ZnO:Al film was optimally operated in the mixing gas rate of Ne(base)-Xe(8[%]), and at gas pressure of 400[Torr]. It also shows the average measured brightness of $836[cd/m^2]$ at voltage range of $200{\sim}300$[V]. Luminous efficiency, one of the key parameter for high brightness and low power consumption, ranges from 1.2 to 1.6[lm/W] with increasing frequency of ac power supplier from 10 to 50[Khz]. The brightness and luminous efficiency are lower than those with ITO electrode by about 10[%]. However, these values are considered to be enough for the normal operation of PDP TV.

Characteristics and Fabrication of Micro-Gas Sensors with Heater and Sensing Electrode on the Same Plane (동일면상에 heater와 감지전극을 형성한 마이크로가스센서의 제작 및 특성)

  • Lim, Jun-Woo;Lee, Sang-Mun;Kang, Bong-Hwi;Chung, Wan-Young;Lee, Duk-Dong
    • Journal of Sensor Science and Technology
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    • v.8 no.2
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    • pp.115-123
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    • 1999
  • A micro-gas sensor with heater and sensing electrode on the same plane was fabricated on phosphosilicate glass(PSG, 800nm)/$Si_3N_4$ (150nm) dielectric membrane. PSG film was provided by atmospheric pressure chemical vapor deposition(APCVD), and $Si_3N_4$ film by low pressure chemical vapor deposition (LPCVD). Total area of the fabricated device was $3.78{\times}3.78mm^2$. The area of diaphragm was $1.5{\times}1.5mm^2$, and that of the sensing layer was $0.24{\times}0.24mm^2$. Finite-element simulation was employed to estimate temperature distribution for a square-shaped diaphragm. The power consumption of Pt heater was about 85mW at $350^{\circ}C$. Tin thin films were deposited on the silicon substrate by thermal evaporation at room temperature and $232^{\circ}C$, and tin oxide films($SnO_2$) were prepared by thermal oxidation of the metallic tin films at $650^{\circ}C$ for 3 hours in oxygen ambient. The film analyses were carried out by SEM and XRD techniques. Effects of humidity and ambient temperature on the resistance of the sensing layer were found to be negligible. The fabricated micro-gas sensor exhibited high sensitivity to butane gas.

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