• 제목/요약/키워드: $TiO_2(110)$

검색결과 180건 처리시간 0.033초

연천 함티타늄 자철광상의 성인 (Ore Genesis of the Yonchon Titaniferous Iron Ore Deposits, South Korea)

  • 김규한;이현주;전효택
    • 자원환경지질
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    • 제27권2호
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    • pp.117-130
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    • 1994
  • Titanomagnetite ore bodies in the Yonchon iron mine are closely associated with alkali gabbroic rocks of middle Proterozoic age which intruded Precambrian metasedimentary rocks. The orebodies can be divided into massive ores in gabbroic rock, skarn ores in calcareous xenoliths and banded ores in gneissic gabbro. Gabbroic rocks from the Yonchon iron mine have unusually high content of $TiO_2$ with an average values of 3.46 wt%. Iron ores are ilmenite (42.25~51.56 wt% in $TiO_2$) and titanomagnetite (1.29~6.57 wt% in $TiO_2$) and the former is dominant Small amount of magnetite, hematite, sphene and sulfide minerals are included in the ores. Grandite garnet, titanoaugite and tschermakite are in iron skarn ores. Hornblendes from ores and gabbroic rocks have a relatively homogeneous isotopic composition with ${\delta}D$ between -110.0 and -133.9‰, and ${\delta}^{18}O$ of +4.5 to +6.5‰, and calculated to have formed in fluids with ${\delta}O_{H_2O}$ of + 6.7 to +8.7‰. and ${\delta}_{H_2O}$ of -87.9 to -111.8‰, which has a similar isotopic value of primary magmatic water. Based on intrusive age, occurrence, mineral chemistry and isotopic compositions of magnetite ores and gabroic rocks, it will be concluded that the gabbroic rocks are responsible for the titanomagnetite mineralization. The titaniferous magnetite melt was immiscibly separated from the high titaniferous gabbroic melts of Proterozoic age.

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In Situ X-ray Photoemission Spectroscopy Study of Atomic Layer Deposition of $TiO_2$ on Silicon Substrate

  • Lee, Seung-Youb;Jeon, Cheol-ho;Kim, Yoo-Seok;Kim, Seok-Hwan;An, Ki-Seok;Park, Chong-Yun
    • 한국진공학회:학술대회논문집
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    • 한국진공학회 2011년도 제41회 하계 정기 학술대회 초록집
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    • pp.222-222
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    • 2011
  • Titanium dioxide (TiO2) has a number of applications in optics and electronics due to its superior properties, such as physical and chemical stability, high refractive index, good transmission in vis and NIR regions, and high dielectric constant. Atomic layer deposition (ALD), also called atomic layer epitaxy, can be regarded as a special modification of the chemical vapor deposition method. ALD is a pulsed method in which the reactant vapors are alternately supplied onto the substrate. During each pulse, the precursors chemisorb or react with the surface groups. When the process conditions are suitably chosen, the film growth proceeds by alternate saturative surface reactions and is thus self-limiting. This makes it possible to cover even complex shaped objects with a uniform film. It is also possible to control the film thickness accurately simply by controlling the number of pulsing cycles repeated. We have investigated the ALD of TiO2 at 100$^{\circ}C$ using precursors titanium tetra-isopropoxide (TTIP) and H2O on -O, -OH terminated Si surface by in situ X-ray photoemission spectroscopy. ALD reactions with TTIP were performed on the H2O-dosed Si substrate at 100$^{\circ}C$, where one cycle was completed. The number of ALD cycles was increased by repeated deposition of H2O and TTIP at 100$^{\circ}C$. After precursor exposure, the samples were transferred under vacuum from the reaction chamber to the UHV chamber at room temperature for in situ XPS analysis. The XPS instrument included a hemispherical analyzer (ALPHA 110) and a monochromatic X-ray source generated by exciting Al K${\alpha}$ radiation (h${\nu}$=1486.6 eV).

