• 제목/요약/키워드: 나노 스크래치

검색결과 32건 처리시간 0.036초

나노스크래치와 HF 식각을 병용한 보로실리케이트 요/철형 구조체 패턴 제작 기술 (Fabrication Technique of Nano/Micro Pattern with Concave and Convex Structures on the Borosilicate Surface by Using Nanoscratch and HF etching)

  • 윤성원;강충길
    • 한국정밀공학회지
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    • 제21권4호
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    • pp.24-31
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    • 2004
  • The objective of this work is to suggest a mastless pattern fabrication technique using the combination of machining by Nanoindenter(equation omitted) XP and HF wet etching. Sample line patterns were machined on a borosilicate surface by constant load scratch (CLS) of the Nanoindenter(equation omitted) XP with a Berkovich diamond tip, and they were etched in HF solution to investigate chemical characteristics of the machined borosilicate surface. All morphological data of scratch traces were scanned using atomic force microscope (AFM).

나노스크래치와 HF 에칭기술을 병용한 Pyrex 7740의 마스크리스 나노 가공 (Maskless Nano-fabrication by using both Nanoscratch and HF Wet Etching Technique)

  • 윤성원;이정우;강충길
    • 한국정밀공학회:학술대회논문집
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    • 한국정밀공학회 2003년도 춘계학술대회 논문집
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    • pp.628-631
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    • 2003
  • This study describes a new mastless nano-fabrication technique of Pyrex 7740 glass using the combination of nanomachining by nano-indenter XP and HF wet etching. First, the surface of a Pyrex 7740 glass specimen was machined by using the nano-machining system, which utilizes the mechanism of the nano-indenter XP. Next, the specimen was etched by HF solution. After the etching process, the convex structure or deeper hole is made because of masking or promotion effect of the affected layer generated by nano-machining. On the basis of this interesting fact. some sample structures were fabricated.

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나노스크래치와 KOH 에칭 기술을 병용한 Si (100) 패턴제작 (Pattern Fabrication on Si (100) Surface by Using Both Nanoscratch and KOH Etching Technique)

  • 윤성원;이정우;강충길
    • 한국소성가공학회:학술대회논문집
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    • 한국소성가공학회 2003년도 춘계학술대회논문집
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    • pp.448-451
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    • 2003
  • This study describes a new maskless nano-fabrication technique of Si (100) using the combination of nanometer-scale mechanical forming by nano-indenter XP and KOH wet etching. First the surface of a Si (100) specimen was machined by using the nano-machining system, which utilizes the mechanism of the nano-indenter XP. Next, the specimen was etched by KOH solution. After the etching process, the convex structure or deeper hole is made because of masking or promotion effect of the affected layer generated by nano-machining. On the basis of this interesting fact, some sample structures were fabricated.

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마스크리스 나노 패턴제작을 위한 나노스크래치 된 Si(100) 표면의 식각 마스크 효과에 관한 연구 (Study on the Masking Effect of the Nanoscratched Si (100) Surface and Its Application to the Maskless Nano Pattern fabrication)

  • 윤성원;강충길
    • 한국정밀공학회지
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    • 제21권5호
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    • pp.24-31
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    • 2004
  • Masking effect of the nanoscratched silicon (100) surface was studied and applied to a maskless nanofabrication technique. First, the surface of the silicon (100) was machined by ductile-regime nanomachining process using the scratch option of the Nanoindenter${ \circledR}$ XP. To clarify the possibility of the nanoscratched silicon surfaces for the application to wet etching mask, the etching characteristic with a KOH solution was evaluated at room temperature. After the etching process, the convex nanostructures were made due to the masking effect of the mechanically affected layer. Moreover, the height and the width of convex structures were controlled with varying normal loads during nanoscratch.

나노스크래치 공정을 이용하여 극미세 패턴을 제작하기 위한 나노 변형의 유한요소해석 (Finite Element Analysis of Nano Deformation for Hyper-fine Pattern Fabrication by Application of Nano-scratch Process)

  • 이정우;강충길;윤성원
    • 한국정밀공학회지
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    • 제21권3호
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    • pp.139-146
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    • 2004
  • In this study, to achieve the optimal conditions for mechanical hyper-fine pattern fabrication process, deformation behavior of the materials during indentation scratch test was studied with numerical method by ABAQUS S/W. Brittle materials (Si, Pyrex glass 7740) were used as specimens, and forming conditions to reduce the elastic recovery and pile-up were proposed. The indenter was modeled as a rigid surface. Minimum mesh sizes of specimens are 1-l0nm. Variables of the nanoindentation scratch test analysis are scratching speed, scratching load, tip radius and tip geometry. The nano-indentation scratch tests were performed by using the Berkovich pyramidal diamond indenter. Comparison between the experimental data and numerical result demonstrated that the FEM approach can be a good model of the nanoindentation scratch test. The result of the investigation will be applied to the fabrication of the hyper-fine pattern.

Berkovich 팁을 이용한 PMMA의 초미세 가공에서 가공속도가 변형거동에 미치는 영향

  • 윤성원;김현일;강충길
    • 한국정밀공학회:학술대회논문집
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    • 한국정밀공학회 2004년도 춘계학술대회 논문요약집
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    • pp.147-147
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    • 2004
  • 폴리메틸메타크릴레이트(polymethylmethacrylate, PMMA)는 아크릴레이트계 고분자이자 열가소성 플라스틱으로써 LCD용 도광판, 콘택트렌즈, 치과용 레진, DVD 디스크용 소재, 나노임프린트용 피가공재, 나노리소그래피 공정용 레지스트 등 많은 분야에서 활발히 사용되고 있다. PMMA 와 같은 점소성 점탄성 소재의 기계적 성질 측정 및 가공을 위해서는, 응력완화 (stress relaxation), 크립 (creep)등과 같은 시간의존적 변형거동에 대한 연구가 선행되어야 한다.(중략)

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마이크로웨이브 플라즈마에서 나노결정다이아몬드 입자의 박막 성장 기구 (Coalescence of Nanocrystalline Diamond Crystallites into Thin Film in Microwave Plasma)

  • 정두영;강찬형
    • 한국표면공학회:학술대회논문집
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    • 한국표면공학회 2009년도 추계학술대회 초록집
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    • pp.142-143
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    • 2009
  • Ar/$CH_4$ 마이크로웨이브 플라즈마 하에서 나노결정다이아몬드 박막의 미세구조 형성 과정에 대하여 연구하였다. 실리콘 기판 위에 불균일 핵생성을 위해 만든 스크래치 자리에 생성된 나노결정 크기의 다이아몬드 입자는 시간의 경과에 따라 성장하고 이웃하고 있는 입자들 간에 접촉이 일어나 표면을 완전히 채우게 되면 다이아몬드 박막이 형성되고 지속적인 박막 두께의 성장이 일어나게 된다. 입자들의 높이(혹은 직경)는 증착시간의 제곱근에 비례하는 것으로 나타났다.

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