• Title/Summary/Keyword: 나노기판

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Nano-Mechanical Studies of HfOx Thin Film for Oxygen Outgasing Effect during the Annealing Process (고온 열처리 과정에서 산소 Outgasing 효과에 의한 HfOx 박막의 Nanomechanics 특성 연구)

  • Park, Myung Joon;Kim, Sung Joon;Lee, Si Hong;Kim, Soo In;Lee, Chang Woo
    • Journal of the Korean Vacuum Society
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    • v.22 no.5
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    • pp.245-249
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    • 2013
  • The $HfO_X$ thin film was deposited what it has been paid attention to the next generation oxide thin layer of MOSFET (metal-Oxide semiconductor field-effect-transistor) by rf magnetron sputter on Si (100) substrate. The $HfO_X$ thin film was deposited using a various oxygen gas flows (5, 10, 15 sccm). After deposition, $HfO_X$ thin films were annealed from 400 to $800^{\circ}C$ for 20 min in nitrogen ambient. The electrical characteristics of the $HfO_X$ thin film was improved by leakage current properties, depending on the increase of oxygen gas flow and annealing temperature. In particular, the properties of nano-mechanics of $HfO_X$ thin films were measured by AFM and Nano-indenter. From the results, the maximum indentation depth at the basis of maximum indentation force was increased from 24.9 to 38.8 nm according to increase the annealing temperature. Especially, the indentation depth was increased rapidly at $800^{\circ}C$. The rapid increasement of indentation depth was expected to be due to the change of residual stress in the $HfO_X$ thin film, and this result was caused by relative flux of oxygen outgasing during the annealing process.

Effect of Reaction Temperature on the Geometry of Carbon Coils Formed by SF6 Flow Incorporation in C2H2 and H2 Source Gases (SF6-C2H2-H2 기체에 의해 생성된 탄소 코일 기하구조의 반응온도 효과)

  • Kim, Sung-Hoon
    • Journal of the Korean Vacuum Society
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    • v.21 no.1
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    • pp.48-54
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    • 2012
  • Carbon coils could be synthesized on nickel catalyst layer-deposited silicon oxide substrate using $C_2H_2$ and $H_2$ as source gases and SF6 as an additive gas under thermal chemical vapor deposition system. The geometries of as-grown carbon materials were investigated with increasing the reaction temperature as the increment of $25^{\circ}C$ from $650^{\circ}C$ up to $800^{\circ}C$. At $650^{\circ}C$, the embryos for carbon coils were formed. With increasing the reaction temperature to $700^{\circ}C$, the coil-type geometries were developed. Further increasing the reaction temperature to $775^{\circ}C$, the development of wave-like nano-sized coils, instead of nano-sized coils, and occasional appearance of micro-sized carbon coils could be observed. Fluorine in $SF_6$ additive may shrink the micro-sized coil diameter via the reduction of Ni catalyst size by fluorine's etching role. Finally, the preparation of the micro-sized carbon coils having the smaller coil diameters, compared with the previously reported ones, could be possible using $SF_6$ additive.

A Comparative Study of ITO Glass Ablation Using Femtosecond and Nanosecond Lasers (펨토초 레이저와 나노초 레이저를 이용한 ITO Glass의 어블레이션 비교 연구)

  • Jeon, Jin-Woo;Shin, Young-Gwan;Kim, Hoon-Young;Choi, Wonsuk;Ji, Seok-Young;Kang, Hee-Shin;Ahn, Sanghoon;Chang, Won Seok;Cho, Sung-Hak
    • Korean Journal of Optics and Photonics
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    • v.28 no.6
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    • pp.356-360
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    • 2017
  • Indium tin oxide (ITO) provides high electrical conductivity and transparency at visible and near-IR wavelengths. ITO is widely used as a transparent electrode for the fabrication of LCDs, OLEDs, and many kinds of optical applications. It is widely employed for electrodes in various electric and display sectors because of its transparency in the visible range and high conductivity. Therefore, one issue is removing a specific area of a layer of material such as ITO or metallic film on a substrate, without affecting the properties of the substrate. ITO-on-glass removal using a laser is friendlier to the environment than traditional methods. In this study, ablation of ITO film on glass using a femtosecond-laser micromachining system (wavelength 1026 nm, pulse duration 150 fs) and a nanosecond-laser micromachining system (wavelength 1027 nm, pulse duration 5 ns) are described, compared, and analyzed.