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Photocatalytic Degradation of Methyl-tertiary butyl ether using Element-Enhanced Photocatalyst

  • 양창희;신명희;장종대;이진우;최성락;조완근
    • 한국환경과학회:학술대회논문집
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    • 한국환경과학회 2008년도 추계학술발표회 발표논문집
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    • pp.110-113
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    • 2008
  • 최근 가시광선에서 응답하는 광촉매를 이용하여 저농도의 일반적인 실내 대기 오염물질 제어를 위한 적용가능성에 대해 많은 평가가 있어왔다. 가시광선에서 활성을 보이는 질소 원소가 도핑된 TiO$_2$광촉매를 이용하여 대표적인 휘발성유기화합물질들 중에 하나인 MTBE의 분해율에 대한 실험을 실시하였다. 본 연구에서 여러 가지 변수들 중에 농도와 상대습도에 따라 MTBE의 분해율에 대하여 실험하였으며, 본 연구의 실험조건하에서 질소가 도핑된 TiO$_2$ 광촉매를 통해서 효과적으로 MTBE가 제거됨을 확인 할 수 있었다.

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Catalytic Activity of Au/$TiO_2$ and Pt/$TiO_2$ Nanocatalysts Synthesized by Arc Plasma Deposition

  • Jung, Chan-Ho;Kim, Sang-Hoon;Reddy, A.S.;Ha, H.;Park, Jeong-Y.
    • 한국진공학회:학술대회논문집
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    • 한국진공학회 2012년도 제42회 동계 정기 학술대회 초록집
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    • pp.245-245
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    • 2012
  • Syntheses of oxide supported metal catalysts by wet-chemical routes have been well known for their use in heterogeneous catalysis. However, uniform deposition of metal nanoparticles with controlled size and shape on the support with high reproducibility is still a challenge for catalyst preparation. Among various synthesis methods, arc plasma deposition (APD) of metal nanoparticles or thin films on oxide supports has received great interest recently, due to its high reproducibility and large-scale production, and used for their application in catalysis. In this work, Au and Pt nanoparticles with size of 1-2 nm have been deposited on titania powder by APD. The size of metal nanoparticles was controlled by number of shots of metal deposition and APD conditions. These catalytic materials were characterized by x-ray diffraction (XRD), inductively coupled plasma (ICP-AES), CO-chemisorption and transmission electron microscopy (TEM). Catalytic activity of the materials was measured by CO oxidation using oxygen, as a model reaction, in a micro-flow reactor at atmospheric pressure. We found that Au/$TiO_2$ is reactive, showing 100% conversion at $110^{\circ}C$, while Pt/$TiO_2$ shows 100% conversion at $200^{\circ}C$. High activity of metal nanoparticles suggests that APD can be used for large scale synthesis of active nanocatalysts. We will discuss the effect of the structure and metal-oxide interactions of the catalysts on catalytic activity.

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기계적 분쇄화법으로 제조된 $(Ti_{52}Al_{48})_{100-x}$-xB(x=0,0.5,2,5) 합금분말의 제조 및 미세조직 특성 (Synthesis and Microstructural Characterization of Mechanically Milled $(Ti_{52}Al_{48})_{100-x}$-xB (x=0,0.5,2,5) Alloys)

  • 표성규
    • 한국분말재료학회지
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    • 제5권2호
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    • pp.98-110
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    • 1998
  • $Ti_{52}Al_{48}$ and $(Ti_{52}Al_{48})_{100-x}B_x(x=0.5, 2, 5)$ alloys have been Produced by mechanical milling in an attritor mill using prealloyed powders. Microstructure of binary $Ti_{52}Al_{48}$ powders consists of grains of hexagonal phase whose structure is very close to $Ti_2Al$. $(Ti_{52}Al_{48})_{95}B_5$ powders contains TiB2 in addition to matrix grains of hexagonal phase. The grain sizes in the as-milled powders of both alloys are nanocrystalline. The mechanically alloyed powders were consolidated by vacuum hot pressing (VHP) at 100$0^{\circ}C$ for 2 hours, resulting in a material which is fully dense. Microstructure of consolidated binary alloy consists of $\gamma$-TiAl phase with dispersions of $Ti_2AlN$ and $A1_2O_3$ phases located along the grain boundaries. Binary alloy shows a significant coarsening in grain and dispersoid sizes. On the other hand, microstructure of B containing alloy consists of $\gamma$-TiAl grains with fine dispersions of $TiB_2$ within the grains and shows the minimal coarsening during annealing. The vacuum hot pressed billets were subjected to various heat treatments, and the mechanical properties were measured by compression testing at room temperature. Mechanically alloyed materials show much better combinations of strength and fracture strain compared with the ingot-cast TiAl, indicating the effectiveness of mechanical alloying in improving the mechanical properties.

