• Composites Research
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• v.29 no.4
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• pp.194-202
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• 2016

A graphene film, two-dimensional carbon sheet, is a promising material for future electronic devices and so on. In graphene applications, the effect of substrate on the atomic/electronic structures of graphene is significant, so we studied an interaction between graphene film and substrate. To study the effect, we investigated the graphene films grown on Ni substrate with two crystal face of (111) and (100) by Raman spectroscopy, comparing with graphene films transferred on $SiO_2/Si$ substrate. In our study, the doping effect caused by charge transfer from Ni or $SiO_2/Si$ substrate to graphene was not observed. The bonding force between graphene and Ni substrate is stronger than that between graphene and $SiO_2/Si$. The graphene films grown on Ni substrate showed compressive strain and the growth of graphene films is incommensurate with Ni (100) lattice. The position of 2D band of graphene synthesized on Ni (111) and (100) substrate was different, and this result will be studied in the near future.

• Journal of the Korean institute of surface engineering
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• v.14 no.3
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• pp.137-141
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• 1981

니켈 도금의 표면 조직과 두께에 따른 조직의 변화를 투과 전자 현미경을 사용하여 관찰하였다. epitaxial deposit층의 두께는 도금 용액 속에 들어있는 외부 물질에 따라 변화하게 되며, substrate의 결정 방향에 따라 또한 변화한다. (110)면 보다는 (100)면에 도금했을 때 epitaxial deposit 층의 두께가 더 큰 것을 알 수 있었다. non-epitaxial 층으로 변화되는 과정은 hillock의 생성과 계속되는 Twinning에 의해 이루어졌다.

• Proceedings of the Materials Research Society of Korea Conference
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• 2003.03a
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• pp.144-144
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• 2003

니켈계 내열합금의 성형은 수백 $^{\circ}C$에 이르는 고온에서 이루어지기 때문에 열간성형 과정에서 소재 내부의 미세조직 변화에 대한 이해는 부품의 특성 제어 측면에서 매우 중요하다. 특히 열간 동적 재결정에 의해 발생되는 결정립 구조의 변화를 적절히 조절함으로써 부품의 특성을 극대화 할 수 있다. 본 연구에서는 Ni-Fe계 초내열합금에 대한 고온 압축실험과 압축시편에 대한 EBSD 분석을 통해 열간 변형 과정에서 발생하는 소재 내부의 동적인 결정립 구조의 변화를 정량적으로 분석하고자 하였다. 고온 압축시험은 101$0^{\circ}C$, 1066$^{\circ}C$의 온도 조건과 0.5s-1, 0.005s-1의 변형율 속도 조건에서 최대 진변형율 0.7까지 수행하였으며 진변형율에 따른 결정립 조직 변화를 관찰하기 위해 진변형 율에도 변화를 주어 실험을 수행하였다. 이들 고온 압축시편은 응력방향에 평행한 면에 대한 미세조직 관찰을 통해 재결정립 크기, 분율 및 결정립계의 특성 변화에 대한 정량적 연구를 수행하였다.

• Journal of the Korean Vacuum Society
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• v.17 no.6
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• pp.528-537
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• 2008

