• Title/Summary/Keyword: 다이싱 공정

Search Result 11, Processing Time 0.014 seconds

Effect of Dual-Dicing Process Adopted for Silicon Wafer Separation on Thermal-Cycling Reliability of Semiconductor Devices (실리콘 웨이퍼에 2중 다이싱 공정의 도입이 반도체 디바이스의 T.C. 신뢰성에 미치는 영향)

  • Lee, Seong-Min
    • Journal of the Microelectronics and Packaging Society
    • /
    • v.16 no.4
    • /
    • pp.1-4
    • /
    • 2009
  • This work shows how the adoption of a dual-dicing process for silicon wafer separation affects the thermal-cycling reliability (i.e. $-65^{\circ}C$ to $150^{\circ}C$) of the semiconductor devices utilizing lead-on-chip (LOC) die attach technique. In-situ examinations show that conventional single-dicing process directly attacks the edge region of diced devices but dual-dicing process effectively protects the edge region of diced devices from dicing-induced mechanical damage. Probably, this is because the preferential and sacrificial fracture of notched regions induced on the active surface of wafers saves the edge regions. It was also investigated through thermal-cycling tests that the number of thermal-cycling induced failures is much lower at the dual-dicing process than the single-dicing process.

  • PDF

A Study on a Laser Dicing and Drilling Machine for Si Thin-Wafer (UV 레이저를 이용한 Si Thin 웨이퍼 다이싱 및 드릴링 머신)

  • Lee, Young-Hyun;Choi, Kyung-Jin
    • Proceedings of the KIEE Conference
    • /
    • 2004.11c
    • /
    • pp.478-480
    • /
    • 2004
  • 다이아몬드 톱날을 이용한 얇은 Si 웨이퍼의 기계적인 다이싱은 chipping, crack 등의 문제점을 발생시킨다. 또한 stacked die 나 multi-chip등과 같은 3D-WLP(wafer level package)에서 via를 생성하기 위해 현재 사용되는 화학적 etching은 공정속도가 느리고 제어가 힘들며, 공정이 복잡하다는 문제점을 가지고 있다. 이러한 문제점을 해결하기 위해 현재 연구되고 있는 분야가 레이저를 이용한 웨이퍼 다이싱 및 드릴링이다. 본 논문에서는 UV 레이저를 이용한 얇은 Si 웨이퍼 다이싱 및 드릴링 시스템에 대해 소개하고, 웨이퍼 다이싱 및 드릴링 실험결과를 바탕으로 적절한 레이저 및 공정 매개변수에 대해 설명한다.

  • PDF

Fabrication of Organic-Inorganic Nanocomposite Blade for Dicing Semiconductor Wafer (반도체 웨이퍼 다이싱용 나노 복합재료 블레이드의 제작)

  • Jang, Kyung-Soon;Kim, Tae-Woo;Min, Kyung-Yeol;Lee, Jeong-Ick;Lee, Kee-Sung
    • Composites Research
    • /
    • v.20 no.5
    • /
    • pp.49-55
    • /
    • 2007
  • Nanocomposite blade for dicing semiconductor wafer is investigated for micro/nano-device and micro/nano-fabrication. While metal blade has been used for dicing of silicon wafer, polymer composite blades are used for machining of quartz wafer in semiconductor and cellular phone industry in these days. Organic-inorganic material selection is important to provide the blade with machinability, electrical conductivity, strength, ductility and wear resistance. Maintaining constant thickness with micro-dimension during shaping is one of the important technologies fer machining micro/nano fabrication. In this study the fabrication of blade by wet processing of mixing conducting nano ceramic powder, abrasive powder phenol resin and polyimide has been investigated using an experimental approach in which the thickness differential as the primary design criterion. The effect of drying conduction and post pressure are investigated. As a result wet processing techniques reveal that reliable results are achievable with improved dimension tolerance.