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열처리에 따른 BST 박막의 특성에 관한 연구 (Study on Post Annealing Dependence of BST Thin Films)

  • 최명률;박인철;권학용;손재구;김홍배
    • 한국전기전자재료학회:학술대회논문집
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    • 한국전기전자재료학회 2005년도 하계학술대회 논문집 Vol.6
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    • pp.197-198
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    • 2005
  • 본 논문에서는 p-type (100)Si. (100)MgO 그리고 MgO/Si 기판 위에 RF Magnetron sputtering 법으로 $Ba_{0.5}Sr_{0.5}TiO_3$(BST) 박막을 증착 후 $600^{\circ}C$ 의 질소분위에서 RTA(Rapid Thermal Annealing)를 이용한 1 분간의 고온 급속열처리를 하였다. XRD 측정결과 모든 기판에서 (110) $Ba_{0.5}Sr_{0.5}TiO_3$의 주피크가 관찰되어졌고, 열처리 후 피크 세기가 증가함을 확인할 수 있었다. C-V 특성에서 각각의 기판에서 측정된 커패시턴스 값으로 계산된 유전율은 120(bare Si), 305(MgO/Si) 그리고 310(MgO)이었다. 누설 전류 특성에서는 150KV/cm이내의 인가전계에서 0.1$uA/cm^2$이하의 안정된 누설전류값을 보여주었다. 결론적으로 MgO 버퍼층을 이용한 기판이 BST 박막의 증착을 위한 기판으로써 효과적임을 알 수 있었다.

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RF 마그네트론 스퍼터링법에 의한 MFM 구조의 $SrBi_2Ta_2O_9$ 박막 특성에 관한 연구 (A study on the characteristics of MEM structure of $SrBi_2Ta_2O_9$ thin films by RE magnetron sputtering)

  • 이후용;최훈상;최인훈
    • 한국진공학회지
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    • 제9권2호
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    • pp.136-143
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    • 2000
  • RF magnetron sputtering법으로 $SrBi_2Ta_2O_9$ (SBT)박막을 상온에서 p-type Si(100) 기판위에 증착하여 DRO 강유전체 메모리(destructive read out ferroelectric random access memory)에 사용되는 강유전체막으로 Pt/SBT/Pt/Ti/$SiO_2$/Si (MFM)구조의 응용가능성을 확인하였다. 구조적인 특징들이 열처리 시간의 변화와 Ar/$O_2$의 가스 유량비의 변화에 따라서 XRD(x-ray diffractometer)에 의해 관찰되었으며 표면 특성은 FE-SEM(field emission scanning electron microscopy)에 의해서 관찰하고 박막의 전기적 특성들은 P-V(polarization-voltage measurement)와 I-V(current-voltage measurement)를 사용하여 관찰하였다. 스퍼터링 증착시 Ar/$O_2$의 가스 유량비는 1:4에서 4:1까지 변화 시켰고 SBT박막은 상온에서 증착시켰다. XRD 측정시 박막들은 SBT의 (105), (110) peak들을 나타내었다. 상온에서 증착시킨 박막은 1시간, 2시간 동안 산소 분위기에서 $800^{\circ}C$ 열처리를 하여 결정화 시켰다. SBT 박막의 P-V곡선은 이력 곡선의 모양을 갖추었으며 비대칭적인 강유전체 특성을 나타내었다. Ar/$O_2$ 가스유량비가 1 : 1, 2 : 1인 경우에 박막의 누설 전류밀도 값이 제일 좋았으며, 그 값은 3V 5V 7V에서 각각 $3.11\times10^{-8} \textrm{A/cm}^2$, $5\times10^{-8}\textrm{A/cm}^2$, $7\times10^{-8}\textrm{A/cm}^2$ 이었다. 열처리 시간을 2시간으로 증가시킨 후, 그들의 전기적 특성과 결정화특성이 개선됨을 확인하였다. AES 분석 및 EPMA분석으로 SBT박막의 깊이 분포 및 조성을 확인하였다.