60 nm and 20 nm thick hydrogenated amorphous silicon(a-Si:H) layers were deposited on 200 nm $SiO_2$/single-Si substrates by inductively coupled plasma chemical vapor deposition(ICP-CVD). Subsequently, 30 nm-Ni layers were deposited by an e-beam evaporator. Finally, 30 nm-Ni/(60 nm and 20 nm) a-Si:H/200 nm-$SiO_2$/single-Si structures were prepared. The prepared samples were annealed by rapid thermal annealing(RTA) from $200^{\circ}C$ to $500^{\circ}C$ in $50^{\circ}C$ increments for 40 sec. A four-point tester, high resolution X-ray diffraction(HRXRD), field emission scanning electron microscopy(FE-SEM), transmission electron microscopy(TEM), and scanning probe microscopy(SPM) were used to examine the sheet resistance, phase transformation, in-plane microstructure, cross-sectional microstructure, and surface roughness, respectively. The nickel silicide from the 60 nm a-Si:H substrate showed low sheet resistance from $400^{\circ}C$ which is compatible for low temperature processing. The nickel silicide from 20 nm a-Si:H substrate showed low resistance from $300^{\circ}C$. Through HRXRD analysis, the phase transformation occurred with silicidation temperature without a-Si:H layer thickness dependence. With the result of FE-SEM and TEM, the nickel silicides from 60 nm a-Si:H substrate showed the microstructure of 60 nm-thick silicide layers with the residual silicon regime, while the ones from 20 nm a-Si:H formed 20 nm-thick uniform silicide layers. In case of SPM, the RMS value of nickel silicide layers increased as the silicidation temperature increased. Especially, the nickel silicide from 20 nm a-Si:H substrate showed the lowest RMS value of 0.75 at $300^{\circ}C$.

• Proceedings of the Korean Vacuum Society Conference
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• 2010.02a
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• pp.221-221
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• 2010

NiO 산화물 타겟을 이용한 RF 마그네트론 스퍼터 방법로 glass 기판 위에 NiO 온도를 R.T(room temperature)~$400^{\circ}C$ 변화시켜 Ar 가스만을 사용하여 박막을 증착시켜, 증착 온도에 따라 NiO 박막 특성에 미치는 영향을 조사하였다. XRD 측정으로부터 증착된 박막의 결정구조는 $200^{\circ}C$이하에서 (111) 면의 우선 배향성으로 보이다가 $300^{\circ}C$ 이상에서 (220)의 우선 배향성으로 보이는 다결정 입방구조임을 확인하였다. NiO 박막의 전기적 특성의 변화는 기판의 온도가 $200^{\circ}C$까지는 $10^5\;{\Omega}cm$대를 보였고 기판의 온도가 $300^{\circ}C$ 이상에서는 $10^{-2}{\sim}10^{-1}{\Omega}cm$대로 감소하는 것을 관측하였다. 이러한 ${\sim}10^7$ 정도의 큰 저항 변화를 관측하였고, 전기적 변화 특성을 결정성, 결정립의 변화 및 NEXAFS를 통한 밴드 구조 변화 등으로 설명하였다.

• Journal of Conservation Science
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• v.35 no.5
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• pp.440-452
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• 2019

This research has analyzed SI, the traditional steel, and SIHS(SI + HS), SICS(SI + CS), and SINiS(SI + NiS), the materials that were produced through welding and reprocessing three modern steel- HS, CS, and NiS- that have different carbon content. The purpose of the analyzation was to improve the definition of the multi-layered pattern that appears in the forging process. In observing modified structures on the commissures of three modern steel that have different carbon component to the SI, SINiS produced the most significant multi-layered pattern as well as the excellent welding quality. The excellent welding quality was due to the content of nickel which helped the forge welding process with other materials. There was no significant difference in crystal grain per materials, and SICS showed the highest hardness. At the measurement of EPMA for commissures of the materials, SINiS showed the highest definition of the multi-layered pattern due to the nickel and carbon content. The results above showed that the carbon steel with nickel content is the best material for the most definite multi-layered pattern, expressed from the multi-layered structure which is a characteristic of traditional forge welding technology. It is expected that the result of this research can be utilized as the technical data in further researches regarding the relics excavated from ancient welding process and their multi-layered structure and patterns.