Synthesis of Nanostructured Si Coatings by Hybrid Plasma-Particle Accelerating Impact Deposition (HP-PAID) and their Characterization (하이브리드 플라즈마 입자가속 충격퇴적(Hybrid Plasma - Particle Accelerating Impact Deposition, HP-PAID) 프로세스에 의한 Si 나노구조 코팅층의 제조 및 특성평가)

  • 이형직;권혁병;정해경;장성식;윤상옥;이형복;이홍림
    • Journal of the Korean Ceramic Society
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    • v.40 no.12
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    • pp.1202-1207
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    • 2003
  • Using a recently developed Hybric Plasma-Particle Accelerating Impact Deposition (HP-PAID) process, synthesis of nanostructured silicon coatings has been investigated by injecting vapor-phase TEOS (tetraethosysilane, (C$_2$H$\_$5/O)$_4$Si) into an Ar hybrid plasma. The plasma jet with reactants was expanded through nozzle into a deposition chamber, with the pressure dropping from 700 to 10 torr. Ultrafine particles accelerated in the free jet downstream of the nozzle, deposited by an inertial impaction onto a temperature controlled substrate. By using this process, nanostructured amorphous silicon coatings with grain size smaller than 10 nm could be synthesized. These samples were annealed in an Ar and crystallized at 900$^{\circ}C$ for 30 min. TEM analysis showed that the annealed coatings were also composed of nanoparticles smaller than 10 nm, which showed a good consistency that the average grain size of 7 nm was also estimated from a peak shift of 2.39 cm$\^$-1/ and Full Width at Half Maximum (FWHM) 5.92 cm$\^$-1/ of Raman analysis. The noteworthy is that a strong PL peak at 398 nm was also obtained for this sample, which indicates that the deposited coatings also contained 3∼4 nm nanostructured grains.

Recycling of Acidic Etching Waste Solution Containing Heavy Metals by Nanofiltration (II) : Dead-end Nanofiltration of PCB Etching Waste Solution Containing Copper Ion (나노여과에 의한 중금속 함유 산성 폐에칭액의 재생(II) : 구리이온을 함유한 PCB 폐에칭액의 Dead-end 나노여과)

  • Nam, Sang-Won;Jang, Kyung-Sun;Youm, Kyung-Ho
    • Membrane Journal
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    • v.23 no.1
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    • pp.92-99
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    • 2013
  • In this study the nanofiltration (NF) membrane treatment of a sulfuric acid waste solutions containing copper ion ($Cu^{+2}$) discharging from the etching processes of the printed circuit board (PCB) manufacturing industry has been studied for the recycling of acid etching solution. SelRO MPS-34 4040 NF membrane from Koch company was tested to obtain the basic NF data for recycling of etching solution and separation efficiency (total rejection) of copper ion. NF experiments were carried out with a dead-end membrane filtration laboratory system. The pure water flux was increased with the increasing storage time in sulfuric acid solution and lowering pH of acid solution because of the enhancement of NF membrane damage by sulfuric acid. The permeate flux of acid solution was decreased with the increasing copper ion concentration. Total rejection of copper ion was decreased with the increasing storage time in sulfuric acid solution and copper ion concentration, and lowering the pH of acid solution. The total rejection of copper ion was decreased from initial 37% to 15% minimum value.