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소결온도에 따른 (Ba,Sr)(Nb,Ti)$O_3$ 세라믹스의 구조적 특성 (The structural properties of (Ba,Sr)(Nb,Ti)$O_3$ ceramics with sintering temperature)

  • 박보근;김지헌;이문기;류기원;이영희
    • 대한전기학회:학술대회논문집
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    • 대한전기학회 2001년도 하계학술대회 논문집 C
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    • pp.1411-1413
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    • 2001
  • The $(Ba_{0.5}Sr_{0.5})(Nb_{0.5}Ti_{0.5})O_3$ [BSNT] ceramics were prepared by conventional mixed oxide method. The structural properties of the BSNT ceramics with sintering temperature were investigated by XRD, SEM, EDS. Increasing the sintering temperature, diffraction intensity of the BST(110) peak was increased. The average grain size of BSNT ceramics were increased with sintering temperature. In the case of BSNT ceramics sintered at 1550$^{\circ}C$, the grain was uniform and the pore was not existed. Increasing the sintering temperature from 1400$^{\circ}C$ to 1500$^{\circ}C$, the amount of Nb and Sr were decreased. The density of BSNT ceramics sintered at 1550$^{\circ}C$ was $1.125g/cm^2$.

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인체 감지용 강유전체 박막 초전형 적외선 센서의 제작 (Pyroelectric Infrared Microsensors Made for Human Body Detection)

  • 최준림
    • 센서학회지
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    • 제7권2호
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    • pp.103-110
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    • 1998
  • 강유전체 박막과 마이크로 가공기술을 이용하여 초전형 적외선 센서를 제작하였다. 초전형 적외선 센서는 $Pb_{l-x}La_{x}Ti_{1-x/4}O_{3}$ (x=0.05) (PLT) 강유전체 박막 커패시터를 RF 마그네트론 스퍼터링 방식으로 백감 전극이 증착된 MgO 기판상에 결정 성장시킨 구조를 갖고 있다. 스퍼터링된 PLT 박막은 높은 c-축 결정 구조를 가지므로 센서로 사용하기 위한 분극 처리 과정이 필요 없다. 이는 적외선 이미지 센서를 구현함에 있어서 수율 향상에 필수적인 요소이다. 또한 마이크로 가공 기술을 사용하여 센서의 열용량을 극소화함으로서 센서의 효율을 최대화하였다. 제작된 센서의 상부에 폴리이미드를 코팅하고 MgO 기판을 선택적으로 식각하여 코팅된 폴리이미드와 MgO가 강유전체 박막 커패시터를 지지하고 있는 구조를 구현하였다. 이렇게 제작된 센서의 감도는 상온에서 $8.5{\times}10^{8}cm{\cdot}\sqrt{Hz}/W$로 측정되었으며 이는 마이크로 가공 기술을 사용하지 않은 경우보다 약 100 배의 감도 향상을 가져왔다. 2차원 배열 구조를 갖는 센서를 가지고 인체의 유 무 뿐만 아니라 위치까지 감별할 수 있는 센싱 시스템을 구현하였다.

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코팅 조건에 따른 BST 박막의 표면 이미지 특성 (The Surface Image Properties of BST Thin Film by Depositing Conditions)

  • 홍경진;기현철;오수홍;조재철
    • 한국전기전자재료학회:학술대회논문집
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    • 한국전기전자재료학회 2002년도 춘계학술대회 논문집 센서 박막재료 반도체재료 기술교육
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    • pp.107-110
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    • 2002
  • The optical memory devices of BST thin films to composite $(Ba_{0.7}\;Sr_{0.3})TiO_{3}$ using sol-gel method were fabricated by changing of the depositing layer number on $Pt/Ti/SiO_{2}/Si$ substrate. The structural properties of optical memory devices to be ferroelectric was investigated by fractal analysis and 3-dimension image processing. The thickness of BST thin films at each coating numbers 3, 4 and 5 times was $2500[\AA]$, $3500[\AA]$ and $3800[\AA]$. BST thin films exhibited the most pronounced grain growth. The surface morphology image was roughness with coating numbers. The thin films increasing with coating numbers shows a more textured and complex configuration.

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