• Journal of the Korea Academia-Industrial cooperation Society
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• v.18 no.5
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• pp.16-21
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• 2017

The aim of this study was to utilize ferronickel slag produced in the manufacture of stainless steel as a flowable backfill material for underground use using crushed fine powder. Experimental combinations were made using two components: Case A (sand) and Case B (soil). The optimal mixing ratio of Case A was sand (58.4%), ferronickel slag fine powder (21.6%), cement (1.8%), and water (18.2%). In the case of B, the optimal mixing ratio was determined to be soil (53.0%), ferronickel slag fine powder (20.0%), cement (1.7%), and water (25.3%). The uniaxial compressive strength of case A, which is a mixture of ordinary sand and ferronickel slag powder, was relatively larger than that of case B using soil. In addition, the strength of the specimen increased with increasing curing time. The uniaxial compressive strength tended to increase with increasing curing time. In addition, the unconfined compression strength of the fluid backfill material using common sand as the main material was relatively larger than that of the mixed material using soil as the main material. In case A, the uniaxial compressive strength ranged from 0.17-0.33 MPa, 0.21-0.39 MPa, and 0.19-0.40 MPa, respectively, at curing times of 7, 14, and 28 days. From the experimental results, it was concluded that the ratio of FNS powder and cement mixture was the most appropriate for Case A3. Case B, which used soil as the main material, showed a similar tendency to Case A. As a result of the dissolution test for evaluating the environmental harm of the FNS fine powder, there was no dissolution of substances harmful to the environment.

• Transactions of the Korean Society of Machine Tool Engineers
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• v.11 no.4
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• pp.1-5
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• 2002

A 110 m diameter aspheric metal secondary mirror for a test model of an earth observation satellite camera was fsbricated by ultra-precision single point diamond turning (SPDT). Aluminum alloy for mirror substrates is known to be easily machinable, but not polishable due to its ductility. A harder material, Ni, is usually electrolessly coated on an A1 substrate to increase the surface hardness for optical polishing. Aspheric metal secondary mirror without a conventional polishing process, the surface roughness of Ra=10nm, and the form error of Ra=λ/12(λ=632.8nm) has been required. The purpose of this research is to find the optimum machining conditions for reflector cutting of electroless-Ni coated A1 alloy and apply the SPDT technique to the manufacturing of ultra precision optical components of metal aspheric reflector.

• Korean Journal of Materials Research
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• v.5 no.8
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• pp.1013-1019
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• 1995

The thin plate of Co-Ni-P was deposited on the polyester film by the electroless plating method. Through present experiments, deposition rates and metal compositions of the plates were determined according to compositions of solution, pH and temperature. Also, magnetic properties of plates were examined according to metal compositions. Considering magnetic properties and deposition rates of electroless plating, the best condition was obtained as pH of 8.5 and 90℃. It was observed that metal compositions were evidently varied by the pH of solutions and the concentration of complex agents. However. they were not affected by other factors. At the optimum condition, the composition of the plate was Co(78%), Ni(16%), and P(6%). Also, it was found that the coercive force was 370 Oe, and squareness was 0.65 at this condition. Magnetic properties (hard or soft) of thin plates were determined by metal compositions. Therefore. the plate became soft magnetic plate as the composition of nickel increased over 30 per cents. The crystal structure of the soft magnetic plate was found to be amorphous in which it was strongly oriented to the (111)phahe of nickel. On the ohter hand, the hard magnetic place was found to be hcp crystalline of α-cobalt which was oriented to the (101)phase of cobalt and the (100)phase of cobalt.

• Journal of the Korean Crystal Growth and Crystal Technology
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• v.6 no.1
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• pp.62-72
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• 1996

The interface formation and reaction-product morphology between SiC and thin metal films were studied at temperatures between 550 and $1450^{\circ}C$ for various times. The typical reaction layer sequence was CoSi/CoSi+C/CoSi/CoSi+C/ $\cdots$ /SiC reaction at 1050 and $1250^{\circ}C$ for 2 h, while $Ni_2Si/Ni_2Si+C/Ni_2Si/Ni_2Si+C/ {\cdots} /SiC$ at 950 and 105$0^{\circ}C$ for 2 h. Carbon precipitated preferentially on the outer surface and crystallized as graphite above $1450^{\circ}C$ for SiC/Co reaction zone and $1250^{\circ}C$ for SiC/Ni. The mechanism of the periodic band structure formation with carbon precipitation behaviour was discussed in terms of thermodynamic considerations.