Preparation of Nanostructures Using Layer-by-Layer Assembly and Applications (층상자기조립법을 이용한 나노구조체의 제조와 응용)

  • Cho, Jin-Han
    • Journal of the Korean Vacuum Society
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    • v.19 no.2
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    • pp.81-90
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    • 2010
  • We introduce a novel and versatile approach for preparing self-assembled nanoporous multilayered films with antireflective properties. Protonated polystyrene-block-poly (4-vinylpyrine) (PS-b-P4VP) and anionic polystyrene-block-poly (acrylic acid) (PS-b-PAA) block copolymer micelles (BCM) were used as building blocks for the layer-by-layer assembly of BCM multilayer films. BCM film growth is governed by electrostatic and hydrogen-bonding interactions between the oppositely BCMs. Both film porosity and film thickness are dependent upon the charge density of the micelles, with the porosity of the film controlled by the solution pH and the molecular weight (Mw) of the constituents. PS7K-b-P4VP28K/PS2K-b-PAA8K films prepared at pH 4 (for PS7K-b-P4VP28K) and pH 6 (for PS2K-b-PAA8K) are highly nanoporous and antireflective. In contrast, PS7K-b-P4VP28K/PS2K-b-PAA8K films assembled at pH 4/4 show a relatively dense surface morphology due to the decreased charge density of PS2K-b-PAA8K. Films formed from BCMs with increased PS block and decreased hydrophilic block (P4VP or PAA) size (e.g., PS36K-b-P4VP12K/PS16K-b-PAA4K at pH 4/4) were also nanoporous. Furthermore, we demonstrate that the nanostructured electrochemical sensors based on patterning methods show the electrochemical activities. Anionic poly(styrene sulfonate) (PSS) layers were selectively and uniformly deposited onto the catalase (CAT)-coated surface using the micro-contact printing method. The pH-induced charge reversal of catalase can provide the selective deposition of consecutive PE multilayers onto patterned PSS layers by causing the electrostatic repulsion between next PE layer and catalase. Based on this patterning method, the hybrid patterned multilayers composed of platinum nanoparticles (PtNP) and catalase were prepared and then their electrochemical properties were investigated from sensing $H_2O_2$ and NO gas. This study was based on the papers reported by our group. (J. Am. Chem. Soc. 128, 9935 (2006); Adv. Mater. 19, 4364 (2007); Electro. Mater. Lett. 3, 163 (2007)).

A Research and Application of Polyhydroxyalkanoates in Biosensor Chip (생분해성 고분자, 폴리하이드록시알카노에이트를 이용한 바이오센서 칩 연구와 그 응용)

  • Park, T.J.;Lee, S.Y.
    • KSBB Journal
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    • v.22 no.6
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    • pp.371-377
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    • 2007
  • Polyhydroxyalkanoates (PHAs) are a family of microbial polyesters that can be produced by fermentation from renewable resources. PHAs can be used as completely biodegradable plastics or elastomers. In this paper, novel applications of PHAs in biosensor are described. A general platform technology was developed by using the substrate binding domain (SBD) of PHA depolymerase as a fusion partner to immobilize proteins of interest on PHA surface. It could be shown that the proteins fused to the SBD of PHA depolymerase could be specifically immobilized onto PHA film, PHA microbead, and microcontact printed PHA surface. We review the results obtained for monitoring the specific interaction between the SBO and PHA by using enhanced green fluorescent protein, red fluorescent protein, single chain antibody against hepatitis B virus preS2 surface protein and severe acute respiratory syndrome coronavirus surface antigen as model proteins. Thus, this system can be efficiently used for studying protein-protein and possibly protein-biomolecule interactions for various biotechnological applications.

Preparation of Nanocrystalline ZrO2 Film by Using a Zirconium Naphthenate and Evaluation of Calcium Phosphate Forming Ability (지르코늄 나프테네이트를 이용한 나노결정질 ZrO2 박막의 제조와 칼슘 포스페이트 형성 능력의 평가)