Study of high Speed Laser Cutting of LED Module (LED 모듈의 초고속 레이저 절단을 위한 연구)

  • Choi, Won Yong;Choa, Sung-Hoon
    • Journal of the Microelectronics and Packaging Society
    • /
    • v.24 no.1
    • /
    • pp.91-101
    • /
    • 2017
  • In this study, we conducted the preliminary research for high speed laser cutting of LED module. In particular, the feasibility of ultra-high speed laser cutting of 100 mm/s which exceeds the cutting speed of conventional dicing saw was examined. For this, copper/ceramic and silicone/ceramic hybrid substrates, which are the components of the LED module, were fabricated, and the surface morphology, surface roughness and flexural strength of the laser-cut samples were investigate and compared with the dicing-cut samples. To investigate optimal laser cutting conditions for hybrid substrates, the effects of various laser cutting conditions on cutting surface characteristics were studied using single ceramic and copper substrate. Optimal laser cutting conditions of the hybrid substrates were the use of Ar assist gas, high laser power and high assist gas pressure. Comparing the cutting surface of the hybrid substrates, the surface characteristics of the laser-cut samples are slightly inferior to those of the dicing-cut samples. The average surface roughness of the laser-cut samples was about $9{\mu}m$, and that of the dicing-cut samples was about $4{\mu}m$. However, considering very low cutting speed (3 mm/s) of the dicing saw, the surface morphology of the laser-cut sample was relatively uniform, and the surface roughness was not much different from that of the dicing-cut sample. The flexural strength of the laser-cut samples was equivalent to or slightly inferior to the flexural strength of dicing-cut samples. However, if the laser processing conditions are sufficiently optimized, the ultra-high speed laser cutting of the LED module will be possible.

A Point of Production System for Semiconductor Wafer Dicing Process (반도체 웨이퍼 다이싱 공정을 위한 생산시점 정보관리시스템)

  • Kim, In-Ho
    • Journal of the Korea Society of Computer and Information
    • /
    • v.14 no.10
    • /
    • pp.55-61
    • /
    • 2009
  • This paper describes a point of production(POP) system which collects and manages real-time shop floor machining information in a wafer dicing process. The system are composed of POP terminal, line controller and network. In the configuration of the system, LAN and RS485 network are used for connection with the upper management system and down stratum respectively. As a bridge between POP terminal and server, a line controller is used. The real-time information which is the base of production management are collected from information resources such as machine, product and worker. The collected information are used for the calculation of optimal cutting condition. The collection of the information includes cutting speed, spout of pure water, accumulated count of cut in process for blade and wafer defect. In order to manage machining information in wafer dicing process, production planning information is delivered to the shop floor, and production result information is collected from the shop floor, delivered to the server and used for managing production plan. From the result of the system application, production progress status, work and non-working hour analysis for each machine, and wafer defect analysis are available, and they are used for quality and productivity improvements in wafer dicing process. A case study is implemented to evaluate the performance of the system.

PC 기반의 다이싱 공정 자동화 시스템 개발

  • 김형태;양해정;송창섭
    • Journal of the Korean Society for Precision Engineering
    • /
    • v.17 no.3
    • /
    • pp.47-57
    • /
    • 2000
  • In this study, PC-based dicing machine and driving software were constructed for the purpose of automation of wafer cutting process. To automate the machine, hard automation including vision, loading, and software were considered in the development. Auto loading device and vision system were adopted for the increase of productivity, GUI software programmed for the expedient operation. The dicing machine is operated by the control algorithm and some parameters. It is verified that this kind of PC based automation has a great potential compared with the conventional dicing machine when applied to manufacturing some kinds of wafers as a test purpose.

  • PDF

Preparation of Silica Nanoparticles via Recycling of Silicon Sludge from Semiconductor Dicing Process and Electro-responsive Smart Fluid Application (반도체 다이싱 공정에서 발생하는 실리콘 슬러지를 재활용한 실리카 나노입자의 제조 및 전기감응형 유체로의 응용)