  • Oh, Jeong-Sun;Ahn, Jun-Hyung;Yun, Yeon-Hum;Kang, Bo-An;Kim, Sang-Bok;Hwang, Kyu-Seog;Shim, Yeon-A
    • Journal of the Korean Ceramic Society
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    • v.39 no.9
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    • pp.884-889
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    • 2002
  • In order to investigate the calcium phosphate forming ability of nanocrystalline $ZrO_2$ film, we prepared $ZrO_2/Si$ structure by using a chemical solution deposition with a zirconium naphthenate as a starting material. Precursor sol was spin-coated onto the (100)Si substrate and prefired at 500$^{\circ}C$ for 10 min in air, followed by final annealing at 800$^{\circ}C$ for 30 min in air. Crystallinity of the annealed film was examined by X-ray diffraction analysis. Surface morphology and surface roughness of the film were characterized by field emission-scanning electron microscope and atomic force microscope. After annealing, nanocrystalline $ZrO_2$ grains were obtained on the surface of the film with a homogeneous interface between the film and substrate. After immersion for 1 or 5 days in a simulated body fluid, formation of calcium phosphate was observed on $ZrO_2$ film annealed at 800$^{\circ}C$ by energy dispersive X-ray spectrometer. The fourier transform infrared spectroscopy revealed that carbonate was substituted into the calcium phosphate.

Electrical Properties of Two-dimensional Electron Gas at the Interface of LaAlO3/SrTiO3 by a Solution-based Process (용액 공정을 통해 제조된 LaAlO3/SrTiO3 계면에서의 이차원 전자 가스의 전기적 특성)

  • Kyunghee Ryu;Sanghyeok Ryou;Hyeonji Cho;Hyunsoo Ahn;Jong Hoon Jung;Hyungwoo Lee;Jung-Woo Lee
    • Journal of the Microelectronics and Packaging Society
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    • v.31 no.1
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    • pp.43-48
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    • 2024
  • The discovery of a two-dimensional electron gas (2DEG) at the interface of LaAlO3 (LAO) and SrTiO3 (STO) substrates has sparked significant interest, providing a foundation for cutting-edge research in electronic devices based on complex oxide heterostructures. However, conventional methods for producing LAO thin films, typically employing techniques like pulsed laser deposition (PLD) within physical vapor deposition (PVD), are associated with high costs and challenges in precisely controlling the La and Al composition within LAO. In this study, we adopted a cost-effective alternative approach-solution-based processing-to fabricate LAO thin films and investigated their electrical properties. By adjusting the concentration of the precursor solution, we varied the thickness of LAO films from 2 to 65 nm and determined the sheet resistance and carrier density for each thickness. After vacuum annealing, the sheet resistance of the conductive channel ranged from 0.015 to 0.020 Ω·s-1, indicating that electron conduction occurs not only at the LAO/STO interface but also into the STO bulk region, consistent with previous studies. These findings demonstrate the successful formation and control of 2DEG through solution-based processing, offering the potential to reduce process costs and broaden the scope of applications in electronic device manufacturing.

New fabrication of CIGS crystals growth by a HVT method (새로운 HVT 성장방법을 이용한 CIGS 결정성장)

  • Lee, Gang-Seok;Jeon, Hun-Soo;Lee, Ah-Reum;Jung, Se-Gyo;Bae, Seon-Min;Jo, Dong-Wan;Ok, Jin-Eun;Kim, Kyung-Hwa;Yang, Min;Yi, Sam-Nyeong;Ahn, Hyung-Soo;Bae, Jong-Seong;Ha, Hong-Ju
    • Journal of the Korean Crystal Growth and Crystal Technology
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    • v.20 no.3
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    • pp.107-112
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    • 2010
  • The Cu$(In_{1-x}Ga_x)Se_2$ is the absorber material for thin film solar cell with high absorption coefficient of $1{\times}10^5cm^{-1}$. In the case of CIGS, the movable energy band gap from $CuInSe_2$ (1.00 eV) to $CuGaSe_2$ (1.68 eV) can be acquired while controlling Ga contain ratio. Generally, the co-evaporator method have used for development and fabrication of the CIGS absorption layer. However, this method should need many steps and lengthy deposition time with high temperature. For these reasons, in this paper, a new growth method of CIGS layer was attempted to hydride vapor transport (HVT) method. The CIGS mixed-source material reacted for HCl gas in the source zone was deposited on the substrate after transporting to growth zone. c-plane $Al_2O_3$ and undoped GaN were used as substrates for growth. The characteristics of grown samples were measured from SEM and EDS.