  • Yeon-Ryong Chu;Suk Jekal;Jiwon Kim;Ha-Yeong Kim;Chan-Gyo Kim;Minki Sa;Hyung Sub Sim;Chang-Min Yoon
    • Journal of the Korea Organic Resources Recycling Association
    • /
    • v.31 no.3
    • /
    • pp.15-25
    • /
    • 2023
  • In this study, silicon sludge from semiconductor dicing process is recycled to fabricate silica nanoparticles, which are applied as dispersing materials for electro-responsive (ER) smart fluid. In specific, metal impurities are removed from silicon sludge by acid washing to obtain the high-purity silicon powder. And then, silica nanoparticles are synthesized by facile hydrothermal method employing the silicon powder as reactant material. To control the size of silica nanoparticles, the reaction time of hydrothermal method is varied as 8, 15, 20, and 30 hours are applied to control the size of silica nanoparticles. Sizes of silica nanoparticles are increased proportionally to the reaction time owing to the increased numbers of hydrolysis and condensation reactions. As-synthesized silica nanoparticles are prepared as electro-responsive smart fluids by dispersing into silicon oil. Silica nanoparticles synthesized by 30 hours of hydrothermal reaction (SiO2-H30) exhibit the highest shear stress of 21.4 Pa under an applied electric field strength of 3.0kV mm-1. Such enhancement in ER performance of SiO2-H30 among various silica nanoparticles are attribute to the reinforcing effect originated from the mixed particle size, which allowing the formation of rigid chain-like structures. Accordingly, this study successfully propose a recycling method of silicon sludge to synthesize silica nanoparticles and their derived ER fluids, which may suggest new possibility to ESG management emphasizing the eco-friendliness.

A study on the automatic wafer alignment in semiconductor dicing (반도체 절단 공정의 웨이퍼 자동 정렬에 관한 연구)

  • 김형태;송창섭;양해정
    • Journal of the Korean Society for Precision Engineering
    • /
    • v.20 no.12
    • /
    • pp.105-114
    • /
    • 2003
  • In this study, a dicing machine with vision system was built and an algorithm for automatic alignment was developed for dual camera system. The system had a macro and a micro inspection tool. The algorithm was formulated from geometric relations. When a wafer was put on the cutting stage within certain range, it was inspected by vision system and compared with a standard pattern. The difference between the patterns was analyzed and evaluated. Then, the stage was moved by x, y, $\theta$ axes to compensate these differences. The amount of compensation was calculated from the result of the vision inspection through the automatic alignment algorithm. The stage was moved to the compensated position and was inspected by vision for checking its result again. Accuracy and validity of the algorithm was discussed from these data.

Synthesis of Pressure-sensitive Acrylic Adhesives with Photoreactive Groups and Their Application to Semiconductor Dicing Tapes (광 반응성기를 갖는 아크릴 점착제의 합성과 반도체 다이싱 테이프로의 적용 연구)

  • Hee-Woong Park;Nam-Gyu Jang;Kiok Kwon;Seunghan Shin
    • Applied Chemistry for Engineering
    • /
    • v.34 no.5
    • /
    • pp.522-528
    • /
    • 2023
  • In this work, adhesive tapes were prepared for the dicing process in semiconductor manufacturing. Compounds with different numbers of photoreactive groups (f = 1 to 3) were synthesized and incorporated into acrylic copolymers to formulate UV-curable acrylic adhesives. Structural confirmation of the synthesized photoreactive compounds (f = 2 or 3) was performed using nuclear magnetic resonance (NMR) spectroscopy. The introduction of the photoreactive compounds into the acrylic adhesive was accomplished by urethane reactions, and the successful synthesis of the UV-curable acrylic adhesive was verified by Fourier transform infrared (FT-IR) measurements. To evaluate the performance of the adhesive, the peel strength was evaluated before and after UV irradiation using a silicon wafer as a substrate. The adhesive exhibited high peel strength (~2000 gf/25 mm) before UV exposure, which was significantly reduced (~5 gf/25 mm) after UV exposure. Interestingly, the adhesive containing multifunctional photoreactive compounds showed the most significant reduction in peel strength. In addition, surface residue measurements by field emission scanning electron microscopy (FE-SEM) showed minimal surface residue (~0.2%) after UV exposure. Overall, these results contribute to the understanding of the behavior of UV-curable acrylic adhesives and pave the way for potential applications in semiconductor manufacturing processes.